GB1329888A - Phenolic resin compositions containing it - Google Patents
Phenolic resin compositions containing itInfo
- Publication number
- GB1329888A GB1329888A GB4331271A GB4331271A GB1329888A GB 1329888 A GB1329888 A GB 1329888A GB 4331271 A GB4331271 A GB 4331271A GB 4331271 A GB4331271 A GB 4331271A GB 1329888 A GB1329888 A GB 1329888A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazide
- sulphonyl chloride
- hcho
- benzoquinone
- sept
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
1329888 Phenolic-resin KONISHIROKU PHOTO INDUSTRY CO Ltd 16 Sept 1971 [16 Sept 1970] 43312/71 Heading C3R [Also in Division G2] A condensation product is obtained by the reaction of (1) an alkaline insoluble or difficultly alkali-soluble p-substituted phenol-formaldehyde resin of the general formula wherein R represents an alkyl, aryl, alkoxy, sulphoalkyl, aryloxy, aralkyloxy, carboalkoxy, aralkyl or acetyl group; each of R 1 and R 2 are H, alkyl or alkoxy, n is at least 3, with (2) a sulphonyl chloride of o-benzoquinone-diazide or o-naphthoquinonediazide. In the examples resins (1) in which R 1 , R 2 are each H and R is CH 3 , t-butyl, phenyl, methoxy or carboxymethyl are condensed with (2) 1,2 benzoquinone-2- diazide-4-sulphonyl chloride, 1,2-naphthoquinone-2-diazide-5-sulphonyl chloride or 1,2- napthoquinone-2-diazide-4-sulphonyl chloride using dioxane as solvent, in the presence of Na 2 CO 3 or pyridine and maintaining the pH below 8. Light sensitive compositions can be prepared by dissolving the product and, optionally a phenol-HCHO or m-cresol-HCHO alkalinesoluble novolak resin in an organic solvent such as acetone, dioxane, methyl or ethyl "Cellosolve" (R.T.M.). A dye such as methyl violet may also be added. Uses.-Light-sensitive materials for printing plates.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8050570A JPS505083B1 (en) | 1970-09-16 | 1970-09-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1329888A true GB1329888A (en) | 1973-09-12 |
Family
ID=13720154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4331271A Expired GB1329888A (en) | 1970-09-16 | 1971-09-16 | Phenolic resin compositions containing it |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS505083B1 (en) |
DE (1) | DE2146167A1 (en) |
GB (1) | GB1329888A (en) |
Cited By (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3009873A1 (en) * | 1979-03-16 | 1980-09-25 | Daicel Chem | PHOTO SENSITIVE DIMENSIONS |
US4306010A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate |
US4306011A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive composite and photosensitive lithographic printing plate |
US4407926A (en) | 1980-11-21 | 1983-10-04 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom |
EP0168065A1 (en) * | 1984-05-18 | 1986-01-15 | Rütgerswerke Aktiengesellschaft | Binders hardening by irradiation and process for preparing flat articles |
US4632900A (en) * | 1984-03-07 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface |
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
US4681923A (en) * | 1985-03-02 | 1987-07-21 | Ciba-Geigy Corporation | Modified quinone-diazide group-containing phenolic novolak resins |
US4839253A (en) * | 1984-12-01 | 1989-06-13 | Ciba-Geigy Corporation | Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group |
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
EP0780730A2 (en) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Positive-type light-sensitive lithographic printing plate |
EP1640173A1 (en) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1690685A2 (en) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1705004A1 (en) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1925447A1 (en) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Image forming material |
EP2036721A1 (en) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042310A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
EP2042305A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042308A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042306A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor and method of producing a copolymer used therein |
WO2009063824A1 (en) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | Method of drying coating film and process for producing lithographic printing plate precursor |
EP2105690A2 (en) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Method and apparatus for drying |
EP2106907A2 (en) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2161129A2 (en) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Photosensitive lithographic printing plate precursor for infrared laser |
EP2236293A2 (en) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Lithographic printing plate precursor |
WO2011037005A1 (en) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Lithographic printing original plate |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
