GB8425489D0 - Microlithographical system - Google Patents

Microlithographical system

Info

Publication number
GB8425489D0
GB8425489D0 GB848425489A GB8425489A GB8425489D0 GB 8425489 D0 GB8425489 D0 GB 8425489D0 GB 848425489 A GB848425489 A GB 848425489A GB 8425489 A GB8425489 A GB 8425489A GB 8425489 D0 GB8425489 D0 GB 8425489D0
Authority
GB
United Kingdom
Prior art keywords
microlithographical
microlithographical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB848425489A
Other versions
GB2148017A (en
GB2148017B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPX Corp
Original Assignee
General Signal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/378,370 external-priority patent/US4425037A/en
Priority claimed from GB08232136A external-priority patent/GB2121552B/en
Application filed by General Signal Corp filed Critical General Signal Corp
Publication of GB8425489D0 publication Critical patent/GB8425489D0/en
Publication of GB2148017A publication Critical patent/GB2148017A/en
Application granted granted Critical
Publication of GB2148017B publication Critical patent/GB2148017B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB08425489A 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer Expired GB2148017B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US26417181A 1981-05-15 1981-05-15
US26424981A 1981-05-15 1981-05-15
US06/378,370 US4425037A (en) 1981-05-15 1982-05-14 Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB08232136A GB2121552B (en) 1981-05-15 1982-05-17 Apparatus for projecting a series of images onto dies of a semiconductor wafer
PCT/US1982/000668 WO1982004133A1 (en) 1981-05-15 1982-05-17 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Publications (3)

Publication Number Publication Date
GB8425489D0 true GB8425489D0 (en) 1984-11-14
GB2148017A GB2148017A (en) 1985-05-22
GB2148017B GB2148017B (en) 1986-04-09

Family

ID=27449406

Family Applications (2)

Application Number Title Priority Date Filing Date
GB08425489A Expired GB2148017B (en) 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer
GB08425488A Expired GB2146454B (en) 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB08425488A Expired GB2146454B (en) 1981-05-15 1984-10-09 Apparatus for projecting a series of images onto dies of a semiconductor wafer

Country Status (1)

Country Link
GB (2) GB2148017B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
GB2347227A (en) * 1995-12-11 2000-08-30 Hyundai Electronics Ind Apparatus for light exposure in making thin film transistors
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (en) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Objective lens for microlithography projection with crystal elements

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB688067A (en) * 1949-10-11 1953-02-25 Optische Ind De Oude Delft Nv Improvements in or relating to optical systems comprising two reflecting spherical surfaces
NL6503242A (en) * 1965-03-15 1966-09-16
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system

Also Published As

Publication number Publication date
GB2146454B (en) 1986-04-16
GB2148017A (en) 1985-05-22
GB2148017B (en) 1986-04-09
GB8425488D0 (en) 1984-11-14
GB2146454A (en) 1985-04-17

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19920517