JP2001210757A - Resin sealed semiconductor element - Google Patents

Resin sealed semiconductor element

Info

Publication number
JP2001210757A
JP2001210757A JP2000015583A JP2000015583A JP2001210757A JP 2001210757 A JP2001210757 A JP 2001210757A JP 2000015583 A JP2000015583 A JP 2000015583A JP 2000015583 A JP2000015583 A JP 2000015583A JP 2001210757 A JP2001210757 A JP 2001210757A
Authority
JP
Japan
Prior art keywords
resin
semiconductor element
groove
resin portion
encapsulated semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000015583A
Other languages
Japanese (ja)
Inventor
Kazumi Fukuda
一美 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2000015583A priority Critical patent/JP2001210757A/en
Publication of JP2001210757A publication Critical patent/JP2001210757A/en
Pending legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a resin sealed semiconductor element which can suppress cracks and improve the reliability or yield. SOLUTION: The semiconductor element comprises a resin block in which the semiconductor element is sealed with a resin, outer leads for connecting the semiconductor element to externals, and heat sink provided on the backside of the resin block, and two or more trenches continuous from end to end are formed on the surface of the resin block.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、樹脂封止型半導体
素子に係り、特に裏面に放熱板を設けた樹脂封止型半導
体素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin-encapsulated semiconductor device, and more particularly, to a resin-encapsulated semiconductor device having a heat radiating plate on the back surface.

【0002】[0002]

【従来の技術】半導体素子を樹脂で封止した樹脂封止型
半導体素子は、例えば図7に示すように、リードフレー
ム上にマウントされる半導体素子(ペレット)1を覆っ
て形成される樹脂部2と、リードフレームの一部で、半
導体素子(ペレット)1を外部に接続するアウターリー
ド3、及び樹脂部2の裏面に固定される放熱板4より構
成されている。そして、このような構成により、半導体
素子は外界の雰囲気の影響を受けにくく、且つ駆動時に
発生する熱を効率的に放出することができるというもの
である。
2. Description of the Related Art As shown in FIG. 7, for example, as shown in FIG. 7, a resin-encapsulated semiconductor element in which a semiconductor element is encapsulated with a resin is formed by covering a semiconductor element (pellet) 1 mounted on a lead frame. 2, a part of the lead frame, an outer lead 3 for connecting the semiconductor element (pellet) 1 to the outside, and a heat radiating plate 4 fixed to the back surface of the resin portion 2. With such a configuration, the semiconductor element is hardly affected by the atmosphere of the outside world, and can efficiently release the heat generated during driving.

【0003】樹脂部2は、リードフレームに金線等で接
続された半導体素子を、モールド金型にセットし、18
0℃前後まで温度を上げ、液状化した低応力系で粘度の
低い熱硬化性樹脂を圧送して流し込み、硬化させて形成
される。このとき、モールド金型の温度と気温との差に
より応力が発生し、樹脂部2の長手方向に反りが発生し
てしまうため、基板実装時、放熱板にネジ締め部5にお
いてネジで固定する際、樹脂部2及びその中心部に配置
される半導体素子(ペレット)1に応力が加わり、ペレ
ットクラック等が発生し製品の信頼性低下や歩留まりの
低下を引き起こしていた。
The resin part 2 sets a semiconductor element connected to a lead frame by a gold wire or the like in a mold, and
The temperature is raised to about 0 ° C., and a liquefied, low-stress, low-viscosity thermosetting resin is pressure-fed, poured, and cured to form. At this time, a stress is generated due to a difference between the temperature of the mold and the air temperature, and a warp is generated in the longitudinal direction of the resin portion 2. At this time, stress is applied to the resin portion 2 and the semiconductor element (pellet) 1 disposed at the center thereof, and pellet cracks and the like are generated, which causes a reduction in product reliability and a reduction in yield.

【0004】[0004]

【発明が解決しようとする課題】この様に、従来の樹脂
封止型半導体素子においては、その表面に反りが発生す
るため、基板実装時に加わる応力により、クラックが生
じるという問題があった。
As described above, the conventional resin-encapsulated semiconductor element has a problem that the surface is warped, so that cracks are generated due to the stress applied when the substrate is mounted.

【0005】従って本発明は、このような従来の樹脂封
止型半導体素子の欠点を取り除き、クラックを生じるこ
となく、信頼性や歩留まりを向上させることが可能にな
る樹脂封止型半導体素子を提供することを目的とするも
のである。
Accordingly, the present invention provides a resin-encapsulated semiconductor device which eliminates such drawbacks of the conventional resin-encapsulated semiconductor device and can improve reliability and yield without causing cracks. It is intended to do so.

【0006】[0006]

【課題を解決するための手段】本発明の樹脂封止型半導
体素子は、半導体素子が樹脂により封止された樹脂部
と、前記半導体素子を外部と接続するアウターリード
と、前記樹脂部の裏面に設けられる放熱板を備え、前記
樹脂部の表面に、端部から端部に連続した溝が2本以上
設けられていることを特徴とする。
According to the present invention, there is provided a resin-encapsulated semiconductor device, comprising: a resin portion in which the semiconductor device is sealed with a resin; an outer lead for connecting the semiconductor device to the outside; and a back surface of the resin portion. And a heat sink provided on the surface of the resin portion, wherein two or more grooves continuous from end to end are provided on the surface of the resin portion.

【0007】また、本発明の樹脂封止型半導体素子にお
いては、前記溝は、前記樹脂部の短手方向と並行に設け
られていることを特徴とする。さらに、本発明の樹脂封
止型半導体素子においては、前記溝は、前記樹脂部の端
部から前記樹脂部の長手方向の長さの15〜35%の位
置に形成されることを特徴とするものである。
Further, in the resin-encapsulated semiconductor device according to the present invention, the groove is provided in parallel with a short direction of the resin portion. Further, in the resin-encapsulated semiconductor device according to the present invention, the groove is formed at a position of 15 to 35% of a longitudinal length of the resin portion from an end of the resin portion. Things.

【0008】さらに、本発明の樹脂封止型半導体素子に
おいては、前記溝の幅は、前記樹脂部の長手方向の長さ
の1%以上でありかつ3%以下であることを特徴とする
ものである。
Further, in the resin-encapsulated semiconductor device according to the present invention, the width of the groove is at least 1% and at most 3% of the longitudinal length of the resin portion. It is.

【0009】さらに、本発明の樹脂封止型半導体素子に
おいては、前記溝の深さは、前記樹脂部厚の2〜15%
であることを特徴とするものである。
Further, in the resin-encapsulated semiconductor device of the present invention, the depth of the groove is 2 to 15% of the thickness of the resin portion.
It is characterized by being.

【0010】[0010]

【発明の実施の形態】本発明の一実施形態について、図
1乃至図6を参照して説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to FIGS.

【0011】先ず、半導体素子1をリードフレームにマ
ウントした後、半導体素子1とリードフレームを金線で
ボンディングする。これを、モールド金型にセットし、
液状化した樹脂を圧送して流し込むことにより、半導体
素子1を樹脂により封止、樹脂部2を形成する。尚、モ
ールド金型は、あらかじめ断面形状が台形の溝6を形成
するように成型されている。
First, after mounting the semiconductor element 1 on a lead frame, the semiconductor element 1 and the lead frame are bonded by a gold wire. This is set in the mold,
The liquefied resin is pressure-fed and poured, whereby the semiconductor element 1 is sealed with the resin and the resin portion 2 is formed. The mold is formed in advance so as to form a groove 6 having a trapezoidal cross section.

【0012】このようにして、図1、2に夫々その上面
図、側面図を、図3に溝6部分の拡大図を、さらに、図
4、5、6に夫々その上面図、長手方向の側面図、短手
方向の側面図を示す。これらの図に示されるように、樹
脂部2の表面に、樹脂部2の短手方向と並行に深さ0.
1mm(即ち樹脂部2の厚さの2.2%)の台形の溝6
を2本設ける。このとき、樹脂部2センターから溝6の
中心線の距離は、夫々樹脂部2の長手方向の長さaの3
0%となっている。また、溝6の幅は、樹脂部表面にお
いて長さaの2.8%となっている。
Thus, FIGS. 1 and 2 show a top view and a side view, respectively, FIG. 3 shows an enlarged view of the groove 6, and FIGS. 4, 5 and 6 show a top view and a longitudinal view, respectively. It shows a side view and a side view in the lateral direction. As shown in these figures, the surface of the resin portion 2 has a depth of 0.
1 mm (ie, 2.2% of the thickness of the resin part 2) trapezoidal groove 6
Are provided. At this time, the distance from the center of the resin portion 2 to the center line of the groove 6 is 3/3 of the length a of the resin portion 2 in the longitudinal direction.
It is 0%. The width of the groove 6 is 2.8% of the length a on the surface of the resin portion.

