JP2001261355A - Method of improving strength of end face of glass substrate and glass substrate for flat panel display - Google Patents

Method of improving strength of end face of glass substrate and glass substrate for flat panel display

Info

Publication number
JP2001261355A
JP2001261355A JP2000082774A JP2000082774A JP2001261355A JP 2001261355 A JP2001261355 A JP 2001261355A JP 2000082774 A JP2000082774 A JP 2000082774A JP 2000082774 A JP2000082774 A JP 2000082774A JP 2001261355 A JP2001261355 A JP 2001261355A
Authority
JP
Japan
Prior art keywords
glass substrate
glass
strength
flat panel
panel display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000082774A
Other languages
Japanese (ja)
Inventor
Tetsuya Nakajima
哲也 中島
Takashi Maeda
敬 前田
Yasumasa Nakao
泰昌 中尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP2000082774A priority Critical patent/JP2001261355A/en
Publication of JP2001261355A publication Critical patent/JP2001261355A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Liquid Crystal (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method of improving the strength of the end faces of a glass substrate, and a glass substrate for flat panel display. SOLUTION: The method of improving the strength of the end faces of a glass substrate comprises the following steps: a solution containing one or more kinds of compounds selected from among lithium salts, sodium salts, potassium salts, boric acid and phosphoric acid is applied on the end faces of a glass substrate; the substrate is dried; and subsequently, it is heat-treated at a temperature of the strain point of the glass ±100 deg.C. The glass substrate for flat panel display is also provided.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ガラス基板端面の
強度向上方法、および該方法により強度が向上されたフ
ラットパネルディスプレイ用ガラス基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for improving the strength of an end face of a glass substrate, and a glass substrate for a flat panel display whose strength is improved by the method.

【0002】[0002]

【従来の技術】液晶ディスプレイ(以下、「LCD」と
いう)、プラズマディスプレイ(以下、「PDP」とい
う)、無機および有機エレクトロルミネッセンスディス
プレイ、フィールドエミッションディスプレイ(以下、
「FED」という)等のフラットパネルディスプレイ用
のガラス基板として、従来、種々の組成のガラス基板が
使用されている。
2. Description of the Related Art Liquid crystal displays (hereinafter referred to as "LCD"), plasma displays (hereinafter referred to as "PDP"), inorganic and organic electroluminescent displays, field emission displays (hereinafter referred to as "PDP").
Conventionally, glass substrates of various compositions have been used as glass substrates for flat panel displays such as “FED”.

【0003】フラットパネルディスプレイ用ガラス基板
は、たとえば以下の工程を経て製造される。まず、用途
に合わせた組成となるよう調合された原料を溶融して、
フロート法、フュージョン法、ダウンドロー法等によっ
て、ガラス素板を製造する。次に、フラットパネルディ
スプレイで使用される寸法に前記ガラス素板を切断し、
その端面を砥石等を用いて面取り・仕上げ加工を行う。
A glass substrate for a flat panel display is manufactured, for example, through the following steps. First, melt the raw materials prepared to have a composition suitable for the application,
A glass base plate is manufactured by a float method, a fusion method, a downdraw method, or the like. Next, cutting the glass blank to dimensions used in flat panel displays,
The end face is chamfered and finished using a grindstone or the like.

【0004】ガラス基板の平坦度を向上させる必要があ
る場合には、ガラス基板の主表面のうち、少なくとも、
フラットパネルディスプレイの製造工程で成膜される面
を研磨加工する。ここで、主表面とは板状体のガラス基
板の表裏面を指し、端面は除かれる。
When it is necessary to improve the flatness of a glass substrate, at least one of the main surfaces of the glass substrate
The surface on which a film is formed in a flat panel display manufacturing process is polished. Here, the main surface refers to the front and back surfaces of the plate-shaped glass substrate, and excludes the end surfaces.

【0005】近年、フラットパネルディスプレイ、特に
LCDおよびPDPの大型化、薄型化の進行により、製
造工程でのハンドリングがますます困難になってきてい
る。特に、大型基板は自重により大きな曲げ応力を受け
ることが多いため、わずかな傷の存在が製造工程での基
板割れにつながる。
In recent years, flat panel displays, particularly LCDs and PDPs, have become larger and thinner, making it more difficult to handle in the manufacturing process. In particular, since a large substrate is often subjected to a large bending stress by its own weight, the presence of a slight flaw leads to a substrate crack in a manufacturing process.

【0006】フラットパネルディスプレイ用ガラス基板
の機械的強度を支配する因子の一つは、ガラス基板端面
に存在する傷である。しかし、フラットパネルディスプ
レイ用ガラス基板においては、高い平坦度が要求される
ガラス基板の主表面の表面粗さと比べて、端面の表面粗
さは粗いのが一般的である。その理由は、端面はガラス
素板から切り出した切断面であるため、面取り・仕上げ
加工前の面品質(表面粗さ等)がもともと良くないこ
と、画像表示に関与しないため高い仕上げ精度が要求さ
れないこと、等である。
One of the factors governing the mechanical strength of a glass substrate for a flat panel display is a flaw existing on the end face of the glass substrate. However, in a glass substrate for a flat panel display, the end surface generally has a coarser surface roughness than the main surface of the glass substrate that requires high flatness. The reason is that the end face is a cut surface cut out from a glass base plate, so that the surface quality (surface roughness, etc.) before chamfering and finishing is not originally good, and high finishing accuracy is not required because it is not involved in image display. And so on.

【0007】[0007]

【発明が解決しようとする課題】ガラス基板の機械的強
度をより向上させるため、従来500メッシュよりも細
かい粒径の砥粒(固定砥粒よりなる研削ホイール)によ
り端面の仕上げ加工を行い、端面の傷の深さを低減させ
ることも行われているが、それでも端面にはかなり深い
傷が存在している。さらに、端面の仕上げ状態を改善す
るためには、段階的に粒径を変えた砥粒による多段階加
工(まず荒い粒径の砥粒を使用した研削ホイールによる
加工、次に細かい粒径の砥粒を使用した研削ホイールに
よる加工、等のように段階的に荒い粒径の砥粒から細か
い粒径の砥粒に変化させる多段階の加工)が必要となる
が、この多段階加工は、大幅に生産性を低下させコスト
を著しく増大させる問題があった。
In order to further improve the mechanical strength of the glass substrate, the end face is finished with abrasive grains (grinding wheels made of fixed abrasive grains) having a particle size smaller than the conventional 500 mesh. It has also been attempted to reduce the depth of the flaw, but there is still a rather deep flaw on the end face. Furthermore, in order to improve the finish of the end face, it is necessary to perform multi-step processing using abrasive grains of which the grain size is changed stepwise (processing with a grinding wheel using abrasive grains of coarse grain size, and then grinding with fine grain size). Multi-step processing, such as processing with a grinding wheel using grains, is required to gradually change from coarse grains to fine grains in a step-wise manner. However, there is a problem that productivity is lowered and cost is remarkably increased.

【0008】端面の仕上げ状態の改善とは異なるガラス
基板強度向上法としては、ガラス基板を硝酸ナトリウム
溶融塩、硝酸カリウム溶融塩、またはその混合溶融塩の
浴に浸漬してガラス表面近傍のLiイオンと硝酸ナトリ
ウム溶融塩のNaイオン、ガラス表面近傍のNaイオン
と硝酸カリウム溶融塩のKイオンとをイオン交換し、ガ
ラス表面に圧縮応力層を形成してガラス基板の強度を向
上させる、イオン交換強化方法と呼ばれる化学強化法に
より高強度化を図る方法が挙げられる。
As a method of improving the strength of a glass substrate, which is different from the improvement of the finished state of the end surface, a glass substrate is immersed in a bath of a molten salt of sodium nitrate, a molten salt of potassium nitrate, or a molten salt of a mixture thereof to remove Li ions near the glass surface. An ion exchange strengthening method for ion exchange between Na ions in sodium nitrate molten salt, Na ions in the vicinity of glass surface and K ions in potassium nitrate molten salt to form a compressive stress layer on the glass surface to improve the strength of the glass substrate; There is a method of increasing the strength by a so-called chemical strengthening method.

【0009】しかし、化学強化法による強度向上の効果
があるのは、所定割合のLiやNa等のアルカリ金属を
含有するガラスに対してのみである。フラットパネルデ
ィスプレイを構成するに際して、アモルファスシリコン
TFT(a−SiTFT)、ポリシリコンTFT(p−
SiTFT)等の半導体または酸化物の薄膜等をガラス
基板上に形成させるもの、たとえばTFT−LCDにお
いては、ガラス基板中にアルカリ金属が多く存在する
と、アルカリ金属イオンが前記薄膜中に拡散して膜特性
を劣化させるため、実質的にアルカリ金属イオンを含ま
ないガラス基板が用いられる。この場合、化学強化法の
適用は困難である。
However, the effect of improving the strength by the chemical strengthening method is effective only for glass containing a predetermined ratio of an alkali metal such as Li or Na. When constructing a flat panel display, an amorphous silicon TFT (a-SiTFT) and a polysilicon TFT (p-SiTFT) are used.
In the case of forming a thin film of a semiconductor such as SiTFT) or an oxide on a glass substrate, for example, in a TFT-LCD, when a large amount of alkali metal is present in the glass substrate, alkali metal ions diffuse into the thin film to form a film. In order to deteriorate the characteristics, a glass substrate containing substantially no alkali metal ions is used. In this case, application of the chemical strengthening method is difficult.

【0010】さらに、薄膜形成工程等フラットパネルデ
ィスプレイの製造工程においては高温の熱処理プロセス
を採用することが多く、この場合化学強化法によって形
成されたガラス表面の応力層が熱処理で緩和され、その
結果、十分な強化の効果が得られないことが多い。
Further, in the flat panel display manufacturing process such as a thin film forming process, a high-temperature heat treatment process is often employed. In this case, the stress layer on the glass surface formed by the chemical strengthening method is relaxed by the heat treatment. In many cases, a sufficient strengthening effect cannot be obtained.

【0011】一方、ガラスには、その歪点付近およびそ
れを上回る温度における熱処理によって、平均強度が向
上する現象が見られる。以下、この現象について説明す
る。
On the other hand, glass has a phenomenon in which the average strength is improved by heat treatment at a temperature near and above the strain point. Hereinafter, this phenomenon will be described.

【0012】ガラスに存在する傷、すなわち亀裂が、該
亀裂に対し垂直な方向に引張応力を受けると、応力集中
が起こり、応力は亀裂先端で最大となる。図3に示され
るように、物体1の表面2に存在する深さCの断面半楕
円形をした亀裂3に、その垂直方向に引張応力σが働く
と、亀裂先端の応力σmは式1で与えられる。
When a flaw or crack present in the glass is subjected to tensile stress in a direction perpendicular to the crack, stress concentration occurs and the stress is maximum at the crack tip. As shown in FIG. 3, when a tensile stress σ acts on a crack 3 having a semi-elliptic cross section at a depth C existing on the surface 2 of the object 1 in the vertical direction, the stress σ m at the crack tip becomes Given by

【0013】σm=2σ(C/ρ)1/2・・式1 ここで、ρは亀裂先端の曲率半径である。式1によれ
ば、亀裂の深さCが小さくなると、または亀裂先端の曲
率半径ρが大きくなると、亀裂先端への応力集中は起こ
りにくくなり、結果的に同じ応力が働いた場合でも破壊
は起こりにくくなる。
Σ m = 2σ (C / ρ) 1/2 (1) where ρ is the radius of curvature of the crack tip. According to Equation 1, when the depth C of the crack becomes small, or when the radius of curvature ρ of the crack tip becomes large, stress concentration on the crack tip becomes difficult to occur, and as a result, even if the same stress acts, the fracture occurs. It becomes difficult.

【0014】通常の亀裂先端の曲率半径ρは充分に小さ
い、すなわち鋭いことが多いが、このような亀裂は化学
結合が切断された、エネルギーが高い状態である。この
ため、ガラスをその歪点付近およびそれを上回る温度に
おいて熱処理を行うと、拡散等の物質移動により亀裂先
端の曲率半径ρは大きくなり、はなはだしい場合は亀裂
の再結合による亀裂の治癒が起こることがある。この現
象は、一般的にクラック・ヒーリング(Crack h
ealing)と呼ばれる。このような現象が起こる
と、上記のように亀裂先端への応力集中は起こりにくく
なり、同じ応力が働いた場合でも破壊は起こりにくくな
る。
Although the radius of curvature ρ of a normal crack tip is sufficiently small, that is, often sharp, such a crack is a state in which a chemical bond is broken and the energy is high. Therefore, if the glass is subjected to heat treatment at a temperature near or above its strain point, the radius of curvature ρ of the crack tip becomes large due to mass transfer such as diffusion, and in extreme cases, crack healing due to recombination of the crack may occur. There is. This phenomenon is generally caused by crack healing.
calling. When such a phenomenon occurs, stress concentration on the crack tip is unlikely to occur as described above, and even when the same stress acts, destruction is unlikely to occur.

