JP2001015572A - Method and device for controlling transportation in process facility - Google Patents

Method and device for controlling transportation in process facility

Info

Publication number
JP2001015572A
JP2001015572A JP11184494A JP18449499A JP2001015572A JP 2001015572 A JP2001015572 A JP 2001015572A JP 11184494 A JP11184494 A JP 11184494A JP 18449499 A JP18449499 A JP 18449499A JP 2001015572 A JP2001015572 A JP 2001015572A
Authority
JP
Japan
Prior art keywords
chamber
processing
transfer
chambers
process treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11184494A
Other languages
Japanese (ja)
Inventor
Koji Okazaki
浩司 岡崎
Hiroshi Kusumoto
寛史 楠元
Atsushi Toizumi
厚 戸泉
Makoto Kiyohara
誠 清原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11184494A priority Critical patent/JP2001015572A/en
Publication of JP2001015572A publication Critical patent/JP2001015572A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position, Course, Altitude, Or Attitude Of Moving Bodies (AREA)

Abstract

PROBLEM TO BE SOLVED: To make the total process treatment throughputs of process treatment chambers equal to each other by comparing the total process treatment throughputs of transportable process treatment chambers with each other, and transporting a material to the process treatment chamber having the minimum total process treatment throughput. SOLUTION: In the transportation control routine 3 of a computer 1, a material is placed on the transportation arm 9 of the transfer chamber 8 of a process facility 2 and whether the material can be transported from the chamber 8 to a process treatment chamber is discriminated. When it is discriminated that the material can be transported from the chamber 8, the process treatment chamber to which the material can be transported are searched from all process treatment chambers. When, for instance, second and third process treatment chambers 5 and 6 are found, the total process treatment throughputs of the chambers 5 and 6 are compared with each other and, when the throughput of the chamber 5 is smaller than that of the chamber 6, the chamber 5 is decided as the transporting destination of the material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はプロセス設備におけ
る搬送制御方法および装置に関し、特に同一のプロセス
処理を行う複数のプロセス処理室とプロセス処理室に材
料を搬送する搬送手段とを備えた、プロセス設備におけ
る搬送制御方法および装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer control method and apparatus in a process facility, and more particularly, to a process facility having a plurality of process processing chambers for performing the same process and a transfer means for transferring materials to the process processing chambers. The present invention relates to a transfer control method and apparatus in the above.

【0002】[0002]

【従来の技術】近年、半導体・液晶などのプロセス製造
設備においては、製品の製造コストを下げるために、設
備の稼働率の向上が求められている。この種のプロセス
設備では、複数のプロセス処理室を備えている。たとえ
ば、図2に示すプロセス設備2は、第1プロセス処理室
4、第2プロセス処理室5、第3プロセス処理室6、第
4プロセス処理室7を備えている。さらに、各プロセス
処理室との間で搬送を行うための移載室8と、この移載
室8に設けられて各プロセス処理室との間で実際の材料
の搬送動作を行う搬送アーム9とを備えている。プロセ
ス設備2は、コンピュータ1によって制御している。
2. Description of the Related Art In recent years, in a process manufacturing facility for semiconductors and liquid crystals, it has been required to improve the operation rate of the facility in order to reduce the manufacturing cost of products. This type of process equipment has a plurality of process chambers. For example, the process equipment 2 shown in FIG. 2 includes a first process chamber 4, a second process chamber 5, a third process chamber 6, and a fourth process chamber 7. Further, a transfer chamber 8 for transferring the material to and from each process chamber, and a transfer arm 9 provided in the transfer chamber 8 and performing an actual material transfer operation to and from each process chamber. It has. The process equipment 2 is controlled by a computer 1.