EP2641738A2 (en) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Method of producing planographic printing plate and planographic printing plate |
EP2644379A1 (en) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Method of producing a planographic printing plate |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5635854B2 (en) * | 1973-08-03 | 1981-08-20 | ||
JPS5723253B2 (en) * | 1974-03-25 | 1982-05-18 | ||
DE2847878A1 (en) * | 1978-11-04 | 1980-05-22 | Hoechst Ag | LIGHT SENSITIVE MIXTURE |
EP0070624B1 (en) * | 1981-06-22 | 1986-11-20 | Philip A. Hunt Chemical Corporation | Novolak resin and a positive photoresist composition containing the same |
JPS5988734A (en) * | 1982-11-12 | 1984-05-22 | Fuji Photo Film Co Ltd | Photosensitive composition |
-
1970
- 1970-09-16 JP JP8050570A patent/JPS505083B1/ja active Pending
-
1971
- 1971-09-15 DE DE19712146167 patent/DE2146167A1/en active Pending
- 1971-09-16 GB GB4331271A patent/GB1329888A/en not_active Expired
Cited By (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3009873A1 (en) * | 1979-03-16 | 1980-09-25 | Daicel Chem | PHOTO SENSITIVE DIMENSIONS |
US4308368A (en) * | 1979-03-16 | 1981-12-29 | Daicel Chemical Industries Ltd. | Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide |
US4306010A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate |
US4306011A (en) * | 1979-06-16 | 1981-12-15 | Konishiroku Photo Industry Co., Ltd. | Photosensitive composite and photosensitive lithographic printing plate |
US4407926A (en) | 1980-11-21 | 1983-10-04 | Hoechst Aktiengesellschaft | Light-sensitive mixture comprising O-naphthoquinone-diazides and light sensitive copying material prepared therefrom |
US4632900A (en) * | 1984-03-07 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface |
EP0168065A1 (en) * | 1984-05-18 | 1986-01-15 | Rütgerswerke Aktiengesellschaft | Binders hardening by irradiation and process for preparing flat articles |
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
US4839253A (en) * | 1984-12-01 | 1989-06-13 | Ciba-Geigy Corporation | Photosensitive and electrodepositable phenolic resin with quinone diazide sulfonyloxy group |
US4681923A (en) * | 1985-03-02 | 1987-07-21 | Ciba-Geigy Corporation | Modified quinone-diazide group-containing phenolic novolak resins |
EP0565006A2 (en) | 1992-04-06 | 1993-10-13 | Fuji Photo Film Co., Ltd. | Method for preparing PS plate |
EP0713143A2 (en) | 1994-11-18 | 1996-05-22 | Fuji Photo Film Co., Ltd. | Photosensitive planographic printing plate |
EP0780730A2 (en) | 1995-12-22 | 1997-06-25 | Fuji Photo Film Co., Ltd. | Positive-type light-sensitive lithographic printing plate |
EP2381312A2 (en) | 2000-08-25 | 2011-10-26 | Fujifilm Corporation | Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate |
EP2036721A1 (en) | 2000-11-30 | 2009-03-18 | FUJIFILM Corporation | Planographic printing plate precursor |
EP1925447A1 (en) | 2002-09-17 | 2008-05-28 | FUJIFILM Corporation | Image forming material |
EP1640173A1 (en) | 2004-09-27 | 2006-03-29 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1690685A2 (en) | 2005-02-09 | 2006-08-16 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP1705004A1 (en) | 2005-03-22 | 2006-09-27 | Fuji Photo Film Co., Ltd. | Planographic printing plate precursor |
EP2042310A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042340A2 (en) | 2007-09-27 | 2009-04-01 | Fujifilm Corporation | Lithographic printing plate surface protective agent and platemaking method for lithographic printing plate |
EP2042308A2 (en) | 2007-09-27 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042305A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2042306A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Planographic printing plate precursor and method of producing a copolymer used therein |
WO2009063824A1 (en) | 2007-11-14 | 2009-05-22 | Fujifilm Corporation | Method of drying coating film and process for producing lithographic printing plate precursor |
EP2105690A2 (en) | 2008-03-26 | 2009-09-30 | Fujifilm Corporation | Method and apparatus for drying |
EP2106907A2 (en) | 2008-04-02 | 2009-10-07 | FUJIFILM Corporation | Planographic printing plate precursor |
EP2161129A2 (en) | 2008-09-09 | 2010-03-10 | Fujifilm Corporation | Photosensitive lithographic printing plate precursor for infrared laser |
EP2236293A2 (en) | 2009-03-31 | 2010-10-06 | FUJIFILM Corporation | Lithographic printing plate precursor |
WO2011037005A1 (en) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Lithographic printing original plate |
EP2641738A2 (en) | 2012-03-23 | 2013-09-25 | Fujifilm Corporation | Method of producing planographic printing plate and planographic printing plate |
EP2644379A1 (en) | 2012-03-30 | 2013-10-02 | FUJIFILM Corporation | Method of producing a planographic printing plate |
Also Published As
Publication number | Publication date |
---|---|
JPS505083B1 (en) | 1975-02-28 |
DE2146167A1 (en) | 1972-03-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |