JP2001052862A - Manufacture of organic el element and device therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of an organic EL element enabling minute patterns to be formed accurately and easily in the event of mask evaporation, and to provide a device therefor. SOLUTION: A transparent electrode 12 with a prescribed shape is formed of a transparent electrode material, such as ITO, on a surface of a transparent substrate 10 made of glass, resin, or the like, a luminescence layer made of organic EL materials is layered on the transparent electrode 12 by a vacuum thin-film forming technique, and a back plate made of Al-Li, etc., having a prescribed shape and confronting the transparent electrode 12 is formed on a surface of the luminescence layer. In forming the luminescence layer, a mask 20 with a stripe-shaped opening 22 (22a, 22b) is provided, and as to the opening 22 in the mask 20, the opening part 22a on the substrate 10 side is formed larger in width than the opening part 22b on the side of evaporation sources for the organic EL materials. The mask 20 and the substrate 10 are inclined with the mask 20 aligned with the substrate 10, the evaporating direction of the organic EL materials is successively changed for evaporation, and a plurality of organic EL materials are evaporated onto different positions on a surface of the substrate 10 by using the single opening 22 in the mask 20.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a method and an apparatus for manufacturing an organic EL element used for light-emitting display of a flat light source, a display, and other predetermined patterns.

[0002]

2. Description of the Related Art Conventionally, an organic EL (electroluminescence) element is formed by forming a translucent ITO film on one surface of a transparent substrate made of glass or the like and etching it into a predetermined stripe to form a transparent electrode. I was A light-emitting layer was laminated on the transparent electrode, and the light-emitting layer was formed of an organic EL material usually in two to three layers to a thickness of about 500 ° to 1500 °. Further, a back electrode material is provided on the surface of the light emitting layer by vapor deposition or the like to form a back electrode.

Here, an organic EL material constituting a light emitting layer includes a hole transport material such as a triphenylamine derivative (TPD) and an aluminum chelate complex (Alq) as a light emitting material.
₃ ) The electron transporting material as described above. The light emitting layer is composed of a layer in which an electron transporting material is laminated on a hole transporting material, or a mixed layer thereof.

[0004]

In the case of the above-mentioned conventional technology, the organic EL material is chemically unstable and cannot be treated by etching or the like, and even exposure to the air causes deterioration. . Therefore, patterning of the organic EL material has been limited to mask evaporation. When a plurality of light-emitting layers are provided in parallel for multi-color display or full-color display, the light-emitting layers are
The material had to be deposited and the mask was changed in a vacuum deposition apparatus for each color.

[0005] However, in this mask deposition, it is difficult to form a fine pattern due to the performance of the mask. For example, if the pitch is about 3 pixels per 1 mm, 3 dots per pixel are required to colorize the pixel, an opening having a width of 90 μm is required, and considerable accuracy is required for mask replacement. And
The replacement work was extremely difficult. Further, sagging of the mask due to heat and the like has also been a serious problem. Further, at the time of replacing the mask, there is a possibility that the surface of the organic EL material which has already been vapor-deposited may be touched and damaged by the mask or the like.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and provides a method and apparatus for manufacturing an organic EL element capable of forming a fine pattern accurately and easily even in mask evaporation. The purpose is to provide.

[0007]

According to a method of manufacturing an organic EL device of the present invention, an IT device is provided on a transparent substrate surface such as glass or resin.
A transparent electrode is formed to have a predetermined shape using a transparent electrode material such as O, and a light emitting layer made of an organic EL material is laminated on the transparent electrode by a vacuum thin film forming technique. Al-Li of predetermined shape facing the electrode
Is formed. Then, a mask having a stripe-shaped opening for forming the light emitting layer is provided, and the opening of the mask has a width of the opening on the substrate side larger than that of the organic EL material on the evaporation source side. The organic EL material is formed widely, the mask is positioned on the substrate, the substrate and the mask are inclined, and the organic EL material is sequentially vapor-deposited while sequentially changing its vapor deposition direction. This is a method of manufacturing an organic EL element in which a plurality of organic EL materials are deposited at different positions on the substrate surface with respect to one opening of the mask.

The light emitting layer is formed by sequentially changing the angle of the mask for each of a plurality of emission colors. The deposition source sequentially deposits while moving parallel to the substrate.

