EP0564389A1
(en)
*
|
1992-04-01 |
1993-10-06 |
International Business Machines Corporation |
Stabilized chemically amplified positive resist composition containing glycol ether polymers
|
JPH0954437A
(en)
|
1995-06-05 |
1997-02-25 |
Fuji Photo Film Co Ltd |
Chemical amplification type positive resist composition
|
US7192681B2
(en)
|
2001-07-05 |
2007-03-20 |
Fuji Photo Film Co., Ltd. |
Positive photosensitive composition
|
US7521168B2
(en)
|
2002-02-13 |
2009-04-21 |
Fujifilm Corporation |
Resist composition for electron beam, EUV or X-ray
|
US7771915B2
(en)
|
2003-06-27 |
2010-08-10 |
Fujifilm Corporation |
Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
|
JP4612999B2
(en)
|
2003-10-08 |
2011-01-12 |
富士フイルム株式会社 |
Positive resist composition and pattern forming method using the same
|
JP4448705B2
(en)
|
2004-02-05 |
2010-04-14 |
富士フイルム株式会社 |
Photosensitive composition and pattern forming method using the photosensitive composition
|
JP4524154B2
(en)
|
2004-08-18 |
2010-08-11 |
富士フイルム株式会社 |
Chemically amplified resist composition and pattern forming method using the same
|
EP1637927A1
(en)
|
2004-09-02 |
2006-03-22 |
Fuji Photo Film Co., Ltd. |
Positive resist composition and pattern forming method using the same
|
JP4469692B2
(en)
|
2004-09-14 |
2010-05-26 |
富士フイルム株式会社 |
Photosensitive composition, compound used for photosensitive composition, and pattern formation method using the photosensitive composition
|
JP4452632B2
(en)
|
2005-01-24 |
2010-04-21 |
富士フイルム株式会社 |
Photosensitive composition, compound used for photosensitive composition, and pattern formation method using the photosensitive composition
|
US7947421B2
(en)
|
2005-01-24 |
2011-05-24 |
Fujifilm Corporation |
Positive resist composition for immersion exposure and pattern-forming method using the same
|
JP4562537B2
(en)
|
2005-01-28 |
2010-10-13 |
富士フイルム株式会社 |
Photosensitive composition, compound used for photosensitive composition, and pattern formation method using the photosensitive composition
|
JP4439409B2
(en)
|
2005-02-02 |
2010-03-24 |
富士フイルム株式会社 |
Resist composition and pattern forming method using the same
|
US7541131B2
(en)
|
2005-02-18 |
2009-06-02 |
Fujifilm Corporation |
Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
|
US8741537B2
(en)
|
2005-03-04 |
2014-06-03 |
Fujifilm Corporation |
Positive resist composition and pattern-forming method using the same
|
US20060204732A1
(en)
|
2005-03-08 |
2006-09-14 |
Fuji Photo Film Co., Ltd. |
Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
|
JP4579019B2
(en)
|
2005-03-17 |
2010-11-10 |
富士フイルム株式会社 |
Positive resist composition and pattern forming method using the resist composition
|
EP1720072B1
(en)
|
2005-05-01 |
2019-06-05 |
Rohm and Haas Electronic Materials, L.L.C. |
Compositons and processes for immersion lithography
|
JP4724465B2
(en)
|
2005-05-23 |
2011-07-13 |
富士フイルム株式会社 |
Photosensitive composition and pattern forming method using the photosensitive composition
|
JP4861767B2
(en)
|
2005-07-26 |
2012-01-25 |
富士フイルム株式会社 |
Positive resist composition and pattern forming method using the same
|
JP4580841B2
(en)
|
2005-08-16 |
2010-11-17 |
富士フイルム株式会社 |
Positive resist composition and pattern forming method using the same
|
JP4695941B2
(en)
|
2005-08-19 |
2011-06-08 |
富士フイルム株式会社 |
Positive resist composition for immersion exposure and pattern forming method using the same
|
ATE410460T1
(en)
|
2005-08-23 |
2008-10-15 |
Fujifilm Corp |
CURABLE INK CONTAINING MODIFIED OXETANE
|
JP4757574B2
(en)
|
2005-09-07 |
2011-08-24 |
富士フイルム株式会社 |
Ink composition, inkjet recording method, printed matter, planographic printing plate manufacturing method, and planographic printing plate
|
TWI403843B
(en)
|
2005-09-13 |
2013-08-01 |
Fujifilm Corp |
Positive resist composition and pattern-forming method using the same
|
EP1783184B9
(en)
|
2005-11-04 |
2011-05-11 |
Fujifilm Corporation |
Curable ink composition and oxetane compound
|
EP1795960B1
(en)
|
2005-12-09 |
2019-06-05 |
Fujifilm Corporation |
Positive resist composition, pattern forming method using the positive resist composition, use of the positive resit composition
|
DE602007012161D1
(en)
|
2006-03-03 |
2011-03-10 |
Fujifilm Corp |
Curable composition, ink composition, ink jet recording method and planographic printing plate
|
JP4911456B2
(en)
|
2006-11-21 |
2012-04-04 |
富士フイルム株式会社 |
POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR POSITIVE PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING THE POLYMER COMPOUND, AND PATTERN FORMATION METHOD USING POSITIVE SENSITIVE COMPOSITION
|
JP4554665B2
(en)
|
2006-12-25 |
2010-09-29 |
富士フイルム株式会社 |
PATTERN FORMATION METHOD, POSITIVE RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED FOR THE PATTERN FORMATION METHOD, NEGATIVE DEVELOPMENT SOLUTION USED FOR THE PATTERN FORMATION METHOD, AND NEGATIVE DEVELOPMENT RINSE SOLUTION USED FOR THE PATTERN FORMATION METHOD
|
JP2008189776A
(en)
|
2007-02-02 |
2008-08-21 |
Fujifilm Corp |
Active radiation-curable polymerizable composition, ink composition, inkjet recording method, printed matter, preparation method of lithographic printing plate, and lithographic printing plate
|
JP4905786B2
(en)
|
2007-02-14 |
2012-03-28 |
富士フイルム株式会社 |
Resist composition and pattern forming method using the same
|
EP1962139A1
(en)
|
2007-02-23 |
2008-08-27 |
FUJIFILM Corporation |
Negative resist composition and pattern forming method using the same
|
JP2008208266A
(en)
|
2007-02-27 |
2008-09-11 |
Fujifilm Corp |
Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
|
JP5162290B2
(en)
|
2007-03-23 |
2013-03-13 |
富士フイルム株式会社 |
Resist composition and pattern forming method using the same
|
US8088566B2
(en)
|
2007-03-26 |
2012-01-03 |
Fujifilm Corporation |
Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
|
US7592118B2
(en)
|
2007-03-27 |
2009-09-22 |
Fujifilm Corporation |
Positive resist composition and pattern forming method using the same
|
EP1975714A1
(en)
|
2007-03-28 |
2008-10-01 |
FUJIFILM Corporation |
Positive resist composition and pattern forming method
|
EP1975716B1
(en)
|
2007-03-28 |
2013-05-15 |
Fujifilm Corporation |
Positive resist composition and pattern forming method
|
US8182975B2
(en)
|
2007-03-28 |
2012-05-22 |
Fujifilm Corporation |
Positive resist composition and pattern forming method using the same
|
US20080241745A1
(en)
|
2007-03-29 |
2008-10-02 |
Fujifilm Corporation |
Negative resist composition and pattern forming method using the same
|
JP5159141B2
(en)
|
2007-03-30 |
2013-03-06 |
富士フイルム株式会社 |
Ink composition, inkjet recording method, printed matter, lithographic printing plate preparation method
|
JP4982228B2
(en)
|
2007-03-30 |
2012-07-25 |
富士フイルム株式会社 |
Positive resist composition and pattern forming method using the same
|
JP5039622B2
(en)
|
2007-03-30 |
2012-10-03 |
富士フイルム株式会社 |
Positive resist composition and pattern forming method using the same
|
EP1980911A3
(en)
|
2007-04-13 |
2009-06-24 |
FUJIFILM Corporation |
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
|
JP4562784B2
(en)
|
2007-04-13 |
2010-10-13 |
富士フイルム株式会社 |
PATTERN FORMING METHOD, RESIST COMPOSITION, DEVELOPER AND RINSE SOLUTION USED FOR THE PATTERN FORMING METHOD
|
JP4617337B2
(en)
|
2007-06-12 |
2011-01-26 |
富士フイルム株式会社 |
Pattern formation method
|
EP2159641A1
(en)
|
2007-06-15 |
2010-03-03 |
Fujifilm Corporation |
Surface treatment agent for forming pattern and pattern forming method using the treatment agent
|
JP2008311474A
(en)
|
2007-06-15 |
2008-12-25 |
Fujifilm Corp |
Method of forming pattern
