GB1390711A - Image-forming process employing a polyene/polythiol composition - Google Patents

Image-forming process employing a polyene/polythiol composition

Info

Publication number
GB1390711A
GB1390711A GB1912673A GB1912673A GB1390711A GB 1390711 A GB1390711 A GB 1390711A GB 1912673 A GB1912673 A GB 1912673A GB 1912673 A GB1912673 A GB 1912673A GB 1390711 A GB1390711 A GB 1390711A
Authority
GB
United Kingdom
Prior art keywords
polyene
radical generating
radiation
compositions
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1912673A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co Conn
WR Grace and Co
Original Assignee
WR Grace and Co Conn
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co Conn, WR Grace and Co filed Critical WR Grace and Co Conn
Priority to GB1912673A priority Critical patent/GB1390711A/en
Publication of GB1390711A publication Critical patent/GB1390711A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/50—Chemical modification of a polymer wherein the polymer is a copolymer and the modification is taking place only on one or more of the monomers present in minority

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

1390711 Radiation curable compositions W R GRACE & CO 19 April 1973 19126/73 Heading C3P [Also in Division G2] Compositions curable by a free-radical generating agent, preferably free-radical generating radiation, comprise (1) a solid polyene having at least 5 recurring units of the structure and (2) a polythiol containing at least 2 thiol groups per molecule, the weight ratio of components (1) and (2) being from 1 : 0À1 to 1 : 0À8. The polyene is obtained by semi-esterifying a methyl vinyl ether/maleic anhydride copolymer with either allyl alcohol or trimethylolpropane diallyl ether. Preferred polythiols are poly- (thioglycolate) and poly-(#-mercaptopropionate) esters of polyhydric alcohols such as ethylene glycol, trimethylolpropane, pentaerythritol, tris- (hydroxyethyl) isocyanurate and polypropylene glycol. The free-radical generating radiation may be visible or ultra-violet light (wavelength 2000-7000Š) or high energy ionizing radiation. The compositions are particularly useful in photo-resist applications and for this purpose may include a photo-curing accelerator such as benzophenone or acetophenone.
GB1912673A 1973-04-19 1973-04-19 Image-forming process employing a polyene/polythiol composition Expired GB1390711A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1912673A GB1390711A (en) 1973-04-19 1973-04-19 Image-forming process employing a polyene/polythiol composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1912673A GB1390711A (en) 1973-04-19 1973-04-19 Image-forming process employing a polyene/polythiol composition

Publications (1)

Publication Number Publication Date
GB1390711A true GB1390711A (en) 1975-04-16

Family

ID=10124188

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1912673A Expired GB1390711A (en) 1973-04-19 1973-04-19 Image-forming process employing a polyene/polythiol composition

Country Status (1)

Country Link
GB (1) GB1390711A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4415651A (en) 1981-03-30 1983-11-15 E. I. Du Pont De Nemours And Company Aqueous processable, positive-working photopolymer compositions
US4415652A (en) 1982-01-04 1983-11-15 E. I. Du Pont De Nemours & Co. Aqueous processable, positive-working photopolymer compositions
EP0218248A2 (en) * 1985-10-09 1987-04-15 Ernst Mühlbauer KG Compounds containing polymerizable acids and acid derivatives, compositions containing them and their use
US7794751B2 (en) 2000-08-15 2010-09-14 Surmodics, Inc. Medicament incorporation matrix
CN111077732A (en) * 2019-12-20 2020-04-28 深圳市华星光电半导体显示技术有限公司 Material composition of light coupling-out lens and manufacturing method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4415651A (en) 1981-03-30 1983-11-15 E. I. Du Pont De Nemours And Company Aqueous processable, positive-working photopolymer compositions
US4415652A (en) 1982-01-04 1983-11-15 E. I. Du Pont De Nemours & Co. Aqueous processable, positive-working photopolymer compositions
EP0218248A2 (en) * 1985-10-09 1987-04-15 Ernst Mühlbauer KG Compounds containing polymerizable acids and acid derivatives, compositions containing them and their use
EP0218248A3 (en) * 1985-10-09 1990-05-16 Ernst Mühlbauer KG Compounds containing polymerizable acids and acid derivatives, compositions containing them and their use
US7794751B2 (en) 2000-08-15 2010-09-14 Surmodics, Inc. Medicament incorporation matrix
CN111077732A (en) * 2019-12-20 2020-04-28 深圳市华星光电半导体显示技术有限公司 Material composition of light coupling-out lens and manufacturing method thereof

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees