JP2001158642A - Formed product having antifogging thin film - Google Patents

Formed product having antifogging thin film

Info

Publication number
JP2001158642A
JP2001158642A JP33916599A JP33916599A JP2001158642A JP 2001158642 A JP2001158642 A JP 2001158642A JP 33916599 A JP33916599 A JP 33916599A JP 33916599 A JP33916599 A JP 33916599A JP 2001158642 A JP2001158642 A JP 2001158642A
Authority
JP
Japan
Prior art keywords
thin film
antifogging
fogging
film
molded article
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33916599A
Other languages
Japanese (ja)
Inventor
Toru Nakamura
徹 中村
Akiko Miyagawa
晶子 宮川
Masashi Suzuki
將史 鈴木
Kazunori Ohashi
一記 大橋
Nobuyuki Nakagiri
伸行 中桐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP33916599A priority Critical patent/JP2001158642A/en
Priority to US09/725,198 priority patent/US20010026859A1/en
Publication of JP2001158642A publication Critical patent/JP2001158642A/en
Pending legal-status Critical Current

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  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a formed product having antifogging thin film capable of maintaining antifogging properties for a long time. SOLUTION: In a formed product comprising a base material and an antifogging thin film on the outermost surface of the base material, the antifogging thin film is characterized in that it has an assemblage of fine asperity having 20-500 Å RMS value on the whole surface.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、鏡、窓ガラス、自動車
用ガラス、眼鏡レンズ、サングラス、その他の光学部品
等の防曇性が要求される物品に広くかつ有効に用いられ
る防曇性薄膜を有する成形体に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antifogging thin film which is widely and effectively used for articles requiring an antifogging property such as mirrors, window glasses, automobile glasses, spectacle lenses, sunglasses and other optical parts. And a molded article having:

【0002】[0002]

【従来の技術】ガラスやプラスチック等の透明材料は、
温度及び湿度の異なる環境に曝されると、曇りを生じ透
明性が損なわれしまう。これは、露点以下の温度に下が
った透明材料の表面に湿った空気が触れ、結露が生じる
ことに起因するものである。光学部品等の透明材料の表
面に対して防曇性を付与する従来の手段としては、透明
材料の最外層に防曇膜を形成することが行われている。
材料としては、例えば界面活性剤やヒドロキシエチルメ
タクリレート、ポリエーテル、ポリビニルアルコール等
の親水性官能基を有する有機化合物が用いられていた。
そして、膜の形成方法としては、前記のような有機化合
物を基板表面に塗布もしくはスプレーにより塗装するこ
とにより、防曇性薄膜を形成する方法があげられる。
2. Description of the Related Art Transparent materials such as glass and plastic
Exposure to environments with different temperatures and humidities results in fogging and loss of transparency. This is because moist air comes into contact with the surface of the transparent material whose temperature has dropped to a temperature lower than the dew point, and dew condensation occurs. As a conventional means for imparting anti-fogging property to the surface of a transparent material such as an optical component, an anti-fogging film is formed on the outermost layer of the transparent material.
As the material, for example, a surfactant or an organic compound having a hydrophilic functional group such as hydroxyethyl methacrylate, polyether, or polyvinyl alcohol has been used.
As a method of forming a film, there is a method of forming an antifogging thin film by applying or spraying the organic compound on the substrate surface as described above.

【0003】また、親水性ビニル化合物と有機シラン化
合物を組み合わせた材料を用い、この材料を基板表面に
塗布する方法があげられる。更に、プラスチック成形体
となる液状プラスチック中に界面活性剤を予め添加して
練り込んだ後に成形する方法も行われてきた。
Further, there is a method in which a material obtained by combining a hydrophilic vinyl compound and an organic silane compound is used, and this material is applied to the substrate surface. Further, a method has been performed in which a surfactant is added in advance to a liquid plastic to be a plastic molded body, kneaded, and then molded.

【0004】[0004]

【発明が解決しようとする課題】本発明者等は、界面活
性剤やヒドロキシエチルメタクリレート、ポリエーテ
ル、ポリビニルアルコール等の親水性官能基を有する有
機化合物を用い、これを浸漬法や刷毛塗り法等によりプ
ラスチック基板上に塗布して防曇性薄膜を形成した。ま
た、スプレーを用い、前記有機化合物をプラスチック基
板上に噴霧することで防曇性薄膜の形成を試みた。
SUMMARY OF THE INVENTION The present inventors have used a surfactant or an organic compound having a hydrophilic functional group such as hydroxyethyl methacrylate, polyether, polyvinyl alcohol, etc. On a plastic substrate to form an antifogging thin film. Further, an attempt was made to form an antifogging thin film by spraying the organic compound onto a plastic substrate using a spray.

