JP2002093795A - Vertical heat treating apparatus - Google Patents
Vertical heat treating apparatusInfo
- Publication number
- JP2002093795A JP2002093795A JP2000284914A JP2000284914A JP2002093795A JP 2002093795 A JP2002093795 A JP 2002093795A JP 2000284914 A JP2000284914 A JP 2000284914A JP 2000284914 A JP2000284914 A JP 2000284914A JP 2002093795 A JP2002093795 A JP 2002093795A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- heater
- processing container
- equalizing tube
- insulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、縦型熱処理装置に
関する。[0001] The present invention relates to a vertical heat treatment apparatus.
【０００２】[0002]
【従来の技術】半導体装置の製造においては、被処理体
例えば半導体ウエハに酸化、拡散、アニール、ＣＶＤ等
の処理を施す半導体製造装置として、例えば一度に多数
枚の半導体ウエハの処理が可能なバッチ式の縦型熱処理
装置が用いられている。この縦型熱処理装置において
は、一般的に、多数枚のウエハを高さ方向に所定間隔で
配列した状態で処理容器内に収容し、該処理容器の周囲
に設けたヒータにより前記ウエハを加熱して所定の熱処
理を施すようになっている。また、縦型熱処理装置とし
ては、例えば拡散処理のように比較的高温領域で熱処理
を行う場合、均熱性を図ると共にヒータからウエハへの
金属汚染を防止するために、前記ヒータと前記処理容器
の間に処理容器を覆うように均熱管を設置したものが知
られている。2. Description of the Related Art In the manufacture of semiconductor devices, a semiconductor manufacturing apparatus for performing processes such as oxidation, diffusion, annealing, and CVD on an object to be processed, for example, a semiconductor wafer, is, for example, a batch capable of processing a large number of semiconductor wafers at one time. A vertical heat treatment apparatus is used. In this vertical heat treatment apparatus, generally, a large number of wafers are accommodated in a processing container in a state of being arranged at predetermined intervals in a height direction, and the wafer is heated by a heater provided around the processing container. A predetermined heat treatment. In addition, as a vertical heat treatment apparatus, for example, when heat treatment is performed in a relatively high temperature region such as a diffusion treatment, in order to maintain uniformity and to prevent metal contamination from a heater to a wafer, the heater and the processing container may be used. It is known that a soaking tube is provided so as to cover a processing container in between.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、前記縦
型熱処理装置においては、高さが高く重量の重い均熱管
がヒータの底部の内周に設置された弾性を有する底部断
熱体の上部に載置されているにすぎなかったので、地震
等の揺れで均熱管が揺れ易く、この揺れにより万が一、
均熱管が処理容器に強く接触ないし衝突した場合、処理
容器が破損する可能性がある。この問題を解決するため
に、例えば均熱管を固定手段で確実に固定することが考
えられるが、固定するための構造や作業が煩雑になる問
題がある。However, in the vertical heat treatment apparatus, a high and heavy heat equalizing tube is mounted on an elastic bottom heat insulator installed on the inner periphery of the bottom of the heater. Because it was only done, the soaking tube was easily shaken by shaking such as an earthquake, and by this shaking,
If the heat equalizing tube strongly contacts or collides with the processing container, the processing container may be damaged. In order to solve this problem, for example, it is conceivable to securely fix the heat equalizing tube by a fixing means, but there is a problem that the structure and operation for fixing are complicated.
【０００４】本発明は、前記事情を考慮してなされたも
ので、簡単な構成で均熱管の揺れを抑えることができる
縦型熱処理装置を提供することを目的とする。[0004] The present invention has been made in view of the above circumstances, and has as its object to provide a vertical heat treatment apparatus capable of suppressing the swing of a heat equalizing tube with a simple configuration.
【０００５】[0005]
【課題を解決するための手段】本発明のうち、請求項１
の発明は、多数の被処理体を高さ方向に所定間隔で配列
した状態で収容する処理容器と、該処理容器の周囲に設
けられたヒータと、該ヒータと前記処理容器の間に処理
容器を覆うように設置された均熱管とを備えた縦型熱処
理装置であって、前記ヒータは筒状断熱体の頂部に設置
される頂部断熱体を有し、該頂部断熱体に前記均熱管の
頂部外周を取り囲んで均熱管の揺れを規制する規制部材
を設けたことを特徴とする。Means for Solving the Problems In the present invention, claim 1 is provided.
The invention relates to a processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in a height direction, a heater provided around the processing container, and a processing container between the heater and the processing container. And a heat equalizing pipe installed so as to cover the heat insulating pipe, wherein the heater has a top heat insulating body installed on the top of a tubular heat insulator, and the top heat insulating body has the heat equalizing pipe. A regulating member is provided to surround the outer periphery of the top part and regulate the swing of the heat equalizing tube.
【０００６】請求項２の発明は、多数の被処理体を高さ
方向に所定間隔で配列した状態で収容する処理容器と、
該処理容器の周囲に設けられたヒータと、該ヒータと前
記処理容器の間に処理容器を覆うように設置された均熱
管とを備えた縦型熱処理装置であって、前記ヒータは筒
状断熱体の頂部に設置される頂部断熱体を有し、前記均
熱管の揺れを規制するために前記頂部断熱体と前記均熱
管の対向部の一方に突部を、他方に該突部が係合する凹
部を設けたことを特徴とする。According to a second aspect of the present invention, there is provided a processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in a height direction;
A vertical heat treatment apparatus comprising: a heater provided around the processing container; and a heat equalizing tube installed between the heater and the processing container so as to cover the processing container, wherein the heater has a cylindrical heat insulating property. It has a top heat insulator installed on the top of the body, and a protrusion is engaged with one of the opposing portions of the heat insulator and the heat equalization tube in order to regulate the swing of the heat equalization tube, and the protrusion is engaged with the other. The recess is provided.
【０００７】請求項３の発明は、多数の被処理体を高さ
方向に所定間隔で配列した状態で収容する処理容器と、
該処理容器の周囲に設けられたヒータと、該ヒータと前
記処理容器の間に処理容器を覆うように設置された均熱
管とを備えた縦型熱処理装置であって、前記ヒータは筒
状断熱体の頂部に設置される頂部断熱体を有し、前記筒
状断熱体の内側に前記均熱管の頂部外周を取り囲んで均
熱管の揺れを規制する規制部材を設けたことを特徴とす
る。According to a third aspect of the present invention, there is provided a processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in a height direction;
A vertical heat treatment apparatus comprising: a heater provided around the processing container; and a heat equalizing tube installed between the heater and the processing container so as to cover the processing container, wherein the heater has a cylindrical heat insulating property. A heat insulator is provided on the top of the body, and a regulating member is provided inside the tubular heat insulator to surround the outer periphery of the heat equalizing tube at the top thereof and regulate the swing of the heat equalizing tube.
【０００８】請求項４の発明は、請求項１，２もしくは
３に記載の縦型熱処理装置において、前記ヒータの底部
の内側には底部断熱体が設置され、該底部断熱体の上部
には前記均熱管の下端部を嵌合する嵌合穴が形成されて
いることを特徴とする。According to a fourth aspect of the present invention, in the vertical heat treatment apparatus of the first, second or third aspect, a bottom heat insulator is installed inside the bottom of the heater, and the heat insulator is provided above the bottom heat insulator. A fitting hole for fitting a lower end portion of the heat equalizing tube is formed.
【０００９】[0009]
【発明の実施の形態】以下に、本発明の実施の形態を添
付図面に基いて詳述する。Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.
【００１０】図１は、本発明の第１の実施の形態を示す
縦型熱処理装置の縦断面図、図２は図１における頂部断
熱体の断面図、図３は同頂部断熱体の底面図である。図
示例の縦型熱処理装置は、例えば高温炉や拡散炉を構成
する縦型の熱処理炉１を備えている。この熱処理炉１
は、多数例えば１５０枚程度の被処理体例えば半導体ウ
エハｗを支持具である例えば石英製のボート２に高さ方
向に所定間隔で配列支持した状態で収容する処理容器
（プロセスチューブ）３と、この処理容器３の周囲を覆
う如く設置され処理容器３内を所望の温度例えば６００
〜１２００℃程度に加熱可能な加熱手段であるヒータ４
と、このヒータ４と処理容器３の間（環状空間）に処理
容器３を覆うように配置された均熱管５とを備えてい
る。FIG. 1 is a longitudinal sectional view of a vertical heat treatment apparatus showing a first embodiment of the present invention, FIG. 2 is a sectional view of a top heat insulator in FIG. 1, and FIG. 3 is a bottom view of the top heat insulator. It is. The illustrated vertical heat treatment apparatus includes a vertical heat treatment furnace 1 that constitutes, for example, a high-temperature furnace or a diffusion furnace. This heat treatment furnace 1
A processing container (process tube) 3 for accommodating a large number of, for example, about 150 objects to be processed, for example, semiconductor wafers w, arranged and supported at predetermined intervals in the height direction on a boat 2, for example, made of quartz, which is a support tool; The processing container 3 is installed so as to cover the periphery of the processing container 3 and a desired temperature, for example, 600
Heater 4 which is a heating means capable of heating to about 1200 ° C.
And a soaking tube 5 disposed between the heater 4 and the processing container 3 (annular space) so as to cover the processing container 3.
【００１１】前記処理容器３は、耐熱性および耐食性を
有する材料例えば石英からなり、上端が閉塞され、下端
が開口した縦長円筒状に形成されている。処理容器３の
下側部には、処理ガスや不活性ガスを導入するガス導入
ポート６や、処理容器３内を排気する排気ポート７等が
設けらている（図示省略）。ガス導入ポート６には、処
理ガス等のガス供給源が接続される。The processing container 3 is made of a material having heat resistance and corrosion resistance, for example, quartz, and is formed in a vertically long cylindrical shape having a closed upper end and an open lower end. A gas introduction port 6 for introducing a processing gas or an inert gas, an exhaust port 7 for exhausting the inside of the processing container 3, and the like are provided at a lower portion of the processing container 3 (not shown). A gas supply source such as a processing gas is connected to the gas introduction port 6.
【００１２】ガス導入ポート６から導入された処理ガス
は、処理容器３の側壁に沿って設けられたガス導入管８
を介して処理容器３内の頂部に導入され、多孔分散板部
９を介して下方へ分散供給されるようになっている。前
記排気ポート7には、排気系が接続される。処理容器３
は、内管と外管の二重管構造になっていても良い。The processing gas introduced from the gas introduction port 6 is supplied to a gas introduction pipe 8 provided along the side wall of the processing vessel 3.
Through the porous dispersion plate portion 9 and supplied downward. An exhaust system is connected to the exhaust port 7. Processing container 3
May have a double pipe structure of an inner pipe and an outer pipe.