【0015】ただし、従来の端面加工を施したガラス基
板のように、ガラス上に所定以上の大きさの傷が存在す
ると、クラック・ヒーリング現象が起こりにくくなるた
め、顕著な強度向上効果が得られにくい。この場合、熱
処理温度をより高くし、物質移動が起こりやすい状態に
することで強度向上効果は得られるようになる。しか
し、フラットパネルディスプレイ用ガラス基板には平坦
度が要求されるため、あまり高温での熱処理、特に、徐
冷点以上での熱処理は、ガラス基板の熱変形を生じ、ガ
ラス基板の平坦度が悪化するので好ましくない。
However, when a flaw of a predetermined size or more is present on the glass, as in a conventional glass substrate having a processed end face, a crack-healing phenomenon is unlikely to occur, so that a remarkable strength-improving effect is obtained. Hateful. In this case, the effect of improving the strength can be obtained by increasing the heat treatment temperature so that mass transfer easily occurs. However, since flatness is required for glass substrates for flat panel displays, heat treatment at an excessively high temperature, particularly at a temperature higher than the annealing point, causes thermal deformation of the glass substrate and deteriorates the flatness of the glass substrate. Is not preferred.

【0016】本発明は、上述の問題を解決するガラス基
板の端面強度向上方法、およびそれを用いたフラットパ
ネルディスプレイ用ガラス基板の提供を目的とする。
An object of the present invention is to provide a method for improving the end face strength of a glass substrate which solves the above-mentioned problems, and to provide a glass substrate for a flat panel display using the same.

【0017】[0017]

【課題を解決するための手段】本発明は、ガラス基板の
端面部分に、リチウム塩、ナトリウム塩、カリウム塩、
ホウ酸およびリン酸から選ばれる化合物(以下、「特定
化合物」という)の1種以上を含む溶液を塗布し乾燥
後、当該ガラスの歪点±100℃の温度範囲内において
熱処理することを特徴とするガラス基板端面の強度向上
方法を提供する。このような方法を採用すれば、ガラス
基板の熱変形を生ぜずに、比較的簡便にガラス基板の端
面強度向上が図れる。また、特定化合物を含む溶液は、
材料の入手が容易であり、さらに、安全かつ簡便に調合
ができ、ガラス基板の端面強度向上方法としてふさわし
いからである。また、本発明は、上記の方法で端面強度
を向上させてなるフラットパネルディスプレイ用ガラス
基板を提供する。
According to the present invention, a lithium salt, a sodium salt, a potassium salt,
A solution containing at least one compound selected from boric acid and phosphoric acid (hereinafter, referred to as "specific compound") is applied, dried, and then heat-treated within a temperature range of the strain point of the glass ± 100 ° C. To provide a method for improving the strength of an end face of a glass substrate. By adopting such a method, it is possible to relatively easily improve the end face strength of the glass substrate without causing thermal deformation of the glass substrate. Also, the solution containing the specific compound,
This is because the material can be easily obtained, and can be safely and simply prepared, and is suitable as a method for improving the end face strength of the glass substrate. Further, the present invention provides a glass substrate for a flat panel display obtained by improving the end face strength by the above method.

【0018】[0018]

【発明の実施の形態】本発明でいうフラットパネルディ
スプレイとは、LCD、PDP、無機および有機エレク
トロルミネッセンスディスプレイ、FED、等画面が平
坦なディスプレイをいう。
BEST MODE FOR CARRYING OUT THE INVENTION A flat panel display according to the present invention refers to a display having a flat screen such as an LCD, a PDP, an inorganic and organic electroluminescent display, and an FED.

【0019】本発明でいうガラス基板は、ガラス素板
(たとえばフロート法、フュージョン法等のダウンドロ
ー法で成形したガラスリボン)を所定寸法に切断したも
のである。本発明のフラットパネルディスプレイ用ガラ
ス基板として通常利用されている形状は長方形であり、
その寸法はmm表示で、長辺650、短辺550、板厚
0.7、または長辺1050、短辺650、板厚2.
8、等種々のものがある。本発明でいうガラス基板の主
表面とは、前述したように、板状体のガラス基板の表裏
面を指し、基板の端面は除かれる。
The glass substrate in the present invention is a glass substrate (for example, a glass ribbon formed by a down-draw method such as a float method or a fusion method) cut into a predetermined size. The shape usually used as a glass substrate for a flat panel display of the present invention is a rectangle,
The dimensions are expressed in mm and the long side 650, short side 550, plate thickness 0.7, or long side 1050, short side 650, plate thickness 2.
8, etc. As described above, the main surface of the glass substrate in the present invention refers to the front and back surfaces of the plate-shaped glass substrate, and excludes the end surface of the substrate.