Further, according to the present invention, a transparent electrode is formed on a transparent substrate surface with a transparent electrode material so as to have a predetermined shape, and a light emitting layer made of an organic EL material is laminated on the transparent electrode by a vacuum thin film forming technique. An organic EL device manufacturing apparatus for forming a back electrode of a predetermined shape facing the transparent electrode on the surface of the light emitting layer, comprising a mask having a stripe-shaped opening for forming the light emitting layer, The opening of the mask is formed such that the width of the opening on the substrate side is wider than the opening on the evaporation source side of the organic EL material, so that the substrate and the mask can be inclined with respect to the evaporation source. An organic EL element manufacturing apparatus, wherein a deposition position on the substrate surface can be set according to a deposition direction of the organic EL material.

The opening of the mask has an opening width on the substrate side set to be three times or more the opening width on the evaporation source side, and an angle setting for setting an inclination angle of the mask with respect to the evaporation source. Means. Further, the vapor deposition source includes a moving device for moving the substrate and the mask in parallel and linearly.

[0011]

Embodiments of the present invention will be described below with reference to the drawings. In the organic EL device of this embodiment, transparent electrodes 12 made of a transparent electrode material such as ITO or SnO ₂ are formed on one surface of a transparent substrate 10 made of glass, quartz, resin, or the like at a constant pitch in a stripe shape. I have. On the surface side of the transparent electrode 12 or on the substrate 10 side, a thin stripe-shaped conductor pattern 14 of chromium, aluminum, or the like is formed along both side edges of the transparent electrode 12. On the entire surface of the transparent electrode 12, a buffer layer 16 of CuPc (copper phthalocyanine) having a thickness of about 100 to 500 ° is formed, and a hole transport material 18 of about 300 to 1000 ° is formed on the surface thereof.

Further, on the surface of the hole transport material 18,
An electron transport material (not shown) having a light-emitting material having three primary colors of light, red (R), green (G), and blue (B), is formed in a stripe shape corresponding to the transparent electrode 12. I have. The electron transporting material is formed in order with these three as a set, and forms a light emitting layer made of an organic EL material. Then, on the surface of the electron transport material, Li is applied in a range of 0.01 to 0.05.
% Al-Li alloy containing about 99% purity, other A
A back electrode made of a cathode material such as l-Mg
It is laminated with a thickness of about {1000}. The back electrode is orthogonally opposed to the transparent electrode 12 and is formed in a stripe shape. Back electrode other than the above, Al, Li, A
A metal thin film containing g, Mg, In, Cs or the like may be used.

Here, the light emitting layer is made of α-NPD, triphenyldiamine derivative (TP
D), hydrazone derivatives, arylamine derivatives and the like. Further, as the EL material of the red light emitting electron transporting material, D
CM, a distyrylbiphenyl derivative (DPVBi) is used as an EL material for a blue light-emitting electron transport material, and an aluminum quinolyl complex (A) is used as an EL material for a green light-emitting electron transport material.
lq ₃ ) or the like. Further, an appropriate light emitting material may be mixed.

The light emitting pixels of this organic EL element are, for example,
Electrons that emit light of three primary colors, red (R), green (G), and blue (B), in one pixel are arranged at intervals of 30 μm with a 330 μm square as one pixel. Each pattern of transport material is located. Accordingly, each electron transporting material is 90 μm wide and arranged at intervals of about 10 μm.
Thus, nine pixels capable of color display are arranged in a 1 mm square.

As shown in FIGS. 1 to 3, a mask 20 for forming each electron transporting material of the organic EL device is, for example, 3
Made of a material such as a stainless steel plate having a thickness of 00 to 500 μm,
It is a material that can be fixed to a mask frame (not shown) with a magnet. The mask 20 forms pixels at a pitch of 330 μm. As shown in FIG. 1, the mask 20 has a stripe-shaped slit 22, and an opening 22 a located on the substrate 10 side of the slit 22 is formed to be wide. The openings 22a are formed with an opening width of 300 μm and an interval of 30 μm. Further, the opening 22b on the evaporation source side of the mask 20
Is formed narrower than the opening 22a so as to be located at the center of the opening 22a. For example, openings of 90 μm are formed at intervals of 240 μm. Therefore, the opening 22b has an opening width three times or more the opening 22a. As shown in FIGS. 2 and 3, the slit 22 has connecting portions 24 of about 20 μm at intervals of 90 μm, for example, in the longitudinal direction.

The method of manufacturing the mask 20 is 300 to 5
An etching resist for forming the opening 22a is printed on one surface of a stainless steel plate or the like having a thickness of about 00 μm, and an etching resist for forming the opening 22b is printed on the other surface. Etching is performed from the part 22a side. Then, after etching of about 90% of the thickness of the mask 20 is completed, etching is performed from the opening 22b side. Thereby, the slit 22 has a substantially trapezoidal cross section.
Is formed.

In the manufacturing method according to one embodiment of the organic EL device of the present invention, a transparent electrode material such as ITO is provided on the entire surface of a transparent substrate 10 made of glass, quartz, resin or the like by vapor deposition or the like. At this time, the transparent electrode 12 is vacuum-deposited on the substrate 10 using a wire mask or the like in which stripe-shaped openings of a predetermined pitch are formed.

Next, the buffer layer 1 is formed on the surface of the transparent electrode 12.
6 is vacuum-deposited on the entire surface, and a hole transport material 18 is further vacuum-deposited on the entire surface. Thereafter, using the mask 20, layers composed of three types of electron transporting materials that emit light of the three primary colors of light and other light emitting materials are sequentially laminated by vacuum deposition, sputtering, or other vacuum thin film forming techniques.

When depositing the electron transporting material, FIGS.
As shown in (A), (B) and (C), a deposition crucible 30 as a deposition source containing a predetermined color of the light emitting layer 12, for example, a red light emitting electron transport material R is provided in a vacuum deposition tank. 1
The mask 0 and the mask 20 are arranged at a predetermined angle with respect to the deposition direction, and the deposition is performed while moving the deposition crucible 30 in parallel with the mask 20. The substrate 10 and the mask 20 at this time
As shown in FIG. 1, the inclination angle is such that the vapor deposition material entering from the opening 22b of the mask 20 is vaporized on one side of the opening 22a with respect to the scattering direction of the vapor deposition material. At this time, the deposition range is three transparent electrodes 1 in one pixel.
The position corresponds to one of the two transparent electrodes 12.

The evaporation crucible 30 is further provided with a substrate 1 from the evaporation material so that the evaporation direction is substantially parallel to a straight line.
A guide plate 32 extending to the 0 side is provided. The guide plate 32 has an opening 34 on the substrate 10 side formed to have a predetermined narrow width, for example, about 5 mm and a length of about 100 mm. In this case, since the vapor deposition is performed with a width of 100 mm, the substrate 10 has a width of 1 mm.
In the case of 00 mm or more, it reciprocates according to its size. Further, the length of the evaporation crucible 30 and the guide plate 32 is
When formed to be equal to the width of the substrate 10, the vapor deposition may be performed by one movement.

Next, the surfaces of the substrate 10 and the mask 20 are fixed perpendicular to the deposition direction, and the deposition crucible 30 provided with the green light-emitting electron transporting material G is placed on the substrate 1 in the same manner as described above.
0 and the mask 20 are moved in parallel. As a result, as shown in FIG. 1, the green light-emitting electron transporting material G passes through the opening 22b of the mask 20, and corresponds to the center of the opening 22a and is adjacent to the transparent position adjacent to the deposition position of the red light-emitting electron transporting material R. It is deposited on the electrode 12. Here, even if a portion where each electron transporting material overlaps occurs, the overlapping portion is a non-light emitting portion which is a portion between the conductor pattern 14 and the transparent electrode 12,
There is no display problem. Further, the surfaces of the substrate 10 and the mask 20 are fixed at an angle symmetrical to the direction of the vapor deposition of the red light-emitting electron transporting material R, and the evaporation crucible 30 provided with the blue light-emitting electron transporting material B, Substrate 1 as well
0 and the mask 20 are moved in parallel. As a result, as shown in FIG. 1, the blue light-emitting electron transporting material B passes through the opening 22b of the mask 20 and corresponds to the other side of the opening 22a and is adjacent to the deposition position of the green light-emitting electron transporting material G. Is deposited on the transparent electrode 12. As a result, the light emitting materials of the three primary colors of light are formed on the substrate 10 in a stripe shape.

