JP2001307983A - Stage device and aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a stage device which realizes long stroke without increasing the weight of a movable part and attains high control performance and high positioning accuracy. SOLUTION: The device is constituted so that long mirrors 75, 77 are fixed to a part which does not move, the weight of a movable part PST of a stage device is reduced and a relative position of read of an actuator which actuates a stage and a laser interferometer does not change due to stage movement. Since an actuator for stage position control and a laser interferometer read position for stage position measurement are always fixed regardless of a position of a stage, design of a control controller is easy.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to an exposure apparatus for exposing a pattern on a substrate in a process of manufacturing a semiconductor device or a liquid crystal display panel, and a stage device incorporated in the exposure apparatus.

[0002]

2. Description of the Related Art FIG. 8 is a schematic view of a conventional step-and-scan type scanning exposure apparatus, and FIG. 9 is a perspective view showing a schematic configuration of a substrate stage (XY stage).
The illumination light IL for exposure from the light source 201 illuminates the mask 207 with a uniform illuminance distribution. An image of the pattern on the mask 207 via the projection optical system 211 is projected and exposed on a substrate 252 coated with a photoresist. Mask 207
Is held on the mask stage RST, and the mask stage RST is in the scanning direction Y on the mask base RSB.
Driven in the direction by, for example, a linear motor. The mask 20 is moved by the Y moving mirror 208 and the external laser interferometer 209.
7 is measured, and the Y coordinate is supplied to a main control system 210 that controls the operation of the entire apparatus. Main control system 2
Reference numeral 10 denotes a mask 2 via a mask stage drive system 219.
The control of the position and the moving speed of 07 is performed.

The Y coordinate of the photosensitive substrate 252 is constantly monitored by a Y-axis movable mirror 250 fixed to the upper end of a top plate 238 of a linear motor driven XY stage, which will be described later, and an external laser interferometer 246. , The detected Y coordinate is supplied to the main control system 210. Main control system 210
Is based on the supplied coordinates via the drive system 223.
Linear motors 224, 226 and Y linear motor 23
2, 234 are controlled.

Next, a substrate stage (XY stage) on which the photosensitive substrate 252 is mounted and moved will be described with reference to FIG. The XY stage 200 has a surface plate 212 and a surface plate 2
X guide 214 as a guide bar fixed on 12
A first moving body 216 movable in the X direction along the upper surface of the surface plate 212 and the X guide 214; and a first moving body 216 in the X direction along a Y guide 222 as a moving guide constituting the first moving body 216. A second moving body 236 that can move in the orthogonal Y direction. X guide 214 is platen 212
It is arranged along the X direction near the one end surface in the upper Y direction. The first moving body 216 is placed on the platen 212 with the X guide 2
14, a first Y guide carrier 218 arranged in the X direction, a second Y guide carrier 220 arranged on the surface plate 212 in parallel with the first Y guide carrier, and a second Y guide carrier 220 laid therebetween. And a Y guide 222 extending in the Y direction.

[0005] On one side of the X guide 214 on the surface plate 212 in the Y direction, a stator 224 of a first X linear motor 224 is provided.
A extends in the X direction near the X guide 214. A stator 226A of the second X linear motor 226 extends in the X direction on the other side in the Y direction of the second Y guide conveyance body 220 near the other end in the Y direction on the surface plate 212. Have been. Mover 224 of first X linear motor 224
B is connected to one end of the Y guide 222 via a connecting member 228, and the mover 226B of the second X linear motor 226 is connected to the other end of the Y guide 22 via a connecting member 230. . For this reason, the first moving body 216 is driven in the X direction by the movement of the movers 224B and 226B of the first and second X linear motors 224 and 226.

[0006] On one side and the other side of the Y guide 222 in the X direction, stators 232A and 234A of first and second Y linear motors 232 and 234 are arranged along the Y direction. Is suspended between the Y guide carriers 218 and 220. Moving magnet type linear motors are also used as the first and second Y linear motors.

The second moving body 236 includes a top plate 238 and a bottom plate 240 which are arranged in parallel with each other while sandwiching the Y guide 222 from above and below and substantially parallel to the upper surface (reference surface) of the surface plate 212. A pair of Y-direction bearing bodies 24 interconnecting the top plate 238 and the bottom plate 240 on both sides of the Y guide 22
2,242. These Y-direction bearing bodies 24
2 and 242 are arranged in parallel with the Y guide 222 with a predetermined gap formed between them. On the outer surfaces of these Y-direction bearing bodies 242, 242,
The mover 23 of the above-described first and second Y linear motors 232 and 234 constituting a driving unit of the second moving body 236
2B and 234B (however, 234B is not shown) are attached, and the second moving body 236 is provided by the movement of the movers 232B and 234B of the Y linear motors 232 and 234.
Are driven in the Y direction.

The top plate section 238 also serves as a work stage. On the upper surface of the top plate section 238, an X-coordinate measurement laser interferometer 244 and a Y-coordinate measurement laser interferometer fixed on a surface plate 212 are provided. A long X-moving mirror 248, a long Y-moving mirror 250, and a photosensitive substrate 252 that reflect the laser light emitted from the 246 are mounted. First and second X linear motors 224 and 226, first and second Y linear motors 2
32 and 234 are driven, the photosensitive substrate 2 is correspondingly driven.
The second moving body 236 on which the light source 52 is mounted moves in the X and Y two-dimensional directions, and the moving position is determined by the laser interferometers 244 and 24.
6 is measured.

[0009]

However, in the above-described conventional exposure apparatus, it is necessary to mount a long mirror on a movable portion (movable stage) of the stage device, and the stroke of the movable stage is increased. As a result, a longer mirror is mounted on the movable part, which results in deterioration of controllability and an increase in driving thrust due to an increase in weight and inertia. Further, the size of the photosensitive substrate 252 is expected to increase in the future, and the size of the movable stage is expected to continue to increase. Conventionally, the stage drive position (the position of the drive shafts of the Y linear motors 232 and 234) and the stage coordinate reading position (the incidence of the laser beam for distance measurement from the laser Position) changes relative to each other,
There was also a problem that the dynamics of the mechanical system changed with the stage position, making it difficult to control. Therefore, it is necessary to increase the rigidity and damping performance of the mechanical system in order to obtain positioning accuracy, positioning time, and constant velocity performance. I was invited.

The present invention has been made in view of the above-mentioned problems of the prior art, and has as its object to provide a movable stage device capable of realizing a long stroke without increasing the weight of the movable portion. Another object of the present invention is to provide a stage device in which the stage drive position and the stage coordinate reading position do not relatively change even when the stage moves, and high control performance and high positioning accuracy can be obtained. Another object of the present invention is to provide a high-performance exposure apparatus incorporating such a stage apparatus.

[0011]

According to the present invention, a long mirror is fixed to a non-movable portion to reduce the weight of a movable portion of a stage device, and a drive for driving the stage is provided. The relative position of the reading of the section (actuator) and the laser interferometer is not changed by the movement of the stage. According to the stage device of the present invention, the actuator for controlling the stage position and the laser interferometer reading position for measuring the stage position are always constant irrespective of the position of the stage. This is advantageous for improving positioning accuracy.

That is, the stage device according to the present invention comprises:
A movable stage (PST) movable in a first direction (Y direction) and a second direction (X direction), and the movable stage (PST) with respect to a long mirror (75, 77) provided on a base member (19). ), A stage device (13, 15) provided with a position detecting device for detecting the position of the long mirror (75, 75).
An optical device (interferometer unit) (81, 82, 83;) provided on the movable stage with detection light (L1, L2, L3) for detecting the position of the movable stage (PST) with respect to 77).
121, 122, 123) through a long mirror (75, 7).
7) a light transmitting optical system (91, 92, 93; 13)
1, 132, 133) and a movable stage (PST, RS)
T) in the first direction, the light transmitting optical system (9)
1, 92, 93; 131, 132, 133)
Moving device (72, 102) for moving in the direction (Y direction)
And characterized in that:

The base member (19) is a movable stage (PS)
T) is movably supported. Moving device (72, 10
2) may move the movable stage (PST) in the first direction (Y direction). Further, a stage moving device for moving the movable stage (PST) in the second direction (X direction) is provided. A moving axis for moving the movable stage (PST) by a stage moving device for moving the movable stage (PST) in the second direction (X direction), and an optical device (interferometer unit) (81) provided on the movable stage (PST) , 82, 83; 121, 122, 123) and the optical axis between the long mirrors (75, 77) are preferably substantially coincident.

The position detecting device has a detector (interferometer receiver 78) arranged on a vibration separating member (79) which is separated from the base member (19) by vibration. An exposure apparatus according to the present invention includes an exposure apparatus (11) for exposing a pattern of a mass (R) held on a mask stage (RST) to a substrate (P) held on a substrate stage (PST). ) And substrate stage (PS)
T) is characterized in that the above-described stage device is used as at least one of the stages. This exposure apparatus (1
1) may include a projection optical system (PL) that projects the pattern of the mask (R) onto the substrate (P). The projection optical system (PL) and the long mirrors (75, 77) can be held by a common member. Further, the long mirror may be configured as a member integrated with the projection optical system.

