GB2437887A - Exposure apparatus and device manufacturing method - Google Patents

Exposure apparatus and device manufacturing method

Info

Publication number
GB2437887A
GB2437887A GB0715924A GB0715924A GB2437887A GB 2437887 A GB2437887 A GB 2437887A GB 0715924 A GB0715924 A GB 0715924A GB 0715924 A GB0715924 A GB 0715924A GB 2437887 A GB2437887 A GB 2437887A
Authority
GB
United Kingdom
Prior art keywords
exposure apparatus
mask
device manufacturing
light source
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB0715924A
Other versions
GB2437887B (en
GB0715924D0 (en
Inventor
Matsuro Sugita
Takao Yonehara
Takaaki Terashi
Toshihiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
American Safety Razor Co
Original Assignee
American Safety Razor Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Safety Razor Co filed Critical American Safety Razor Co
Priority claimed from PCT/US2006/004135 external-priority patent/WO2006086314A1/en
Publication of GB0715924D0 publication Critical patent/GB0715924D0/en
Publication of GB2437887A publication Critical patent/GB2437887A/en
Application granted granted Critical
Publication of GB2437887B publication Critical patent/GB2437887B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • AHUMAN NECESSITIES
    • A45HAND OR TRAVELLING ARTICLES
    • A45DHAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D27/00Shaving accessories
    • A45D27/22Containers or carriers for storing shaving appliances
    • A45D27/225Containers or carriers for storing shaving appliances for storing razor blade cartridges, e.g. after use
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26BHAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B21/00Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
    • B26B21/08Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor involving changeable blades
    • B26B21/14Safety razors with one or more blades arranged transversely to the handle
    • B26B21/22Safety razors with one or more blades arranged transversely to the handle involving several blades to be used simultaneously
    • B26B21/222Safety razors with one or more blades arranged transversely to the handle involving several blades to be used simultaneously with the blades moulded into, or attached to, a changeable unit
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26BHAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B21/00Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
    • B26B21/40Details or accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26BHAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B21/00Razors of the open or knife type; Safety razors or other shaving implements of the planing type; Hair-trimming devices involving a razor-blade; Equipment therefor
    • B26B21/40Details or accessories
    • B26B21/52Handles, e.g. tiltable, flexible
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D25/00Details of other kinds or types of rigid or semi-rigid containers
    • B65D25/02Internal fittings
    • B65D25/10Devices to locate articles in containers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/7005Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/54Containers, packaging elements or packages, specially adapted for particular articles or materials for articles of special shape not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

This invention relates to an exposure apparatus which transfers a pattern of a mask onto a wafer. The exposure apparatus includes a master stage which holds the mask, and a light source which generates light to illuminate the mask. The light source includes a solid state device which emits light by spontaneous emission.
GB0715924A 2004-06-30 2005-06-29 Shaving system Expired - Fee Related GB2437887B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004194231A JP2006019412A (en) 2004-06-30 2004-06-30 Exposure device and manufacturing method of device
PCT/US2006/004135 WO2006086314A1 (en) 2005-02-07 2006-02-07 Yoke style razor connector assembly

Publications (3)

Publication Number Publication Date
GB0715924D0 GB0715924D0 (en) 2007-09-26
GB2437887A true GB2437887A (en) 2007-11-07
GB2437887B GB2437887B (en) 2010-07-14

Family

ID=35782934

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0715924A Expired - Fee Related GB2437887B (en) 2004-06-30 2005-06-29 Shaving system

Country Status (4)

Country Link
JP (1) JP2006019412A (en)
GB (1) GB2437887B (en)
TW (1) TW200615709A (en)
WO (1) WO2006004135A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5361239B2 (en) * 2008-04-09 2013-12-04 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP5316783B2 (en) * 2008-05-15 2013-10-16 株式会社リコー Surface emitting laser element, surface emitting laser array, optical scanning device, and image forming apparatus
JP2010093094A (en) * 2008-10-09 2010-04-22 U-Vix Corp Ultraviolet irradiation device for photocuring
JP5345443B2 (en) * 2009-04-21 2013-11-20 株式会社日立ハイテクノロジーズ Exposure apparatus, exposure light irradiation method, and display panel substrate manufacturing method
JP5121783B2 (en) 2009-06-30 2013-01-16 株式会社日立ハイテクノロジーズ LED light source, manufacturing method thereof, exposure apparatus using LED light source, and exposure method
CN102369484B (en) * 2010-02-05 2015-05-20 恩斯克科技有限公司 Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate
CN102483587B (en) * 2010-07-22 2014-11-05 恩斯克科技有限公司 Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method
JP5799306B2 (en) * 2010-07-22 2015-10-21 株式会社ブイ・テクノロジー Method of controlling light irradiation apparatus for exposure apparatus and exposure method
WO2012011497A1 (en) * 2010-07-22 2012-01-26 Nskテクノロジー株式会社 Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method
JP5895100B2 (en) 2012-05-22 2016-03-30 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. Cutting head for hair cutting device
JP6057072B2 (en) * 2013-03-22 2017-01-11 ウシオ電機株式会社 Light source device
KR101532352B1 (en) * 2013-10-30 2015-06-29 주식회사 인피테크 LED light source apparatus for exposure resist and management system for the same
JP7202142B2 (en) * 2018-10-30 2023-01-11 キヤノン株式会社 Cooling device, light source device, exposure device, and article manufacturing method
JP2021043343A (en) * 2019-09-11 2021-03-18 株式会社ブイ・テクノロジー Illumination apparatus for proximity exposure apparatus, proximity exposure apparatus, and exposure method for proximity exposure apparatus
JP7340167B2 (en) * 2020-01-21 2023-09-07 株式会社ニコン Illumination optical system, exposure equipment, and device manufacturing method

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334803A (en) * 1995-06-07 1996-12-17 Nikon Corp Uv laser beam source
JPH09148658A (en) * 1995-11-29 1997-06-06 Nikon Corp Laser ray source
JPH09246648A (en) * 1996-03-13 1997-09-19 Nikon Corp Laser beam source and illuminating optical device
JP2002033255A (en) * 2000-07-14 2002-01-31 Nikon Corp Aligner and illuminator
JP2004039871A (en) * 2002-07-03 2004-02-05 Hitachi Ltd Illuminating method, exposure method and equipment for the methods
JP2004146793A (en) * 2002-08-30 2004-05-20 Nichia Chem Ind Ltd Semiconductor-laser light source for exposure
JP2004253758A (en) * 2002-12-27 2004-09-09 Nikon Corp Illuminating light source unit, aligner, and exposure method
JP2004335952A (en) * 2002-12-27 2004-11-25 Nikon Corp Illumination light source, lighting system, exposure device, and exposure method
JP2004335937A (en) * 2002-11-25 2004-11-25 Nikon Corp Method for manufacturing aligner light source unit, aligner, exposure method and adjusting method for same
JP2004335953A (en) * 2002-11-25 2004-11-25 Nikon Corp Aligner and exposure method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4785534A (en) * 1987-12-07 1988-11-22 The Gillette Company Razor
US5518114A (en) * 1994-07-28 1996-05-21 The Gillette Company Cartridge dispenser
US5784790A (en) * 1996-04-10 1998-07-28 The Gillette Company Shaving razor and method
KR100352838B1 (en) * 2000-06-24 2002-09-16 주식회사 도루코 Shaver
US7200942B2 (en) * 2001-03-28 2007-04-10 Eveready Battery Company, Inc. Safety razor with pivot point shift from center to guard-bar under applied load

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334803A (en) * 1995-06-07 1996-12-17 Nikon Corp Uv laser beam source
JPH09148658A (en) * 1995-11-29 1997-06-06 Nikon Corp Laser ray source
JPH09246648A (en) * 1996-03-13 1997-09-19 Nikon Corp Laser beam source and illuminating optical device
JP2002033255A (en) * 2000-07-14 2002-01-31 Nikon Corp Aligner and illuminator
JP2004039871A (en) * 2002-07-03 2004-02-05 Hitachi Ltd Illuminating method, exposure method and equipment for the methods
JP2004146793A (en) * 2002-08-30 2004-05-20 Nichia Chem Ind Ltd Semiconductor-laser light source for exposure
JP2004335937A (en) * 2002-11-25 2004-11-25 Nikon Corp Method for manufacturing aligner light source unit, aligner, exposure method and adjusting method for same
JP2004335953A (en) * 2002-11-25 2004-11-25 Nikon Corp Aligner and exposure method
JP2004253758A (en) * 2002-12-27 2004-09-09 Nikon Corp Illuminating light source unit, aligner, and exposure method
JP2004335952A (en) * 2002-12-27 2004-11-25 Nikon Corp Illumination light source, lighting system, exposure device, and exposure method

Also Published As

Publication number Publication date
GB2437887B (en) 2010-07-14
GB0715924D0 (en) 2007-09-26
WO2006004135A1 (en) 2006-01-12
TW200615709A (en) 2006-05-16
JP2006019412A (en) 2006-01-19

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20210207