JP2000246200A - Surface treatment device - Google Patents

Surface treatment device

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Publication number
JP2000246200A
JP2000246200A JP11051431A JP5143199A JP2000246200A JP 2000246200 A JP2000246200 A JP 2000246200A JP 11051431 A JP11051431 A JP 11051431A JP 5143199 A JP5143199 A JP 5143199A JP 2000246200 A JP2000246200 A JP 2000246200A
Authority
JP
Japan
Prior art keywords
processing chamber
ozone concentration
surface treatment
ultraviolet
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11051431A
Other languages
Japanese (ja)
Inventor
Kazuhiro Sakai
和宏 坂井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Iwasaki Denki KK
Original Assignee
Iwasaki Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Iwasaki Denki KK filed Critical Iwasaki Denki KK
Priority to JP11051431A priority Critical patent/JP2000246200A/en
Publication of JP2000246200A publication Critical patent/JP2000246200A/en
Pending legal-status Critical Current

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  • Cleaning In General (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment device in which stabilized surface treatment can constantly be performed without being influenced by variations in atmospheric humidity by controlling ozone concentration in a treating chamber or the illuminance of ultraviolet radiation of 300 nm or shorter. SOLUTION: A treatment chamber 12 in a treatment device body in which ultraviolet radiation light sources 16 are fitted is provided with an air introducing part 20 for introducing air into the treatment chamber and an oxygen feeding part 21 for introducing oxygen into the treatment chamber, and an ozone concentration meter 30 for measuring ozone concentration in the treatment chamber is arranged. Using the output of the ozone concentration meter, the oxygen feed quantity in the treatment chamber is controlled to always keep the ozone concentration in the treatment chamber constant. Instead of the ozone concentration meter, an ultraviolet radiation illuminance meter may be arranged to keep fixed the ozone concentration in the treatment chamber constant similarly.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は表面処理装置の改良
に関する。
The present invention relates to an improvement in a surface treatment apparatus.

【0002】[0002]

【従来の技術】一般にプラスチック、ガラス、金属、セ
ラミック等の材料表面に付着している有機物の汚れを紫
外放射とオゾンにより分解除去することが行われてい
る。またプラスチック等の有機系材料の表面改質におい
ても紫外放射とオゾンが使用されている。従来の表面処
理装置は、例えば図5に示すように、箱体状の装置本体
1の内部に反射体2を配置すると共に同反射体2の内部
に紫外放射光源3を装着して構成してある。紫外放射光
源3としては、例えば低圧水銀ランプを用いて構成して
ある。さらに紫外放射光源3の下面に位置して、被処理
物4をコンベアー5等で搬送し、紫外放射光源3により
生成されるオゾンと紫外放射により、被処理物4の表面
処理を行っている。同図において、6は装置外部にオゾ
ンを漏洩させないために装置本体内を負圧にするための
オゾン排気ファンであって、空気取入口7より空気を取
入れ、紫外放射光源によって生成したオゾンを一定流量
で排気している。
2. Description of the Related Art Generally, organic dirt adhering to the surface of materials such as plastic, glass, metal, and ceramic is decomposed and removed by ultraviolet radiation and ozone. Ultraviolet radiation and ozone are also used in surface modification of organic materials such as plastics. As shown in FIG. 5, for example, a conventional surface treatment apparatus is configured by disposing a reflector 2 inside a box-shaped apparatus main body 1 and mounting an ultraviolet radiation light source 3 inside the reflector 2. is there. As the ultraviolet radiation light source 3, for example, a low-pressure mercury lamp is used. Further, the object 4 is conveyed by a conveyor 5 or the like at the lower surface of the ultraviolet radiation light source 3, and the surface treatment of the object 4 is performed by ozone and ultraviolet radiation generated by the ultraviolet radiation light source 3. In the figure, reference numeral 6 denotes an ozone exhaust fan for reducing the pressure in the apparatus main body so as to prevent ozone from leaking out of the apparatus. Exhaust at the flow rate.