【0005】形成された防曇性薄膜の耐久性を調べたと
ころ、防曇効果は長続きせず、満足のいく耐久性を備え
た薄膜を得ることができなかった。また、基材上に反射
防止膜を形成した後に従来の材料、成膜方法で防曇性薄
膜を形成すると、反射防止効果に悪影響を及ぼすことが
あった。本発明者等は、材料を変えて防曇性薄膜を形成
し、薄膜の耐久性の向上を試みた。そして、本発明者等
は、防曇性材料として親水性ビニル化合物と有機シラン
化合物を組み合わせたものを用いることにした。そし
て、この材料を塗布法によりプラスチック基板の表面に
塗布し、防曇性薄膜を形成した。しかし、防曇性薄膜の
耐久性の向上を実現することはできなかった。
When the durability of the formed antifogging thin film was examined, the antifogging effect was not long-lasting, and a thin film having satisfactory durability could not be obtained. Further, if an antifogging thin film is formed by a conventional material and a film forming method after forming an antireflection film on a substrate, the antireflection effect may be adversely affected. The present inventors have tried to improve the durability of the thin film by forming the anti-fogging thin film by changing the material. The present inventors have decided to use a combination of a hydrophilic vinyl compound and an organic silane compound as the antifogging material. Then, this material was applied on the surface of a plastic substrate by an application method to form an antifogging thin film. However, improvement in durability of the antifogging thin film could not be realized.

【0006】更に本発明者等は、液状のプラスチック材
料中に界面活性剤を添加し、これを練り込んだ後に成形
する方法により、成形されたプラスチック基材に防曇性
を付与することを試みた。しかし、この方法でも防曇性
薄膜の耐久性を向上させることはできなかった。特にこ
の方法では、使用できるプラスチック材料と界面活性剤
の組み合わせが限られ、汎用性が乏しい上に、練り込み
可能な界面活性剤の量に限りがあることから実用的では
なく、効率の悪い方法であった。
Further, the present inventors have tried to impart an antifogging property to a molded plastic substrate by adding a surfactant to a liquid plastic material, kneading the surfactant, and molding. Was. However, even this method could not improve the durability of the antifogging thin film. In particular, in this method, the combination of a plastic material and a surfactant that can be used is limited, the versatility is poor, and since the amount of the surfactant that can be kneaded is limited, it is not practical, and the method is inefficient. Met.

【0007】そこで、本発明は、十分な防曇性が長続き
し、かつ反射防止性能等に悪影響を及ぼさないような実
用的に有用な防曇性薄膜を提供することを目的とする。
また、耐久性も向上した防曇性薄膜を提供することも目
的とする。
Accordingly, an object of the present invention is to provide a practically useful antifogging thin film that has a long lasting sufficient antifogging property and does not adversely affect antireflection performance and the like.
Another object is to provide an antifogging thin film having improved durability.

【0008】[0008]

【課題を解決するための手段】本発明者らは鋭意検討し
た結果、膜の表面に特定の深さを有する微細な凹凸の集
合体を形成すれば、優れた防曇効果が長期間、持続する
ことを見出した。また、膜表面の粗さをRMS値で表現
した場合、その値が一定値以上であると、特に優れた防
曇効果が長期間、持続することを見出した。
Means for Solving the Problems As a result of intensive studies, the present inventors have found that if an aggregate of fine irregularities having a specific depth is formed on the surface of a film, an excellent antifogging effect can be maintained for a long time. I found to do. Further, it has been found that when the roughness of the film surface is represented by an RMS value, when the value is not less than a certain value, a particularly excellent antifogging effect is maintained for a long time.

【0009】また、前記のように優れた防曇性を呈する
薄膜の断面構造は、柱状の構造を有するものが好ましい
ことが明らかになった。更に、防曇性薄膜を構成する物
質が無機酸化物である場合に、更に耐久性が向上し、特
に優れた防曇性が長期間、持続することも判明した。そ
こで本発明は、第1に「基材と、該基材の最表面に防曇
性薄膜を具えた成形体であって、該防曇性薄膜は、全面
にRMS値が20Å以上、500Å以下の深さの微細凹
凸の集合体を有することを特徴とする防曇性薄膜を具え
た成形体(請求項1)」を提供する。第2に「前記防曇
性薄膜の表面は、親水性基を有することを特徴とする請
求項1に記載の防曇性薄膜を具えた成形体(請求項
2)」を提供する。第3に「前記防曇性薄膜は、無機酸
化物を主成分とすることを特徴とする請求項1又は2に
記載の防曇性薄膜を具えた成形体(請求項3)」を提供
する。第4に「前記防曇性薄膜は、乾式法で形成される
ことを特徴とする請求項1又は2又は3に記載の防曇性
薄膜を具えた成形体(請求項4)」を提供する。
It has also been found that the cross-sectional structure of the thin film exhibiting excellent anti-fogging properties as described above is preferably one having a columnar structure. Further, it has been found that when the substance constituting the anti-fogging thin film is an inorganic oxide, the durability is further improved, and particularly excellent anti-fogging property is maintained for a long time. Therefore, the present invention firstly provides a molded article comprising a substrate and an antifogging thin film on the outermost surface of the substrate, wherein the antifogging thin film has an RMS value of 20 ° or more and 500 ° or less on the entire surface. A molded article provided with an antifogging thin film, characterized by having an aggregate of fine irregularities having a depth of (1). Secondly, there is provided "a molded article provided with an anti-fogging thin film according to claim 1, wherein the surface of the anti-fogging thin film has a hydrophilic group (claim 2)." Thirdly, there is provided "a molded article provided with an anti-fogging thin film according to claim 1 or 2, wherein the anti-fogging thin film contains an inorganic oxide as a main component." . Fourthly, there is provided "a molded article provided with an anti-fogging thin film according to claim 1 or 2 or 3, wherein the anti-fogging thin film is formed by a dry method". .