【００１３】前記処理容器３の下端部は、ベースプレー
ト１０の下側に図示しない取付部材により取付けられて
いる。ベースプレート１０は、例えばステンレス製であ
り、縦型熱処理装置の筐体内に水平に設けられている。
このベースプレート１０には、均熱管５や処理容器３を
上下方向に挿通可能な開口部１１が形成されている。The lower end of the processing container 3 is attached to the lower side of the base plate 10 by an attachment member (not shown). The base plate 10 is made of, for example, stainless steel, and is provided horizontally in a housing of the vertical heat treatment apparatus.
The base plate 10 has an opening 11 through which the heat equalizing tube 5 and the processing container 3 can be inserted in the vertical direction.
【００１４】処理容器３の下方には、その下端開口部を
開閉する蓋体１２が図示しない昇降機構により昇降可能
に設けられている。この蓋体１２上には前記ボート２が
保温筒１３を介して載置されている。昇降機構により、
処理容器３内へのボート２の搬入搬出と前記蓋体１２の
開閉が行われるようになっている。なお、蓋体１２に
は、半導体ウエハｗを面内均一に処理するためにボート
２を保温筒１３と共に回転させる回転機構が設けられて
いても良い。Below the processing container 3, a lid 12 for opening and closing the lower end opening is provided so as to be able to move up and down by a lifting mechanism (not shown). The boat 2 is placed on the lid 12 via a heat retaining tube 13. By the lifting mechanism,
The loading and unloading of the boat 2 into and out of the processing container 3 and the opening and closing of the lid 12 are performed. The cover 12 may be provided with a rotation mechanism for rotating the boat 2 together with the heat retaining tube 13 in order to uniformly process the semiconductor wafer w in the plane.
【００１５】前記ヒータ４は、ベースプレート１０上に
設置されている。このヒータ4は、処理容器３の周囲を
取り囲む筒状好ましくは円筒状の断熱体（筒状断熱体）
１４と、この筒状断熱体１４の頂部（上端部）に設置さ
れた板状の頂部断熱体１５とを備えている。この頂部断
熱体１５は、下部に前記筒状断熱体１４の上端開口部に
嵌合する嵌合部１６を有することにより、左右に移動し
ないようになっている。前記筒状断熱体１４の内周に
は、線状の抵抗発熱体１７を周方向に蛇行状もしくは長
手方向に螺旋状に配設して構成されている。前記ヒータ
４は、抵抗発熱体１７が高さ方向に複数ゾーンに分割さ
れ、各ゾーン毎に独立して温度制御が可能に構成されて
いても良い。The heater 4 is provided on a base plate 10. The heater 4 is a cylindrical or preferably cylindrical heat insulator (cylindrical heat insulator) surrounding the periphery of the processing container 3.
14, and a plate-shaped top heat insulator 15 installed on the top (upper end) of the tubular heat insulator 14. The top heat insulator 15 has a fitting portion 16 at the lower portion which fits into the upper end opening of the tubular heat insulator 14, so that it does not move left and right. On the inner periphery of the cylindrical heat insulator 14, a linear resistance heating element 17 is arranged in a meandering shape in the circumferential direction or in a spiral shape in the longitudinal direction. The heater 4 may be configured such that the resistance heating element 17 is divided into a plurality of zones in the height direction, and the temperature can be controlled independently for each zone.
【００１６】筒状断熱体１４、頂部断熱体１５および後
述の底部断熱体１８は、所定の断熱材料例えばシリカ
（ＳｉＯ2）およびアルミナ（Ａｌ2Ｏ3）の混合材料に
より形成されている。これら断熱体１４，１５，１８の
製造方法は、断熱体を成形する成形型を断熱材料をなす
無機質繊維を含む懸濁液に浸漬して吸引により成形型内
に断熱材料を堆積させる工程と、その堆積された断熱材
料からなる成形体を成形型から取外して乾燥させる工程
と、その乾燥された成形体を焼成する工程とを備えてい
る。前記筒状断熱体１４および頂部断熱体１５の外側
は、金属板からなるアウターシェル１９で覆われ、この
アウターシェル１９の外周には水冷ジャケット２０が設
けられている。The cylindrical heat insulator 14, the top heat insulator 15, and the below-described bottom heat insulator 18 are made of a predetermined heat insulating material, for example, a mixed material of silica (SiO 2 ) and alumina (Al 2 O 3 ). The method for manufacturing the heat insulators 14, 15, 18 includes a step of dipping a mold for forming the heat insulator into a suspension containing inorganic fibers forming the heat insulating material and depositing the heat insulating material in the mold by suction, The method includes a step of removing the molded body made of the deposited heat insulating material from the mold and drying, and a step of firing the dried molded body. The outside of the cylindrical heat insulator 14 and the top heat insulator 15 is covered with an outer shell 19 made of a metal plate, and a water cooling jacket 20 is provided on the outer periphery of the outer shell 19.
【００１７】前記均熱管５は、処理容器３内のウエハｗ
に対する加熱温度の均一性を図ると共に、ヒータ４の抵
抗発熱体１７等から放出される金属によるウエハｗの汚
染を防止するもので、例えば炭化珪素（ＳｉＣ）により
形成されている。この均熱管５は、処理容器３の周囲を
取り囲む如く、上端が閉塞され下端が開放された縦長円
筒状に形成されている。The heat equalizing tube 5 is provided for the wafer w in the processing vessel 3.
In order to prevent the contamination of the wafer w by the metal released from the resistance heating element 17 of the heater 4 and the like, it is made of, for example, silicon carbide (SiC). The heat equalizing tube 5 is formed in a vertically long cylindrical shape having a closed upper end and an open lower end so as to surround the periphery of the processing container 3.
【００１８】前記ヒータ４の底部の内側には、筒状断熱
体１４と処理容器３との間の環状の開口（炉口、開口部
１１）を覆う底部断熱体（炉口断熱体ともいう）１８が
設置され、該底部断熱体１８の上部に均熱管５が設置さ
れている。具体的には、前記ベースプレート１０の開口
部周縁には、環状の支持板２１がボルト締めにより下方
から着脱可能に取付けられ、この支持板２１上に前記底
部断熱体１８が設置されている。均熱管５の揺れを抑制
するために、前記底部断熱体１８の上部には、均熱管５
の下端部を嵌合する嵌合穴２２が形成され、この嵌合穴
２２に均熱管５の下端部が挿入嵌合されて均熱管５が設
置されていることが好ましい。Inside the bottom of the heater 4, a bottom heat insulator (furnace heat insulator) that covers an annular opening (furnace opening, opening 11) between the cylindrical heat insulator 14 and the processing vessel 3 is provided. A heat equalizing tube 5 is provided above the bottom heat insulator 18. Specifically, an annular support plate 21 is detachably attached to the periphery of the opening of the base plate 10 from below by bolting, and the bottom heat insulator 18 is installed on the support plate 21. In order to suppress the shaking of the heat equalizing tube 5, the heat equalizing tube 5 is provided above the bottom heat insulator 18.
It is preferable that a fitting hole 22 is formed to fit the lower end of the heat equalizing tube 5, and the lower end of the heat equalizing tube 5 is inserted and fitted into the fitting hole 22 so that the heat equalizing tube 5 is installed.
【００１９】前記頂部断熱体１５には、前記均熱管５の
頂部外周を取り囲んで均熱管５の揺れを規制する規制部
材２３が設けられている。規制部材２３は、図２ないし
図３にも示すように、頂部断熱体１５に均熱管５の頂部
外周を取り囲む如く周方向に適宜間隔で複数例えば３個
取付けられている。この場合、規制部材２３は、例えば
頂部断熱体１５と同じ断熱材料により平面円弧状で且つ
断面逆Ｌ字状に形成されており、頂部断熱体１５の対応
箇所には規制部材２３を上方から挿入して取付けるため
の断面逆Ｌ字状の取付孔２４が形成されている。The top heat insulator 15 is provided with a regulating member 23 that surrounds the outer periphery of the top of the heat equalizing tube 5 and regulates the swing of the heat equalizing tube 5. As shown in FIGS. 2 and 3, a plurality of, for example, three regulating members 23 are attached to the top heat insulator 15 at appropriate intervals in the circumferential direction so as to surround the outer periphery of the top of the heat equalizing tube 5. In this case, the regulating member 23 is formed, for example, from the same heat insulating material as the top heat insulator 15 so as to have a planar arc shape and an inverted L-shaped cross section. A mounting hole 24 having an inverted L-shaped cross section is formed for mounting.
【００２０】前記規制部材２３は、下側が頂部断熱体１
５の下部から下方へ突出した状態に取付けられる。規制
部材２３は、前記取付孔２４に接着剤で接着固定されて
いることが好ましい。また、規制部材２３の均熱管対向
面は、均熱管５の頂部外周形状に対応させてテーパー状
ないし階段状２５に形成されていることが好ましい。The lower side of the regulating member 23 is the top heat insulator 1.
5 is mounted so as to protrude downward from the lower portion. It is preferable that the restricting member 23 is fixed to the mounting hole 24 with an adhesive. It is preferable that the surface of the regulating member 23 facing the heat equalizing tube is formed in a tapered or stepped shape 25 corresponding to the outer peripheral shape of the top of the heat equalizing tube 5.
【００２１】次に、以上の構成からなる縦型熱処理装置
の作用について述べる。先ず、ウエハｗの移載が終了し
たボート２は、ヒータ４下方のローディングエリアにお
いて、蓋体１２上の保温筒１３上に載置され、次に、昇
降機構による蓋体１２の上昇によってボート２を処理容
器３内にその下端開口から搬入し、その開口を蓋体１２
で気密に閉じる。Next, the operation of the vertical heat treatment apparatus having the above configuration will be described. First, the boat 2 on which the transfer of the wafer w has been completed is placed on the heat retaining cylinder 13 on the lid 12 in the loading area below the heater 4, and then the boat 2 is moved up by the raising and lowering mechanism. Is loaded into the processing container 3 through the opening at the lower end thereof, and the opening is
Close hermetically.
【００２２】そして、処理容器３内を排気しながらボー
ト２上のウエハｗをヒータ４により所定の処理温度に昇
温させ、処理容器３内に所定の処理ガスを導入してウエ
ハｗに所定の熱処理例えば拡散処理を施す。所定の熱処
理が終了したなら、先ず、ヒータ４の電源を切り、処理
容器３内を不活性ガス例えば窒素ガスで置換した後、蓋
体１２を下方に開けてボート２を処理容器３内から下方
のローディングエリアに搬出すれば良い。Then, the wafer w on the boat 2 is heated to a predetermined processing temperature by the heater 4 while evacuating the processing container 3, and a predetermined processing gas is introduced into the processing container 3, and a predetermined Heat treatment, for example, diffusion treatment is performed. When the predetermined heat treatment is completed, first, the power of the heater 4 is turned off, and the inside of the processing container 3 is replaced with an inert gas such as nitrogen gas. Then, the lid 12 is opened downward and the boat 2 is moved downward from the inside of the processing container 3. It can be carried out to the loading area.