【0003】[0003]

【発明が解決しようとする課題】ところで上記した表面
処理装置におけるオゾン生成(オゾン濃度)は、図6に
示すようにその日の環境条件によって大きく変化する。
つまり同図に示すように、処理装置の雰囲気湿度が高く
なると、オゾン濃度は低下し、紫外線254nmは高く
なり、均一な表面処理を行うことができない欠点があ
る。つまり湿度が高くなると、酸素からオゾンへの反応
が阻害され、オゾン濃度が低くなる。さらにオゾン濃度
が低くなると、オゾンによる254nmの吸収が少なく
なり、254nmの照度が高くなり、活性酸素が減少し
有機物の除去ができなくなる。
Incidentally, the ozone generation (ozone concentration) in the above-mentioned surface treatment apparatus greatly changes depending on the environmental conditions of the day as shown in FIG.
That is, as shown in the figure, when the atmospheric humidity of the processing apparatus increases, the ozone concentration decreases, the ultraviolet ray 254 nm increases, and there is a disadvantage that uniform surface treatment cannot be performed. That is, when the humidity increases, the reaction of oxygen to ozone is inhibited, and the ozone concentration decreases. When the ozone concentration is further reduced, the absorption at 254 nm by ozone is reduced, the illuminance at 254 nm is increased, and active oxygen is reduced, so that organic substances cannot be removed.

【0004】本発明は上記の点に鑑み発明したものであ
って、処理室内のオゾン濃度あるいは300nm以下の
紫外放射照度を一定に制御することにより、雰囲気湿度
の変動の影響を受けず常に安定した表面処理を行うこと
ができる表面処理装置を提供することを目的とする。
[0004] The present invention has been made in view of the above points, and by constantly controlling the ozone concentration in the processing chamber or the ultraviolet irradiance of 300 nm or less, it is always stable without being affected by changes in the atmospheric humidity. An object of the present invention is to provide a surface treatment apparatus capable of performing a surface treatment.

【0005】[0005]

【課題を解決するための手段】本発明は上記課題を解決
するために次の構成とする。つまり請求項1に記載の発
明は、内部に紫外放射光源を装着してなる処理装置本体
と、同紫外放射光源の照射部に配置してなる処理室と、
処理室内のオゾン濃度を測定するオゾン濃度計を有する
表面処理装置に関する。また前記処理室に空気を導入す
る空気導入部と、同処理室に酸素を導入する酸素供給部
を設け、また同処理室内のオゾン濃度を測定するオゾン
濃度計を配置して構成してある。さらにオゾン濃度計の
出力により処理室内の酸素供給量を制御し、絶えず処理
室内のオゾン濃度が一定となるように構成してある。
Means for Solving the Problems The present invention has the following arrangement to solve the above-mentioned problems. That is, the invention according to claim 1 includes a processing apparatus main body in which an ultraviolet radiation light source is mounted, a processing chamber disposed in an irradiation unit of the ultraviolet radiation light source,
The present invention relates to a surface treatment apparatus having an ozone concentration meter for measuring an ozone concentration in a treatment chamber. Further, an air introduction section for introducing air into the processing chamber, an oxygen supply section for introducing oxygen into the processing chamber are provided, and an ozone concentration meter for measuring ozone concentration in the processing chamber is arranged. Further, the supply amount of oxygen in the processing chamber is controlled by the output of the ozone concentration meter, so that the ozone concentration in the processing chamber is constantly kept constant.

【0006】請求項1記載の発明によると、処理室内の
酸素供給量を制御することにより、絶えず処理室内のオ
ゾン濃度が一定となり、雰囲気湿度の変動の影響を受け
ず常に安定した表面処理を行うことができる。
According to the first aspect of the invention, by controlling the amount of oxygen supplied into the processing chamber, the concentration of ozone in the processing chamber is constantly kept constant, and a stable surface treatment is always performed without being affected by changes in the atmospheric humidity. be able to.

