GB9210897D0 - Apparatus for and method of producing ions - Google Patents
Apparatus for and method of producing ionsInfo
- Publication number
- GB9210897D0 GB9210897D0 GB929210897A GB9210897A GB9210897D0 GB 9210897 D0 GB9210897 D0 GB 9210897D0 GB 929210897 A GB929210897 A GB 929210897A GB 9210897 A GB9210897 A GB 9210897A GB 9210897 D0 GB9210897 D0 GB 9210897D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- producing ions
- ions
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB929210897A GB9210897D0 (en) | 1992-05-21 | 1992-05-21 | Apparatus for and method of producing ions |
PCT/GB1993/001036 WO1993023869A1 (en) | 1992-05-21 | 1993-05-20 | Apparatus for and method of producing ions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB929210897A GB9210897D0 (en) | 1992-05-21 | 1992-05-21 | Apparatus for and method of producing ions |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9210897D0 true GB9210897D0 (en) | 1992-07-08 |
Family
ID=10715876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB929210897A Pending GB9210897D0 (en) | 1992-05-21 | 1992-05-21 | Apparatus for and method of producing ions |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB9210897D0 (en) |
WO (1) | WO1993023869A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9524117D0 (en) * | 1995-11-24 | 1996-01-24 | Applied Materials Inc | Improvements in boron ion sources for ion implantation apparatus |
US5977552A (en) * | 1995-11-24 | 1999-11-02 | Applied Materials, Inc. | Boron ion sources for ion implantation apparatus |
US7655932B2 (en) | 2007-01-11 | 2010-02-02 | Varian Semiconductor Equipment Associates, Inc. | Techniques for providing ion source feed materials |
CN104299871B (en) * | 2013-07-16 | 2016-12-28 | 上海凯世通半导体股份有限公司 | Ion source system and ion beam current system |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4719355A (en) * | 1986-04-10 | 1988-01-12 | Texas Instruments Incorporated | Ion source for an ion implanter |
US4841197A (en) * | 1986-05-28 | 1989-06-20 | Nihon Shinku Gijutsu Kabushiki Kaisha | Double-chamber ion source |
JP2530434B2 (en) * | 1986-08-13 | 1996-09-04 | 日本テキサス・インスツルメンツ株式会社 | Ion generator |
DE3813559A1 (en) * | 1988-02-26 | 1989-09-07 | Asea Brown Boveri | Ion source |
-
1992
- 1992-05-21 GB GB929210897A patent/GB9210897D0/en active Pending
-
1993
- 1993-05-20 WO PCT/GB1993/001036 patent/WO1993023869A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1993023869A1 (en) | 1993-11-25 |
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