【0020】一般に、フラットパネルディスプレイ用ガ
ラス基板にはSiO2−Al23−RO系ガラスが使用
されている。本発明において、これらのガラスの局部に
処理を施したことで、該局部の歪点をみかけ上顕著に低
下させる成分を探索した結果、リチウム塩、ナトリウム
塩、カリウム塩、ホウ酸、リン酸が有効であることを見
い出した。
Generally, SiO 2 —Al 2 O 3 —RO glass is used for a glass substrate for a flat panel display. In the present invention, by treating local portions of these glasses, as a result of searching for a component that apparently significantly reduces the strain point of the local portions, lithium salt, sodium salt, potassium salt, boric acid, and phosphoric acid are removed. Found to be effective.

【0021】本発明では、ガラス基板の端面部分に、特
定化合物の1種以上を含む溶液を塗布し乾燥後、当該ガ
ラスの歪点±100℃の温度範囲内で熱処理する。これ
により、端面付近のガラスの歪点が低下するため、比較
的低い温度で熱処理してもクラック・ヒーリング効果が
得られやすくなり、ガラスの平坦度を損なうことなくガ
ラスの強度が向上する。
In the present invention, a solution containing at least one specific compound is applied to the end face of the glass substrate, dried, and then heat-treated within a temperature range of ± 100 ° C. of the strain point of the glass. As a result, the strain point of the glass near the end face decreases, so that even when heat treatment is performed at a relatively low temperature, the crack healing effect is easily obtained, and the strength of the glass is improved without impairing the flatness of the glass.

【0022】特定化合物としては、材料の入手が容易で
あり、また安全かつ簡便に調合ができる点でLi2
3、Na2CO3、K2CO3、B23・nH2O(たとえ
ばH3BO3)、P25・nH2O(たとえばH3PO4
等が好ましいが、これらに限定されない。前記溶液の溶
媒としては、水またはアルコール等の有機溶剤等が好ま
しいが、使用する特定化合物を溶解する溶媒であれば、
これらに限定されない。
As the specific compound, Li 2 C is used because the material is easily available and the compound can be safely and simply prepared.
O 3 , Na 2 CO 3 , K 2 CO 3 , B 2 O 3 .nH 2 O (for example, H 3 BO 3 ), P 2 O 5 .nH 2 O (for example, H 3 PO 4 )
Etc. are preferred, but not limited thereto. The solvent of the solution is preferably an organic solvent such as water or alcohol, but any solvent that dissolves the specific compound used can be used.
It is not limited to these.

【0023】ガラス基板の熱処理温度は、該ガラスの歪
点±100℃の範囲内でなされる。なお、ここでいう熱
処理温度とは、熱処理工程中の処理雰囲気の最高到達温
度をいう(なお、ガラス基板の熱処理条件の詳細につい
ては、後述する図1に示される。)。最高到達温度で保
持する時間は5分以上であればよい。ガラス基板に、よ
り高い平坦性が要求される場合は、熱処理温度は該ガラ
スの歪点±50℃の範囲内が好ましく、(歪点−50
℃)〜歪点の範囲内がより好ましい。
The heat treatment temperature of the glass substrate is set within a range of ± 100 ° C. of the strain point of the glass. Here, the heat treatment temperature refers to the maximum temperature of the treatment atmosphere during the heat treatment step (the details of the heat treatment conditions for the glass substrate are shown in FIG. 1 described later). The holding time at the highest temperature may be 5 minutes or more. When higher flatness is required for the glass substrate, the heat treatment temperature is preferably within the range of ± 50 ° C. of the strain point of the glass,
C) to within the range of the strain point.

【0024】なお、フラットパネルディスプレイ用ガラ
ス基板では、製造工程中の熱処理等における熱収縮を抑
制するため、あらかじめ歪点付近の温度で前熱処理され
ることがある。したがって、基板の端面部分に上記溶液
を塗布し乾燥した後、後述する図1に示される熱処理を
行えば、熱収縮抑制効果と端面強度向上効果とが同時に
得られる。この場合では、新たに強度向上のための熱処
理を行う必要がないため工程が省ける。
Incidentally, the glass substrate for a flat panel display may be pre-heat-treated at a temperature near the strain point in advance in order to suppress heat shrinkage during the heat treatment or the like during the manufacturing process. Therefore, if the above-mentioned solution is applied to the end face portion of the substrate and dried, and then the heat treatment shown in FIG. 1 described later is performed, the heat shrinkage suppressing effect and the end face strength improving effect can be simultaneously obtained. In this case, since it is not necessary to newly perform a heat treatment for improving the strength, the process can be omitted.

【0025】[0025]

【実施例】質量%で、SiO2:58%、Al23:7
%、MgO:2%、CaO:5%、SrO:7%、Ba
O:7.5%、ZrO2:3%、Na2O:4%、K
2O:6.5%の組成からなるガラス(歪点:570
℃)を、長さ50〜55mm、幅4mm、厚さ2.8m
mのサイズに加工し、強度を評価する面を320メッシ
ュのGC研磨材(緑色炭化ケイ素研磨材)に擦り付けて
加傷し、試験サンプルを製作した。試験サンプルを10
0本用意し、20〜30本ずつ4グループに分けて、そ
れぞれ以下の処理を行った。
EXAMPLES In terms of mass%, SiO 2 : 58%, Al 2 O 3 : 7
%, MgO: 2%, CaO: 5%, SrO: 7%, Ba
O: 7.5%, ZrO 2 : 3%, Na 2 O: 4%, K
2 O: glass having a composition of 6.5% (strain point: 570)
° C), length 50-55 mm, width 4 mm, thickness 2.8 m
The test sample was fabricated by processing into a size of m and rubbing the surface for evaluating the strength with a 320-mesh GC abrasive (green silicon carbide abrasive) to damage the surface. 10 test samples
0 pieces were prepared, and 20 to 30 pieces were divided into four groups, and the following processes were respectively performed.

【0026】処理1:未処理(比較例)。 処理2:マッフル炉で図1に示した熱処理のみを実施
(比較例)。 処理3:H3BO3の4質量%水溶液に2秒間浸した後、
室温で自然乾燥させ、乾燥後、マッフル炉で図1に示し
た熱処理を実施。 処理4:Na2CO3の4質量%水溶液に2秒間浸した
後、室温で自然乾燥させ、乾燥後、マッフル炉で図1に
示した熱処理を実施。
Process 1: unprocessed (comparative example) Process 2: Only the heat treatment shown in FIG. 1 was performed in a muffle furnace (comparative example). Treatment 3: After immersing in a 4% by mass aqueous solution of H 3 BO 3 for 2 seconds,
After air drying at room temperature, the heat treatment shown in FIG. 1 was performed in a muffle furnace. Treatment 4: After immersing in a 4% by mass aqueous solution of Na 2 CO 3 for 2 seconds, air-drying is performed at room temperature, and after drying, the heat treatment shown in FIG. 1 is performed in a muffle furnace.

【0027】得られたサンプルの4点曲げ強度試験(J
IS R1601、下スパン30mm、上スパン10m
m、クロスヘッドスピード0.5mm/分)を行い、強
度を比較した。なお、破壊起点が加傷面でないサンプル
は以下のデータから除いた。得られたワイブルプロット
を図2に、測定結果を表1に示す。
The four-point bending strength test (J
IS R1601, lower span 30mm, upper span 10m
m, crosshead speed 0.5 mm / min) and the strength was compared. In addition, the sample whose fracture origin is not a damaged surface was excluded from the following data. FIG. 2 shows the obtained Weibull plot, and Table 1 shows the measurement results.

【0028】[0028]

【表1】 [Table 1]

【0029】処理1および処理2の結果を比較すると、
熱処理によって平均破壊強度が向上することがわかる。
しかし、処理1に比較し処理2におけるワイブル係数は
小さく、0.1%破壊確率応力で比較すると大きな改善
効果は見られていない。この理由は、大きな傷ではクラ
ック・ヒーリング現象が起こっていないためと推定され
る。現実のフラットパネルディスプレイ製造工程では、
破壊確率0.1%程度での割れが問題となるため、処理
2では強度が十分に改善されたとはいえない。
Comparing the results of processing 1 and processing 2,
It can be seen that the average breaking strength is improved by the heat treatment.
However, the Weibull coefficient in Process 2 was smaller than that in Process 1, and no significant improvement was seen when compared with 0.1% probability of fracture stress. The reason is presumed to be that the crack healing phenomenon did not occur in the large wound. In the actual flat panel display manufacturing process,
Since cracking with a fracture probability of about 0.1% becomes a problem, it cannot be said that the strength was sufficiently improved in the treatment 2.