【0010】[0010]

【発明の実施の形態】本発明の防曇性薄膜は、水の接触
角が小さくなる性質、即ち親水性を呈する薄膜である。
親水性であるために、水は薄膜の表面に水滴状に付着す
ることなく、薄膜の表面全体に広がることになる。これ
により光の散乱が生じなくなり、曇りの発生が防止でき
る。
BEST MODE FOR CARRYING OUT THE INVENTION The antifogging thin film of the present invention is a thin film exhibiting a property of reducing the contact angle of water, that is, a hydrophilic property.
Due to the hydrophilicity, water spreads over the entire surface of the thin film without adhering to the surface of the thin film in the form of water droplets. As a result, light scattering does not occur, and fogging can be prevented.

【0011】防曇性薄膜を成膜した直後に親水性を示す
薄膜は、従来から多かった。しかし、通常、その効果は
長続きせず、1日〜数日もすれば、水の接触角は30度
以上になり、吐息で容易に曇る様になる。本発明の防曇
性薄膜は、成膜時と同程度の高い親水性が数ヶ月以上に
亘って持続することが可能なものである。そして、従
来、親水性や防曇性を論じる場合に、ある時点における
接触角の測定値のみを論じることが多かった。しかし、
実用的な見地からは、むしろ防曇性の経時変化を評価の
指針とした方が適切であると考えた。
Conventionally, there have been many thin films showing hydrophilicity immediately after the formation of the antifogging thin film. However, the effect usually does not last long, and in one to several days, the contact angle of water becomes 30 degrees or more, and it becomes easily clouded by exhalation. The anti-fogging thin film of the present invention is capable of maintaining high hydrophilicity as high as that at the time of film formation for several months or more. In the past, when discussing hydrophilicity and anti-fog properties, only the measured value of the contact angle at a certain point in time has often been discussed. But,
From a practical point of view, it was considered more appropriate to use the time-dependent change in antifogging property as a guideline for evaluation.

【0012】本発明では、防曇性薄膜の成膜直後の測定
値の他に、成膜から一定期間経過後の水の接触角を合わ
せて測定し、これらを比較することにより防曇性の持続
性を評価した。防曇性を発現するのに必要な親水性は、
防曇性薄膜の使用条件等によって異なるが、一般的に、
水の接触角が20度以下であれば、防曇性能があるとい
って良い。
In the present invention, in addition to the measured value immediately after the formation of the antifogging thin film, the contact angle of water after a certain period of time has elapsed since the film formation was measured, and these were compared to obtain the antifogging thin film. Sustainability was assessed. The hydrophilicity required to develop anti-fog properties is
Depending on the conditions of use of the anti-fog thin film, etc., generally,
If the contact angle of water is not more than 20 degrees, it can be said that there is anti-fog performance.

【0013】本発明の防曇性薄膜表面の粗さをRMS
(Root−Mean−Square)値で表現した場合、20Å以
上、500Å以下であり、このような表面にすると、特
に優れた防曇性が長期間に亘り持続する。RMS値と
は、表面の凹部の深さを示すものであり、その数ではな
い。従って、RMS値が大きい膜というのは、深い凹部
を有する膜であるということもできる。そして、表面粗
さの測定は、AFM(原子間力顕微鏡)で行った。 この
ような最表面の凹凸は、表面の全面に無数に形成し凹凸
が集合した集合体にすることが必要である。
The surface roughness of the antifogging thin film of the present invention is determined by RMS.
When expressed in terms of (Root-Mean-Square) value, it is not less than 20 ° and not more than 500 °. With such a surface, particularly excellent antifogging property is maintained for a long time. The RMS value indicates the depth of the concave portion on the surface, and is not the number. Therefore, it can be said that a film having a large RMS value is a film having a deep concave portion. The measurement of the surface roughness was performed by AFM (atomic force microscope). It is necessary to form such an unevenness on the outermost surface countlessly over the entire surface to form an aggregate of the unevenness.

【0014】この凹凸の山と山の間の間隔は、約1Å〜
1000Å程度であることが好ましい。防曇性薄膜の成
膜は、スパッタリング、真空蒸着、CVD等の乾式法や
ゾル−ゲル法等の湿式法で形成可能であり、特別な制限
はない。防曇性薄膜表面に凹凸を形成するには、スパッ
タリングや真空蒸着において真空槽内の圧力設定や基板
位置、基板温度、成膜レート等の成膜条件をコントロー
ルする方法や成膜後にエッチング処理(例えばプラズマ
処理や酸溶液やアルカリ溶液への浸漬)する方法等、各
種の方法を採用することができる。また、防曇性薄膜を
形成する下地に予め凹凸を形成し、この上に防曇性薄膜
を形成してもよい。この場合でも、防曇性薄膜の表面に
は凹凸が形成される。
The distance between the peaks of the irregularities is approximately 1 mm to
Preferably, it is about 1000 °. The antifogging thin film can be formed by a dry method such as sputtering, vacuum evaporation, or CVD, or a wet method such as a sol-gel method, and there is no particular limitation. In order to form irregularities on the surface of the anti-fogging thin film, a method of controlling film forming conditions such as a pressure setting in a vacuum chamber, a substrate position, a substrate temperature, and a film forming rate in sputtering or vacuum deposition, or an etching treatment after film formation ( For example, various methods such as a method of performing plasma treatment and immersion in an acid solution or an alkali solution can be employed. Alternatively, irregularities may be formed in advance on the base on which the antifogging thin film is formed, and the antifogging thin film may be formed thereon. Even in this case, irregularities are formed on the surface of the antifogging thin film.

【0015】このように、成膜と同時に薄膜表面の凹凸
を形成することもできるし、成膜終了後に凹凸形成の処
理を別に行うことも可能である。更に、本発明における
防曇性薄膜の最表面の凹凸のRMS値は、約20Å以
上、約500Å以下にすることが好ましく、約20Å以
上、約100Å以下することがより好ましい。
As described above, the irregularities on the surface of the thin film can be formed at the same time as the film formation, and the treatment for forming the irregularities can be separately performed after the film formation. Further, the RMS value of the irregularities on the outermost surface of the antifogging thin film in the present invention is preferably about 20 ° or more and about 500 ° or less, more preferably about 20 ° or more and about 100 ° or less.

【0016】本発明のように前記のようなRMS値を有
する凹凸が形成された防曇性薄膜が優れた防曇性を持続
する理由は、必ずしも明らかではないが、本発明のRM
S値を有する凹部は、水分が長期間保持されるのに適す
る深さであることから防曇性が持続するとも考えられ
る。本発明の防曇性薄膜を構成する物質に特別の制限は
ないが、最表面に親水性基を具えたものにすることが好
ましい。
Although the reason why the antifogging thin film having the irregularities having the RMS values as described above maintains the excellent antifogging property is not necessarily clear, the RM of the present invention is not always clear.
Since the concave portion having the S value has a depth suitable for holding moisture for a long period of time, it is considered that the antifogging property is maintained. The substance constituting the anti-fogging thin film of the present invention is not particularly limited, but preferably has a hydrophilic group on the outermost surface.

【0017】無機酸化物を用いる場合、無機酸化物とし
ては、珪素酸化物や酸化チタン、酸化ジルコニウム、酸
化亜鉛、酸化タンタル、酸化タングステン等の無機酸化
物を用いれば表面にOH基を備えた膜にすることができ
る。これらの無機酸化物は、シラノール基等の親水性基
が表面に多数存在するものである。まや、金属アルコキ
シドを原料として形成される無機酸化物層も使用可能で
ある。
When an inorganic oxide is used, if an inorganic oxide such as silicon oxide, titanium oxide, zirconium oxide, zinc oxide, tantalum oxide, or tungsten oxide is used, a film having an OH group on the surface is used. Can be These inorganic oxides have a large number of hydrophilic groups such as silanol groups on the surface. In addition, an inorganic oxide layer formed using a metal alkoxide as a raw material can also be used.

【0018】また、親水性基を有する有機系化合物を用
いることも可能である。例えば、ポリアクリル酸やポリ
ビニルアルコール、ポリビニルピロリドン等の高分子化
合物等が使用可能である。また、分子内にエチレンオキ
シを有する化合物も使用できる。前記のように、本発明
に係る防曇性薄膜は、最表面に親水性基を有するものが
好ましいが、前記のような無機酸化物でなくてもよい。
It is also possible to use an organic compound having a hydrophilic group. For example, polymer compounds such as polyacrylic acid, polyvinyl alcohol, and polyvinylpyrrolidone can be used. Further, a compound having ethyleneoxy in the molecule can also be used. As described above, the antifogging thin film according to the present invention preferably has a hydrophilic group on the outermost surface, but may not be the inorganic oxide as described above.

【0019】本発明の防曇性薄膜の膜厚は約200Å以
上、約100μm以下にすることが好ましく、約200
Å以上、約10μm以下にすることがより好ましい。膜
厚が約200Åよりも薄いと、防曇性能の持続期間が短
くなってしまう。防曇性薄膜が成膜される基板には特別
の制限はなく、各種ガラスやプラスチック又はシリコン
ウエハ等、あらゆる基板が使用可能である。
The thickness of the antifogging thin film of the present invention is preferably about 200 ° or more and about 100 μm or less.
More preferably, the thickness is not less than about 10 μm. If the film thickness is less than about 200 °, the duration of the anti-fog performance will be short. The substrate on which the antifogging thin film is formed is not particularly limited, and any substrate such as various kinds of glass, plastic, or silicon wafer can be used.

【0020】また防曇性薄膜は、基板の片面に設けても
良いし、両面に設けても良い。また、必要に応じて、防
曇性薄膜を設けない方の面には、反射防止膜やハードコ
ート等の薄膜を形成することもできる。また、本発明の
防曇性薄膜は最表面に形成されることが必要であるが、
基板と防曇性薄膜との間に、他の層を設け、多層化する
ことも可能である。一例を挙げると、ハードコートを設
けて耐擦傷性を向上させたり、高屈折率の物質より成る
層を設けて反射防止特性を持たせたり、衝撃吸収層を設
けて耐衝撃特性を向上させたりすることができる。
The antifogging thin film may be provided on one side of the substrate or on both sides. If necessary, a thin film such as an antireflection film or a hard coat may be formed on the surface on which the antifogging thin film is not provided. Further, the antifogging thin film of the present invention needs to be formed on the outermost surface,
It is also possible to provide another layer between the substrate and the antifogging thin film to form a multilayer. For example, a hard coat is provided to improve abrasion resistance, a layer made of a material having a high refractive index is provided to provide anti-reflection properties, or a shock absorbing layer is provided to improve impact resistance. can do.

【0021】[0021]

【実施例1】厚さ2mm、一辺5cmの正方形の白板ガ
ラスを基板とし、SiO2をターゲットとしてRFスパ
ッタ法により、酸化珪素膜を基板上に形成した。成膜中
の真空槽内圧力は、1.5Paとし、アルゴンガスを1
00sccm導入した。RFパワーは、800Wとし、
成膜時間は1時間とした。
Embodiment 1 A silicon oxide film was formed on a substrate by RF sputtering using a white plate glass of 2 mm in thickness and 5 cm on a side as a substrate and SiO 2 as a target. The pressure in the vacuum chamber during film formation was 1.5 Pa, and argon gas was
00 sccm was introduced. RF power is 800W,
The film formation time was 1 hour.

【0022】本実施例では、真空槽内圧力を調整するこ
とにより、最表面の凹凸のRMS値を制御したが(真空
槽内圧力を約0.5Paにすれば、RMS値が約10Å
の凹凸を有する薄膜が形成できる)、他の条件を変える
ことでもRMS値を変更することが可能である。この様
な条件で成膜した珪素酸化物の膜厚を触針式の膜厚計で
測定したところ、3000Åであった。
In the present embodiment, the RMS value of the irregularities on the outermost surface is controlled by adjusting the pressure in the vacuum chamber. (If the pressure in the vacuum chamber is about 0.5 Pa, the RMS value is about 10 ° C.)
The RMS value can be changed by changing other conditions. The thickness of the silicon oxide film formed under such conditions was measured by a stylus-type film thickness meter and found to be 3000 °.

【0023】この防曇性薄膜の水の接触角は、成膜直後
には5度であり、これを2ヶ月間室内に放置した後で再
測定してみたところ、やはり5度であり、優れた親水性
が長期間持続していることが明らかになった。また、吐
息を吹きかけてみても、2ヶ月間の放置後にも全く曇り
は生じなかった。更に、このガラス基板を5℃にセット
した恒温槽内に1時間入れた後、25℃85%RHにし
た恒温恒湿槽に瞬時に移し替えたところ、表面に薄い水
の膜が形成されたが、ガラスの透明性は全く損なわれる
ことはなく、優れた防曇性能が確認された。
The contact angle of water of the anti-fogging thin film was 5 ° immediately after the film formation, and was again measured after leaving it in the room for 2 months. It was found that the hydrophilicity was maintained for a long time. In addition, even when sprayed, no fogging occurred even after being left for two months. Further, the glass substrate was placed in a constant temperature bath set at 5 ° C. for 1 hour, and then immediately transferred to a constant temperature / humidity bath set at 25 ° C. and 85% RH. As a result, a thin water film was formed on the surface. However, the transparency of the glass was not impaired at all, and excellent antifogging performance was confirmed.

