JP2001207160A - Abrasive and method of abrasion using the abrasive - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain an abrasive having excellent durability in abrasion efficiency. SOLUTION: This abrasive 10 comprises nucleuses 1 exhibiting a desired elasticity and adhesivity by containing water, the water 2 contained in the nucleuses 1 and plural abrasive grains 4 adhered on the surface of the nucleuses 1 by the adhesivity. The nucleus 1 contains a vaporization preventing agent 3 for preventing the evaporation of the water from the nucleus 1.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abrasive having excellent polishing ability and a polishing method using the abrasive.

[0002]

2. Description of the Related Art Conventionally, in polishing a material to be polished, a polishing material obtained by adhering abrasive grains around a resilient nucleus is used.
For example, Japanese Utility Model Application Laid-Open No. 55-98565 or Japanese Unexamined Patent Publication No.
No. 314468.

[0003]

When the polished surface of the material to be polished is polished to a mirror finish, for example, a method disclosed in Japanese Utility Model Application Laid-Open No. 55-9856.
As shown in Japanese Patent Application Publication No. 5 (1995) -2005, when the core of the abrasive is formed of rubber, the polished surface of the material to be polished is formed on a pear. This is considered to be a phenomenon that occurs because the elasticity of rubber as a core is not suitable for mirror finishing.

[0004] Further, for example, as shown in Japanese Patent Application Laid-Open No. 9-31468, when a nucleus is formed of plant fiber, the nucleus is covered while moisture is contained in the nucleus. The polished surface of the abrasive is polished closer to a mirror surface than in the conventional case. However, if the abrasive is used continuously, the moisture generated in the core evaporates due to the heat generated during polishing, and the adhesiveness and elasticity of the core of the abrasive decrease in a short polishing operation time, and the material to be polished is reduced. However, there is a problem that the polishing surface is polished to a pear ground or the polishing ability is reduced, so that the polishing operation efficiency is reduced.

When the core is made of rubber or vegetable fibrous material, if the abrasive collides with the material to be polished or is crushed by other causes, the abrasive is also used as the abrasive at that time. There was a problem that the function could not be achieved, the amount of the abrasive was reduced, and the polishing efficiency was reduced.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and uses a polishing material and a polishing material whose polishing surface is polished to a mirror surface and which can improve the working efficiency. It is an object of the present invention to provide a polishing method.

[0007]

Means for Solving the Problems Claim 1 according to the present invention.
The abrasive is composed of a nucleus having desired elasticity and tackiness by containing water, water to be contained in the nucleus, and a plurality of abrasive grains adhered to the surface of the nucleus by tackiness. In the abrasive, the core contains an evaporation inhibitor for preventing evaporation of water from the core.

[0008] In the abrasive material according to claim 2 of the present invention, in claim 1, the core is formed by incorporating a plurality of abrasive grains into the core.

A third aspect of the present invention provides the abrasive according to the first or second aspect, wherein the core is made of gelatin.

A fourth aspect of the present invention is directed to the abrasive according to any one of the first to third aspects, wherein the evaporation preventing material is made of a water-soluble oil.

According to a fifth aspect of the present invention, there is provided the abrasive as set forth in the third or fourth aspect, wherein the weight ratio of the nucleus to the water is 10: 2 to 5.

The abrasive according to claim 6 of the present invention is the abrasive according to any one of claims 1 to 5, wherein any one or all of diamond, silicon carbide, and alumina are used as abrasive grains.

According to a seventh aspect of the present invention, there is provided a polishing method using the abrasive according to any one of the first to sixth aspects, wherein the abrasive has a desired particle size. In this method, the surface of the material to be polished is polished by colliding with the material to be polished in a state where water is held in the body.

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 Hereinafter, embodiments of the present invention will be described. FIG. 1A is a plan view showing a configuration of an abrasive according to Embodiment 1 of the present invention, and FIG.
FIG. 2 is a sectional view showing a section of the abrasive shown in FIG.
FIG. 2 is a view showing a configuration of a jetting device for jetting and colliding the abrasive shown in FIG. 1 with a material to be polished. In FIG.
Numeral 1 is a core having desired elasticity and adhesiveness by containing water. Numerals 2 and 3 are water contained in the core 1 and an anti-evaporation material. It has the following characteristics. Reference numeral 4 denotes a plurality of abrasive grains adhered to the surface of the core 1 by its adhesiveness. These constitute the abrasive 10.

Further, as a specific example, as the core 1, for example, gelatin, which has desired elasticity and tackiness by containing water, can be considered. When this gelatin is used, a diameter of 0.1 mm to 2 mm is used. Next, it is conceivable that the abrasive grains 4 use any or all of diamond, silicon carbide, and alumina. The grain size of the abrasive grains 4 is 300
A mesh of 0 mesh to 10000 mesh is used.
Next, the evaporation preventing material 3 prevents water evaporation from the core 1 and is made of, for example, a water-soluble oil, and ethylene glycol or sorbitol may be used.

Next, the respective mixing ratios when an abrasive is manufactured from the above-mentioned materials are as follows. For example, if the amount of the core 1 is 1000 g, the amount of water 2 is 200 g to 5 g.
And the amount of the abrasive grains 4 is 10 g
0 ct ± 10 ct, silicon carbide is 50 g ± 10 g, alumina is 50 g ± 10 g, and the amount of the evaporation preventing material 3 is set to be approximately the same as the water 2.

If the amount of water 2 at this time is too small, the adhesiveness and elasticity of the core 1 become smaller than desired, and the surface of the material to be polished cannot be mirror-finished. This is a value set because excess water remains on the surface of the polishing material and the surface of the polishing material is oxidized. Further, since a water-soluble oil is used as the evaporation preventing material 3, the water-soluble oil retains moisture in the core 1,
This moisture can be prevented from adhering to the surface of the workpiece. Therefore, oxidation of the surface of the material to be polished is reliably prevented.

Further, the amount of the abrasive grains 4 is set so as to substantially cover the surface of the core 1 and needs to be appropriately set depending on the shape of the abrasive grains 4 and the substance to be used.

Although the amount of the evaporation preventing material 3 has been described in connection with the case where ethylene glycol or sorbitol is used, the compounding amount in the case where another substance is used depends on the molecular weight and characteristics of the substance. It needs to be set appropriately.

Next, a method for producing an abrasive is described.
A mixed solution of water 2 and evaporation preventive material 3 is sprayed onto nucleus 1 by means of spraying or the like to contain the mixture. Next, the well-mixed abrasive grains 4 are adhered to the surface of the core 1 having desired adhesiveness by containing the water 2. Then, an abrasive as shown in FIG. 1 can be formed.

As another manufacturing method, the core 1 and the abrasive grains 4 are well mixed. Next, while stirring the mixture of the core 1 and the abrasive grains 4, a mixed solution of the water 2 and the evaporation preventing material 3 is sprayed by spraying or the like so that the core 2 contains the water 2 and the evaporation preventing material 3. The abrasive grains 4 are adhered to the surface of the core body 1 having the adhesive property by the water 2 to form an abrasive as shown in FIG.

In FIG. 2, reference numeral 5 denotes an impeller, in which two disks sandwich a plurality of plate-like blades, and the blades are provided to be inclined forward in the rotation direction. Reference numeral 6 denotes a belt wound around a part of the periphery of the impeller 5, and reference numeral 7 denotes an inlet provided in the impeller 5, from which the abrasive 10 is supplied into the impeller 5. Reference numeral 8 denotes a pulley for linking the belt 6 with the impeller 5, and 9 denotes an injection nozzle for injecting the abrasive 10 from the impeller 5 to the workpiece.

A polishing method using the injection device configured as described above will be described. First, the impeller 5 is rotated by rotating the belt 6 via the pulley 8.
Next, the abrasive 10 is charged into the impeller 5 through the charging port 7. Next, the abrasive 10 gradually shifts toward the outer periphery of the impeller 5 due to the wind pressure and centrifugal force of the blade. Further, since the impeller 5 is rolling on the belt 6, the abrasive 10 is ejected from the nozzle 9 to the material to be polished in a tangential direction starting from a point at which the belt 6 is separated from the peripheral surface of the impeller 5. Colliding and polishing. Then, the polished abrasive material 10 is collected and again input from the input port 7, and the above-described polishing operation is repeatedly performed.

When a material to be polished is polished by using a polishing material having a desired particle size by such a method, frictional heat is generated by collision between the material to be polished and the polishing material. The material and the material to be polished are heated. When the abrasive is heated in this way, water contained in the core evaporates. Since such a phenomenon occurs in polishing, if this polishing method is continuously performed, if the core of the abrasive contains only water, water is evaporated by heating the abrasive. As a result, the elasticity and adhesiveness of the nucleus were immediately reduced, and the surface of the material to be polished became a pear, or a desired polished state could not be obtained.

However, as in the present invention, if the core 1 of the polishing material 10 contains the evaporation preventing material 3 for preventing the water 2 from evaporating in addition to the water 2, the heating of the polishing material 10 The evaporation of the water 2 is suppressed, and even if the polishing is performed by continuously using the abrasive 10 for a long time, the state where the desired amount of water 2 is contained in the core 1 is maintained. The desired elasticity and adhesiveness do not decrease, and the surface of the material to be polished can be continuously polished with a mirror surface. Further, when the evaporation preventing material 3 is formed of a water-soluble oil, the evaporation preventing material 3 retains moisture in the core 1, so that moisture does not adhere to the surface of the material to be polished, Oxidation (corrosion) can be prevented.