【0003】コンピュータ1は、プロセス設備2の搬送
の制御を搬送処理制御ルーチン3で実行するように構成
されている。この場合の搬送処理制御ルーチン3は、具
体的には図3に示すように構成されている。(ステップ
S31)において、プロセス設備2の移載室8の搬送ア
ーム9上に材料があり、移載室8からプロセス処理室へ
の搬送が可能な状態か否かを判断する。搬送が可能な状
態であれば、(ステップS32)で搬送を行ってもよい
全てのプロセス処理室を探索する。搬送を行ってもよい
プロセス処理室が1室以上あった場合は、(ステップS
33)で、図4に示すような搬送条件から搬送先を決定
する。たとえば、前回は第1プロセス処理室4に搬送
し、今回の搬送を行ってもよいプロセス処理室が第2プ
ロセス処理室5と第3プロセス処理室6であった場合
は、図4の条件から搬送先を第2プロセス処理室5と決
定する。そして、(ステップS34)で搬送処理を実行
する。
[0005] The computer 1 is configured to execute the control of the transfer of the process equipment 2 by a transfer processing control routine 3. The transport processing control routine 3 in this case is specifically configured as shown in FIG. In (Step S31), it is determined whether or not there is a material on the transfer arm 9 of the transfer chamber 8 of the process equipment 2 and transfer from the transfer chamber 8 to the process chamber is possible. If the transfer is possible, all the process processing chambers that may be transferred in step S32 are searched. If there is one or more process processing chambers in which the transfer may be performed (Step S
In 33), the transfer destination is determined from the transfer conditions as shown in FIG. For example, if the process chambers that were transported last time to the first process chamber 4 and may be transported this time are the second process chamber 5 and the third process chamber 6, the condition shown in FIG. The transfer destination is determined to be the second processing chamber 5. Then, the carrying process is executed in (Step S34).

【0004】[0004]

【発明が解決しようとする課題】プロセス設備では、プ
ロセス処理室で一定の累計プロセス処理量を超えた場
合、たとえば一定の累計プラズマ放電時間を超えた場合
に、プロセス処理室をメンテナンスする必要があり、設
備を停止させなければならない。このため、メンテナン
ス後における全てのプロセス処理室での累計プロセス処
理量が均一であり、同時に一定のプロセス処理量を超
え、次のメンテナンスを全てのプロセス処理室について
一斉に行うことができれば、メンテナンスの際の設備停
止時間が最少となり、稼働率が上がる。
In a process facility, it is necessary to maintain the processing chamber when the total processing amount exceeds a certain amount in the processing chamber, for example, when a certain cumulative plasma discharge time is exceeded. , Equipment must be shut down. For this reason, if the accumulated process throughput in all the processing chambers after the maintenance is uniform and at the same time exceeds a certain processing throughput, and the next maintenance can be performed simultaneously for all the processing chambers, the maintenance The downtime of equipment during operation is minimized, and the operating rate increases.

【0005】しかし、前記従来の搬送制御方法では、た
とえば第1プロセス処理室4が故障等のため搬送できな
くなった場合、第2プロセス処理室5、第3プロセス処
理室6、第4プロセス処理室7の3室を使って処理を続
け、第1プロセス処理室4が復旧した場合に再び4室で
処理を行う。すると、第1プロセス処理室4のプロセス
処理量が他のプロセス処理室よりも少なくなり、その後
に、第1プロセス処理室4がメンテナンス時期になって
いなくても他のプロセス処理室がメンテナンス時期にな
った場合は、設備を停止させなければならず、稼働率が
低下するという問題を有している。
However, according to the conventional transfer control method, if the first process chamber 4 cannot be transported due to a failure or the like, the second process chamber 5, the third process chamber 6, the fourth process chamber, or the like. The processing is continued using the three chambers 7, and when the first processing chamber 4 is restored, the processing is performed again in the four chambers. Then, the processing amount of the first process chamber 4 becomes smaller than that of the other process chambers. Thereafter, even if the first process chamber 4 is not in the maintenance time, the other process chambers are not in the maintenance time. If this happens, the facility must be stopped, and there is a problem that the operation rate decreases.

【0006】本発明は上記の問題点を解決し、各プロセ
ス処理室での累計プロセス処理量を均一にして設備の稼
働率を上げるようにすることを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and to make the cumulative processing amount in each processing chamber uniform so as to increase the operation rate of the equipment.