【0024】本実施例の防曇性薄膜表面の粗さをAFM
で測定したところ、RMS値は27Åであり、表面に微
細な凹凸が形成されていることが明らかになった。本実
施例で得られた防曇性薄膜を有する成形体の断面のSE
M写真を図1に示す。これより、本実施例の防曇性薄膜
は柱状構造を有し、微細な凹部(穴)が深く存在している
ことが明らかになった。図中、最表面から厚さ方向に約
0.2mm(写真の寸法(縦×横)が8.3cm×1
1.1cmの場合)の領域が、RMS値が約27Åの深
さに対応する。
The surface roughness of the antifogging thin film of this embodiment was measured by AFM.
As a result, the RMS value was 27 °, which revealed that fine irregularities were formed on the surface. SE of cross section of molded article having antifogging thin film obtained in this example
An M photograph is shown in FIG. From this, it was clarified that the anti-fogging thin film of this example had a columnar structure, and deep concave portions (holes) existed deeply. In the figure, about 0.2 mm in the thickness direction from the outermost surface (the dimension (length x width) of the photograph is 8.3 cm x 1
Area (for 1.1 cm) corresponds to a depth with an RMS value of about 27 °.

【0025】[0025]

【実施例2】直径80mmのプラスチック製眼鏡レンズ
基材表面に、真空蒸着法で酸化珪素膜を成膜した。成膜
は、6×10-6Torrの真空度にした真空チャンバー
に酸素を導入し、5×10-5Torrの圧力にし、Si
2顆粒を蒸着源とする電子ビーム加熱蒸着法により行
った。なお、電子ビームのパワーは約90mAとし、膜
厚1500ÅのSiO2を成膜した。
Example 2 A silicon oxide film was formed on the surface of a plastic spectacle lens substrate having a diameter of 80 mm by a vacuum evaporation method. For film formation, oxygen was introduced into a vacuum chamber having a vacuum degree of 6 × 10 −6 Torr, the pressure was set to 5 × 10 −5 Torr, and Si was formed.
This was performed by an electron beam heating evaporation method using O 2 granules as an evaporation source. The power of the electron beam was about 90 mA, and a 1500 ° -thick SiO 2 film was formed.

【0026】次に、前記で得られた膜を酸素プラズマ処
理することにより、表面に微細な凹凸を形成した。酸素
流量は100sccm、RFパワーは500W、圧力は
0.2Torr、処理時間は300秒とした。酸素プラ
ズマ処理後に薄膜表面の水の接触角を測ったところ7度
であった。そして、これを2ヶ月間室内に放置した後で
再測定してみたところ、やはり7度であり、優れた親水
性が持続していることが明らかになった。また、吐息を
吹きかけてみても、2ヶ月放置後にも、全く曇りは生じ
なかった。
Next, the film obtained above was subjected to oxygen plasma treatment to form fine irregularities on the surface. The oxygen flow rate was 100 sccm, the RF power was 500 W, the pressure was 0.2 Torr, and the processing time was 300 seconds. When the contact angle of water on the thin film surface was measured after the oxygen plasma treatment, it was 7 degrees. Then, when this was left in a room for two months and re-measured, it was again 7 °, and it became clear that excellent hydrophilicity was maintained. In addition, no fogging was observed even after spraying, even after being left for two months.

【0027】更に、このプラスチックレンズ基材を5℃
にセットした恒温槽内に1時間入れた後、25℃85%
RHにした恒温恒湿槽に瞬時に移し替えたところ、表面
に薄い水の膜が形成されるものの、ガラスの透明性は全
く損なわれることはなく、優れた防曇性能が確認され
た。本実施例の防曇性薄膜の表面粗さをAFMで測定し
たところ、RMS値は25Åであり、表面に微細な凹凸
が形成されている事が明らかになった。
Further, the plastic lens substrate was heated at 5 ° C.
1 hour in a thermostat set at 25 ° C, 85%
When the glass was immediately transferred to a constant temperature and humidity chamber at RH, a thin water film was formed on the surface, but the transparency of the glass was not impaired at all, and excellent antifogging performance was confirmed. When the surface roughness of the anti-fogging thin film of this example was measured by AFM, the RMS value was 25 °, and it became clear that fine irregularities were formed on the surface.

【0028】[0028]

【比較例】防曇性薄膜の成膜後に酸素プラズマ処理を行
わない以外は、全て実施例2と同様に行った。防曇性薄
膜の成膜後に水の接触角を測定したところ、8度であっ
た。しかし、2ヶ月間室内に放置した後に再測定したと
ころ、40度と大きく上昇していた。また、吐息を吹き
かけてみたところ、成膜直後には曇りは見られなかった
ものの、2ヶ月間放置したものは、吐息で容易に白く曇
ってしまった。
COMPARATIVE EXAMPLE The same operation as in Example 2 was performed except that the oxygen plasma treatment was not performed after the formation of the antifogging thin film. When the contact angle of water was measured after the formation of the antifogging thin film, it was 8 degrees. However, when it was re-measured after being left indoors for two months, it was found to have risen significantly to 40 degrees. When spraying was performed, no fogging was observed immediately after the film formation, but one that had been left for two months easily turned white and cloudy by exhalation.