The same can be said when the abrasive is stored and managed. That is, when only the water is contained when the abrasive is stored without using the abrasive,
The water gradually evaporates in the storage state and becomes the same state as the above-mentioned state, and cannot be used for polishing. However, when the anti-evaporation material 3 is contained as in the present invention, the water 2 of the abrasive 10 hardly evaporates in the storage state.

Actually, a comparative experiment was conducted using the abrasive 10 in the above-described specific example and an abrasive containing only water. As a result, a difference was found depending on the material to be polished and the jetting speed of the abrasive. However, when the polishing time when desired polishing (mirror finish) when using an abrasive containing only water is used is compared with the similar polishing time using the abrasive 10 of the present invention, the present invention has 10 times the polishing time. The desired polishing state could be maintained for about 20 times the polishing time.

The material to be polished is a material mainly composed of metal. For example, various materials such as high-speed steel, die steel, stainless steel, cemented carbide, iron material, aluminum material, and copper material are possible, and similar effects were obtained. However, it goes without saying that any material other than those described above can be used as long as it can be polished.

Further, when a nucleus is made of rubber or vegetable fiber and the nucleus is crushed as in the prior art, the nucleus does not recombine again. Since the abrasive 10 is made of gelatin, even if the abrasive 10 collides with the material to be polished or is crushed by other causes, the abrasive 10 is recombined due to the characteristics of gelatin. Therefore, a decrease in the amount of the abrasive 10 is prevented, and a decrease in polishing efficiency can be prevented.

According to the polishing material of the embodiment of the present invention configured as described above, the surface of the material to be polished can be mirror-finished, the polishing is excellent in sustainability, and the working efficiency is improved. Can be improved.

In actual polishing, the blowing speed of the abrasive is appropriately adjusted according to the material of the material to be polished. For example, if the surface of the material to be polished is a soft material or a brittle material, the speed of spraying the abrasive is reduced, and in the opposite case, the speed is increased to adjust the surface of the material to be mirror-polished. Finish. That is, it is possible to adjust the kinetic energy of the abrasive by adjusting the blowing speed of the abrasive, thereby adjusting the frictional force of the abrasive with respect to the surface of the material to be polished, that is, the abrasive power.

Further, in the above-described embodiment, the example in which the abrasive is sprayed obliquely downward from the impeller has been described. However, the present invention is not limited to this, and the abrasive can be sprayed obliquely upward from the impeller. . That is, by appropriately setting the rotation of the impeller, it is possible to perform polishing from various angles with respect to the surface of the workpiece without moving the workpiece itself.

Although the water and the evaporation preventing material for preventing the evaporation of the water are shown to be contained in the core 1, it is sufficiently considered that a substance such as a preservative is further added.

Embodiment 2 FIG. 3 is a cross-sectional view showing the structure of the abrasive according to the second embodiment of the present invention, and FIG. 4 is a cross-sectional view showing a state before the abrasive grains are adhered to the surface of the core of the abrasive shown in FIG. . In each drawing, the same parts as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted. Reference numeral 11 denotes a plurality of abrasive grains taken into the core body 1 and is formed of the same abrasive grains 4 adhered to the surface of the core body 1.
The abrasive 12 includes the core 1 in which the abrasive grains 11 are incorporated, the abrasive grains 4 adhered to the surface of the core 1, the water 2 contained in the core 1, Material 3.

The abrasive 12 according to the second embodiment of the present invention
The feature is that the abrasive grains 11 are formed in advance so as to be incorporated into the core body 1, and the other parts are formed and used in the same manner as in the first embodiment, so that the description thereof will be omitted as appropriate.

First, as to the respective mixing ratios when the abrasive is manufactured, for example, when the amount of the core 1 is 1000 g, the amounts of the water 2, the abrasive grains 4, and the evaporation preventing material 3 are the same as those in the first embodiment. Set as above. The abrasive grains 11 taken into the core 1 are, for example, diamonds of 25 ct ±
5ct, total amount of silicon carbide and alumina is 75g ± 1
Set to 5g.

At this time, the amount of the abrasive grains 11 is such that the core body 1 can be formed, and when the core body 1 is crushed, the exposed inner surface of the core body 1 acts as a polishing surface. It is set to be.