【0007】請求項2に記載の発明は、請求項1に記載
の表面処理装置における空気導入部より処理室に乾燥空
気を供給し、またオゾン濃度計の測定値により、乾燥空
気供給量を制御し、処理室内のオゾン濃度が絶えず一定
となるように構成してある。
According to a second aspect of the present invention, dry air is supplied to the processing chamber from the air inlet in the surface treatment apparatus according to the first aspect, and the supply amount of the dry air is controlled by a measurement value of an ozone concentration meter. In addition, the ozone concentration in the processing chamber is configured to be constantly constant.

【0008】請求項2に記載の発明によると、オゾン濃
度の測定結果により、乾燥空気供給量を制御することが
でき、絶えず処理室内のオゾン濃度が一定となり、雰囲
気湿度の変動の影響を受けず常に安定した表面処理を行
うことができる。
According to the second aspect of the present invention, the supply amount of dry air can be controlled based on the measurement result of the ozone concentration, and the ozone concentration in the processing chamber is constantly kept constant, and is not affected by the fluctuation of the atmospheric humidity. Stable surface treatment can always be performed.

【0009】請求項3に記載の発明は、内部に紫外放射
光源を装着してなる処理装置本体と、同紫外放射光源の
照射部に配置してなる処理室と、処理室内の紫外放射照
度を測定する照度計を有する表面処理装置に関する。ま
た前記処理室に空気を導入する空気導入部と、同処理室
に酸素を導入する酸素供給部を設け、さらに処理室内の
紫外放射照度を測定する紫外放射照度計を配置して構成
してある。そして紫外放射照度計の測定値により処理室
内の酸素供給量を制御し、絶えず処理室内のオゾン濃度
が一定となるように構成してある。
According to a third aspect of the present invention, there is provided a processing apparatus main body having an ultraviolet radiation light source mounted therein, a processing chamber disposed in an irradiation section of the ultraviolet radiation light source, and an ultraviolet irradiance in the processing chamber. The present invention relates to a surface treatment device having an illuminometer for measuring. Further, an air introduction unit for introducing air into the processing chamber, an oxygen supply unit for introducing oxygen into the processing chamber are provided, and an ultraviolet irradiometer for measuring ultraviolet irradiance in the processing chamber is further arranged. . Then, the supply amount of oxygen in the processing chamber is controlled by the measurement value of the ultraviolet irradiometer so that the ozone concentration in the processing chamber is constantly kept constant.

【0010】請求項3に記載の発明によると、処理室内
の酸素供給量を制御することにより、絶えず処理室内の
オゾン濃度が一定となり、雰囲気湿度の変動の影響を受
けず常に安定した表面処理を行うことができる。
According to the third aspect of the present invention, by controlling the amount of oxygen supplied into the processing chamber, the concentration of ozone in the processing chamber is constantly kept constant, and a stable surface treatment can be performed without being affected by changes in the atmospheric humidity. It can be carried out.

【0011】請求項4に記載の発明は、請求項3に記載
の表面処理装置において、空気導入部より処理室に乾燥
空気を供給し、また紫外放射照度計の測定値により、乾
燥空気供給量を制御し、処理室内のオゾン濃度が絶えず
一定となるように構成してある。
According to a fourth aspect of the present invention, in the surface treatment apparatus according to the third aspect, dry air is supplied to the processing chamber from the air introduction portion, and the dry air supply amount is determined based on a measurement value of the ultraviolet irradiometer. Is controlled so that the ozone concentration in the processing chamber is constantly constant.

【0012】請求項4に記載の発明によると、紫外放射
照度計の測定結果により、乾燥空気供給量を制御するこ
とができ、絶えず処理室内のオゾン濃度が一定となり、
雰囲気湿度の変動の影響を受けず常に安定した表面処理
を行うことができる。
According to the fourth aspect of the present invention, the supply amount of dry air can be controlled based on the measurement result of the ultraviolet irradiometer, and the ozone concentration in the processing chamber is constantly kept constant.
A stable surface treatment can always be performed without being affected by changes in the atmospheric humidity.