【0029】更に、このプラスチックレンズ基材を5℃
にセットした恒温槽内に1時間入れた後、25℃85%
RHにした恒温恒湿槽に瞬時に移し替えたところ、成膜
直後では、表面に薄い水の膜が形成されたものの透明性
は全く損なわれることはなく、優れた防曇性能が確認さ
れた。しかし、2ヶ月間放置後のプラスチック基板で
は、25℃85%RHに設定した恒温恒湿槽に移し替え
た瞬間に曇りが生じ、防曇性能は失われていた。
Further, the plastic lens substrate was heated at 5 ° C.
1 hour in a thermostat set at 25 ° C, 85%
Immediately after being transferred to a constant temperature and humidity chamber at RH, immediately after film formation, although a thin water film was formed on the surface, transparency was not impaired at all, and excellent antifogging performance was confirmed. . However, when the plastic substrate was left for two months, it was fogged the moment it was transferred to a thermo-hygrostat set at 25 ° C. and 85% RH, and the anti-fog performance was lost.

【0030】本実施例の防曇性薄膜の表面粗さをAFM
で測定した。その結果、RMS値は8Åであり、実施例
1及び2の膜の表面に比べ、深さの浅い凹部を具えるも
のであり、より平坦であることが明らかになった。
The surface roughness of the antifogging thin film of this embodiment was measured by AFM.
Was measured. As a result, the RMS value was 8 °, and it was found that the film had recesses having a smaller depth than the surfaces of the films of Examples 1 and 2, and was more flat.

【0031】[0031]

【発明の効果】本発明によれば、従来の防曇性薄膜を有
する成形体に比べて、防曇性が長期間に渡って持続す
る。また、親水性基を有する材料を用いれば、更に、防
曇性を向上させることができ、高い防曇性の長期間の継
続が可能になる。
According to the present invention, the antifogging property is maintained for a long period of time as compared with a conventional molded article having an antifogging thin film. When a material having a hydrophilic group is used, the anti-fogging property can be further improved, and the high anti-fogging property can be continued for a long time.

【0032】また、本発明の防曇性薄膜を硬度の高い無
機化合物を用いて成膜すれば、耐擦傷性や耐久性に優れ
たものになり、高い防曇性の継続性に加え、耐久性をも
兼ね備えた成形体が得られる。また、真空蒸着法等の乾
式を用いて形成すれば、密着性にも優れるものが得られ
る。更に、ガラス、プラスック等、基材の種類を問わず
に成膜可能である。
When the anti-fogging thin film of the present invention is formed using an inorganic compound having high hardness, the anti-fogging film becomes excellent in scratch resistance and durability. Thus, a molded article having properties can be obtained. In addition, when formed using a dry method such as a vacuum evaporation method, a material having excellent adhesion can be obtained. Further, the film can be formed irrespective of the type of the substrate such as glass and plastic.

【0033】このように、本発明の防曇性薄膜を具えた
成形体は、製品寿命も延びることになり、長期間、防曇
性の優れた製品を使用することができるようになる。ま
た、無機酸化物からなる防曇性薄膜を具えるものは、高
耐久性を示すので、様々な環境下での使用が可能にな
り、防曇性を具えた製品の使用範囲を広くすることがで
きる。そのため、本発明の防曇性薄膜は、眼鏡、カメ
ラ、顕微鏡、望遠鏡、双眼鏡等、各種の光学機器の曇り
防止や車の窓や浴室の鏡などの曇り防止として、光学機
器以外の用途にも幅広く応用が可能である。
As described above, the molded article provided with the anti-fogging thin film of the present invention has a prolonged product life, so that a product having excellent anti-fogging properties can be used for a long period of time. In addition, those having an antifogging thin film made of an inorganic oxide exhibit high durability, so that they can be used in various environments, and the range of use of products having antifogging properties should be widened. Can be. Therefore, the anti-fogging thin film of the present invention is used for applications other than optical devices, such as for preventing fogging of various optical devices such as glasses, cameras, microscopes, telescopes, and binoculars, and for preventing fogging of car windows and bathroom mirrors. Widely applicable.

【図面の簡単な説明】[Brief description of the drawings]

【図1】は、本実施例に関わる防曇性薄膜を有する成形
体の断面構造を示す電子顕微鏡写真である。
FIG. 1 is an electron micrograph showing a cross-sectional structure of a molded article having an antifogging thin film according to the present example.

【符号の説明】 11・・・シリコン基板 12・・・防曇性薄膜[Explanation of Signs] 11: Silicon substrate 12: Anti-fog thin film

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C09K 3/18 C09K 3/18 G02B 1/10 G02B 1/10 Z (72)発明者 大橋 一記 東京都千代田区丸の内3丁目2番3号 株 式会社ニコン内 (72)発明者 中桐 伸行 東京都千代田区丸の内3丁目2番3号 株 式会社ニコン内 Fターム(参考) 2K009 BB01 BB02 BB11 CC03 CC21 DD01 DD03 DD04 DD12 DD15 EE02 4F100 AA17B AA20B AG00A AR00B AT00A BA02 BA10A BA10B DD07B EH66 GB07 GB32 GB90 JB05B JB20B JM02B YY00B 4G059 AA01 AA11 AC01 AC21 EA01 EA04 EA05 EB01 EB03 EB04 EB07 GA01 GA16 4H020 AA01 AA05 AA06 AB02 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C09K 3/18 C09K 3/18 G02B 1/10 G02B 1/10 Z (72) Inventor Kazuki Ohashi Tokyo 3-2-3 Marunouchi, Chiyoda-ku Nikon Corporation (72) Inventor Nobuyuki Nakagiri 3-2-3 Marunouchi, Chiyoda-ku, Tokyo Nikon Corporation F term (reference) 2K009 BB01 BB02 BB11 CC03 CC21 DD01 DD03 DD04 DD12 DD15 EE02 4F100 AA17B AA20B AG00A AR00B AT00A BA02 BA10A BA10B DD07B EH66 GB07 GB32 GB90 JB05B JB20B JM02B YY00B 4G059 AA01 AA11 AC01 AC21 EA01 EA04 EA05 A01 A04 EB03 A01 A04A04

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基材と、該基材の最表面に防曇性薄膜を
具えた成形体であって、該防曇性薄膜は、全面にRMS
値が20Å以上、500Å以下の深さの微細凹凸の集合
体を有することを特徴とする防曇性薄膜を具えた成形
体。
1. A molded article comprising a base material and an antifogging thin film on the outermost surface of the base material, wherein the antifogging thin film has an RMS
A molded article provided with an antifogging thin film, comprising an aggregate of fine irregularities having a value of not less than 20 ° and not more than 500 °.
【請求項2】 前記防曇性薄膜の表面は、親水性基を有
することを特徴とする請求項1に記載の防曇性薄膜を具
えた成形体。
2. The molded article provided with the anti-fogging thin film according to claim 1, wherein the surface of the anti-fogging thin film has a hydrophilic group.
【請求項3】 前記防曇性薄膜は、無機酸化物を主成分
とすることを特徴とする請求項1又は2に記載の防曇性
薄膜を具えた成形体。
3. The molded article provided with the anti-fogging thin film according to claim 1, wherein the anti-fogging thin film contains an inorganic oxide as a main component.
【請求項4】 前記防曇性薄膜は、乾式法で形成される
ことを特徴とする請求項1又は2又は3に記載の防曇性
薄膜を具えた成形体。
4. The molded article provided with the anti-fogging thin film according to claim 1, wherein the anti-fogging thin film is formed by a dry method.
JP33916599A 1999-11-30 1999-11-30 Formed product having antifogging thin film Pending JP2001158642A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP33916599A JP2001158642A (en) 1999-11-30 1999-11-30 Formed product having antifogging thin film
US09/725,198 US20010026859A1 (en) 1999-11-30 2000-11-29 Functional films, their use, articles having the films and processes for producing these

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33916599A JP2001158642A (en) 1999-11-30 1999-11-30 Formed product having antifogging thin film

Publications (1)

Publication Number Publication Date
JP2001158642A true JP2001158642A (en) 2001-06-12

Family

ID=18324865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33916599A Pending JP2001158642A (en) 1999-11-30 1999-11-30 Formed product having antifogging thin film

Country Status (1)

Country Link
JP (1) JP2001158642A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100529525B1 (en) * 2001-06-29 2005-11-21 크리스탈 시스템스 인코포레이티드 Antifogging product, inorganic hydrophilic hard layer forming material and process for producing antifogging lens
JP2015136885A (en) * 2014-01-23 2015-07-30 デクセリアルズ株式会社 Hydrophilic laminate and manufacturing method thereof, and article and manufacturing method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100529525B1 (en) * 2001-06-29 2005-11-21 크리스탈 시스템스 인코포레이티드 Antifogging product, inorganic hydrophilic hard layer forming material and process for producing antifogging lens
JP2015136885A (en) * 2014-01-23 2015-07-30 デクセリアルズ株式会社 Hydrophilic laminate and manufacturing method thereof, and article and manufacturing method thereof
WO2015111426A1 (en) * 2014-01-23 2015-07-30 デクセリアルズ株式会社 Hydrophilic laminate, method for manufacturing same, article, and method for manufacturing same

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