Next, a back electrode material is provided on the surface of the electron transporting material of the light emitting layer by a vacuum thin film forming technique such as vacuum evaporation. Also at this time, a back electrode is formed in a direction orthogonal to the transparent electrode 12 using a wire mask or the like. The back electrode is appropriately laminated with a thickness of about 500 to 1000 °.

According to the method and apparatus for manufacturing an EL element of this embodiment, even when a plurality of organic EL materials for color display are deposited, they can be deposited without exchanging a mask. The EL material can be accurately deposited.

The method and the apparatus for manufacturing an EL element according to the present invention make use of the difference in the width of the opening of the mask to perform vapor deposition from a single slit to a plurality of positions. The cross-sectional shape does not matter. Therefore,
Even in a wire mask having a circular cross section, the same vapor deposition as described above is possible due to the difference between the minimum gap between the slits and the gap between the openings on the substrate side.

[0025]

According to the method and the apparatus for manufacturing an EL element of the present invention, vapor deposition is performed at a plurality of positions from each slit by utilizing the difference in the width of the opening of the mask. Thus, it is possible to accurately perform vapor deposition at a plurality of locations.

[Brief description of the drawings]

FIG. 1 is a schematic vertical sectional view showing a method for manufacturing an organic EL device according to an embodiment of the present invention.

FIG. 2 is a plan view of a mask used in this embodiment.

FIG. 3 is a bottom view of a mask used in this embodiment.

FIG. 4 is a schematic front view showing a manufacturing process of the organic EL device of this embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Transparent substrate 12 Transparent electrode 14 Conductive pattern 16 Buffer layer 18 Hole transport material 20 Mask 22 Slit 22a, 22b Opening

Continuing from the front page (72) Nobuyuki Miyama, Inventor 3158, Shimo-Okubo, Osawano-cho, Kamishinkawa-gun, Toyama Prefecture F term (reference) 3K007 AB18 CA01 CA02 CA05 CB01 DA00 DB03 EB00 FA00 FA01 4K029 AA09 AA11 AA24 BA62 BB03 BC07 BD00 HA03

Claims (6)

[Claims] 1. A transparent electrode is formed on a transparent substrate surface with a transparent electrode material so as to have a predetermined shape, and a light emitting layer made of an organic EL material is laminated on the transparent electrode by a vacuum thin film forming technique. In the method for manufacturing an organic EL device, in which a back electrode having a predetermined shape facing the transparent electrode is formed on a surface of a layer, a mask having a stripe-shaped opening for forming the light emitting layer is provided, and the opening of the mask is provided. The portion is formed such that the width of the opening on the substrate side is wider than the opening on the evaporation source side of the organic EL material, the mask is positioned on the substrate and the substrate and the mask are inclined, and the organic EL material is tilted. A plurality of organic EL materials are vapor-deposited at different positions on the surface of the substrate with respect to one opening of the mask by sequentially changing a vapor deposition direction of the organic EL device. 2. The method for manufacturing an organic EL device according to claim 1, wherein the light emitting layer is sequentially deposited by changing the angle of the mask for each of a plurality of emission colors. 3. The method for manufacturing an organic EL device according to claim 2, wherein the evaporation source sequentially performs the evaporation while moving in parallel to the substrate. 4. A transparent electrode is formed on the surface of a transparent substrate with a transparent electrode material so as to have a predetermined shape, and a light emitting layer made of an organic EL material is laminated on the transparent electrode by a vacuum thin film forming technique. An apparatus for manufacturing an organic EL device, wherein a back electrode having a predetermined shape facing a transparent electrode is formed on a surface of a layer, a mask having a stripe-shaped opening for forming the light-emitting layer is provided. The portion is formed such that the width of the opening on the substrate side is wider than the opening on the evaporation source side of the organic EL material.
A guide plate that is formed in a linear shape and regulates a vapor deposition direction to be substantially parallel; a substrate and the mask are provided so as to be tiltable with respect to the vapor deposition source; An apparatus for manufacturing an organic EL element, wherein a deposition position can be set. 5. An opening of the mask, wherein an opening width on the substrate side is set to be three times or more as large as an opening width on the evaporation source side, and an angle setting for setting an inclination angle of the mask with respect to the evaporation source. 4. The apparatus for manufacturing an organic EL device according to claim 3, further comprising means. 6. The apparatus for manufacturing an organic EL device according to claim 5, wherein the vapor deposition source includes a moving device for moving the substrate and the mask in parallel and linearly.