【0013】[0013]

【発明の実施の形態】請求項1に記載の本発明を図1乃
至図3について説明する。図1において、11は処理装
置本体であって、処理室12を有して箱形に構成してあ
る。また同処理装置本体は水平方向の略中央にコンベア
ー通過部13を有して構成してある。15は処理装置本
体11の内部に配置してなる反射体であって、例えば鏡
面のアルミニュウム板を用いて構成してある。16は反
射体15の内部に装着してなる紫外放射光源であって、
例えば40ワットの低圧水銀ランプを用いて構成してあ
る。また同紫外放射光源16は、例えば6灯を被処理物
の搬送方向に沿って、5cmの間隔を有して構成してあ
る。また同紫外放射光源は300nm以下の波長を効率
よく照射する合成石英ガラス若しくは溶融石英ガラス製
の発光管を用いて構成してある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The first embodiment of the present invention will be described with reference to FIGS. In FIG. 1, reference numeral 11 denotes a processing apparatus main body, which has a processing chamber 12 and is formed in a box shape. The main body of the processing apparatus has a conveyor passage section 13 at substantially the center in the horizontal direction. Reference numeral 15 denotes a reflector disposed inside the processing apparatus main body 11, and is configured using, for example, a mirror-finished aluminum plate. Reference numeral 16 denotes an ultraviolet radiation light source mounted inside the reflector 15,
For example, it is configured using a 40-watt low-pressure mercury lamp. In addition, the ultraviolet radiation light source 16 includes, for example, six lamps arranged at intervals of 5 cm along the transport direction of the workpiece. Further, the ultraviolet radiation light source is configured using an arc tube made of synthetic quartz glass or fused silica glass which efficiently irradiates a wavelength of 300 nm or less.

【0014】20は処理装置本体11の例えば上面に構
成した空気導入部であって、排気ファン34の排気量に
応じて空気が導入される。これはオゾンが装置の外部に
漏れるのを防止するためである。21は処理装置本体1
1の例えば上部両端に構成した酸素供給部であって、処
理室22の内部が与圧にならない程度にオゾン濃度に応
じて流量調整された酸素が供給される。また酸素は少な
くとも空気中の酸素濃度より高濃度としてある。さらに
酸素は外部から導入した空気と処理室内で混合する。2
2は処理装置本体11の処理室12を通過するように配
置してなるコンベアーであって、被処理物を搬送する。
Reference numeral 20 denotes an air introduction section formed on, for example, the upper surface of the processing apparatus main body 11, and air is introduced according to the displacement of the exhaust fan 34. This is to prevent ozone from leaking out of the apparatus. 21 is the processing apparatus main body 1
For example, oxygen supply units configured at both upper ends of the upper part 1 supply oxygen whose flow rate is adjusted according to the ozone concentration so that the inside of the processing chamber 22 is not pressurized. Oxygen is at least higher than the oxygen concentration in the air. Further, oxygen is mixed with air introduced from outside in the processing chamber. 2
Reference numeral 2 denotes a conveyor arranged so as to pass through the processing chamber 12 of the processing apparatus main body 11, and conveys an object to be processed.

【0015】30は例えばコンベアーの下側に位置して
配置してなるオゾン濃度計、31はオゾン濃度計30に
一端を接続してなるオゾン濃度サンプリング部であっ
て、例えば中空状に構成し、処理室12内のオゾンを採
取するように構成してある。オゾンは紫外線185nm
が酸素に吸収されて生成される。またオゾンはオゾナイ
ザーにより供給することも可能である。さらにオゾンは
光吸収特性を有することから紫外線254nmを吸収し
て、活性酸素に分解され、この活性酸素が有機物に作用
して被処理物の洗浄改質を行うことができる。32は入
出力インターフェースであって、オゾン濃度計30から
の信号を受けてレギュレター33に信号を送り、酸素供
給量を制御する。また処理室12内のオゾンが外部に流
出するのを防止するために、処理室12内は負圧に構成
してある。35は紫外放射光源16の下方に位置する被
処理物であって、例えばプラスチック、ガラス、金属、
セラミック等の素材で構成されたものである。同被処理
物35は図1に示すように例えばコンベアー22で搬送
する。
Reference numeral 30 denotes an ozone concentration meter disposed below the conveyor, for example. Reference numeral 31 denotes an ozone concentration sampling unit having one end connected to the ozone concentration meter 30. It is configured to collect ozone in the processing chamber 12. Ozone is UV 185nm
Is generated by being absorbed by oxygen. Ozone can also be supplied by an ozonizer. Further, since ozone has a light absorbing property, it absorbs ultraviolet rays of 254 nm and is decomposed into active oxygen, and this active oxygen acts on an organic substance to perform cleaning and reforming of an object to be processed. Reference numeral 32 denotes an input / output interface which receives a signal from the ozone concentration meter 30 and sends a signal to a regulator 33 to control an oxygen supply amount. Further, in order to prevent ozone in the processing chamber 12 from flowing out, the inside of the processing chamber 12 is configured to have a negative pressure. Reference numeral 35 denotes an object to be processed located below the ultraviolet radiation light source 16, such as plastic, glass, metal, or the like.
It is made of a material such as ceramic. The workpiece 35 is conveyed by, for example, the conveyor 22 as shown in FIG.

【0016】また請求項2に記載の発明は、請求項1に
記載の表面処理装置における酸素の代わりに乾燥空気を
供給するように構成してある。請求項2に記載の発明は
請求項1に記載の発明と同様に、オゾン濃度計30から
の信号を入出力インターフェース32が受けて、レギュ
レター33に信号を送り、乾燥空気の供給量を制御す
る。
According to a second aspect of the present invention, dry air is supplied instead of oxygen in the surface treatment apparatus of the first aspect. According to the second aspect of the present invention, similarly to the first aspect, the input / output interface 32 receives a signal from the ozone concentration meter 30 and sends a signal to the regulator 33 to control the supply amount of dry air. .

【0017】請求項3に記載の発明を図4について説明
する。請求項3に記載の発明は、請求項1に記載のオゾ
ン濃度計30の代わりに、処理室内の紫外放射照度を測
定する紫外放射照度計40と紫外放射導入管41を設け
て構成してある。同発明によると、紫外放射照度計40
で処理室12内の紫外放射照度を測定し、紫外放射照度
計40からの信号を入出力インターフェース32が受け
て、レギュレター33に信号を送り、酸素供給部21か
らの処理室12への酸素の供給量を制御する。
The third embodiment will be described with reference to FIG. According to a third aspect of the present invention, an ultraviolet irradiance meter 40 for measuring ultraviolet irradiance in a processing chamber and an ultraviolet radiation introducing tube 41 are provided in place of the ozone concentration meter 30 according to the first aspect. . According to the invention, the ultraviolet irradiometer 40
, The ultraviolet irradiance in the processing chamber 12 is measured, a signal from the ultraviolet irradiometer 40 is received by the input / output interface 32, a signal is sent to the regulator 33, and oxygen from the oxygen supply unit 21 to the processing chamber 12 is measured. Control the supply.

【0018】また請求項4に記載の発明は、請求項3に
記載の表面処理装置における空気の代わりに乾燥空気を
供給するように構成してある。請求項4に記載の発明は
請求項3に記載の発明と同様に、紫外放射照度計40か
らの信号を入出力インターフェース32が受けて、レギ
ュレター33に信号を送り、乾燥空気の供給量を制御す
る。請求項1乃至請求項4によると、処理室12内は絶
えずオゾン濃度が雰囲気湿度の変動の影響を受けず一定
となる。
According to a fourth aspect of the present invention, in the surface treatment apparatus of the third aspect, dry air is supplied instead of air. According to a fourth aspect of the present invention, similarly to the third aspect of the invention, the input / output interface 32 receives a signal from the ultraviolet irradiometer 40 and sends a signal to the regulator 33 to control the supply amount of dry air. I do. According to the first to fourth aspects of the present invention, the ozone concentration in the processing chamber 12 is constantly kept constant without being affected by the fluctuation of the atmospheric humidity.