【0013】この様にして形成される樹脂部2につい
て、表面粗さ計で表面の反り量を測定したところ、本実
施形態において溝6を設けた樹脂部2においては、明ら
かに反りが軽減されており、従来のものの反りが、数十
μmであったのに対し、本発明においては、10〜20
μm軽減されている。さらに、Cu材から成る放熱板4
をネジ締め部5においてネジにより装着し、樹脂封止型
半導体素子を形成したところ、樹脂及びペレットにクラ
ックの発生は認められなかった。
When the amount of warpage of the surface of the resin portion 2 thus formed is measured by a surface roughness meter, the warpage is clearly reduced in the resin portion 2 provided with the grooves 6 in the present embodiment. The warpage of the conventional one was several tens of μm, whereas in the present invention, the warp was 10 to 20 μm.
μm has been reduced. Further, a heat sink 4 made of Cu material
Was mounted with a screw at the screwed portion 5 to form a resin-sealed semiconductor element. No crack was observed in the resin and the pellet.

【0014】本実施形態において、図3に示すように溝
の断面形状は台形としたが、特に規定されるものではな
く、半円など底面が曲線であっても、長方形など底面が
直線状に形成されていても、形成可能な形状であればよ
い。
In this embodiment, as shown in FIG. 3, the cross-sectional shape of the groove is trapezoidal. However, the shape is not particularly limited. Even if the bottom surface is a curve such as a semicircle, the bottom surface is a straight line such as a rectangle. Even if it is formed, any shape that can be formed may be used.

【0015】また、溝の幅は、反りをクラックが発生し
ない程度まで軽減するために、長さaの1%以上が好ま
しく、一方良好な封止状態を得るため、長さaの3%以
下が好ましい。
The width of the groove is preferably 1% or more of the length a in order to reduce the warpage to the extent that cracks do not occur, while 3% or less of the length a in order to obtain a good sealing state. Is preferred.

【0016】さらに、溝の深さは、反りをクラックが発
生しない程度まで軽減できる深さで、且つ半導体素子を
ボンディングする金線を樹脂部表面に露出させない深さ
であることが必要で、製品により異なるものの、樹脂部
厚(最大パッケージ厚)の2〜15%が好ましい。より
好ましくは5%以上であり、10%前後が最適である。
Further, the depth of the groove must be such that warpage can be reduced to such an extent that cracks do not occur, and the depth of the groove does not expose the gold wire for bonding the semiconductor element to the surface of the resin portion. However, the thickness is preferably 2 to 15% of the resin part thickness (maximum package thickness). It is more preferably at least 5%, and optimally around 10%.

【0017】また、このような溝は、夫々短手方向と並
行であることが好ましく、樹脂部の端部から長さaの1
5〜30%の位置に形成されることが好ましい。さら
に、夫々樹脂部のセンターからの距離の等しい位置に形
成されることが好ましいが、公差内のばらつきまでは許
容される(aの1%以下)。本実施形態においては、2
本の溝を形成したが、封止状態に影響しない程度で、好
ましくは左右対称に形成されていれば、本数は特に制限
されない。
It is preferable that such grooves are respectively parallel to the short side direction, and that one groove having a length a from the end of the resin portion.
It is preferably formed at a position of 5 to 30%. Further, it is preferable that each of the resin portions is formed at a position having the same distance from the center, but a variation within a tolerance is allowed (1% or less of a). In the present embodiment, 2
Although the number of grooves is formed, the number is not particularly limited as long as the grooves are formed so as not to affect the sealing state, and preferably are symmetric.

【0018】尚、溝の連続を妨げなければ、溝の一部に
図1、図4に示されるような変形した部分7を形成して
も良い。
If the continuity of the groove is not hindered, a deformed portion 7 as shown in FIGS. 1 and 4 may be formed in a part of the groove.

【0019】[0019]

【発明の効果】本発明によれば、クラックを生じること
なく、信頼性や歩留まりを向上させることが可能になる
樹脂封止型半導体素子を提供することができる。
According to the present invention, it is possible to provide a resin-encapsulated semiconductor device capable of improving reliability and yield without cracking.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本実施形態の樹脂封止型半導体素子の上面図。FIG. 1 is a top view of a resin-encapsulated semiconductor device according to an embodiment.

【図2】本実施形態の樹脂封止型半導体素子の長手方向
の側面図。
FIG. 2 is a longitudinal side view of the resin-encapsulated semiconductor element of the embodiment.

【図3】溝6部分の拡大図。FIG. 3 is an enlarged view of a groove 6;

【図4】本実施形態の樹脂封止型半導体素子の上面図。FIG. 4 is a top view of the resin-encapsulated semiconductor element of the embodiment.

【図5】本実施形態の樹脂封止型半導体素子の長手方向
の側面図。
FIG. 5 is a longitudinal side view of the resin-encapsulated semiconductor element of the embodiment.

【図6】本実施形態の樹脂封止型半導体素子の短手方向
の側面図。
FIG. 6 is a lateral view of the resin-encapsulated semiconductor element of the embodiment in a lateral direction.

【図7】従来の樹脂封止型半導体素子を示す上面および
側面図。
FIG. 7 is a top view and a side view showing a conventional resin-encapsulated semiconductor element.

【符号の説明】[Explanation of symbols]

1 半導体素子(ペレット) 2 樹脂部 3 アウターリード 4 放熱板 5 ネジ締め部 6 溝 7 溝の変形した部分 DESCRIPTION OF SYMBOLS 1 Semiconductor element (pellet) 2 Resin part 3 Outer lead 4 Heat sink 5 Screw fastening part 6 Groove 7 Deformed part of groove

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 半導体素子が樹脂により封止された樹脂
部と、前記半導体素子を外部と接続するアウターリード
と、前記樹脂部の裏面に設けられる放熱板を備え、前記
樹脂部の表面に、端部から端部に連続した溝が2本以上
設けられていることを特徴とする樹脂封止型半導体素
子。
1. A resin part in which a semiconductor element is sealed with a resin, an outer lead for connecting the semiconductor element to the outside, and a radiator plate provided on a back surface of the resin part. A resin-encapsulated semiconductor element, wherein two or more continuous grooves are provided from end to end.
【請求項2】 前記溝は、前記樹脂部の短手方向と並行
に設けられていることを特徴とする請求項1記載の樹脂
封止型半導体素子。
2. The resin-encapsulated semiconductor device according to claim 1, wherein said groove is provided in parallel with a lateral direction of said resin portion.
【請求項3】 前記溝は、前記樹脂部の中心部に対して
ほぼ対称に設けられていることを特徴とする請求項1又
は2記載の樹脂封止型半導体素子。
3. The resin-encapsulated semiconductor device according to claim 1, wherein the groove is provided substantially symmetrically with respect to a center of the resin portion.
【請求項4】 前記溝は、前記樹脂部の端部から前記樹
脂部の長手方向の長さの15〜35%の位置に形成され
ることを特徴とする請求項1乃至3記載の樹脂封止型半
導体素子。
4. The resin sealing device according to claim 1, wherein said groove is formed at a position of 15 to 35% of a longitudinal length of said resin portion from an end of said resin portion. Stop type semiconductor element.
【請求項5】 前記溝の幅は、前記樹脂部の長手方向の
長さの1%以上でありかつ3%以下であることを特徴と
する請求項1乃至4記載の樹脂封止型半導体素子。
5. The resin-encapsulated semiconductor device according to claim 1, wherein a width of the groove is 1% or more and 3% or less of a length of the resin portion in a longitudinal direction. .
【請求項6】 前記溝の深さは、前記樹脂部厚の2〜1
5%であることを特徴とする請求項1乃至5記載の樹脂
封止型半導体素子。
6. The depth of the groove is 2 to 1 of the thickness of the resin portion.
The resin-encapsulated semiconductor device according to claim 1, wherein the content is 5%.
JP2000015583A 2000-01-25 2000-01-25 Resin sealed semiconductor element Pending JP2001210757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000015583A JP2001210757A (en) 2000-01-25 2000-01-25 Resin sealed semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000015583A JP2001210757A (en) 2000-01-25 2000-01-25 Resin sealed semiconductor element

Publications (1)

Publication Number Publication Date
JP2001210757A true JP2001210757A (en) 2001-08-03

Family

ID=18542857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000015583A Pending JP2001210757A (en) 2000-01-25 2000-01-25 Resin sealed semiconductor element

Country Status (1)

Country Link
JP (1) JP2001210757A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100725824B1 (en) * 2004-12-27 2007-06-08 다이닛뽕스크린 세이조오 가부시키가이샤 An anointing apparatus
US8531504B2 (en) 2010-06-11 2013-09-10 Intel Corporation System and method for 3D video stabilization by fusing orientation sensor readings and image alignment estimates

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100725824B1 (en) * 2004-12-27 2007-06-08 다이닛뽕스크린 세이조오 가부시키가이샤 An anointing apparatus
US8531504B2 (en) 2010-06-11 2013-09-10 Intel Corporation System and method for 3D video stabilization by fusing orientation sensor readings and image alignment estimates

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