[0015]

Embodiments of the present invention will be described below with reference to the drawings. Here, an example in which the stage apparatus of the present invention is applied to a step-and-scan type exposure apparatus that exposes a rectangular glass substrate with a reticle pattern as a mask will be described. In this exposure apparatus, the stage apparatus of the present invention is applied to both a mask stage that moves while holding a mask and a substrate stage that moves while holding a glass substrate.

FIG. 1 is a schematic view showing an example of an exposure apparatus 11 according to the present invention. The exposure apparatus 11 includes an illumination optical system 12, a mask stage device (stage device) 13 that holds and moves a mask R, a projection optical system PL, and a projection optical system P
A main body column 14 for holding L, a substrate stage device (stage device) 15 for holding and moving the glass substrate P, and the like are provided. In the present embodiment, as an example, 800
The liquid crystal display element pattern is exposed on a large glass substrate P of × 950 mm.

The illumination optical system 12 is, for example, disclosed in
As disclosed in Japanese Unexamined Patent Publication No. 0956, a mask is constituted by a light source unit, a shutter, a secondary light source forming optical system, a beam splitter, a condenser lens system, a mask blind, and an imaging lens system (all not shown). A rectangular (or arc-shaped) illumination area on the mask R held by the stage device 13 is illuminated by the illumination light IL with uniform illuminance.

The main body column 14 has a plurality of (here, four, but only two on the front side shown in FIG. 1) anti-vibration units are provided on the upper surface of the base plate BP serving as a reference of the apparatus mounted on the upper surface of the installation floor FD. First column 17 held via table 16
And a second column 18 provided on the first column 17
It is composed of The vibration isolator 16 is of a passive type using an elastic material such as rubber as a damping material.

The first column 17 is supported substantially horizontally by the four vibration isolating tables 16, and has a rectangular base 19 constituting the substrate stage device 15 and four corners on the upper surface of the base 19 along the vertical direction. And four upper end portions of the four leg portions 20 are connected to each other, and a boundary platen 21 which constitutes a top plate portion of the first column 17 is provided. I have. The base 19 is composed of a stone surface plate. Absent. If this stone surface plate is sprayed with ceramic and coated, the surface accuracy can be prevented from deteriorating due to chipping of the stone surface plate. An opening 21A having a circular shape in a plan view is formed at the center of the boundary plate base 21, and the projection optical system PL is inserted into the opening 21A from above. This projection optical system P
L is provided with a flange FL at a position slightly below the center in the height direction, and the projection optical system PL is supported from below by the boundary platen 21 via the flange FL.

The second column 18 has four legs 22 erected on the upper surface of the boundary platen 21 so as to surround the projection optical system PL.
And a top plate that connects the upper ends of the four legs 22, that is, a base 23 that forms the mask stage device 13. An opening 23A serving as a passage for the illumination light IL is formed in the center of the base 23. Note that the whole or a part of the base 23 (a part corresponding to the opening 23A) may be formed of a light-transmitting material. Vibration from the installation floor FD to the main body column 14 thus configured is insulated at the micro G level by the vibration isolator 16.

As the projection optical system PL, the direction of the optical axis AX is the Z-axis direction. Here, a plurality of projection optical systems PL are arranged at predetermined intervals along the optical axis AX direction so as to have a telecentric optical arrangement on both sides. Is used. The projection optical system PL has a predetermined projection magnification, for example, an equal magnification. For this reason, when the illumination area of the mask R is illuminated by the illumination light IL from the illumination optical system 12, the illumination light passing through the mask R
An equal-size erect image of the pattern of the illumination region on the mask R is exposed to an exposure region conjugate to the illumination region on the glass substrate P having a surface coated with a photoresist via the projection optical system PL.

FIG. 2 is an external perspective view of the substrate stage device 15. The substrate stage device 15 includes a base 19
And a substrate stage (stage main body) PST which is levitated and supported in a non-contact manner above the base 19, and a substrate stage PST
X linear motor 64 as a linear motor for driving the substrate stage PST in the X-axis direction as a scanning direction, Y linear motors 65A and 65B as linear motors for driving the substrate stage PST in the Y-axis direction as a step moving direction, and Y linear. Reaction force cut-off frames 54, 55 which receive a reaction force generated by driving the substrate stage PST by the motors 65A, 65B.
It is composed of Reaction force blocking frames 54, 55
Is vibrated independently of the base 19 by being supported at one end by a support member 62 fixed to the floor FD. Since the reaction force blocking frames 54 and 55 transmit the reaction force generated when the substrate stage PST is driven in the Y direction to the floor, the reaction force is not transmitted to the projection optical system PL.

The X linear motor 64 includes stators 66A and 66B extending along the X-axis direction and a substrate stage PS
An X carriage 67 as a mover to which T is fixed and relatively moves with respect to the stator 66 is provided. The stators 66A and 66B are provided above an X guide 68 extending along the X axis direction. The X carriage 67 is provided with a movable member 69 integrally with the X carriage 67 and movably with respect to the X guide 68 with the X guide 68 interposed therebetween. Further, the movable member 69 is provided with, for example, an air pad 70 (air bearing) made of ceramic on the bottom surface side, and is floated and supported on the base 19. The glass substrate P is held on the upper surface of the substrate stage PST via a substrate holder (not shown) by vacuum suction or the like.

The Y linear motor 65A is composed of a mover 57A provided at the -X end of the Y guide 68, and a stator 59A supported on the reaction force blocking frame 54. The Y linear motor 65B includes a mover 57B provided at a + X side end of a Y carriage 72 that is movable along a Y guide 71 extending along the Y axis direction.
And a stator 59B supported on the reaction force blocking frame 55. Each of the stators 59A and 59B is mounted on the substrate stage PST so as to sandwich the movers 57A and 57B.
It has a U-shape opening toward. Note that an X guide 68 is fixed to the −X side end of the Y carriage 72.

The measurement of the coordinate position in the X and Y directions of the substrate stage PST is performed using a laser interferometer. In order to measure the coordinate position of the substrate stage PST in the X direction, a long boundary 75 for a laser interferometer is fixed on the base 19 via a support member 74, and a corner cube and a plane mirror are paired on the substrate stage PST. Interferometer units 81 and 82 are arranged. Further, in order to measure the coordinate position of the substrate stage PST in the Y direction, a long boundary 77 for a laser interferometer is fixed on the base 19 via a support member 76, and the corner cube and the plane mirror are paired on the substrate stage PST. Is arranged. Interferometer receiver 78 containing laser light sources and light receivers for laser interferometer units 81, 82, 83
Is vibrated independently of the base 19 by being supported by a support member 79 having one end fixed to the floor FD. Since the interferometer receiver 78 does not need to be movable, the interferometer receiver 78 can be installed at a position away from the apparatus as in the related art, so that there is no influence of heat generation of the receiver and no wiring is required. Further, reflecting mirrors 91, 92, 9 for bending the optical path constituting an interferometer path on the Y carriage 72.
3 are installed.

FIG. 3 is a schematic plan view for explaining the configuration of the laser interferometer according to the present invention. Substrate stage PS
On the T, two interferometer units 81 and 82 for measuring the coordinate position of the substrate stage PST in the X direction and one interferometer unit 83 for measuring the coordinate position of the substrate stage PST in the Y direction are installed. Have been. Further, reflecting mirrors 91 to 93 forming an interferometer path are arranged on a Y carriage 72 that moves in the Y direction along a Y guide 71. The measurement laser light L1 emitted from the laser light source in the interferometer receiver 78 is reflected by the reflecting mirror 91 on the Y carriage 72, enters the interferometer unit 81, and is reflected by the reference mirror of the interferometer unit. The interference light generated by the laser light and the laser light reflected by the long boundary 75 fixed to the base 19 interfering with each other in the interferometer unit 81 is emitted from the interferometer unit 81 and then incident laser light. The light travels in the opposite direction to L 1, is reflected by the reflecting mirror 91 on the Y carriage 72, and returns to the interferometer receiver 78.

Similarly, the laser beam L2 emitted from the laser light source in the interferometer receiver 78 is reflected by the reflecting mirror 92 on the Y carriage 72, enters the interferometer unit 82, and is reflected by the reference mirror of the interferometer unit. The reflected laser light and the laser light reflected by the long boundary 75 fixed to the base 19 cause optical interference in the interferometer unit 82, and the interference light is emitted from the interferometer unit 81 and then incident laser light. L2
, And is reflected by the reflecting mirror 92 on the Y carriage 72 and returns to the interferometer receiver 78. The laser light L3 emitted from the laser light source in the interferometer receiver 78
Is reflected by the reflecting mirror 93 on the Y carriage 72, enters the interferometer unit 83, and is reflected by the laser beam reflected by the reference mirror of the interferometer unit 83 and the long boundary 77 fixed to the base 19. The interference light generated by the interference with the emitted laser light travels in the opposite direction to the incident laser light L3,
The light is reflected by the reflecting mirror 93 on the carriage 72 and returns to the interferometer receiver 78.

As described above, laser light is made incident on the interferometer units 81, 82 and 83 from the reflecting mirrors 91, 92 and 93 arranged on the Y carriage 72 which moves in the Y direction together with the substrate stage PST along the Y guide 71. By doing
Even if the substrate stage PST moves in the Y direction, laser light can be accurately incident on the interferometer units 81, 82, and 83 on the substrate stage PST. Further, the interference light emitted from the interferometer units 81, 82, and 83 returns to the interferometer receiver 78 by traveling backward in the incident optical path. The locations where the laser interferometer performs the interference measurement are the distance between the interferometer units 81 and 82 on the substrate stage PST and the long mirror 75 and the distance between the interferometer unit 83 and the long mirror 77.
Therefore, although a part of the optical system constituting the interferometer path is mounted on the Y carriage 72, no measurement error occurs even if the straightness of the part is poor.

The long boundary 75 has a length that covers the movement stroke in the Y direction of the interferometer units 81 and 82 that move together with the substrate stage PST, and the long boundary 77 similarly moves on the substrate stage PST. It has a length that covers the movement stroke of the interferometer unit 83 in the X direction. The optical path of the laser beam reciprocating between the interferometer unit 81 and the long mirror 75 is set on a stator 66A extending along the X-axis direction of the X linear motor 64. That is, the interferometer unit 81 measures the distance between the substrate stage PST and the long mirror 75 at the position where the driving force of the X linear motor 64 acts. Similarly, the optical path of the laser light reciprocating between the interferometer unit 82 and the long mirror 75 is X
The interferometer unit 81 is set on the stator 66B extending along the X-axis direction of the linear motor 64, and the substrate stage PST and the long mirror 75 are positioned at the position where the driving force of the X linear motor 64 acts. Measure the distance between.

FIG. 4 is a schematic diagram illustrating the structure of the interferometer unit. Here, the interferometer unit 81 will be described as an example, but the other interferometer units 82 and 83 have the same structure. The interferometer unit 81 includes a polarizing beam splitter 95, a reference mirror 96, a corner cube 97, and quarter-wave plates 98, 99.

The laser beam L1 reflected by the reflecting mirror 91 on the Y carriage 72 enters the polarizing beam splitter 95 of the interferometer unit 81, and is split by the polarizing beam splitter 95 into a transmitted light component 1 and a reflected light component 2. You. The reflected light component 1 is reflected by the reference mirror 96 through the quarter-wave plate 98, is again rotated by 90 ° through the quarter-wave plate 98, and is reflected by the polarization beam splitter 95 this time. Incident on the corner cube 97. Corner cube 9
The laser light returned from 7 is reflected again by the polarization beam splitter 95, travels along the optical path 3, and enters the reference mirror 96. The laser beam reflected by the reference mirror passes through the polarization beam splitter 95 and exits from the interferometer unit 81 as it is.

On the other hand, the reflected light component 2 is a quarter wave plate 99
Is reflected by the long mirror 75 and passes through the quarter-wave plate 9 again.
9, the polarization direction is rotated by 90 °, passes through the polarization beam splitter 95, and enters the corner cube 97.
The light returned from the corner cube 97 passes through the polarizing beam splitter 95 again, travels along the optical path 4, and travels along the long mirror 75.
Incident on. The laser light reflected by the long mirror is reflected by the polarization beam splitter 95 and exits from the interferometer unit 81.

In this way, the interference light between the laser light that has reciprocated two times between the reference mirror 96 and the laser light that has reciprocated two times between the long mirror 75 is emitted from the interferometer unit 81 and reflected on the Y carriage 72. After being reflected by the mirror 91, the light enters the interferometer receiver 78 and is detected. Polarizing beam splitter 95
The distance between and the reference mirror 96 is unchanged. On the other hand, the distance between the polarizing beam splitter 95 and the long mirror 75 changes due to the movement of the substrate stage PST,
The interference state of the interference light emitted from the
The interferometer receiver 78 measures the distance between the interferometer unit 81 and the long mirror 75 from the change in interference fringes. In the illustrated example, the X-direction coordinate of the substrate stage PST is obtained by averaging the distance measurement value obtained by the interferometer unit 81 and the distance measurement value obtained by the interferometer unit 82, and the distance measurement is performed by the interferometer unit 81 and the interferometer unit 82. The difference between the values is calculated by
The rotation angle of the substrate stage PST is measured by dividing by 82 in the Y direction. Further, the Y direction coordinate of the substrate stage PST is obtained from the distance measurement value using the interferometer unit 83.

Returning to FIG. 1, the mask stage device 13
The base 23, a mask stage (stage main body) RST which is levitated and supported in a non-contact manner above the base 23, and drives the mask stage RST with a predetermined stroke in the Y-axis direction which is the scanning direction (relative movement direction). Drive system 2 that drives minutely in the X-axis direction orthogonal to the Y-axis direction
4 and reaction force blocking frames (supporting portions) 25 and 26 that receive reaction force generated by driving the mask stage RST by the mask driving system. The base ends of the reaction force blocking frames 25 and 26 are connected to the cylinder platen 2 shown in FIG.
1, fixed to the floor FD through openings formed in the base 19 and the base plate BP, respectively, to release reaction force generated by movement of the mask stage RST to the floor. The reaction force is not transmitted to the projection optical system PL by the reaction force blocking frames 25 and 26. Therefore, highly accurate exposure can be realized.

The drive system of the mask stage device 13 has the same structure as the drive system of the substrate stage PST, and the coordinate position detecting device of the mask stage RST using the laser interferometer is similar to the coordinate position detecting device of the substrate stage PST. It has a configuration of In the above-described embodiment, the stator has a U-shape that opens toward the stage. However, for example, as illustrated in FIG. 5, the stators 59A and 59B open in the + Z direction. It may be. In this case, the mover may have a shape that hangs in the −Z direction toward the inside of the stator. In addition, the Y linear motor 64 and the X linear motors 65A and 65B, which are the above-described linear motors, can use either a moving coil type or a moving magnet type.

The present invention is also applicable to a stage device driven by a driving device other than a linear motor. FIG. 6 is a schematic perspective view showing an example in which the present invention is applied to a substrate stage device driven by a ball screw, and FIG. 7 is a schematic plan view thereof.

This substrate stage device comprises a base 19,
A substrate stage PST located above the base 19 and a mechanism for driving the substrate stage PST are provided. The drive mechanism includes a ball screw 114 and an X motor 113 that rotationally drives the ball screw 114, and a ball screw 104 and a Y motor 103 that rotationally drives the ball screw 104. The glass substrate P is held on the upper surface of the substrate stage PST via a substrate holder (not shown) by vacuum suction or the like. The Y motor 103 drives the Y carriage 102 along the Y guide 101. An X guide 111 is fixed to the −X side end of the Y carriage 102. The substrate stage PST is a Y motor 103
Is driven in the Y direction together with the Y carriage 102, and is driven in the X direction along the X guide 111 by driving the X motor 113.

The measurement of the coordinate position of the substrate stage PST in the X and Y directions is performed using a laser interferometer as in the case of the above-described stage device. In order to measure the coordinate position of the substrate stage PST in the X direction, a long boundary 75 for the laser interferometer is fixed on the base 19 via a support member 74, and the substrate stage PST is fixed.
Interferometer units 121 and 122 each having a pair of a corner cube and a plane mirror are arranged on ST. The base 19 is used to measure the coordinate position of the substrate stage PST in the Y direction.
A long boundary 77 for the laser interferometer is provided on the support member 76.
Is fixed, and an interferometer 123 having a pair of a corner cube and a plane mirror is arranged on the substrate stage PST. Also, Y
On the carriage 102, reflecting mirrors 131, 132, and 133 for bending an optical path, which constitute an interferometer path, are provided.

The optical path of the laser light reciprocating between the interferometer unit 122 and the long mirror 75 is set at a position where the driving force of the X motor 113 acts on the substrate stage PST, that is, on the ball screw 114. Thus, the interferometer unit 122 measures the distance between the substrate stage PST and the long mirror 75 at the position where the driving force of the X motor 113 acts. The X-direction coordinate of the substrate stage PST is obtained from the distance measurement value obtained by the interferometer unit 122, and the difference between the distance measurement values obtained by the interferometer unit 121 and the interferometer unit 122 is divided by the Y-direction distance between the interferometer units 121 and 122. The rotation angle of the substrate stage PST is measured. Further, the Y-direction coordinate of the substrate stage PST is obtained from the distance measurement value using the interferometer unit 123.

According to the present invention, since the relative position between the driving actuator and the laser interferometer for measuring the position of the movable portion does not change, the frequency of the control system can be set regardless of the position of the stage movable portion in the X and Y coordinate systems. Response does not change. This allows filtering by the controller,
Even higher control performance can be obtained.

Also, in order to maintain the accuracy of the long mirror surface, a high flatness is required for the surface of the member on which the long mirror is mounted, and rigidity is required to maintain the flat mirror surface. I didn't get it. However, in the present invention, since the long mirror can be brought to the fixed side,
The configuration can be made without considering not only the weight of the long mirror main body but also the weight of the supporting member. Therefore, a long mirror can be incorporated without any loss of flatness.

There is a concern that the interferometer configuration according to the present invention may cause Abbe errors. In particular, when the projection optical system PL, which does not move during exposure, is used as a reference, the laser beam side for position measurement moves, and therefore, the distance is proportional to the distance (Δx or Δy) between the laser beam and the projection optical system PL. An error will occur. However, the movable part (substrate stage PS
T, the displacement of the mask stage RST) in the X, Y, and θ directions is monitored. Even in this case, the error in the X direction is Δy · Δθ, and the error in the Y direction is Δx · Δθ. Abbe error can be canceled by applying the correction.

In the above embodiment, the stage apparatus of the present invention is applied to the exposure apparatus 11. However, the present invention is not limited to this. In addition to the exposure apparatus 11, a transfer mask drawing apparatus and a mask pattern The present invention is also applicable to precision measuring devices such as a position coordinate measuring device. As the substrate, not only a glass substrate P for a liquid crystal display device, but also a semiconductor wafer for a semiconductor device, a ceramic wafer for a thin-film magnetic head, or a mask or an original mask (synthetic quartz, silicon wafer) used in an exposure apparatus Etc. are applied.

As the exposure apparatus 11, a step-and-scan type scanning exposure apparatus (scanning stepper; US Pat. 47
No. 3,410), a step-and-repeat type projection exposure apparatus (stepper) that exposes the pattern of the mask R while the mask R and the glass substrate P are stationary and sequentially moves the glass substrate P stepwise. Can also be applied. The type of the exposure apparatus 11 is not limited to an exposure apparatus for manufacturing a liquid crystal display device, but includes an exposure apparatus for manufacturing a semiconductor device for exposing a semiconductor device pattern onto a wafer, a thin-film magnetic head, an imaging device (CCD) or a mask. It can be widely applied to an exposure apparatus for manufacturing and the like.

As a light source of the illumination light for exposure, a bright line (g-line (436 nm), h
Line (404.7 nm), i-line (365 nm)), KrF
Excimer laser (248 nm), ArF excimer laser (193 nm), not only the _{F 2} laser (157 nm), it is possible to use a charged particle beam such as X-ray or electron beam. For example, when an electron beam is used, a thermionic emission type lanthanum hexaborite (LaB ₆ ) or tantalum (Ta) can be used as an electron gun. Further, when an electron beam is used, a structure using a mask R may be used, or a pattern may be formed directly on a wafer without using the mask R. Further, a harmonic such as a YAG laser or a semiconductor laser may be used.

The magnification of the projection optical system PL may be any of a reduction system and an enlargement system as well as an equal magnification system. Further, As the projection optical system PL, using a material which transmits far ultraviolet rays such as quartz and fluorite as the glass material when using a far ultraviolet ray such as an excimer laser, catadioptric system, or in the case of using the F ₂ laser or X-ray An optical system of a refraction system (a reflection type mask is used as the mask R). When an electron beam is used, an electron optical system including an electron lens and a deflector may be used as the optical system. It goes without saying that the optical path through which the electron beam passes is in a vacuum state. Further, the projection optical system PL
However, the present invention can also be applied to a broximity exposure apparatus that exposes the pattern of the mask R by bringing the mask R and the wafer W into close contact with each other without using the mask.

As a driving mechanism of each of the stages RST and PST, a magnet unit (permanent magnet) having a two-dimensionally arranged magnet and an armature unit having a two-dimensionally arranged coil are opposed to each other, and each stage RST, PST is driven by electromagnetic force. A planar motor for driving the PST may be used. In this case, one of the magnet unit and the armature unit is connected to the stage RS
T and PST, and the other of the magnet unit and the armature unit may be provided on both sides (base) of the movement of the stages RST and PST.

[0048]

As described above, according to the present invention, it is not necessary to form a long mirror requiring precision in the movable part, so that not only the weight of the long mirror but also a member for fastening it with high accuracy can be omitted. The weight of the moving parts can be significantly reduced. Therefore, the resonance frequency of the mechanical system increases, and the frequency response of the control system can be increased.
Control performance can be improved.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing an example of an exposure apparatus according to the present invention.