【0019】次に上記した表面処理装置による湿度と、
オゾン排風量と、オゾン濃度の関係を説明する。図5に
示した従来の表面処理装置によると、図6に示すよう
に、湿度が上昇すると、オゾン濃度は低下し、紫外放射
照度は上昇する。これは、オゾン分子が空気中の水分子
に衝突し分解するためである。さらにオゾン濃度が低下
すると、オゾンによる紫外放射(200nmから300
nm)吸収量が減るため紫外放射照度は逆に上昇する。
これに対し請求項1に記載の本発明によると、図2に示
すように、湿度が上昇してもオゾンの原料となる酸素濃
度が上昇するのでオゾン濃度は平均化し安定した表面処
理を行うことができる。また従来の装置によると、図3
に示すように、湿度が上昇すると処理時間が長くなる
が、本発明に係る処理装置によると処理時間が長くなる
ことはない。
Next, the humidity by the above-mentioned surface treatment device,
The relationship between the amount of ozone exhaust air and the ozone concentration will be described. According to the conventional surface treatment apparatus shown in FIG. 5, as shown in FIG. 6, as the humidity increases, the ozone concentration decreases and the ultraviolet irradiance increases. This is because ozone molecules collide with water molecules in the air and decompose. When the ozone concentration further decreases, ultraviolet radiation by ozone (200 nm to 300
nm) The UV irradiance increases conversely due to the reduced absorption.
On the other hand, according to the present invention, as shown in FIG. 2, even if the humidity increases, the concentration of oxygen, which is a raw material of ozone, increases, so that the ozone concentration is averaged and a stable surface treatment is performed. Can be. According to the conventional apparatus, FIG.
As shown in (2), the processing time increases when the humidity increases, but the processing time does not increase with the processing apparatus according to the present invention.

【0020】[0020]

【発明の効果】上記した請求項1に記載の本発明による
と、処理室内の酸素供給量を制御することにより、オゾ
ン濃度を常に一定範囲に制御することができ、雰囲気湿
度の影響を受けることなく、安定した表面処理を行うこ
とができる特別な効果を有する。
According to the first aspect of the present invention, by controlling the amount of oxygen supplied into the processing chamber, the ozone concentration can always be controlled within a certain range, and the influence of the atmospheric humidity can be obtained. And has a special effect that a stable surface treatment can be performed.

【0021】上記した請求項2に記載の本発明による
と、オゾン濃度の測定結果により、乾燥空気供給量を制
御し、内部の湿度調整を行うことにより処理室内のオゾ
ン濃度を一定とすることができ、雰囲気湿度の変動の影
響を受けず常に安定した表面処理を行うことができる特
別な効果がある。
According to the second aspect of the present invention, the ozone concentration in the processing chamber can be kept constant by controlling the supply amount of dry air and adjusting the internal humidity based on the measurement result of the ozone concentration. There is a special effect that a stable surface treatment can always be performed without being affected by the fluctuation of the atmospheric humidity.

【0022】上記した請求項3に記載の本発明による
と、紫外放射照度の測定結果に基づいて、乾燥空気供給
量を制御することにより、処理室内のオゾン濃度が一定
となり、雰囲気湿度の変動の影響を受けず常に安定した
表面処理を行うことができる特別な効果がある。
According to the third aspect of the present invention, the ozone concentration in the processing chamber becomes constant by controlling the supply amount of dry air based on the measurement result of the ultraviolet irradiance, and the fluctuation of the atmospheric humidity is reduced. There is a special effect that a stable surface treatment can be always performed without being affected.

【0023】上記した請求項4に記載の本発明による
と、紫外放射照度の測定結果に基づいて、乾燥空気供給
量を制御し、処理室内のオゾン濃度が一定となり、雰囲
気湿度の変動の影響を受けず常に安定した表面処理を行
うことができる特別な効果がある。
According to the present invention, the supply amount of the dry air is controlled based on the measurement result of the ultraviolet irradiance, the ozone concentration in the processing chamber becomes constant, and the influence of the fluctuation of the atmospheric humidity is reduced. There is a special effect that a stable surface treatment can always be performed without receiving.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る表面処理装置の正面図。FIG. 1 is a front view of a surface treatment apparatus according to the present invention.

