IT201700122378A1 - Method for simulating the color of a solid substrate surface coated with a film and applying this film by atomic layer deposition - Google Patents

Method for simulating the color of a solid substrate surface coated with a film and applying this film by atomic layer deposition

Info

Publication number
IT201700122378A1
IT201700122378A1 IT102017000122378A IT201700122378A IT201700122378A1 IT 201700122378 A1 IT201700122378 A1 IT 201700122378A1 IT 102017000122378 A IT102017000122378 A IT 102017000122378A IT 201700122378 A IT201700122378 A IT 201700122378A IT 201700122378 A1 IT201700122378 A1 IT 201700122378A1
Authority
IT
Italy
Prior art keywords
film
simulating
color
applying
substrate surface
Prior art date
Application number
IT102017000122378A
Other languages
Italian (it)
Inventor
Elza Bontempi
Laura Borgese
Mariangiola Brisotto
Laura Eleonora Depero
Stefania Federici
Annalisa Zacco
Original Assignee
Smart Solutions S R L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Smart Solutions S R L filed Critical Smart Solutions S R L
Priority to IT102017000122378A priority Critical patent/IT201700122378A1/en
Publication of IT201700122378A1 publication Critical patent/IT201700122378A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
IT102017000122378A 2017-10-27 2017-10-27 Method for simulating the color of a solid substrate surface coated with a film and applying this film by atomic layer deposition IT201700122378A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IT102017000122378A IT201700122378A1 (en) 2017-10-27 2017-10-27 Method for simulating the color of a solid substrate surface coated with a film and applying this film by atomic layer deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT102017000122378A IT201700122378A1 (en) 2017-10-27 2017-10-27 Method for simulating the color of a solid substrate surface coated with a film and applying this film by atomic layer deposition

Publications (1)

Publication Number Publication Date
IT201700122378A1 true IT201700122378A1 (en) 2019-04-27

Family

ID=61526970

Family Applications (1)

Application Number Title Priority Date Filing Date
IT102017000122378A IT201700122378A1 (en) 2017-10-27 2017-10-27 Method for simulating the color of a solid substrate surface coated with a film and applying this film by atomic layer deposition

Country Status (1)

Country Link
IT (1) IT201700122378A1 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017041085A1 (en) * 2015-09-04 2017-03-09 President And Fellows Of Harvard College Modifying optical properties of thin film structures using an absorbing element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017041085A1 (en) * 2015-09-04 2017-03-09 President And Fellows Of Harvard College Modifying optical properties of thin film structures using an absorbing element

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
X-RITE INC.: "Color IQC", 1 March 2017 (2017-03-01), pages 1 - 2, XP055479434, Retrieved from the Internet <URL:https://www.xrite.com/-/media/xrite/files/literature/l10/l10-400_l10-499/l10-462_color_icontrol_qc_product_brochure/l10-462_coloriqc_en.pdf> [retrieved on 20180529] *
X-RITE INC.: "InkColor Master", 1 November 2004 (2004-11-01), France, pages 1 - 2, XP055479303, Retrieved from the Internet <URL:http://www.labsolutions.fr/wp-content/uploads/2010/12/L10-258-FR-InkColor-Master.pdf> [retrieved on 20180529] *

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