GB2189493B - Self-developing resist - Google Patents

Self-developing resist

Info

Publication number
GB2189493B
GB2189493B GB8708265A GB8708265A GB2189493B GB 2189493 B GB2189493 B GB 2189493B GB 8708265 A GB8708265 A GB 8708265A GB 8708265 A GB8708265 A GB 8708265A GB 2189493 B GB2189493 B GB 2189493B
Authority
GB
United Kingdom
Prior art keywords
self
developing resist
resist
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8708265A
Other versions
GB8708265D0 (en
GB2189493A (en
Inventor
James C W Chien
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of GB8708265D0 publication Critical patent/GB8708265D0/en
Publication of GB2189493A publication Critical patent/GB2189493A/en
Application granted granted Critical
Publication of GB2189493B publication Critical patent/GB2189493B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2/00—Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
    • C08G2/18—Copolymerisation of aldehydes or ketones
    • C08G2/20—Copolymerisation of aldehydes or ketones with other aldehydes or ketones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB8708265A 1986-04-11 1987-04-07 Self-developing resist Expired - Lifetime GB2189493B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85060686A 1986-04-11 1986-04-11

Publications (3)

Publication Number Publication Date
GB8708265D0 GB8708265D0 (en) 1987-05-13
GB2189493A GB2189493A (en) 1987-10-28
GB2189493B true GB2189493B (en) 1990-12-19

Family

ID=25308620

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8708265A Expired - Lifetime GB2189493B (en) 1986-04-11 1987-04-07 Self-developing resist

Country Status (2)

Country Link
JP (1) JPS6311932A (en)
GB (1) GB2189493B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5292689A (en) * 1992-09-04 1994-03-08 International Business Machines Corporation Method for planarizing semiconductor structure using subminimum features
JP2007279459A (en) * 2006-04-07 2007-10-25 Asahi Kasei Corp Refractive index control thin film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB960047A (en) * 1961-11-15 1964-06-10 Grace W R & Co Process for reducing the molecular weight of polyoxymethylene
EP0096895A2 (en) * 1982-06-16 1983-12-28 Hitachi, Ltd. Positive type radiation-sensitive organic highpolymer material and method of forming fine pattern by using the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3021599A1 (en) * 1980-06-09 1981-12-24 Hoechst Ag, 6000 Frankfurt 2- (HALOGENMETHYL-PHENYL) -4-HALOGENOXAZOL DERIVATIVES, A METHOD FOR THE PRODUCTION THEREOF AND MEASURES CONTAINING THE RADIATION-SENSITIVITY
DE3021590A1 (en) * 1980-06-09 1981-12-17 Hoechst Ag, 6000 Frankfurt 4-HALOGEN-5- (HALOGENMETHYL-PHENYL) -OXAZOLE DERIVATIVES, A METHOD FOR THE PRODUCTION THEREOF AND THEIR RADIO-SENSITIVE MEASURES
JPS58219736A (en) * 1982-06-16 1983-12-21 Hitachi Ltd Manufacture of relief structure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB960047A (en) * 1961-11-15 1964-06-10 Grace W R & Co Process for reducing the molecular weight of polyoxymethylene
EP0096895A2 (en) * 1982-06-16 1983-12-28 Hitachi, Ltd. Positive type radiation-sensitive organic highpolymer material and method of forming fine pattern by using the same

Also Published As

Publication number Publication date
JPS6311932A (en) 1988-01-19
GB8708265D0 (en) 1987-05-13
GB2189493A (en) 1987-10-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19950407