GB2082339B - Lithographic printing plates and method for processing - Google Patents

Lithographic printing plates and method for processing

Info

Publication number
GB2082339B
GB2082339B GB8123907A GB8123907A GB2082339B GB 2082339 B GB2082339 B GB 2082339B GB 8123907 A GB8123907 A GB 8123907A GB 8123907 A GB8123907 A GB 8123907A GB 2082339 B GB2082339 B GB 2082339B
Authority
GB
United Kingdom
Prior art keywords
processing
lithographic printing
printing plates
plates
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8123907A
Other versions
GB2082339A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horsell Graphic Industries Ltd
Original Assignee
Horsell Graphic Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horsell Graphic Industries Ltd filed Critical Horsell Graphic Industries Ltd
Priority to GB8123907A priority Critical patent/GB2082339B/en
Publication of GB2082339A publication Critical patent/GB2082339A/en
Application granted granted Critical
Publication of GB2082339B publication Critical patent/GB2082339B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
GB8123907A 1980-08-05 1981-08-05 Lithographic printing plates and method for processing Expired GB2082339B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8123907A GB2082339B (en) 1980-08-05 1981-08-05 Lithographic printing plates and method for processing

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8025448 1980-08-05
GB8123907A GB2082339B (en) 1980-08-05 1981-08-05 Lithographic printing plates and method for processing

Publications (2)

Publication Number Publication Date
GB2082339A GB2082339A (en) 1982-03-03
GB2082339B true GB2082339B (en) 1985-06-12

Family

ID=26276446

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8123907A Expired GB2082339B (en) 1980-08-05 1981-08-05 Lithographic printing plates and method for processing

Country Status (1)

Country Link
GB (1) GB2082339B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6218083B1 (en) 1997-07-05 2001-04-17 Kodak Plychrome Graphics, Llc Pattern-forming methods
US6485890B2 (en) 1996-04-23 2002-11-26 Kodak Polychrome Graphics, Llc Lithographic printing forms

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8203521A (en) * 1982-09-10 1984-04-02 Philips Nv METHOD FOR MANUFACTURING AN APPARATUS
DE3325022A1 (en) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES
DE3325023A1 (en) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES
IT1169682B (en) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp COMPOSITION FOR PHOTOS REPRODUCTIONS
EP0196031A3 (en) * 1985-03-22 1987-12-23 Fuji Photo Film Co., Ltd. Light-sensitive compositions and light-sensitive materials
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
US5256522A (en) * 1985-08-12 1993-10-26 Hoechst Celanese Corporation Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5217840A (en) * 1985-08-12 1993-06-08 Hoechst Celanese Corporation Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
US4929536A (en) * 1985-08-12 1990-05-29 Hoechst Celanese Corporation Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
DE3711264A1 (en) * 1987-04-03 1988-10-13 Hoechst Ag LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3711263A1 (en) * 1987-04-03 1988-10-13 Hoechst Ag LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF AND METHOD FOR THE PRODUCTION OF PRINTING FORMS
DE3716848A1 (en) * 1987-05-20 1988-12-01 Hoechst Ag METHOD FOR IMAGING LIGHT-SENSITIVE MATERIALS
DE3725949A1 (en) * 1987-08-05 1989-02-16 Hoechst Ag LIGHT SENSITIVE MIXTURE, LIGHT SENSITIVE COPY MATERIAL MADE THEREOF AND METHOD FOR PRODUCING NEGATIVE RELIEF COPIES
DE3837500A1 (en) * 1988-11-04 1990-05-23 Hoechst Ag NEW RADIATION-SENSITIVE COMPOUNDS, MADE BY THIS RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL
DE3940911A1 (en) * 1989-12-12 1991-06-13 Hoechst Ag PROCESS FOR PRODUCING NEGATIVE COPIES
DE4004719A1 (en) * 1990-02-15 1991-08-22 Hoechst Ag RADIATION-SENSITIVE MIXTURE, RADIATION-RECESSED RECORDING MATERIAL PRODUCED HEREOF AND METHOD FOR PRODUCING CROSS-REFERENCES
US5340699A (en) * 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
EP0672954B1 (en) 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
US5466557A (en) * 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
US5491046A (en) * 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
GB2317457B (en) * 1995-08-15 1999-05-26 Horsell Graphic Ind Ltd Heat-sensitive composition and method of making a lithographic printing form with it
JP3814961B2 (en) 1996-08-06 2006-08-30 三菱化学株式会社 Positive photosensitive printing plate
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US6399279B1 (en) 1998-01-16 2002-06-04 Mitsubishi Chemical Corporation Method for forming a positive image
DE69925053T2 (en) 1998-02-04 2006-03-02 Mitsubishi Chemical Corp. Positive-working photosensitive composition, photosensitive printing plate and method for producing a positive image
US6143479A (en) * 1999-08-31 2000-11-07 Kodak Polychrome Graphics Llc Developing system for alkaline-developable lithographic printing plates
DE10307521A1 (en) 2003-02-21 2004-09-09 Kodak Polychrome Graphics Gmbh Heat sensitive positive working lithographic printing plate runner with high chemical resistance
DE10347682B4 (en) 2003-10-14 2007-11-29 Kodak Polychrome Graphics Gmbh Process for the preparation of two-layer thermosensitive imageable elements
DE602005000609T2 (en) 2004-03-16 2007-11-29 Fujifilm Corp. Positive-working photosensitive composition
DE102004029501A1 (en) 2004-06-18 2006-01-12 Kodak Polychrome Graphics Gmbh Modified polymers and their use in the preparation of lithographic printing plate precursors
EP1747899B1 (en) 2005-07-28 2008-07-16 Eastman Kodak Company Double-layer infrared-sensitive imageable elements with polysiloxane toplayer
EP1747900B1 (en) 2005-07-28 2008-07-02 Eastman Kodak Company IR-sensitive positive working lithographic printing plate precursor
WO2007017162A2 (en) 2005-08-05 2007-02-15 Kodak Graphic Communications Gmbh Dual-layer heat- sensitive imageable elements with a polyvinyl acetal top layer
EP1849600B1 (en) 2006-04-25 2013-12-11 Eastman Kodak Company Bakeable radiation-sensitive elements with a high resistance to chemicals
EP1884359A1 (en) 2006-08-04 2008-02-06 Eastman Kodak Company Dual-layer heat-sensitive imageable elements with phosphorous containing polymers in the top layer
JP2008311474A (en) * 2007-06-15 2008-12-25 Fujifilm Corp Method of forming pattern

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6485890B2 (en) 1996-04-23 2002-11-26 Kodak Polychrome Graphics, Llc Lithographic printing forms
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6218083B1 (en) 1997-07-05 2001-04-17 Kodak Plychrome Graphics, Llc Pattern-forming methods
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates

Also Published As

Publication number Publication date
GB2082339A (en) 1982-03-03

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20000805