GB1539192A - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
GB1539192A
GB1539192A GB3366/75A GB336675A GB1539192A GB 1539192 A GB1539192 A GB 1539192A GB 3366/75 A GB3366/75 A GB 3366/75A GB 336675 A GB336675 A GB 336675A GB 1539192 A GB1539192 A GB 1539192A
Authority
GB
United Kingdom
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3366/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Priority to GB3366/75A priority Critical patent/GB1539192A/en
Priority to IE91/76A priority patent/IE42402B1/en
Priority to NZ179793A priority patent/NZ179793A/en
Priority to BE163691A priority patent/BE837782A/en
Priority to IT19557/76A priority patent/IT1068132B/en
Priority to DE2602574A priority patent/DE2602574C2/en
Priority to AU10536/76A priority patent/AU500898B2/en
Priority to NL7600760A priority patent/NL7600760A/en
Priority to FR7602044A priority patent/FR2298558A1/en
Priority to SE7600771A priority patent/SE431990B/en
Priority to DK32176*#A priority patent/DK32176A/en
Priority to ZA760429A priority patent/ZA76429B/en
Priority to JP51007863A priority patent/JPS5929850B2/en
Publication of GB1539192A publication Critical patent/GB1539192A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/912—Polymers modified by chemical after-treatment derived from hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
GB3366/75A 1975-01-27 1975-01-27 Photopolymerisable compositions Expired GB1539192A (en)

Priority Applications (13)

Application Number Priority Date Filing Date Title
GB3366/75A GB1539192A (en) 1975-01-27 1975-01-27 Photopolymerisable compositions
IE91/76A IE42402B1 (en) 1975-01-27 1976-01-16 Photopolymerisable compositions
NZ179793A NZ179793A (en) 1975-01-27 1976-01-20 Photopolymerisation of acid-polymerisable or acid curable material in the presence of an iodonium salt
BE163691A BE837782A (en) 1975-01-27 1976-01-21 PHOTOPOLYMERISABLE COMPOSITIONS
IT19557/76A IT1068132B (en) 1975-01-27 1976-01-23 PHOTOPOLYMERIZABLE COMPOSITIONS
DE2602574A DE2602574C2 (en) 1975-01-27 1976-01-23 Photopolymerizable compositions
AU10536/76A AU500898B2 (en) 1975-01-27 1976-01-23 Photopolymerisable composition with iodonium salt catalyst
NL7600760A NL7600760A (en) 1975-01-27 1976-01-26 PROCESS FOR THE PREPARATION OF A PHOTOPOLYMERIZABLE MATERIAL AND ARTICLES MADE BY USE OF THE MATERIAL SO PREPARED.
FR7602044A FR2298558A1 (en) 1975-01-27 1976-01-26 PHOTOPOLYMERISABLE COMPOSITIONS
SE7600771A SE431990B (en) 1975-01-27 1976-01-26 POLYMER PRODUCT FOR USE AS COVERING OR ADHESIVE AND PHOTOPOLYMERIZABLE COMPOSITION FOR MANUFACTURING THE POLYMER PRODUCT
DK32176*#A DK32176A (en) 1975-01-27 1976-01-27 PHOTOPOLYMERIZABLE MATERIALS
ZA760429A ZA76429B (en) 1975-01-27 1976-01-27 Photopolymerisable compositions
JP51007863A JPS5929850B2 (en) 1975-01-27 1976-01-27 Photopolymerizable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3366/75A GB1539192A (en) 1975-01-27 1975-01-27 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
GB1539192A true GB1539192A (en) 1979-01-31

Family

ID=9756970

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3366/75A Expired GB1539192A (en) 1975-01-27 1975-01-27 Photopolymerisable compositions

Country Status (13)