【図2】図1に示す表面処理装置における雰囲気湿度と
オゾン濃度及び酸素供給量との関係を示す説明図。
FIG. 2 is an explanatory diagram showing a relationship among an atmospheric humidity, an ozone concentration, and an oxygen supply amount in the surface treatment apparatus shown in FIG.

【図3】本発明と従来の表面処理装置の雰囲気湿度と処
理時間の関係を示す図。
FIG. 3 is a diagram showing the relationship between the atmospheric humidity and the processing time of the present invention and a conventional surface treatment apparatus.

【図4】本発明に係る他の表面処理装置の正面図。FIG. 4 is a front view of another surface treatment apparatus according to the present invention.

【図5】従来の表面処理装置の側面図。FIG. 5 is a side view of a conventional surface treatment apparatus.

【図6】図5に示す表面処理装置における雰囲気湿度と
オゾン濃度及び254nmとの関係を示す説明図。
FIG. 6 is an explanatory diagram showing the relationship between the atmospheric humidity, the ozone concentration, and 254 nm in the surface treatment apparatus shown in FIG.

【符号の説明】[Explanation of symbols]

11 処理装置本体 12 処理室 13 コンベアー通過部 15 反射体 16 紫外放射光源 20 空気導入部 21 酸素供給部 22 コンベアー 30 オゾン濃度計 31 オゾン濃度サンプリング部 32 入出力インターフェース 33 レギュレター 34 排気ファン 35 被処理物 40 紫外放射照度計 41 紫外放射導入管 DESCRIPTION OF SYMBOLS 11 Processing apparatus main body 12 Processing room 13 Conveyor passage part 15 Reflector 16 Ultraviolet radiation light source 20 Air introduction part 21 Oxygen supply part 22 Conveyor 30 Ozone concentration meter 31 Ozone concentration sampling part 32 Input / output interface 33 Regulator 34 Exhaust fan 35 Exhaust fan 35 40 UV irradiance meter 41 UV radiation introduction tube

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】内部に紫外放射光源を装着してなる処理装
置本体と、同紫外放射光源の照射部に配置してなる処理
室と、処理室内のオゾン濃度を測定するオゾン濃度計を
有する表面処理装置において、前記処理室に空気を導入
する空気導入部と、同処理室に酸素を導入する酸素供給
部を設け、また同処理室内のオゾン濃度を測定するオゾ
ン濃度計を配置し、オゾン濃度計の出力により処理室内
の酸素供給量を制御し、絶えず処理室内のオゾン濃度が
一定となるように構成したことを特徴とする表面処理装
置。
1. A processing apparatus main body in which an ultraviolet radiation light source is mounted, a processing chamber disposed in an irradiation section of the ultraviolet radiation light source, and a surface having an ozone concentration meter for measuring an ozone concentration in the processing chamber. In the processing apparatus, an air introduction unit that introduces air into the processing chamber, an oxygen supply unit that introduces oxygen into the processing chamber, and an ozone concentration meter that measures an ozone concentration in the processing chamber are disposed. A surface treatment apparatus characterized in that the oxygen supply amount in the processing chamber is controlled by the output of the meter so that the ozone concentration in the processing chamber is constantly kept constant.
【請求項2】空気導入部より処理室に乾燥空気を供給
し、またオゾン濃度計からの測定値により、乾燥空気供
給量を制御し、処理室内のオゾン濃度が絶えず一定とな
るように構成したことを特徴とする請求項1記載の表面
処理装置。
2. An apparatus for supplying dry air from an air inlet to a processing chamber and controlling a supply amount of dry air based on a measurement value from an ozone concentration meter so that the ozone concentration in the processing chamber is constantly constant. The surface treatment apparatus according to claim 1, wherein:
【請求項3】内部に紫外放射光源を装着してなる処理装
置本体と、同紫外放射光源の照射部に配置してなる処理
室と、処理室内の紫外放射照度を測定する照度計を有す
る表面処理装置において、前記処理室に空気を導入する
空気導入部と、同処理室に酸素を導入する酸素供給部を
設け、また同処理室内の紫外放射照度を測定する紫外放
射照度計を配置し、同紫外放射照度計の測定値により処
理室内の酸素供給量を制御し、絶えず処理室内のオゾン
濃度が一定となるように構成したことを特徴とする表面
処理装置。
3. A processing apparatus main body having an ultraviolet radiation light source mounted therein, a processing chamber disposed in an irradiation section of the ultraviolet radiation light source, and a surface having an illuminometer for measuring ultraviolet irradiance in the processing chamber. In the processing apparatus, an air introduction unit that introduces air into the processing chamber, an oxygen supply unit that introduces oxygen into the processing chamber is provided, and an ultraviolet irradiance meter that measures ultraviolet irradiance in the processing chamber is arranged. A surface treatment apparatus characterized in that an oxygen supply amount in a processing chamber is controlled based on a measurement value of the ultraviolet irradiometer and an ozone concentration in the processing chamber is constantly kept constant.
【請求項4】空気導入部より処理室に乾燥空気を供給
し、また紫外放射照度計の測定値により、乾燥空気供給
量を制御し、処理室内のオゾン濃度が絶えず一定となる
ように構成したことを特徴とする請求項3記載の表面処
理装置。
4. An apparatus for supplying dry air from an air inlet to a processing chamber and controlling a supply amount of dry air based on a measured value of an ultraviolet irradiometer so that an ozone concentration in the processing chamber is constantly constant. The surface treatment apparatus according to claim 3, wherein:
JP11051431A 1999-02-26 1999-02-26 Surface treatment device Pending JP2000246200A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11051431A JP2000246200A (en) 1999-02-26 1999-02-26 Surface treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11051431A JP2000246200A (en) 1999-02-26 1999-02-26 Surface treatment device