【００２３】ところで、処理容器３とヒータ４の間に設
けられている均熱管５は、弾性を有する底部断熱体１８
上に設置されており、しかも高さが高く重量も重いた
め、地震等の揺れによって横揺れを起こし易い。しかし
ながら、前記縦型熱処理装置によれば、前記ヒータ４の
筒状断熱体１４の頂部に設置される頂部断熱体１５に前
記均熱管５の頂部外周を取り囲んで均熱管５の揺れを規
制する規制部材２３が設けられているので、別途複雑な
固定手段を有すること無く簡単な構成で均熱管５の揺れ
を抑えることができる。The heat equalizing tube 5 provided between the processing vessel 3 and the heater 4 is provided with an elastic bottom heat insulator 18.
Since it is installed on the top, and is high and heavy, it is easy to roll due to shaking such as an earthquake. However, according to the vertical heat treatment apparatus, the top heat insulator 15 installed at the top of the cylindrical heat insulator 14 of the heater 4 surrounds the top outer periphery of the heat equalizing tube 5 and regulates the swing of the heat equalizing tube 5. Since the member 23 is provided, the swing of the heat equalizing tube 5 can be suppressed with a simple configuration without separately providing complicated fixing means.
【００２４】従って、均熱管５が揺れて処理容器３に強
く接触ないし衝突することによって生じる可能性のある
処理容器３の破損を防止することが可能となり、耐久
性、安全性および信頼性が一段と向上する。また、本発
明は、構成が簡単で、大幅な設計変更を要しないため、
既存の縦型熱処理装置にも容易に実施することが可能で
ある。また、ヒータ４の底部断熱体１８における均熱管
５の設置部分には、均熱管５の下端部を嵌合する嵌合穴
２２が形成されているため、この嵌合穴２２に均熱管５
の下端部を嵌合させて保持することができ、頂部の規制
部材２３と相俟って均熱管５の揺れを更に十分に抑制す
ることが可能となる。Accordingly, it is possible to prevent the processing vessel 3 from being damaged due to the swinging of the heat equalizing pipe 5 and the strong contact or collision with the processing vessel 3, thereby further improving the durability, safety and reliability. improves. In addition, the present invention has a simple configuration and does not require a significant design change,
It can be easily implemented in existing vertical heat treatment equipment. Further, since a fitting hole 22 for fitting the lower end of the heat equalizing tube 5 is formed in the installation portion of the heat equalizing tube 5 in the bottom heat insulator 18 of the heater 4, the heat equalizing tube 5 is fitted in the fitting hole 22.
Can be fitted and held, and the swing of the heat equalizing tube 5 can be more sufficiently suppressed in combination with the regulating member 23 at the top.
【００２５】図４は、本発明の第２の実施の形態を示す
縦型熱処理装置の要部縦断面図である。図４の実施の形
態において、前記図１の実施の形態と同一部分は同一参
照符号を付して説明を省略し、異なる部分について説明
する。図４の実施の形態では、前記均熱管５の揺れを規
制するために前記頂部断熱体１５と前記均熱管５の対向
部の一方（図示例では均熱管５の頂部）には突部２６が
設けられ、他方（図示例では頂部断熱体１５の下面部）
には該突部２６が係合する凹部２７が設けられている。
これら突部２６と凹部２７は、熱処理炉１の設計誤差や
組立誤差および熱膨張等を考慮して、ゆるく係合するよ
うに形成されていることが好ましい。FIG. 4 is a vertical sectional view of a main part of a vertical heat treatment apparatus showing a second embodiment of the present invention. In the embodiment of FIG. 4, the same parts as those in the embodiment of FIG. 1 are denoted by the same reference numerals, and description thereof will be omitted. Only different parts will be described. In the embodiment of FIG. 4, a protrusion 26 is provided on one of the opposing portions of the top heat insulator 15 and the heat equalizing tube 5 (the top of the heat equalizing tube 5 in the illustrated example) in order to regulate the swing of the heat equalizing tube 5. The other (the lower surface of the top heat insulator 15 in the illustrated example)
Is provided with a recess 27 with which the projection 26 engages.
It is preferable that the projection 26 and the recess 27 are formed so as to be loosely engaged in consideration of a design error and an assembly error of the heat treatment furnace 1 and thermal expansion.
【００２６】図４の実施の形態の縦型熱処理装置によれ
ば、均熱管５の頂部に突部２６を設け、頂部断熱体１５
の下面部に該突部２６が係合する凹部２７を設けている
ため、別途複雑な固定手段を有すること無く簡単な構成
で均熱管５の揺れを抑えることができる。本実施の形態
でも、図１の実施の形態と同様、ヒータの底部断熱体に
均熱管の下端部を嵌合する嵌合穴が設けられていること
が好ましい（図示省略）。なお、図４において、２８は
筒状断熱体１４の内周に抵抗発熱体を保持する絶縁性を
有する櫛状の保持体、２９は均熱管５の内側に保持され
た温度検出器である。According to the vertical heat treatment apparatus of the embodiment shown in FIG. 4, the protrusion 26 is provided at the top of the heat equalizing tube 5 so that the top heat insulator 15 is provided.
Since the concave portion 27 with which the protruding portion 26 is engaged is provided on the lower surface of the, the swing of the heat equalizing tube 5 can be suppressed with a simple configuration without additional complicated fixing means. Also in the present embodiment, it is preferable that a fitting hole for fitting the lower end portion of the heat equalizing tube is provided in the bottom heat insulator of the heater as in the embodiment of FIG. 1 (not shown). In FIG. 4, reference numeral 28 denotes a comb-like holding member having insulating properties for holding a resistance heating element on the inner periphery of the cylindrical heat insulator 14, and reference numeral 29 denotes a temperature detector held inside the heat equalizing tube 5.
【００２７】図５は図４の実施の形態の変形例を示す要
部概略的断面図である。すなわち、頂部断熱材１５の下
面部略中央部には下方に突出した突部２６が設けられ、
均熱管５の頂部には該突部２６が係合する凹部２７が設
けられている。この場合、突部２６は、折れや曲りを防
止するために、頂部断熱体１５の断熱材料よりも剛性を
有する材料例えばセラミックにより形成されていること
が好ましい。前記凹部２７は、例えば均熱管５の頂部に
均熱管５と同材質のリング３０を溶接することにより形
成されていても良い。図５の変形例によっても、図４の
実施の形態と同様の効果を奏することができる。FIG. 5 is a schematic sectional view of a main part showing a modification of the embodiment of FIG. That is, a protrusion 26 protruding downward is provided at a substantially central portion of the lower surface portion of the top heat insulating material 15,
The top of the heat equalizing tube 5 is provided with a recess 27 with which the projection 26 engages. In this case, in order to prevent the protrusion 26 from being bent or bent, it is preferable that the protrusion 26 be formed of a material having a higher rigidity than the heat insulating material of the top heat insulator 15, for example, ceramic. The recess 27 may be formed, for example, by welding a ring 30 of the same material as the heat equalizing tube 5 to the top of the heat equalizing tube 5. According to the modification of FIG. 5, the same effect as that of the embodiment of FIG. 4 can be obtained.
【００２８】図６は、本発明の第３の実施の形態を示す
縦型熱処理装置の要部縦断面図である。図６の実施の形
態において、前記図１ないし図４の実施の形態と同一部
分は同一参照符号を付して説明を省略し、異なる部分に
ついて説明する。図３の実施の形態の縦型熱処理装置に
おいては、ヒータ４の筒状断熱体１４の内側に前記均熱
管５の頂部外周を取り囲んで均熱管５の揺れを規制する
規制部材３１が設けられている。図示例の規制部材３１
は、均熱管５を取り囲む如く周方向に連続した属したリ
ング状に形成されているが、周方向に適宜間隔で複数設
けられていても良い。図６の実施の形態の縦型熱処理装
置によれば、ヒータ４の筒状断熱体１４の内側に前記均
熱管５の頂部外周を取り囲んで均熱管５の揺れを規制す
る規制部材３１が設けられているため、別途複雑な固定
手段を有すること無く簡単な構成で均熱管の揺れを抑え
ることができる。本実施の形態でも、図１の実施の形態
と同様、ヒータの底部断熱体に均熱管の下端部を嵌合す
る嵌合穴が設けられていることが好ましい（図示省
略）。FIG. 6 is a vertical sectional view of a main part of a vertical heat treatment apparatus showing a third embodiment of the present invention. In the embodiment of FIG. 6, the same parts as those in the embodiments of FIGS. 1 to 4 are denoted by the same reference numerals, and description thereof will be omitted. Different parts will be described. In the vertical heat treatment apparatus of the embodiment shown in FIG. 3, a regulating member 31 is provided inside the cylindrical heat insulator 14 of the heater 4 to surround the outer periphery of the top of the heat equalizing tube 5 and regulate the swing of the heat equalizing tube 5. I have. The regulating member 31 in the illustrated example
Are formed in a ring shape that is continuous in the circumferential direction so as to surround the heat equalizing tube 5, but a plurality of rings may be provided at appropriate intervals in the circumferential direction. According to the vertical heat treatment apparatus of the embodiment shown in FIG. 6, a regulating member 31 is provided inside the cylindrical heat insulator 14 of the heater 4 to surround the outer periphery of the top of the heat equalizing tube 5 and regulate the swing of the heat equalizing tube 5. Therefore, it is possible to suppress the swing of the heat equalizing tube with a simple configuration without separately providing complicated fixing means. Also in the present embodiment, it is preferable that a fitting hole for fitting the lower end portion of the heat equalizing tube is provided in the bottom heat insulator of the heater as in the embodiment of FIG. 1 (not shown).
【００２９】以上、本発明の実施の形態を図面により詳
述してきたが、本発明は前記実施の形態に限定されるも
のではなく、本発明の要旨を逸脱しない範囲での種々の
設計変更等が可能である。被処理体としては、半導体ウ
エハ以外に、例えばガラス基板やＬＣＤ基板等が適用可
能である。Although the embodiment of the present invention has been described in detail with reference to the drawings, the present invention is not limited to the above embodiment, and various design changes and the like can be made without departing from the gist of the present invention. Is possible. As the object to be processed, for example, a glass substrate, an LCD substrate, or the like can be applied other than the semiconductor wafer.
【００３０】[0030]
【発明の効果】以上要するに本発明によれば、次のよう
な効果を奏することができる。In summary, according to the present invention, the following effects can be obtained.
【００３１】（１）請求項１の発明によれば、多数の被
処理体を高さ方向に所定間隔で配列した状態で収容する
処理容器と、該処理容器の周囲に設けられたヒータと、
該ヒータと前記処理容器の間に処理容器を覆うように設
置された均熱管とを備えた縦型熱処理装置であって、前
記ヒータは筒状断熱体の頂部に設置される頂部断熱体を
有し、該頂部断熱体に前記均熱管の頂部外周を取り囲ん
で均熱管の揺れを規制する規制部材を設けたので、簡単
な構成で均熱管の揺れを抑えることができる。(1) According to the first aspect of the present invention, a processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in the height direction, a heater provided around the processing container,
What is claimed is: 1. A vertical heat treatment apparatus comprising: a heater and a heat equalizing tube installed between the processing container so as to cover the processing container, wherein the heater has a top heat insulator installed at the top of a tubular heat insulator. In addition, since the top heat insulator is provided with a regulating member that surrounds the outer periphery of the top of the heat equalizing tube and regulates the vibration of the heat equalizing tube, the vibration of the heat equalizing tube can be suppressed with a simple configuration.
【００３２】（２）請求項２の発明によれば、多数の被
処理体を高さ方向に所定間隔で配列した状態で収容する
処理容器と、該処理容器の周囲に設けられたヒータと、
該ヒータと前記処理容器の間に処理容器を覆うように設
置された均熱管とを備えた縦型熱処理装置であって、前
記ヒータは筒状断熱体の頂部に設置される頂部断熱体を
有し、前記均熱管の揺れを規制するために前記頂部断熱
体と前記均熱管の対向部の一方に突部を、他方に該突部
が係合する凹部を設けたので、簡単な構成で均熱管の揺
れを抑えることができる。(2) According to the second aspect of the present invention, a processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in the height direction, a heater provided around the processing container,
What is claimed is: 1. A vertical heat treatment apparatus comprising: a heater and a heat equalizing tube installed between the processing container so as to cover the processing container, wherein the heater has a top heat insulator installed at the top of a tubular heat insulator. In addition, a projection is provided on one of the opposing portions of the top heat insulator and the heat equalizing tube in order to restrict the vibration of the heat equalizing tube, and a recess is provided on the other of the opposite portion, so that the uniformity can be achieved with a simple configuration. The shaking of the heat tube can be suppressed.
【００３３】（３）請求項３の発明によれば、多数の被
処理体を高さ方向に所定間隔で配列した状態で収容する
処理容器と、該処理容器の周囲に設けられたヒータと、
該ヒータと前記処理容器の間に処理容器を覆うように設
置された均熱管とを備えた縦型熱処理装置であって、前
記ヒータは筒状断熱体の頂部に設置される頂部断熱体を
有し、前記筒状断熱体の内側に前記均熱管の頂部外周を
取り囲んで均熱管の揺れを規制する規制部材を設けたの
で、簡単な構成で均熱管の揺れを抑えることができる （４）請求項４の発明によれば、前記ヒータの底部の内
側には底部断熱体が設置され、該底部断熱体の上部には
前記均熱管の下端部を嵌合する嵌合穴が形成されている
ため、簡単な構成で均熱管の揺れを更に十分に抑えるこ
とができる。(3) According to the third aspect of the invention, a processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in the height direction, a heater provided around the processing container,
What is claimed is: 1. A vertical heat treatment apparatus comprising: a heater and a heat equalizing tube installed between the processing container so as to cover the processing container, wherein the heater has a top heat insulator installed at the top of a tubular heat insulator. In addition, since the regulating member that surrounds the outer periphery of the top of the heat equalizing tube and regulates the vibration of the heat equalizing tube is provided inside the cylindrical heat insulator, the vibration of the heat equalizing tube can be suppressed with a simple configuration. According to the invention of Item 4, since the bottom heat insulator is provided inside the bottom portion of the heater, and a fitting hole for fitting a lower end portion of the heat equalizing tube is formed above the bottom heat insulator. With a simple configuration, it is possible to further sufficiently suppress the vibration of the heat equalizing tube.
【図１】本発明の第１の実施の形態を示す縦型熱処理装
置の縦断面図である。FIG. 1 is a vertical sectional view of a vertical heat treatment apparatus showing a first embodiment of the present invention.
【図２】図１における頂部断熱体の断面図である。FIG. 2 is a cross-sectional view of the top heat insulator in FIG.
【図３】同頂部断熱体の底面図である。FIG. 3 is a bottom view of the top heat insulator.
【図４】本発明の第２の実施の形態を示す縦型熱処理装
置の要部縦断面図である。FIG. 4 is a vertical sectional view of a main part of a vertical heat treatment apparatus showing a second embodiment of the present invention.
【図５】本発明の第２の実施の形態の変形例を示す要部
概略的断面図である。FIG. 5 is a schematic cross-sectional view of a main part showing a modification of the second embodiment of the present invention.
【図６】本発明の第３の実施の形態を示す縦型熱処理装
置の要部縦断面図である。FIG. 6 is a vertical sectional view of a main part of a vertical heat treatment apparatus showing a third embodiment of the present invention.
ｗ 半導体ウエハ（被処理体） ３ 処理容器 ４ ヒータ ５ 均熱管 １４ 筒状断熱体 １５ 頂部断熱体 １８ 底部断熱体 ２２ 嵌合穴 ２３ 規制部材 ２６ 突部 ２７ 凹部 ３１ 規制部材 w Semiconductor wafer (object to be processed) 3 Processing container 4 Heater 5 Heat equalizing tube 14 Cylindrical heat insulator 15 Top heat insulator 18 Bottom heat insulator 22 Fitting hole 23 Restriction member 26 Protrusion 27 Recess 31 Restriction member
Claims (4)
配列した状態で収容する処理容器と、該処理容器の周囲
に設けられたヒータと、該ヒータと前記処理容器の間に
処理容器を覆うように設置された均熱管とを備えた縦型
熱処理装置であって、前記ヒータは筒状断熱体の頂部に
設置される頂部断熱体を有し、該頂部断熱体に前記均熱
管の頂部外周を取り囲んで均熱管の揺れを規制する規制
部材を設けたことを特徴とする縦型熱処理装置。1. A processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in a height direction, a heater provided around the processing container, and processing between the heater and the processing container. A vertical heat treatment apparatus provided with a heat equalizing pipe installed so as to cover the container, wherein the heater has a top heat insulating body installed on a top of a cylindrical heat insulator, and the heat equalizing pipe is provided on the top heat insulating body. A vertical heat treatment apparatus, comprising a regulating member surrounding the outer periphery of the top portion to regulate the swing of the heat equalizing tube.
配列した状態で収容する処理容器と、該処理容器の周囲
に設けられたヒータと、該ヒータと前記処理容器の間に
処理容器を覆うように設置された均熱管とを備えた縦型
熱処理装置であって、前記ヒータは筒状断熱体の頂部に
設置される頂部断熱体を有し、前記均熱管の揺れを規制
するために前記頂部断熱体と前記均熱管の対向部の一方
に突部を、他方に該突部が係合する凹部を設けたことを
特徴とする縦型熱処理装置。2. A processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in a height direction, a heater provided around the processing container, and processing between the heater and the processing container. A vertical heat treatment apparatus comprising: a heat equalizing tube installed to cover a container, wherein the heater has a top heat insulator installed at the top of a cylindrical heat insulator, and regulates a swing of the heat equalizing tube. A vertical heat treatment apparatus characterized in that a projection is provided on one of the opposing portions of the top heat insulator and the heat equalizing tube, and a concave portion is provided on the other, with which the projection is engaged.
配列した状態で収容する処理容器と、該処理容器の周囲
に設けられたヒータと、該ヒータと前記処理容器の間に
処理容器を覆うように設置された均熱管とを備えた縦型
熱処理装置であって、前記ヒータは筒状断熱体の頂部に
設置される頂部断熱体を有し、前記筒状断熱体の内側に
前記均熱管の頂部外周を取り囲んで均熱管の揺れを規制
する規制部材を設けたことを特徴とする縦型熱処理装
置。3. A processing container for accommodating a large number of objects to be processed arranged at predetermined intervals in a height direction, a heater provided around the processing container, and processing between the heater and the processing container. A vertical heat treatment apparatus having a heat equalizing tube installed to cover the container, wherein the heater has a top heat insulator installed at the top of the cylindrical heat insulator, and inside the cylindrical heat insulator. A vertical heat treatment apparatus, comprising a regulating member surrounding the outer periphery of the top of the heat equalizing tube to restrict the swing of the heat equalizing tube.
が設置され、該底部断熱体の上部には前記均熱管の下端
部を嵌合する嵌合穴が形成されていることを特徴とする
請求項１，２もしくは３に記載の縦型熱処理装置。4. A bottom heat insulator is provided inside a bottom portion of the heater, and a fitting hole for fitting a lower end portion of the heat equalizing tube is formed in an upper portion of the bottom heat insulator. The vertical heat treatment apparatus according to claim 1, 2, or 3.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000284914A JP4493823B2 (en) | 2000-09-20 | 2000-09-20 | Vertical heat treatment equipment |
| TW90123244A TW502299B (en) | 2000-09-20 | 2001-09-20 | Vertical heat-processing apparatus and fastening member used in the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000284914A JP4493823B2 (en) | 2000-09-20 | 2000-09-20 | Vertical heat treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002093795A true JP2002093795A (en) | 2002-03-29 |
| JP4493823B2 JP4493823B2 (en) | 2010-06-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000284914A Expired - Lifetime JP4493823B2 (en) | 2000-09-20 | 2000-09-20 | Vertical heat treatment equipment |
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| Country | Link |
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| JP (1) | JP4493823B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5882167B2 (en) | 2012-09-13 | 2016-03-09 | 東京エレクトロン株式会社 | Heat treatment equipment |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0758037A (en) * | 1993-08-18 | 1995-03-03 | Toshiba Ceramics Co Ltd | Heat treatment apparatus for semiconductor wafer |
| JPH0758094A (en) * | 1993-08-18 | 1995-03-03 | Toshiba Ceramics Co Ltd | Heat treating device for semiconductor wafer |
| JPH0855811A (en) * | 1994-08-10 | 1996-02-27 | Kokusai Electric Co Ltd | Vertical furnace |
| JP2000243747A (en) * | 1999-02-18 | 2000-09-08 | Kokusai Electric Co Ltd | Substrate preparing apparatus |
-
2000
- 2000-09-20 JP JP2000284914A patent/JP4493823B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0758037A (en) * | 1993-08-18 | 1995-03-03 | Toshiba Ceramics Co Ltd | Heat treatment apparatus for semiconductor wafer |
| JPH0758094A (en) * | 1993-08-18 | 1995-03-03 | Toshiba Ceramics Co Ltd | Heat treating device for semiconductor wafer |
| JPH0855811A (en) * | 1994-08-10 | 1996-02-27 | Kokusai Electric Co Ltd | Vertical furnace |
| JP2000243747A (en) * | 1999-02-18 | 2000-09-08 | Kokusai Electric Co Ltd | Substrate preparing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4493823B2 (en) | 2010-06-30 |
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