【0030】これに対し、処理3、4では平均破壊強度
が向上し、また処理1を上回るワイブル係数であるた
め、0.1%破壊確率応力も大きくなっていることがわ
かる。この理由は、H3BO3、Na2CO3の塗布および
熱処理によりガラスの歪点が局部的に低下し、大きな傷
でもクラック・ヒーリング現象が起こっているためと推
定される。この結果より、実用上での破壊確率は大幅に
低下すると考えられる。このように、本発明によれば、
ガラスの破壊強度、特に実用上問題となる破壊確率応力
を大きくでき、ガラスの割れを防止できる。
On the other hand, it can be seen that the average fracture strength is improved in the treatments 3 and 4, and the Weibull coefficient is higher than that in the treatment 1, so that the 0.1% fracture probability stress is also increased. The reason for this is presumed to be that the strain point of the glass is locally reduced by the application of H 3 BO 3 and Na 2 CO 3 and the heat treatment, and the crack healing phenomenon occurs even with a large flaw. From this result, it is considered that the probability of destruction in practical use is greatly reduced. Thus, according to the present invention,
The breaking strength of glass, especially the probability of breaking stress, which is a practical problem, can be increased, and the breaking of glass can be prevented.

【0031】[0031]

【発明の効果】本発明によれば、化学強化を必ずしも要
せず、ガラス基板の機械的強度に大きく影響を与えるガ
ラス基板端面の強度を向上できる。特に、実用上問題と
なる低確率での破壊確率応力を大きくできる。これによ
り、高強度のフラットパネルディスプレイ用ガラス基板
を提供できる。
According to the present invention, the strength of the end face of the glass substrate, which does not necessarily require chemical strengthening and greatly affects the mechanical strength of the glass substrate, can be improved. In particular, it is possible to increase the probability of fracture stress at a low probability, which is a practical problem. Thereby, a high-strength glass substrate for a flat panel display can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例における、試料の熱処理パター
ンを示すグラフ。
FIG. 1 is a graph showing a heat treatment pattern of a sample in an example of the present invention.

【図2】本発明の実施例における、4点曲げ強度試験の
結果のワイブルプロット。
FIG. 2 is a Weibull plot of a result of a four-point bending strength test in an example of the present invention.

【図3】ガラス基板の表面に存在する亀裂を説明する概
略断面図。
FIG. 3 is a schematic cross-sectional view illustrating a crack existing on the surface of a glass substrate.

【符号の説明】[Explanation of symbols]

1:物体 2:物体の表面 3:亀裂 C:亀裂の深さ 1: Object 2: Surface of object 3: Crack C: Depth of crack

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H090 JA11 JB02 JC06 JD13 LA04 4G015 DA05 5C094 AA36 BA21 BA27 BA31 BA43 EB02 GB10  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H090 JA11 JB02 JC06 JD13 LA04 4G015 DA05 5C094 AA36 BA21 BA27 BA31 BA43 EB02 GB10

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ガラス基板の端面部分に、リチウム塩、ナ
トリウム塩、カリウム塩、ホウ酸およびリン酸から選ば
れる化合物の1種以上を含む溶液を塗布し乾燥後、当該
ガラスの歪点±100℃の温度範囲内において熱処理す
ることを特徴とするガラス基板端面の強度向上方法。
1. A solution containing at least one compound selected from a lithium salt, a sodium salt, a potassium salt, boric acid and phosphoric acid is applied to an end surface of a glass substrate, dried, and then subjected to a strain point ± 100 of the glass. A method for improving the strength of an end face of a glass substrate, wherein the heat treatment is performed within a temperature range of ° C.
【請求項2】請求項1に記載の方法で端面強度を向上さ
せてなるフラットパネルディスプレイ用ガラス基板。
2. A glass substrate for a flat panel display, wherein the end face strength is improved by the method according to claim 1.
JP2000082774A 2000-03-23 2000-03-23 Method of improving strength of end face of glass substrate and glass substrate for flat panel display Pending JP2001261355A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000082774A JP2001261355A (en) 2000-03-23 2000-03-23 Method of improving strength of end face of glass substrate and glass substrate for flat panel display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000082774A JP2001261355A (en) 2000-03-23 2000-03-23 Method of improving strength of end face of glass substrate and glass substrate for flat panel display

Publications (1)

Publication Number Publication Date
JP2001261355A true JP2001261355A (en) 2001-09-26

Family

ID=18599528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000082774A Pending JP2001261355A (en) 2000-03-23 2000-03-23 Method of improving strength of end face of glass substrate and glass substrate for flat panel display

Country Status (1)