Publications (1)

Publication Number Publication Date
JP2000246200A true JP2000246200A (en) 2000-09-12

Family

ID=12886753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11051431A Pending JP2000246200A (en) 1999-02-26 1999-02-26 Surface treatment device

Country Status (1)

Country Link
JP (1) JP2000246200A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098357A (en) * 2005-10-07 2007-04-19 Fujitsu Ltd Apparatus and method for photochemistry treatment
JP2008101110A (en) * 2006-10-19 2008-05-01 Toppan Printing Co Ltd Surface treatment method of and surface treatment apparatus for film
JP2009098133A (en) * 2007-09-27 2009-05-07 National Institute Of Advanced Industrial & Technology Oxidizing active chemical species sensor, method and device for measuring abundance of oxidizing active chemical species
JP2012224702A (en) * 2011-04-18 2012-11-15 Tatsumo Kk Substrate treating apparatus
WO2013035304A1 (en) * 2011-09-05 2013-03-14 独立行政法人産業技術総合研究所 Active oxygen volume measurement device, active oxygen surface processing device, active oxygen volume measurement method, and active oxygen surface processing method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007098357A (en) * 2005-10-07 2007-04-19 Fujitsu Ltd Apparatus and method for photochemistry treatment
JP2008101110A (en) * 2006-10-19 2008-05-01 Toppan Printing Co Ltd Surface treatment method of and surface treatment apparatus for film
JP2009098133A (en) * 2007-09-27 2009-05-07 National Institute Of Advanced Industrial & Technology Oxidizing active chemical species sensor, method and device for measuring abundance of oxidizing active chemical species
JP2012224702A (en) * 2011-04-18 2012-11-15 Tatsumo Kk Substrate treating apparatus
WO2013035304A1 (en) * 2011-09-05 2013-03-14 独立行政法人産業技術総合研究所 Active oxygen volume measurement device, active oxygen surface processing device, active oxygen volume measurement method, and active oxygen surface processing method
JPWO2013035304A1 (en) * 2011-09-05 2015-03-23 独立行政法人産業技術総合研究所 Active oxygen amount measuring device, active oxygen surface treatment device, active oxygen amount measuring method, and active oxygen surface treatment method

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