HK1202331A1 - Measuring apparatus and film-forming apparatus - Google Patents

Measuring apparatus and film-forming apparatus

Info

Publication number
HK1202331A1
HK1202331A1 HK15102625.2A HK15102625A HK1202331A1 HK 1202331 A1 HK1202331 A1 HK 1202331A1 HK 15102625 A HK15102625 A HK 15102625A HK 1202331 A1 HK1202331 A1 HK 1202331A1
Authority
HK
Hong Kong
Prior art keywords
film
forming apparatus
measuring
measuring apparatus
forming
Prior art date
Application number
HK15102625.2A
Other languages
Chinese (zh)
Inventor
佐井旭陽
日向陽平
大瀧芳幸
姜友松
Original Assignee
Shincron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shincron Co Ltd filed Critical Shincron Co Ltd
Publication of HK1202331A1 publication Critical patent/HK1202331A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Chemical Vapour Deposition (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
HK15102625.2A 2012-09-10 2015-03-16 Measuring apparatus and film-forming apparatus HK1202331A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/073097 WO2014038090A1 (en) 2012-09-10 2012-09-10 Measuring apparatus and film-forming apparatus

Publications (1)

Publication Number Publication Date
HK1202331A1 true HK1202331A1 (en) 2015-09-25

Family

ID=49850420

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15102625.2A HK1202331A1 (en) 2012-09-10 2015-03-16 Measuring apparatus and film-forming apparatus

Country Status (5)

Country Link
JP (1) JP5367196B1 (en)
CN (1) CN104350380B (en)
HK (1) HK1202331A1 (en)
TW (1) TWI502164B (en)
WO (1) WO2014038090A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107179053A (en) * 2016-03-10 2017-09-19 中国科学院高能物理研究所 Guiding device, the homogeneity test device of film and method
CN105714252B (en) * 2016-04-28 2018-09-28 中国工程物理研究院激光聚变研究中心 A kind of optical thin film deposition scan control method and system
EP3642577B1 (en) * 2017-06-22 2023-05-31 AMS Sensors Singapore Pte. Ltd. Compact spectrometer modules
JP2019144217A (en) * 2018-02-20 2019-08-29 国立大学法人千葉大学 Film thickness measurement device, vapor deposition apparatus using the same and film characteristic evaluation device
CN109811323B (en) * 2019-01-23 2023-09-08 北京北方华创微电子装备有限公司 Magnetron sputtering device and tray detection method

Family Cites Families (22)

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JPH01304345A (en) * 1988-06-02 1989-12-07 Nkk Corp Gas sensor
JPH0590371A (en) * 1991-09-27 1993-04-09 Nec Corp Method and apparatus for film thickness measurement
JP2973639B2 (en) * 1991-09-30 1999-11-08 横河電機株式会社 Equipment for measuring characteristics of sheet-like objects
JP3534632B2 (en) * 1998-12-22 2004-06-07 シャープ株式会社 Film thickness measurement method
JP2001174404A (en) * 1999-12-15 2001-06-29 Takahisa Mitsui Apparatus and method for measuring optical tomographic image
CN1302916A (en) * 2000-12-27 2001-07-11 中国科学院上海技术物理研究所 Method of monitoring and controlling thickness of optical medium film for infrared-stopping filter
JP3823745B2 (en) * 2001-03-14 2006-09-20 オムロン株式会社 Film thickness measuring method and film thickness sensor using the method
US7247345B2 (en) * 2002-03-25 2007-07-24 Ulvac, Inc. Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof
CN2552943Y (en) * 2002-04-30 2003-05-28 西安工业学院 Optical film thickness on line real time monitor
JP3959469B2 (en) * 2003-08-07 2007-08-15 独立行政法人産業技術総合研究所 Method for measuring refractive index and thickness of film, measurement program, and computer-readable recording medium
JP2006071589A (en) * 2004-09-06 2006-03-16 Univ Kansai Color measuring instrument and light source device
CN2763776Y (en) * 2004-12-30 2006-03-08 鸿富锦精密工业（深圳）有限公司 Film thickness monitoring controller
CN100365467C (en) * 2005-04-08 2008-01-30 中国科学院上海光学精密机械研究所 Optical film thickness monitoring system
JP4559995B2 (en) * 2006-03-30 2010-10-13 株式会社東芝 Tumor testing device
JP4775798B2 (en) * 2006-05-18 2011-09-21 独立行政法人科学技術振興機構 Multiple gas concentration simultaneous measurement device
CN1877298A (en) * 2006-07-05 2006-12-13 中国科学院上海光学精密机械研究所 Real-time measurement apparatus and measurement method for film layer spectrum
JP2008180597A (en) * 2007-01-24 2008-08-07 Sanyo Electric Co Ltd Light detection device and optical measurement unit
JP5314301B2 (en) * 2008-03-14 2013-10-16 三菱重工業株式会社 Gas concentration measuring method and apparatus
JP4878632B2 (en) * 2009-07-03 2012-02-15 株式会社シンクロン Optical film thickness meter and thin film forming apparatus equipped with optical film thickness meter
JP2012026949A (en) * 2010-07-27 2012-02-09 Shimadzu Corp Gas concentration measurement instrument
JP2012063321A (en) * 2010-09-17 2012-03-29 Hamamatsu Photonics Kk Reflectivity measurement device, reflectivity measurement method, film thickness measurement device, and film thickness measurement method
JP5126909B2 (en) * 2010-10-08 2013-01-23 株式会社シンクロン Thin film forming method and thin film forming apparatus

Also Published As

Publication number Publication date
CN104350380B (en) 2017-03-15
TWI502164B (en) 2015-10-01
CN104350380A (en) 2015-02-11
WO2014038090A1 (en) 2014-03-13
JPWO2014038090A1 (en) 2016-08-08
JP5367196B1 (en) 2013-12-11
TW201411090A (en) 2014-03-16

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210909