FIG. 2 is an external perspective view of the substrate stage device.

FIG. 3 is a schematic plan view for explaining a configuration of a laser interferometer according to the present invention.

FIG. 4 is a schematic diagram illustrating the structure of an interferometer unit.

FIG. 5 is a schematic view showing another example of the substrate stage device according to the present invention.

FIG. 6 is a schematic view showing another example of the substrate stage device according to the present invention.

FIG. 7 is a schematic plan view of the substrate stage device shown in FIG. 7;

FIG. 8 is a schematic view of a conventional step-and-scan type scanning exposure apparatus.

FIG. 9 is a perspective view showing a schematic configuration of a conventional substrate stage.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 11 ... Exposure apparatus, 12 ... Illumination optical system, 13 ... Mask stage apparatus, 14 ... Main body column, 15 ... Substrate stage apparatus, 16 ... Anti-vibration table, 19 ... Base, 20 ... Leg part, 21 ...
Boundary plate surface plate, 22 legs, 23 base, 24 mask drive system, 25, 26 reaction force blocking frame, 54, 55
Reaction force blocking frame, 57A, 57B ... mover, 59
A, 59B: stator, 62: support member, 64: X linear motor, 65A, 65B: Y linear motor, 66A, 6
6B: stator, 67: X carriage, 68: X guide,
70 air pad, 71 Y guide, 72 Y carriage, 74 support member, 75 long border, 76 support member,
77: long border, 78: interferometer receiver, 79: support member, 81, 82, 83 ... interferometer unit, 91, 92,
93: Reflecting mirror, 95: Polarizing beam splitter, 96: Reference mirror, 97: Corner cube, 98, 99: Quarter
Wave plate, 101 ... Y guide, 102 ... Y carriage, 1
03 ... Y motor, 104 ... ball screw, 111 ... X guide, 113 ... X motor, 114 ... ball screw, 121,
122, 123 ... interferometer unit, 131, 132, 1
33: Reflecting mirror, 200: XY stage, 201: Light source system, 207: Mask, 210: Main control system, 211: Projection optical system, 212: Surface plate, 214: X guide, 216: First moving body, 218 , 220 ... Y guide carrier, 219
Reticle stage drive system, 222 Y guide, 223
... Driving system, 224,226 ... X linear motor, 228 ...
Connecting members, 232, 234... Y linear motor, 236.
Load stage (second moving body), 242: Y-direction bearing body, 246: Laser interferometer, 250: Y moving mirror, 252
... photosensitive substrate, BP ... base plate, FD ... installation floor, I
L: illumination light, L1, L2, L3: measuring laser light, P:
Glass substrate, PL: Projection optical system, PST: Substrate stage, R: Mask, RST: Mask stage

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2F078 CA02 CA08 CB05 CB09 CB12 CC03 3C029 AA01 AA12 AA40 5F046 BA05 CC01 CC02 CC03 CC16 CC18 DB05 DC05 DC12 GA06 GA11 GA12 GA14 5F056 CB22 CC05 EA14 FA06

Claims (9)

[Claims] 1. A stage device comprising: a movable stage movable in a first direction and a second direction; and a position detecting device that detects a position of the movable stage with respect to a long mirror provided on a base member. A light transmitting optical system for transmitting detection light for detecting a position of the movable stage with respect to the long mirror to the long mirror via an optical device provided on the movable stage; and a first direction of the movable stage. A moving device for moving the light transmitting optical system in the first direction in accordance with the movement of the stage. 2. The stage device according to claim 1, wherein the base member movably supports the movable stage. 3. The stage device according to claim 1, wherein the moving device moves the movable stage in the first direction. 4. The stage device according to claim 1, further comprising a stage moving device that moves the movable stage in the second direction. 5. The stage device according to claim 4, wherein the stage moving device moves the movable stage, and an optical axis provided between the optical device and the long mirror provided on the movable stage. Is a stage device, which almost coincides. 6. The stage device according to claim 1, wherein the position detecting device includes a detector disposed on a vibration separating member that is separated from the base member in a vibration manner. A stage device characterized by the above-mentioned. 7. An exposure apparatus for exposing a pattern of a mask held on a mask stage to a substrate held on a substrate stage, wherein at least one of the mask stage and the substrate stage is used as the stage. An exposure apparatus using the stage device according to any one of the preceding claims. 8. The exposure apparatus according to claim 7, further comprising a projection optical system that projects the pattern of the mask onto the substrate. 9. The exposure apparatus according to claim 8, wherein the projection optical system and the long mirror are held by a common member.