【0007】[0007]

【課題を解決するための手段】この課題を解決するため
に本発明は、搬送先を決定する条件として、搬送可能な
プロセス処理室の累計プロセス処理量を比較し、この累
計プロセス処理量が最少のプロセス室へ搬送するように
したものである。これにより、累計プロセス処理量の均
一化がはかれる。
In order to solve this problem, according to the present invention, as a condition for determining a transfer destination, a total process amount of a process chamber capable of being transferred is compared, and the total process amount is minimized. Is transferred to the process chamber. As a result, the total amount of process processing can be made uniform.

【0008】[0008]

【発明の実施の形態】請求項1に記載の本発明は、同一
のプロセス処理を行う複数のプロセス処理室へ搬送手段
によって材料を搬送するに際し、搬送を行ってもよい複
数のプロセス処理室のうちの累積プロセス処理量が最少
であるプロセス処理室へ搬送を行うものである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention according to claim 1 provides a method for transporting a material to a plurality of processing chambers for performing the same process by using a plurality of processing chambers which may be transported. The transfer is performed to the processing chamber where the accumulated processing amount is the minimum.

【0009】こうすると、累積プロセス処理量が最少で
あるプロセス処理室へ搬送を行うことを繰り返すこと
で、各プロセス処理室での累計プロセス処理量の均一化
がはかれる。請求項2記載の本発明は、同一のプロセス
処理を行う複数のプロセス処理室へ搬送手段によって材
料を搬送するに際し、搬送手段からプロセス処理室への
搬送が可能な状態になった場合に、搬送を行ってもよい
プロセス処理室を探索し、探索した搬送を行ってもよい
複数のプロセス処理室の中から、それまでの累計のプロ
セス処理量が最少のプロセス処理室を探索して、この累
計のプロセス処理量が最少のプロセス処理室へ搬送を行
うものである。
By repeating the transfer to the processing chambers having the smallest accumulated processing amount, the total amount of the processing amount in each processing chamber can be made uniform. According to the second aspect of the present invention, when a material is conveyed to a plurality of processing chambers performing the same process by the conveying means, when the material can be conveyed from the conveying means to the processing chamber, the material is conveyed. A search is made for a process processing chamber which may perform the transfer, and a search is made for a process processing chamber having the smallest total process processing amount from among the plurality of process processing chambers which may perform the searched transfer. Is transferred to the process processing chamber having the minimum processing amount.

【0010】こうすると、累積プロセス処理量が最少で
あるプロセス処理室へ搬送を行うことを繰り返すこと
で、各プロセス処理室での累計プロセス処理量の均一化
がはかれる。請求項3に記載の本発明は、同一のプロセ
ス処理を行う複数のプロセス処理室と、各プロセス処理
室へ材料を搬送する搬送手段と、搬送手段からプロセス
処理室への搬送が可能な状態であるか否かを判別する手
段と、搬送が可能な状態になった場合に、搬送を行って
もよいプロセス処理室を探索する手段と、探索した搬送
を行ってもよい複数のプロセス処理室の中から、それま
での累計のプロセス処理量が最少のプロセス処理室を探
索して、この累計のプロセス処理量が最少のプロセス処
理室を搬送先として決定する手段とを有するようにした
ものである。
[0010] In this way, by repeating the transfer to the processing chambers having the smallest cumulative processing capacity, the total processing capacity in each processing chamber can be made uniform. According to a third aspect of the present invention, a plurality of process chambers for performing the same process, a transport unit for transporting a material to each process chamber, and a transport unit capable of transporting the material from the transport unit to the process chamber are provided. Means for determining whether or not there is, a means for searching for a process processing chamber in which the transfer may be performed when the transfer becomes possible, and a plurality of process processing chambers in which the searched transfer may be performed. From among them, means for searching for a process processing chamber with the smallest total process processing amount up to that time and determining the process processing chamber with the smallest total process processing amount as the transfer destination is provided. .

【0011】このような構成であると、累積プロセス処
理量が最少であるプロセス処理室へ搬送を行うことが繰
り返され、これによって各プロセス処理室での累計プロ
セス処理量が均一化される。以下に、本発明の実施の形
態を、図1と、従来技術の説明にも用いた図2とにもと
づいて説明する。
With such a configuration, the transfer to the processing chambers with the smallest accumulated processing amount is repeated, whereby the total amount of processing in each processing chamber is made uniform. Hereinafter, an embodiment of the present invention will be described with reference to FIG. 1 and FIG. 2 which is also used for describing a conventional technique.

【0012】図1は本発明にもとづくコンピュータ1の
搬送処理制御ルーチン3を示す。(ステップS1)にお
いて、プロセス設備2の移載室8の搬送手段としての搬
送アーム9上に材料があり、移載室8からプロセス処理
室への搬送が可能な状態か否かを判断する。搬送が可能
な状態であれば、(ステップS2)で搬送を行ってもよ
い全てのプロセス処理室を探索する。搬送を行ってもよ
いプロセス処理室が1室以上あった場合は、(ステップ
S3)において、探索した搬送を行ってもよい全てのプ
ロセス処理室の中から、累計のプロセス処理量が最少の
室を探索し、この室に搬送先を決定する。たとえば、搬
送可能なプロセス処理室が第2プロセス処理室5と第3
プロセス処理室6とである場合は、第2プロセス処理室
5と第3プロセス処理室6との累計プロセス処理量どう
しを比較し、たとえば第2プロセス処理室5の累計プロ
セス処理量が第3プロセス処理室6の累計プロセス処理
量より少ない場合は、搬送先を第2プロセス処理室5と
決定し、(ステップS4)で搬送処理を実行する。
FIG. 1 shows a transport processing control routine 3 of the computer 1 according to the present invention. In (Step S1), it is determined whether or not there is a material on the transfer arm 9 as a transfer means of the transfer chamber 8 of the process equipment 2 and transfer from the transfer chamber 8 to the process chamber is possible. If the transfer is possible, a search is made in step S2 for all the process chambers that may be transferred. If there is one or more process processing chambers in which the transfer may be performed, in step S3, the room having the smallest total process processing amount is selected from all the searched process processing chambers in which the transfer may be performed. Is searched, and a transfer destination is determined in this room. For example, the process chambers that can be transported are the second process chamber 5 and the third process chamber.
In the case of the processing chamber 6, the total processing capacity of the second processing chamber 5 and the total processing capacity of the third processing chamber 6 are compared with each other. If the amount is smaller than the total process amount of the processing chamber 6, the transfer destination is determined to be the second process chamber 5, and the transfer processing is executed in (Step S4).

【0013】[0013]

【発明の効果】以上のように本発明によれば、同一のプ
ロセス処理を行う複数のプロセス処理室へ搬送手段によ
って材料を搬送するに際し、搬送先を決定する条件とし
て、搬送可能なプロセス処理室の累計プロセス処理量を
比較し、この累計プロセス処理量が最少のプロセス室へ
搬送するようにしたため、プロセス処理室での累計プロ
セス処理量を均一にすることができて、設備の稼働率を
上げることができるという有利な効果を得られる。
As described above, according to the present invention, when a material is conveyed to a plurality of process processing chambers for performing the same process by the transfer means, the transferable process processing chamber is used as a condition for determining a transfer destination. Compared to the total process throughput of this process, the total process throughput is transported to the process room with the minimum, so the total process throughput in the process chamber can be made uniform and the equipment operation rate increased. The advantageous effect that it can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の搬送制御方法を実施するための制御フ
ローチャート
FIG. 1 is a control flowchart for implementing a transport control method of the present invention.

【図2】本発明を適用可能なプロセス設備の概略構成図FIG. 2 is a schematic configuration diagram of a process facility to which the present invention can be applied.

【図3】従来の搬送制御方法の制御フローチャートFIG. 3 is a control flowchart of a conventional transport control method.

【図4】従来の搬送制御方法の搬送条件を表形式で示す
FIG. 4 is a diagram showing, in a table format, transfer conditions of a conventional transfer control method.

【符号の説明】[Explanation of symbols]

3 搬送処理ルーチン 4 第1プロセス処理室 5 第2プロセス処理室 6 第3プロセス処理室 7 第4プロセス処理室 9 搬送アーム Reference Signs List 3 transfer processing routine 4 first process chamber 5 second process chamber 6 third process chamber 7 fourth process chamber 9 transfer arm

───────────────────────────────────────────────────── フロントページの続き (72)発明者 戸泉 厚 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 清原 誠 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 3F022 AA08 CC02 KK01 MM15 MM44 5F031 FA12 GA50 MA04 PA03 5H301 AA02 AA09 BB05 KK03 KK04 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Atsushi Toizumi 1006 Kadoma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. Term (reference) 3F022 AA08 CC02 KK01 MM15 MM44 5F031 FA12 GA50 MA04 PA03 5H301 AA02 AA09 BB05 KK03 KK04

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 同一のプロセス処理を行う複数のプロセ
ス処理室へ搬送手段によって材料を搬送するに際し、搬
送を行ってもよい複数のプロセス処理室のうちの累積プ
ロセス処理量が最少であるプロセス処理室へ搬送を行う
ことを特徴とするプロセス設備における搬送制御方法。
When a material is conveyed to a plurality of processing chambers for performing the same processing by a conveying means, a process processing in which a cumulative amount of processing of the plurality of processing chambers which may be conveyed is the smallest. A transfer control method in a process facility, wherein the transfer is performed to a chamber.
【請求項2】 同一のプロセス処理を行う複数のプロセ
ス処理室へ搬送手段によって材料を搬送するに際し、搬
送手段からプロセス処理室への搬送が可能な状態になっ
た場合に、搬送を行ってもよいプロセス処理室を探索
し、探索した搬送を行ってもよい複数のプロセス処理室
の中から、それまでの累計のプロセス処理量が最少のプ
ロセス処理室を探索して、この累計のプロセス処理量が
最少のプロセス処理室へ搬送を行うことを特徴とするプ
ロセス設備における搬送制御方法。
2. When a material is conveyed to a plurality of processing chambers for performing the same process by the conveying means, if the material can be conveyed from the conveying means to the processing chamber, the material may be conveyed. A search is made for a good process processing chamber, and a search is made for a process processing chamber having the smallest total process processing amount from among the plurality of process processing chambers that may perform the searched transfer. Transfer method in a process facility, wherein the transfer is performed to a process processing chamber having the minimum number.
【請求項3】 同一のプロセス処理を行う複数のプロセ
ス処理室と、各プロセス処理室へ材料を搬送する搬送手
段と、搬送手段からプロセス処理室への搬送が可能な状
態であるか否かを判別する手段と、搬送が可能な状態に
なった場合に、搬送を行ってもよいプロセス処理室を探
索する手段と、探索した搬送を行ってもよい複数のプロ
セス処理室の中から、それまでの累計のプロセス処理量
が最少のプロセス処理室を探索して、この累計のプロセ
ス処理量が最少のプロセス処理室を搬送先として決定す
る手段とを有することを特徴とするプロセス設備におけ
る搬送制御装置。
3. A plurality of process chambers for performing the same process, transport means for transporting a material to each process chamber, and whether or not transport from the transport means to the process chamber is possible. Means for determining, and means for searching for a processing chamber in which transfer may be performed when transfer becomes possible, and a plurality of process chambers in which the searched transfer may be performed. Means for searching for a process processing chamber having the smallest total process processing amount and determining the process processing chamber having the smallest total process processing amount as a transfer destination. .
JP11184494A 1999-06-30 1999-06-30 Method and device for controlling transportation in process facility Pending JP2001015572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11184494A JP2001015572A (en) 1999-06-30 1999-06-30 Method and device for controlling transportation in process facility

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9728431B2 (en) 2015-09-29 2017-08-08 Hitachi Kokusai Electric Inc. Method of manufacturing semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9728431B2 (en) 2015-09-29 2017-08-08 Hitachi Kokusai Electric Inc. Method of manufacturing semiconductor device

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