Country Link
JP (1) JP2001261355A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008522950A (en) * 2004-12-13 2008-07-03 コーニング インコーポレイテッド Glass laminated substrate with increased impact / static load strength
JP2008218417A (en) * 2008-03-24 2008-09-18 Nippon Electric Glass Co Ltd Sheet glass for plane surface display device and its evaluation method
JP2008306149A (en) * 2007-07-24 2008-12-18 Hoya Candeo Optronics株式会社 Wafer support glass
WO2009116263A1 (en) * 2008-03-18 2009-09-24 パナソニック株式会社 Plasma display panel and method for manufacturing the same
JP2011062894A (en) * 2009-09-16 2011-03-31 Seiko Instruments Inc Thermal head and printer
JP2011181941A (en) * 2011-04-15 2011-09-15 Lintec Corp Method for processing semiconductor wafer
WO2013050165A1 (en) * 2011-10-07 2013-04-11 Schott Ag Glass film with smooth and microcrack-free edge surface and manufacturing method thereof
KR20150143493A (en) 2013-04-18 2015-12-23 아사히 가라스 가부시키가이샤 Glass plate manufacturing method, glass plate manufacturing device and glass plate

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008522950A (en) * 2004-12-13 2008-07-03 コーニング インコーポレイテッド Glass laminated substrate with increased impact / static load strength
JP2008306149A (en) * 2007-07-24 2008-12-18 Hoya Candeo Optronics株式会社 Wafer support glass
WO2009116263A1 (en) * 2008-03-18 2009-09-24 パナソニック株式会社 Plasma display panel and method for manufacturing the same
EP2180496A1 (en) * 2008-03-18 2010-04-28 Panasonic Corporation Plasma display panel and method for manufacturing the same
EP2180496A4 (en) * 2008-03-18 2010-11-03 Panasonic Corp Plasma display panel and method for manufacturing the same
KR101136651B1 (en) * 2008-03-18 2012-04-18 파나소닉 주식회사 Plasma display panel and method for manufacturing the same
JP2008218417A (en) * 2008-03-24 2008-09-18 Nippon Electric Glass Co Ltd Sheet glass for plane surface display device and its evaluation method
JP2011062894A (en) * 2009-09-16 2011-03-31 Seiko Instruments Inc Thermal head and printer
JP2011181941A (en) * 2011-04-15 2011-09-15 Lintec Corp Method for processing semiconductor wafer
WO2013050165A1 (en) * 2011-10-07 2013-04-11 Schott Ag Glass film with smooth and microcrack-free edge surface and manufacturing method thereof
KR20150143493A (en) 2013-04-18 2015-12-23 아사히 가라스 가부시키가이샤 Glass plate manufacturing method, glass plate manufacturing device and glass plate

Similar Documents

Publication Publication Date Title
TWI486320B (en) Reinforced plate glass and manufacturing method thereof
JP4535692B2 (en) Chemically tempered glass
KR101541631B1 (en) Glass plate and method for manufacturing glass plate
JP3313721B2 (en) Method for strengthening glass articles
EP2202208B1 (en) Glass substrate and method for manufacturing the same
JP5255611B2 (en) GLASS SUBSTRATE FOR DISPLAY, PROCESS FOR PRODUCING THE SAME AND DISPLAY USING THE SAME
JP2012111661A (en) Glass substrate and method for production thereof
JP2010202514A (en) Glass substrate for mobile liquid crystal display and method for producing the same, and mobile liquid crystal display using the same
JP2008266046A (en) Glass substrate for flat panel display and method for manufacturing the same
US10081569B2 (en) Process for producing glass substrate, and glass substrate
JP5790303B2 (en) Method for producing tempered glass sheet
WO2015076268A1 (en) Chemically strengthened glass plate
US9896371B2 (en) Tempered glass cutting method and cutting apparatus
JP2012218995A (en) Method for manufacturing tempered glass plate and cover glass, and cover glass
US20090113935A1 (en) Process for producing glass bar
JPWO2014045809A1 (en) Method for producing chemically strengthened glass
JP2001261355A (en) Method of improving strength of end face of glass substrate and glass substrate for flat panel display
TW201817689A (en) Method for producing chemically toughened glass
JP2003308792A (en) Plate glass for flat display device
CN109071332B (en) Tempered glass plate and method for producing tempered glass plate
JP6288347B2 (en) Glass substrate for display
JP5502937B2 (en) GLASS SUBSTRATE FOR DISPLAY, PROCESS FOR PRODUCING THE SAME AND DISPLAY USING THE SAME
JPH0768051B2 (en) Method of chemically strengthening float glass
JP5002067B2 (en) GLASS SUBSTRATE FOR PORTABLE LIQUID CRYSTAL DISPLAY, ITS MANUFACTURING METHOD, AND PORTABLE LIQUID CRYSTAL DISPLAY USING THE SAME
JP2013040086A (en) Method for manufacturing tempered glass plate and cover glass, and cover glass