|
JP2009009047A
(en)
|
2007-06-29 |
2009-01-15 |
Fujifilm Corp |
Pattern forming method
|
US8088550B2
(en)
|
2007-07-30 |
2012-01-03 |
Fujifilm Corporation |
Positive resist composition and pattern forming method
|
JP5066405B2
(en)
|
2007-08-02 |
2012-11-07 |
富士フイルム株式会社 |
Resist composition for electron beam, X-ray or EUV, and pattern forming method using the composition
|
US8110333B2
(en)
|
2007-08-03 |
2012-02-07 |
Fujifilm Corporation |
Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound
|
EP2177952A4
(en)
|
2007-08-10 |
2011-05-04 |
Fujifilm Corp |
Positive working resist composition and method for pattern formation using the positive working resist composition
|
JP5449675B2
(en)
|
2007-09-21 |
2014-03-19 |
富士フイルム株式会社 |
Photosensitive composition, pattern forming method using the photosensitive composition, and compound used in the photosensitive composition
|
JP5111039B2
(en)
|
2007-09-27 |
2012-12-26 |
富士フイルム株式会社 |
Photocurable composition containing a polymerizable compound, a polymerization initiator, and a dye
|
JP4911469B2
(en)
|
2007-09-28 |
2012-04-04 |
富士フイルム株式会社 |
Resist composition and pattern forming method using the same
|
US8240838B2
(en)
|
2007-11-29 |
2012-08-14 |
Fujifilm Corporation |
Ink composition for inkjet recording, inkjet recording method, and printed material
|
JP5150296B2
(en)
|
2008-02-13 |
2013-02-20 |
富士フイルム株式会社 |
Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same
|
US9046773B2
(en)
|
2008-03-26 |
2015-06-02 |
Fujifilm Corporation |
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
|
JP5244711B2
(en)
|
2008-06-30 |
2013-07-24 |
富士フイルム株式会社 |
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
|
JP5997873B2
(en)
|
2008-06-30 |
2016-09-28 |
富士フイルム株式会社 |
Photosensitive composition and pattern forming method using the same
|
JP5746818B2
(en)
|
2008-07-09 |
2015-07-08 |
富士フイルム株式会社 |
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
|
JP5383133B2
(en)
|
2008-09-19 |
2014-01-08 |
富士フイルム株式会社 |
Ink composition, ink jet recording method, and method for producing printed product
|
ATE541905T1
(en)
|
2008-09-26 |
2012-02-15 |
Fujifilm Corp |
INK COMPOSITION AND INK RECORDING METHOD
|
JP5461809B2
(en)
|
2008-09-29 |
2014-04-02 |
富士フイルム株式会社 |
Ink composition and inkjet recording method
|
ATE526322T1
(en)
|
2008-12-12 |
2011-10-15 |
Fujifilm Corp |
POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR PRODUCING THE LACTONE-CONTAINING COMPOUND AND POLYMERIZABLE COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
|
JP2010235911A
(en)
|
2009-03-11 |
2010-10-21 |
Konica Minolta Ij Technologies Inc |
Active energy ray curable ink-jet ink, ink-jet recording method, and printed matter
|
JP5585112B2
(en)
*
|
2009-04-01 |
2014-09-10 |
Jsr株式会社 |
Radiation-sensitive resin composition, interlayer insulating film and method for forming the same
|
JP5964007B2
(en)
|
2009-04-02 |
2016-08-03 |
コニカミノルタ株式会社 |
Active energy ray-curable inkjet ink, inkjet recording method, and printed matter
|
JP5783687B2
(en)
|
2009-06-23 |
2015-09-24 |
住友化学株式会社 |
Resin and resist composition
|
CN102002121A
(en)
|
2009-08-31 |
2011-04-06 |
住友化学株式会社 |
Resin, resist composition and method for producing resist pattern
|
JP2011074365A
(en)
|
2009-09-02 |
2011-04-14 |
Sumitomo Chemical Co Ltd |
Compound, resin, resist composition and manufacturing method of resist pattern
|
US9063414B2
(en)
|
2010-07-28 |
2015-06-23 |
Sumitomo Chemical Company, Limited |
Photoresist composition
|
TWI521302B
(en)
|
2010-08-30 |
2016-02-11 |
住友化學股份有限公司 |
Resist composition and method for producing resist pattern
|
JP2012087294A
(en)
|
2010-09-21 |
2012-05-10 |
Sumitomo Chemical Co Ltd |
Resin, resist composition, and manufacturing method of resist pattern
|
JP5824321B2
(en)
|
2010-10-26 |
2015-11-25 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5824320B2
(en)
|
2010-10-26 |
2015-11-25 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5879834B2
(en)
|
2010-11-15 |
2016-03-08 |
住友化学株式会社 |
Salt, resist composition and method for producing resist pattern
|
JP6088133B2
(en)
|
2010-12-15 |
2017-03-01 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6034025B2
(en)
|
2011-02-25 |
2016-11-30 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5829940B2
(en)
|
2011-02-25 |
2015-12-09 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6034026B2
(en)
|
2011-02-25 |
2016-11-30 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5829939B2
(en)
|
2011-02-25 |
2015-12-09 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5829941B2
(en)
|
2011-02-25 |
2015-12-09 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5898521B2
(en)
|
2011-02-25 |
2016-04-06 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5947053B2
(en)
|
2011-02-25 |
2016-07-06 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5947051B2
(en)
|
2011-02-25 |
2016-07-06 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5898520B2
(en)
|
2011-02-25 |
2016-04-06 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5934536B2
(en)
|
2011-04-07 |
2016-06-15 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6005964B2
(en)
|
2011-04-07 |
2016-10-12 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5852490B2
(en)
|
2011-04-07 |
2016-02-03 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6022788B2
(en)
|
2011-04-07 |
2016-11-09 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5977595B2
(en)
|
2011-07-19 |
2016-08-24 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5977593B2
(en)
|
2011-07-19 |
2016-08-24 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5912912B2
(en)
|
2011-07-19 |
2016-04-27 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5985898B2
(en)
|
2011-07-19 |
2016-09-06 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6130630B2
(en)
|
2011-07-19 |
2017-05-17 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5977594B2
(en)
|
2011-07-19 |
2016-08-24 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5996944B2
(en)
|
2011-07-19 |
2016-09-21 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP5990041B2
(en)
|
2011-07-19 |
2016-09-07 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6130631B2
(en)
|
2011-07-19 |
2017-05-17 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6013798B2
(en)
|
2011-07-19 |
2016-10-25 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6595255B2
(en)
|
2014-08-25 |
2019-10-23 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6541508B2
(en)
|
2014-08-25 |
2019-07-10 |
住友化学株式会社 |
Salt, resin, resist composition and method for producing resist pattern
|
JP6507065B2
(en)
|
2014-08-25 |
2019-04-24 |
住友化学株式会社 |
Compound, resin, resist composition and method for producing resist pattern
|
JP6615536B2
(en)
|
2014-08-25 |
2019-12-04 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6596263B2
(en)
|
2014-08-25 |
2019-10-23 |
住友化学株式会社 |
Compound, resin, resist composition, and method for producing resist pattern
|
JP6576162B2
(en)
|
2014-08-25 |
2019-09-18 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6706891B2
(en)
|
2014-09-16 |
2020-06-10 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6706892B2
(en)
|
2014-09-16 |
2020-06-10 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6541525B2
(en)
|
2014-09-16 |
2019-07-10 |
住友化学株式会社 |
Resin, resist composition and method for producing resist pattern
|
US9996002B2
(en)
|
2014-09-16 |
2018-06-12 |
Sumitomo Chemical Company, Limited |
Resin, resist composition and method for producing resist pattern
|
JP6533724B2
(en)
|
2014-09-16 |
2019-06-19 |
住友化学株式会社 |
Resin, resist composition and method for producing resist pattern
|
JP6706890B2
(en)
|
2014-09-16 |
2020-06-10 |
住友化学株式会社 |
Resin, resist composition, and method for producing resist pattern
|
JP6688041B2
(en)
|
2014-11-11 |
2020-04-28 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6670591B2
(en)
|
2014-11-11 |
2020-03-25 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6585471B2
(en)
|
2014-11-11 |
2019-10-02 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP6684075B2
(en)
|
2014-11-11 |
2020-04-22 |
住友化学株式会社 |
Resin, resist composition, and method for producing resist pattern
|
JP6664932B2
(en)
|
2014-11-14 |
2020-03-13 |
住友化学株式会社 |
Resin, resist composition and method for producing resist pattern
|
JP6782070B2
(en)
|
2014-11-26 |
2020-11-11 |
住友化学株式会社 |
Method for manufacturing resist composition and resist pattern
|
JP6721319B2
(en)
|
2014-11-26 |
2020-07-15 |
住友化学株式会社 |
Nonionic compound, resin, resist composition, and method for producing resist pattern
|
JP6910108B2
(en)
|
2015-03-31 |
2021-07-28 |
住友化学株式会社 |
Method for manufacturing resin, resist composition and resist pattern
|
JP6761657B2
(en)
|
2015-03-31 |
2020-09-30 |
住友化学株式会社 |
Method for manufacturing resist composition and resist pattern
|
US10365560B2
(en)
|
2015-03-31 |
2019-07-30 |
Sumitomo Chemical Company, Limited |
Resist composition and method for producing resist pattern
|
JP6783540B2
(en)
|
2015-03-31 |
2020-11-11 |
住友化学株式会社 |
Method for manufacturing resist composition and resist pattern
|
JP6769735B2
(en)
|
2015-05-12 |
2020-10-14 |
住友化学株式会社 |
Method for producing salt, acid generator, resin, resist composition and resist pattern
|
JP6864994B2
(en)
|
2015-06-26 |
2021-04-28 |
住友化学株式会社 |
Resist composition
|
JP6782102B2
(en)
|
2015-06-26 |
2020-11-11 |
住友化学株式会社 |
Resist composition
|
JP6883954B2
(en)
|
2015-06-26 |
2021-06-09 |
住友化学株式会社 |
Resist composition
|
JP7042598B2
(en)
|
2016-12-14 |
2022-03-28 |
住友化学株式会社 |
Method for manufacturing resin, resist composition and resist pattern
|
JP6963979B2
(en)
|
2016-12-14 |
2021-11-10 |
住友化学株式会社 |
Method for manufacturing resin, resist composition and resist pattern
|
JP7020433B2
(en)
|
2017-02-08 |
2022-02-16 |
住友化学株式会社 |
Methods for Producing Compounds, Resins, Resist Compositions and Resist Patterns
|
JP7283883B2
(en)
|
2017-11-09 |
2023-05-30 |
住友化学株式会社 |
Salt, acid generator, resist composition and method for producing resist pattern
|
US11820735B2
(en)
|
2018-04-12 |
2023-11-21 |
Sumitomo Chemical Company, Limited |
Salt, acid generator, resist composition and method for producing resist pattern
|
US11378883B2
(en)
|
2018-04-12 |
2022-07-05 |
Sumitomo Chemical Company, Limited |
Salt, acid generator, resist composition and method for producing resist pattern
|
JP7269093B2
(en)
|
2018-05-29 |
2023-05-08 |
住友化学株式会社 |
Salt, acid generator, resist composition and method for producing resist pattern
|
JP2020029451A
(en)
|
2018-08-17 |
2020-02-27 |
住友化学株式会社 |
Salt, acid generator, resist composition and manufacturing method of resist pattern
|
JP7341787B2
(en)
|
2018-08-27 |
2023-09-11 |
住友化学株式会社 |
Resin, resist composition, and method for producing resist pattern
|
JP7389622B2
(en)
|
2018-11-20 |
2023-11-30 |
住友化学株式会社 |
Salt, quencher, resist composition, and method for producing resist pattern
|
JP7471828B2
(en)
|
2019-01-18 |
2024-04-22 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|
JP7412186B2
(en)
|
2019-01-18 |
2024-01-12 |
住友化学株式会社 |
Resin, resist composition, and method for producing resist pattern
|
BE1027107B1
(en)
|
2019-03-25 |
2021-02-15 |
Sumitomo Chemical Co |
COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR THE PRODUCTION OF PHOTORESIST PATTERNS
|
JP2020189830A
(en)
|
2019-05-17 |
2020-11-26 |
住友化学株式会社 |
Salt, quencher, resist composition, and method for producing resist pattern
|
JP2020200310A
(en)
|
2019-06-04 |
2020-12-17 |
住友化学株式会社 |
Salt, quencher, resist composition and method for producing resist pattern
|
JP2020200311A
(en)
|
2019-06-04 |
2020-12-17 |
住友化学株式会社 |
Salt, quencher, resist composition and method for producing resist pattern and method for producing salt
|
JP2021038204A
(en)
|
2019-08-29 |
2021-03-11 |
住友化学株式会社 |
Salt, quencher, resist composition and method for producing resist pattern
|
JP2021038203A
(en)
|
2019-08-29 |
2021-03-11 |
住友化学株式会社 |
Salt, quencher, resist composition and method for producing resist pattern
|
JP2021130807A
(en)
|
2019-12-18 |
2021-09-09 |
住友化学株式会社 |
Resin, resist composition, method for producing resist pattern, and compound
|
JP2021123580A
(en)
|
2020-02-06 |
2021-08-30 |
住友化学株式会社 |
Carboxylate, carboxylic acid generator, resist composition, and method for producing resist pattern
|
JP2021123579A
(en)
|
2020-02-06 |
2021-08-30 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
US11740555B2
(en)
|
2020-03-05 |
2023-08-29 |
Sumitomo Chemical Company, Limited |
Resist composition and method for producing resist pattern
|
US11681220B2
(en)
|
2020-03-05 |
2023-06-20 |
Sumitomo Chemical Company, Limited |
Resist composition and method for producing resist pattern
|
US11675267B2
(en)
|
2020-03-23 |
2023-06-13 |
Sumitomo Chemical Company, Limited |
Resist composition and method for producing resist pattern
|
TW202146383A
(en)
|
2020-04-22 |
2021-12-16 |
日商住友化學股份有限公司 |
Salt, acid generator, resist composition and method for producing resist pattern
|
JP2021181429A
(en)
|
2020-05-15 |
2021-11-25 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2021181431A
(en)
|
2020-05-15 |
2021-11-25 |
住友化学株式会社 |
Carboxylate, quencher, resist composition, and method for producing resist pattern
|
TW202202476A
(en)
|
2020-05-21 |
2022-01-16 |
日商住友化學股份有限公司 |
Salt, acid generator, resist composition, and manufacturing method of resist pattern Capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same
|
JP2021188041A
(en)
|
2020-06-01 |
2021-12-13 |
住友化学株式会社 |
Compound, resin, resist composition, and method for producing resist pattern
|
TW202215157A
(en)
|
2020-06-01 |
2022-04-16 |
日商住友化學股份有限公司 |
Compound, resin, resist composition and method for producing resist pattern
|
JP2022008152A
(en)
|
2020-06-25 |
2022-01-13 |
住友化学株式会社 |
Salt, acid generator, resist composition and method for producing resist pattern
|
JP2022013736A
(en)
|
2020-07-01 |
2022-01-18 |
住友化学株式会社 |
Salt, acid generator, resist composition and production method of resist pattern
|
JP2022075556A
(en)
|
2020-11-06 |
2022-05-18 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2022077505A
(en)
|
2020-11-11 |
2022-05-23 |
住友化学株式会社 |
Carboxylate, resist composition, and method for producing resist pattern
|
JP2022077982A
(en)
|
2020-11-12 |
2022-05-24 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2022123839A
(en)
|
2021-02-12 |
2022-08-24 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2022164585A
(en)
|
2021-04-15 |
2022-10-27 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2022164583A
(en)
|
2021-04-15 |
2022-10-27 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
US20230004084A1
(en)
|
2021-05-06 |
2023-01-05 |
Sumitomo Chemical Company, Limited |
Salt, acid generator, resist composition and method for producing resist pattern
|
JP2022183074A
(en)
|
2021-05-28 |
2022-12-08 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2022183077A
(en)
|
2021-05-28 |
2022-12-08 |
住友化学株式会社 |
Salt, acid generator, resist composition, and method for producing resist pattern
|
JP2023024363A
(en)
|
2021-08-06 |
2023-02-16 |
住友化学株式会社 |
Resist composition and method for producing resist pattern
|