Country Link
JP (1) JPS5929850B2 (en)
AU (1) AU500898B2 (en)
BE (1) BE837782A (en)
DE (1) DE2602574C2 (en)
DK (1) DK32176A (en)
FR (1) FR2298558A1 (en)
GB (1) GB1539192A (en)
IE (1) IE42402B1 (en)
IT (1) IT1068132B (en)
NL (1) NL7600760A (en)
NZ (1) NZ179793A (en)
SE (1) SE431990B (en)
ZA (1) ZA76429B (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US5151341A (en) * 1989-12-12 1992-09-29 Kim Son N Radiation-sensitive mixture and production of relief structures
US5274060A (en) * 1991-03-01 1993-12-28 Ciba-Geigy Corporation Copolymers crosslinkable by acid catalysis
US5286600A (en) * 1991-08-27 1994-02-15 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern by means thereof
US5292614A (en) * 1991-08-02 1994-03-08 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern
US5558978A (en) * 1993-12-21 1996-09-24 Ocg Microelectronic Materials, Inc. Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
US6204350B1 (en) 1997-03-14 2001-03-20 3M Innovative Properties Company Cure-on-demand, moisture-curable compositions having reactive silane functionality
US6855748B1 (en) 1999-09-16 2005-02-15 Huntsman Advanced Materials Americas, Inc. UV-curable compositions
EP1978408A1 (en) 2007-03-29 2008-10-08 FUJIFILM Corporation Negative resist composition and pattern forming method using the same
WO2009063824A1 (en) 2007-11-14 2009-05-22 Fujifilm Corporation Method of drying coating film and process for producing lithographic printing plate precursor
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
WO2013015121A1 (en) 2011-07-27 2013-01-31 富士フイルム株式会社 Photosensitive composition, master plate for planographic printing plate, polyurethane, and method for producing polyurethane
WO2021124114A1 (en) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516352A (en) 1974-05-02 1978-07-05 Gen Electric Halonium salts
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
GB2027435B (en) * 1977-12-16 1982-11-24 Gen Electric Curable resin compositions
CA1164710A (en) * 1978-05-09 1984-04-03 Edward J. Reardon, Jr. Phototropic photosensitive compositions containing fluoran colorformer
DE2966584D1 (en) * 1978-10-27 1984-03-01 Ici Plc Polymerisable compositions, derived coatings and other polymerised products
DE2854011C2 (en) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Thermosetting composition and process for its manufacture
DE3029247C2 (en) * 1979-08-03 1996-04-11 Gen Electric UV-curable silicone coating compositions, process for their preparation and their use
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4336366A (en) * 1980-02-29 1982-06-22 Ciba-Geigy Corporation Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
DE3107087A1 (en) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "PHOTOPOLYMERIZABLE MIXTURES AND METHOD FOR PHOTOPOLYMERISATION OF CATIONICALLY POLYMERIZABLE COMPOUNDS"
JPS6076735A (en) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078442A (en) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078443A (en) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol Photo-insoluble resin composition
JPS60206328A (en) * 1984-03-30 1985-10-17 Matsushita Electric Ind Co Ltd High frequency circuit device
CA1289803C (en) * 1985-10-28 1991-10-01 Robert J. Cox Photoresist composition and printed circuit boards and packages made therewith
US4689289A (en) * 1986-04-30 1987-08-25 General Electric Company Block polymer compositions
JP2565331B2 (en) * 1987-04-20 1996-12-18 富士写真フイルム株式会社 Photosensitive composition
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
FR3105231B1 (en) * 2019-12-18 2021-12-10 Photon Polymers PHOTORADICAL PROCESS FOR CURING AN ALKYD RESIN

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1516352A (en) 1974-05-02 1978-07-05 Gen Electric Halonium salts

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US5151341A (en) * 1989-12-12 1992-09-29 Kim Son N Radiation-sensitive mixture and production of relief structures
US5274060A (en) * 1991-03-01 1993-12-28 Ciba-Geigy Corporation Copolymers crosslinkable by acid catalysis
US5292614A (en) * 1991-08-02 1994-03-08 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern
US5286600A (en) * 1991-08-27 1994-02-15 Mitsubishi Kasei Corporation Negative photosensitive composition and method for forming a resist pattern by means thereof
US5558978A (en) * 1993-12-21 1996-09-24 Ocg Microelectronic Materials, Inc. Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both
US6204350B1 (en) 1997-03-14 2001-03-20 3M Innovative Properties Company Cure-on-demand, moisture-curable compositions having reactive silane functionality
US6855748B1 (en) 1999-09-16 2005-02-15 Huntsman Advanced Materials Americas, Inc. UV-curable compositions
US7202286B2 (en) 1999-09-16 2007-04-10 Huntsman Advanced Materials Americas Inc. UV-curable compositions
EP1978408A1 (en) 2007-03-29 2008-10-08 FUJIFILM Corporation Negative resist composition and pattern forming method using the same
WO2009063824A1 (en) 2007-11-14 2009-05-22 Fujifilm Corporation Method of drying coating film and process for producing lithographic printing plate precursor
EP2105690A2 (en) 2008-03-26 2009-09-30 Fujifilm Corporation Method and apparatus for drying
WO2013015121A1 (en) 2011-07-27 2013-01-31 富士フイルム株式会社 Photosensitive composition, master plate for planographic printing plate, polyurethane, and method for producing polyurethane
WO2021124114A1 (en) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

Also Published As

Publication number Publication date
DE2602574C2 (en) 1983-04-21
SE7600771L (en) 1976-07-28
NL7600760A (en) 1976-07-29
FR2298558A1 (en) 1976-08-20
SE431990B (en) 1984-03-12
ZA76429B (en) 1977-09-28
IE42402L (en) 1976-07-27
IT1068132B (en) 1985-03-21
IE42402B1 (en) 1980-07-30
AU1053676A (en) 1977-08-11
DE2602574A1 (en) 1976-07-29
DK32176A (en) 1976-07-28
NZ179793A (en) 1978-04-03
JPS51100716A (en) 1976-09-06
FR2298558B1 (en) 1980-05-30
AU500898B2 (en) 1979-06-07
BE837782A (en) 1976-07-22
JPS5929850B2 (en) 1984-07-24

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Legal Events

Date Code Title Description
PS Patent sealed
48R Reference inserted (sect. 8/1949)
SP Amendment (slips) printed
PCNP Patent ceased through non-payment of renewal fee