As a method for forming the abrasive grains 11 in the core body 1, the abrasive grains 11 are kneaded into a base material before the core body 1 is formed into a desired particle size, and thereafter, the abrasive grains 11 are formed. A method of forming a nucleus 1 (shown in FIG. 4) having a particle size of Then, if the subsequent forming method is performed in the same manner as in the first embodiment, the abrasive 12 as shown in FIG. 3 can be formed.

According to the polishing material of the second embodiment configured as described above, the same effect as that of the first embodiment can be obtained, and the polishing material 12 collides with the material to be polished and is crushed. In such a case, since the abrasive grains 11 are present on the exposed inner surface of the polishing material 12, the inner surface of the polishing material 12 continues to function as a polishing surface, and the polishing of the material to be polished can be continued. Therefore, the polishing efficiency is improved and the polishing time can be shortened as compared with the case where the abrasive grains are not taken into the core 1.

When the nucleus 1 is formed of gelatin and the crushed abrasive 12 is recombined, the inner surface of the crushed and exposed abrasive 12 is brought into contact with the surface of the abrasive 12. Even if bonded, the abrasive grains 11 are present on the surface and act as a polished surface, so that the polishing efficiency is improved and the polishing time is shortened as compared with the case where the abrasive particles are not taken into the core 1. can do.

[0041]

As described above, according to the first aspect of the present invention, a nucleus having desired elasticity and tackiness by containing water, water to be contained in the nucleus, In a polishing material comprising a plurality of abrasive grains adhered to the surface by stickiness, the core body contains an evaporation preventing material for preventing water evaporation from the core body, so that the desired elasticity of the core body of the abrasive material In addition, it is possible to provide an abrasive that can maintain tackiness.

According to a second aspect of the present invention, in the first aspect, since the core is formed by incorporating a plurality of abrasive grains into the core, the abrasive may be crushed during polishing. However, since abrasive grains are present on the inner surface of the exposed abrasive and the inner surface of the abrasive continuously acts as a polishing surface, it is possible to provide an abrasive having improved polishing efficiency.

According to a third aspect of the present invention, in the first or second aspect, since the core is made of gelatin, even if the abrasive is crushed, it can be recombined and used repeatedly. It is possible to provide a polishing material that can be used.

According to a fourth aspect of the present invention, in any one of the first to third aspects, the evaporation preventing material is made of a water-soluble oil. In addition, it is possible to provide an abrasive that can reliably maintain adhesiveness and that prevents moisture from adhering to the surface of the workpiece.

According to a fifth aspect of the present invention, in the third or fourth aspect, the weight ratio between the core and the water is 10: 2 to 5, so that a desired polishing state is obtained. It is possible to provide an abrasive which can be used.

According to a sixth aspect of the present invention, in any one of the first to fifth aspects, as the abrasive grains,
Since any or all of diamond, silicon carbide, and alumina are used, it is possible to provide an abrasive that can reliably polish a workpiece.

According to a seventh aspect of the present invention, there is provided the abrasive according to any one of the first to sixth aspects having a desired particle size, wherein water is held in a core of the abrasive. Since the surface of the material to be polished is polished by spraying and colliding with the material to be polished, it is possible to provide an abrasive capable of finishing the polished surface of the material to be polished with a mirror surface.

[Brief description of the drawings]

FIG. 1 is a diagram showing a configuration of an abrasive according to a first embodiment of the present invention.

FIG. 2 is a diagram showing a configuration of a jetting device using the abrasive shown in FIG.

FIG. 3 is a sectional view showing a configuration of an abrasive according to a third embodiment of the present invention.

4 is a cross-sectional view showing a configuration of a core of the abrasive shown in FIG.

[Explanation of symbols]

1 core, 2 water, 3 evaporation inhibitor, 4,11 abrasive grains,
10,12 abrasive.

Claims (7)

[Claims] 1. A core having desired elasticity and tackiness by containing water, water to be contained in the core, and a plurality of abrasive grains adhered to the surface of the core by the tackiness. The abrasive material according to claim 1, wherein the core contains an evaporation inhibitor for preventing water from evaporating from the core. 2. The abrasive according to claim 1, wherein the core is formed by incorporating a plurality of abrasive grains into the core. 3. The abrasive according to claim 1, wherein the core is made of gelatin. 4. The polishing material according to claim 1, wherein the evaporation preventing material is made of a water-soluble oil. 5. The method according to claim 3, wherein the weight ratio between the core and water is 10: 2 to 5.
The abrasive according to any one of the above. 6. An abrasive comprising diamond, silicon carbide,
The abrasive according to any one of claims 1 to 5, wherein any or all of alumina is used. 7. The abrasive according to any one of claims 1 to 6, which has a desired particle size, is sprayed onto the material to be polished while water is held in the core of the abrasive. A polishing method using an abrasive, characterized by colliding and polishing the surface of the object to be polished.