GB201006567D0 - High density plasma source - Google Patents
High density plasma sourceInfo
- Publication number
- GB201006567D0 GB201006567D0 GBGB1006567.0A GB201006567A GB201006567D0 GB 201006567 D0 GB201006567 D0 GB 201006567D0 GB 201006567 A GB201006567 A GB 201006567A GB 201006567 D0 GB201006567 D0 GB 201006567D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- high density
- plasma source
- density plasma
- source
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1006567.0A GB201006567D0 (en) | 2010-04-20 | 2010-04-20 | High density plasma source |
PCT/GB2011/000519 WO2011131921A1 (en) | 2010-04-20 | 2011-04-05 | High density plasma source |
TW100113530A TW201145349A (en) | 2010-04-20 | 2011-04-19 | High density plasma source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB1006567.0A GB201006567D0 (en) | 2010-04-20 | 2010-04-20 | High density plasma source |
Publications (1)
Publication Number | Publication Date |
---|---|
GB201006567D0 true GB201006567D0 (en) | 2010-06-02 |
Family
ID=42245475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB1006567.0A Ceased GB201006567D0 (en) | 2010-04-20 | 2010-04-20 | High density plasma source |
Country Status (3)
Country | Link |
---|---|
GB (1) | GB201006567D0 (en) |
TW (1) | TW201145349A (en) |
WO (1) | WO2011131921A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6010406B2 (en) * | 2012-01-27 | 2016-10-19 | 東京エレクトロン株式会社 | Microwave radiation mechanism, microwave plasma source, and surface wave plasma processing apparatus |
GB2576541A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
GB2576542A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
GB2576545A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
GB2576540A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
GB2576547A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | A method |
GB2576539A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | A method |
GB2576543A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
GB2576546A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
GB2576544A (en) * | 2018-08-23 | 2020-02-26 | Dyson Technology Ltd | An apparatus |
US11255016B2 (en) * | 2019-10-04 | 2022-02-22 | Mks Instruments, Inc. | Microwave magnetron with constant anodic impedance and systems using the same |
GB2588949B (en) * | 2019-11-15 | 2022-09-07 | Dyson Technology Ltd | Method and apparatus for sputter deposition |
GB2588935B (en) * | 2019-11-15 | 2022-09-07 | Dyson Technology Ltd | Method and apparatus for sputter deposition of target material to a substrate |
GB2588941B (en) * | 2019-11-15 | 2022-08-17 | Dyson Technology Ltd | Method of depositing a material |
GB2588937B (en) * | 2019-11-15 | 2023-01-04 | Dyson Technology Ltd | Sputter deposition |
GB2588946B (en) * | 2019-11-15 | 2022-08-17 | Dyson Technology Ltd | Method of manufacturing crystalline material from different materials |
GB2588948A (en) | 2019-11-15 | 2021-05-19 | Dyson Technology Ltd | A method of manufacturing solid state battery cathodes for use in batteries |
GB2588945B (en) * | 2019-11-15 | 2024-04-17 | Dyson Technology Ltd | Method of depositing material on a substrate |
GB2588947B (en) | 2019-11-15 | 2024-02-21 | Dyson Technology Ltd | A method of manufacturing solid state battery cathodes for use in batteries |
GB2590614B (en) * | 2019-12-16 | 2022-09-28 | Dyson Technology Ltd | Method and apparatus for use in generating plasma |
GB2590613B (en) * | 2019-12-16 | 2023-06-07 | Dyson Technology Ltd | Method and apparatus for use in generating plasma |
GB2590612A (en) * | 2019-12-16 | 2021-07-07 | Dyson Technology Ltd | Method and apparatus for use in generating plasma |
GB2599393A (en) | 2020-09-30 | 2022-04-06 | Dyson Technology Ltd | Method and apparatus for sputter deposition |
GB2599392B (en) * | 2020-09-30 | 2024-01-03 | Dyson Technology Ltd | Sputter deposition apparatus and method |
CN116815152A (en) * | 2023-07-11 | 2023-09-29 | 安徽立光电子材料股份有限公司 | Continuous vacuum deposition coating equipment |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4990229A (en) * | 1989-06-13 | 1991-02-05 | Plasma & Materials Technologies, Inc. | High density plasma deposition and etching apparatus |
US5122251A (en) * | 1989-06-13 | 1992-06-16 | Plasma & Materials Technologies, Inc. | High density plasma deposition and etching apparatus |
US6083363A (en) * | 1997-07-02 | 2000-07-04 | Tokyo Electron Limited | Apparatus and method for uniform, low-damage anisotropic plasma processing |
GB2343992B (en) | 1998-11-20 | 2001-06-20 | Michael John Thwaites | High density plasmas |
WO2001063981A1 (en) | 2000-02-24 | 2001-08-30 | Ccr Gmbh Beschichtungstechno Logie | High frequency plasma source |
US6463873B1 (en) | 2000-04-04 | 2002-10-15 | Plasma Quest Limited | High density plasmas |
-
2010
- 2010-04-20 GB GBGB1006567.0A patent/GB201006567D0/en not_active Ceased
-
2011
- 2011-04-05 WO PCT/GB2011/000519 patent/WO2011131921A1/en active Application Filing
- 2011-04-19 TW TW100113530A patent/TW201145349A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2011131921A1 (en) | 2011-10-27 |
TW201145349A (en) | 2011-12-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB201006567D0 (en) | High density plasma source | |
EP2600714A4 (en) | Materials for disinfection produced by non-thermal plasma | |
GB201001051D0 (en) | Optical sources | |
EP2561540A4 (en) | Improved ion source | |
ZA201404102B (en) | Lamp powering technology | |
EP2521202A4 (en) | Power source | |
TWI561292B (en) | Plasma torch | |
ZA201200480B (en) | Non-networked messaging | |
EP2779803A4 (en) | Plasma generation device | |
EP2748843A4 (en) | Susceptor | |
EP2672105A4 (en) | Plasma generation device | |
EP2707598A4 (en) | Plasma micro-thruster | |
EP2790472A4 (en) | Plasma generator | |
EP2592911A4 (en) | Plasma-generating apparatus | |
EP2788762A4 (en) | Graphene-biomolecule bioelectronic devices | |
EP2672103A4 (en) | Plasma generation device | |
EP2739764A4 (en) | Ion source | |
SG11201504651QA (en) | Plasma source | |
SG2014007694A (en) | Radiation source | |
GB201420134D0 (en) | High fidelity restriction endonucleses | |
GB0900411D0 (en) | Plasma source electrode | |
HK1186293A1 (en) | Plasma light source | |
GB201407307D0 (en) | Plasma generating device | |
GB201316178D0 (en) | Plasma source | |
EP2728133A4 (en) | Plasma generation device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |