GB2111530B - Selective electro plating or etching process - Google Patents

Selective electro plating or etching process

Info

Publication number
GB2111530B
GB2111530B GB08136888A GB8136888A GB2111530B GB 2111530 B GB2111530 B GB 2111530B GB 08136888 A GB08136888 A GB 08136888A GB 8136888 A GB8136888 A GB 8136888A GB 2111530 B GB2111530 B GB 2111530B
Authority
GB
United Kingdom
Prior art keywords
etching process
electro plating
selective electro
selective
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08136888A
Other versions
GB2111530A (en
Inventor
Miles Patrick Drake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB08136888A priority Critical patent/GB2111530B/en
Publication of GB2111530A publication Critical patent/GB2111530A/en
Application granted granted Critical
Publication of GB2111530B publication Critical patent/GB2111530B/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/026Electroplating of selected surface areas using locally applied jets of electrolyte
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20Electroplating using ultrasonics, vibrations
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/625Discontinuous layers, e.g. microcracked layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/02Etching
    • C25F3/14Etching locally

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
GB08136888A 1981-12-08 1981-12-08 Selective electro plating or etching process Expired GB2111530B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08136888A GB2111530B (en) 1981-12-08 1981-12-08 Selective electro plating or etching process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08136888A GB2111530B (en) 1981-12-08 1981-12-08 Selective electro plating or etching process

Publications (2)

Publication Number Publication Date
GB2111530A GB2111530A (en) 1983-07-06
GB2111530B true GB2111530B (en) 1985-07-03

Family

ID=10526428

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08136888A Expired GB2111530B (en) 1981-12-08 1981-12-08 Selective electro plating or etching process

Country Status (1)

Country Link
GB (1) GB2111530B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109778189A (en) * 2019-03-14 2019-05-21 杭州电子科技大学 A kind of auxiliary manufactures the device and method of metal porous foil

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5409594A (en) * 1993-11-23 1995-04-25 Dynamotive Corporation Ultrasonic agitator
GB2316366A (en) * 1996-08-16 1998-02-25 Rolls Royce Plc Apparatus for chemically machining or etching metal components uses acid jets for agitation
DE10259365A1 (en) 2002-04-08 2003-10-30 Siemens Ag Device and method for removing surface areas of a component
EP1890004A1 (en) 2006-08-08 2008-02-20 Siemens Aktiengesellschaft Method for the production of a deposited layer from recycled layer material
FR2940324B1 (en) * 2008-12-19 2012-04-27 Centre Nat Rech Scient METHOD OF SELECTIVELY MASKING A SUBSTRATE DURING AN ELECTRO POLYMERIZATION PROCESS
CN103255452B (en) * 2013-05-03 2016-02-24 中国人民解放军装甲兵工程学院 A kind of selective metal electric deposition device and application thereof
CN109487088B (en) * 2019-01-14 2020-08-04 东北大学 Method for gradient recovery of metal from waste copper-based nickel-gold plating piece
CN109468641B (en) * 2019-01-14 2020-11-24 东北大学 Method for chemically-physically removing copper and copper-zinc alloy based silver coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109778189A (en) * 2019-03-14 2019-05-21 杭州电子科技大学 A kind of auxiliary manufactures the device and method of metal porous foil

Also Published As

Publication number Publication date
GB2111530A (en) 1983-07-06

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee