JP2001185024A5

JP2001185024A5 -

Info

Publication number: JP2001185024A5
Application number: JP2000340515A
Authority: JP
Filing date: 2000-11-08
Publication date: 2004-09-09
Anticipated expiration: 2016-07-25

Description

【００１４】
【発明の実施の形態】
本発明の製造方法において、焼成されることにより誘電体層となる膜形成材料層は、ガラス粉末を含有するペースト状組成物を、剛性を有するガラス基板上に直接塗布して形成されるのではなく、可撓性を有する支持フィルム上に塗布することにより形成される。このため、当該ペースト状組成物の塗布方法として、ロールコータなどによる塗布方法を採用することができ、これにより、膜厚が大きくて、かつ、膜厚の均一性に優れた膜形成材料層（例えば１００μｍ±５μｍ）を支持フィルム上に形成することが可能となる。そして、このようにして形成された膜形成材料層をガラス基板の表面に対して一括転写するという簡単な操作により、当該膜形成材料層をガラス基板上に確実に形成することができる。従って本発明の製造方法によれば、誘電体層の形成工程における工程改善（高効率化）を図ることができるとともに、形成される誘電体層の品質の向上（安定した誘電特性の発現）を図ることができる。[0014]
BEST MODE FOR CARRYING OUT THE INVENTION
In the production method of the present invention, the film-forming material layer to be a dielectric layer by firing is formed by directly applying a paste-like composition containing a glass powder on a rigid glass substrate. Instead, they are formed by coating on a flexible support film. Therefore, a coating method using a roll coater or the like can be adopted as a method of applying the paste-like composition, whereby a film- forming material layer having a large film thickness and excellent film thickness uniformity ( For example, 100 μm ± 5 μm can be formed on the support film. And the said film formation material layer can be reliably formed on a glass substrate by simple operation of carrying out the package transfer of the film formation material layer formed in this way with respect to the surface of a glass substrate. Therefore, according to the manufacturing method of the present invention, it is possible to achieve process improvement (high efficiency) in the process of forming the dielectric layer, and to improve the quality of the dielectric layer to be formed (expression of stable dielectric characteristics). Can be

Claims

When manufacturing a plasma display panel,
(I) A paste-like composition containing a glass powder, an acrylic ester resin and a solvent is applied on a support film to form a film-forming material layer having a thickness of 10 to 200 μm,
(Ii) transferring the film forming material layer formed on the support film to the surface of the glass substrate on which the electrode is fixed;
(Iii) By baking the transferred film-forming material layer, a dielectric layer made of a sintered glass body is formed on the surface of the glass substrate, the organic substance contained in the film-forming material layer being decomposed and removed. Including the process,
A manufacturing method of a plasma display panel characterized in that a film thickness tolerance of a dielectric layer formed on a plasma display panel is within ± 5%.

The glass powder contained in the film-forming material layer is a mixture of 60 to 90% by weight of zinc oxide, 5 to 20% by weight of boron oxide, and 5 to 20% by weight of silicon oxide. Method of manufacturing plasma display panel.

The method for manufacturing a plasma display panel according to any one of claims 1 and 2, wherein the support film is a resin film having flexibility.

The method for producing a plasma display panel according to any one of claims 1 to 3, wherein the support film is a polyethylene terephthalate film.

5. The method for manufacturing a plasma display panel according to any one of claims 1 to 4, wherein the surface of the support film is subjected to a release treatment.

The viscosity of the paste-like composition is 500 to 10,000 cp, The manufacturing method of the plasma display panel in any one of the Claims 1 thru | or 5 characterized by the above-mentioned.