GB9812852D0 - Plasma processing apparatus - Google Patents

Plasma processing apparatus

Info

Publication number
GB9812852D0
GB9812852D0 GBGB9812852.3A GB9812852A GB9812852D0 GB 9812852 D0 GB9812852 D0 GB 9812852D0 GB 9812852 A GB9812852 A GB 9812852A GB 9812852 D0 GB9812852 D0 GB 9812852D0
Authority
GB
United Kingdom
Prior art keywords
processing apparatus
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB9812852.3A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Surface Technology Systems Ltd
Original Assignee
Surface Technology Systems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Surface Technology Systems Ltd filed Critical Surface Technology Systems Ltd
Priority to GBGB9812852.3A priority Critical patent/GB9812852D0/en
Publication of GB9812852D0 publication Critical patent/GB9812852D0/en
Priority to JP2000555274A priority patent/JP2002518165A/en
Priority to EP99926627A priority patent/EP1004136A1/en
Priority to KR1020007001570A priority patent/KR20010022962A/en
Priority to PCT/GB1999/001913 priority patent/WO1999066531A1/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32504—Means for preventing sputtering of the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
GBGB9812852.3A 1998-06-16 1998-06-16 Plasma processing apparatus Ceased GB9812852D0 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GBGB9812852.3A GB9812852D0 (en) 1998-06-16 1998-06-16 Plasma processing apparatus
JP2000555274A JP2002518165A (en) 1998-06-16 1999-06-16 Plasma processing equipment
EP99926627A EP1004136A1 (en) 1998-06-16 1999-06-16 Plasma processing apparatus
KR1020007001570A KR20010022962A (en) 1998-06-16 1999-06-16 Plasma processing apparatus
PCT/GB1999/001913 WO1999066531A1 (en) 1998-06-16 1999-06-16 Plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB9812852.3A GB9812852D0 (en) 1998-06-16 1998-06-16 Plasma processing apparatus

Publications (1)

Publication Number Publication Date
GB9812852D0 true GB9812852D0 (en) 1998-08-12

Family

ID=10833772

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB9812852.3A Ceased GB9812852D0 (en) 1998-06-16 1998-06-16 Plasma processing apparatus

Country Status (5)

Country Link
EP (1) EP1004136A1 (en)
JP (1) JP2002518165A (en)
KR (1) KR20010022962A (en)
GB (1) GB9812852D0 (en)
WO (1) WO1999066531A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100481313B1 (en) * 2001-11-09 2005-04-07 최대규 Inductively coupled plasma source
CN1322167C (en) * 2004-11-05 2007-06-20 哈尔滨工业大学 Composite plasma surface treatment apparatus
JP5701050B2 (en) * 2010-12-24 2015-04-15 キヤノンアネルバ株式会社 Plasma processing equipment
GB201502453D0 (en) * 2015-02-13 2015-04-01 Spts Technologies Ltd Plasma producing apparatus
JP7302338B2 (en) * 2019-07-01 2023-07-04 日新電機株式会社 Plasma processing equipment

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3458912B2 (en) * 1994-11-15 2003-10-20 アネルバ株式会社 Plasma processing equipment
US5763851A (en) * 1995-11-27 1998-06-09 Applied Materials, Inc. Slotted RF coil shield for plasma deposition system
TW327236B (en) * 1996-03-12 1998-02-21 Varian Associates Inductively coupled plasma reactor with faraday-sputter shield
EP0908921A1 (en) * 1997-10-10 1999-04-14 European Community Process chamber for plasma enhanced chemical vapour deposition and apparatus employing said process chamber

Also Published As

Publication number Publication date
EP1004136A1 (en) 2000-05-31
KR20010022962A (en) 2001-03-26
JP2002518165A (en) 2002-06-25
WO1999066531A1 (en) 1999-12-23

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)