GB1257015A - - Google Patents
Info
- Publication number
- GB1257015A GB1257015A GB1257015DA GB1257015A GB 1257015 A GB1257015 A GB 1257015A GB 1257015D A GB1257015D A GB 1257015DA GB 1257015 A GB1257015 A GB 1257015A
- Authority
- GB
- United Kingdom
- Prior art keywords
- evaporant
- discharge
- plasma
- electrode
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1,257,015. Plasma discharge apparatus. G. V. PLANER Ltd. 31 Jan., 1969 [3 Nov., 1967; 14 Feb., 1968], Nos. 50051/67 and 7163/68. Heading H5H. [Also in Division C7] A vacuum evaporation coating process in which a conductive, semi-conductive or insulating evaporant enclosed by an electrode having at least one hole for directing the evaporant towards the substrate is initially heated at a pressure not lower than 10<SP>-3</SP> torr and an electric discharge generated in the evaporant plasma is then the sole heating source for maintaining the evaporation. The evaporant may be initially heated by electron beam, resistance, R.F. or an ionizable gas may be introduced between the discharge electrodes to provide an initial plasma. This initial heating source is removed once the evaporant plasma discharge is generated. The substrate may be a metal plate or strip such as steel on a plastics film. Al or Zn may be evaporated and coated on the steel strip moving past the evaporant source. The evaporant 2 in a hearth 1 is connected to an electrode 5 and connected to a D.C. source 10 and surrounded by a spherical Ta electrode 3 with an aperture 4 opposite the substrate 9. The chamber is pumped down to a pressure not less than 10<SP>-3</SP> torr and initial heating is effected by electrons generated from a heated cathode 8. The high P.D. between electrodes 5 and 3 generates a discharge in the evaporant plasma and evaporation is continued without the electron beam. Alternative arrangements disclose an electron gun outside the chamber instead of cathode 8; an elongated trough for the evaporant supported within a cylindrical electrode; two electrodes of the evaporant with an adjustable gap between them for generating the discharge; a central anode coated with the evaporant and surrounded by an electron filament and a cylindrical cathode.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB5005167 | 1967-11-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1257015A true GB1257015A (en) | 1971-12-15 |
Family
ID=10454465
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1257015D Expired GB1257015A (en) | 1967-11-03 | 1967-11-03 |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1257015A (en) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4351855A (en) * | 1981-02-24 | 1982-09-28 | Eduard Pinkhasov | Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum |
GB2139648A (en) * | 1983-05-13 | 1984-11-14 | Wedtech Corp | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase |
GB2159540A (en) * | 1984-05-25 | 1985-12-04 | Wedtech Corp | Apparatus and methods for coating substrates |
GB2202237A (en) * | 1987-03-12 | 1988-09-21 | Vac Tec Syst | Cathodic arc plasma deposition of hard coatings |
GB2223032A (en) * | 1988-09-27 | 1990-03-28 | Leybold Ag | Apparatus for applying dielectric or metallic materials to a substrate |
GB2261226A (en) * | 1991-11-08 | 1993-05-12 | Univ Hull | Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD |
US5216690A (en) * | 1992-03-11 | 1993-06-01 | Hanks Charles W | Electron beam gun with grounded shield to prevent arc down |
EP1372897A2 (en) * | 2001-03-28 | 2004-01-02 | CPFilms, Inc. | Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
US20140216343A1 (en) | 2008-08-04 | 2014-08-07 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US9721764B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
US10586685B2 (en) | 2014-12-05 | 2020-03-10 | Agc Glass Europe | Hollow cathode plasma source |
US10755901B2 (en) | 2014-12-05 | 2020-08-25 | Agc Flat Glass North America, Inc. | Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces |
-
1967
- 1967-11-03 GB GB1257015D patent/GB1257015A/en not_active Expired
Cited By (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4609564A (en) * | 1981-02-24 | 1986-09-02 | Wedtech Corp. | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase |
US4351855A (en) * | 1981-02-24 | 1982-09-28 | Eduard Pinkhasov | Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum |
GB2156384A (en) * | 1981-02-24 | 1985-10-09 | Wedtech Corp | Apparatus for vapour deposition by arc discharge |
FR2545839A1 (en) * | 1983-05-13 | 1984-11-16 | Wedtech Corp | METHOD AND APPARATUS FOR COATING A SUBSTRATE WITH MATERIAL ELECTRICALLY TRANSFORMED INTO THE GASEOUS PHASE |
GB2139648A (en) * | 1983-05-13 | 1984-11-14 | Wedtech Corp | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapour phase |
GB2159540A (en) * | 1984-05-25 | 1985-12-04 | Wedtech Corp | Apparatus and methods for coating substrates |
GB2167774A (en) * | 1984-05-25 | 1986-06-04 | Wedtech Corp | Apparatus and methods for coating substrates with metal coatings |
GB2202237A (en) * | 1987-03-12 | 1988-09-21 | Vac Tec Syst | Cathodic arc plasma deposition of hard coatings |
GB2223032A (en) * | 1988-09-27 | 1990-03-28 | Leybold Ag | Apparatus for applying dielectric or metallic materials to a substrate |
US5070811A (en) * | 1988-09-27 | 1991-12-10 | Albert Feuerstein | Apparatus for applying dielectric or metallic materials |
GB2261226A (en) * | 1991-11-08 | 1993-05-12 | Univ Hull | Deposition of non-conductive material using D.C. biased, thermionically enhanced, plasma assisted PVD |
GB2261226B (en) * | 1991-11-08 | 1994-10-26 | Univ Hull | Deposition of non-conductive material |
US5216690A (en) * | 1992-03-11 | 1993-06-01 | Hanks Charles W | Electron beam gun with grounded shield to prevent arc down |
USRE35024E (en) * | 1992-03-11 | 1995-08-22 | Hanks; Charles W. | Electron beam gun with grounded shield to prevent arc down |
DE4391006C2 (en) * | 1992-03-11 | 2002-10-17 | Charles W Hanks | electron beam gun |
EP1372897A4 (en) * | 2001-03-28 | 2007-04-25 | Cpfilms Inc | Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
EP1372897A2 (en) * | 2001-03-28 | 2004-01-02 | CPFilms, Inc. | Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source |
US10580625B2 (en) | 2008-08-04 | 2020-03-03 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US20140216343A1 (en) | 2008-08-04 | 2014-08-07 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US20150004330A1 (en) | 2008-08-04 | 2015-01-01 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US9478401B2 (en) | 2008-08-04 | 2016-10-25 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US10438778B2 (en) | 2008-08-04 | 2019-10-08 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US20150002021A1 (en) | 2008-08-04 | 2015-01-01 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US10580624B2 (en) | 2008-08-04 | 2020-03-03 | Agc Flat Glass North America, Inc. | Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition |
US11875976B2 (en) | 2014-12-05 | 2024-01-16 | Agc Flat Glass North America, Inc. | Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces |
US10755901B2 (en) | 2014-12-05 | 2020-08-25 | Agc Flat Glass North America, Inc. | Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces |
US10586685B2 (en) | 2014-12-05 | 2020-03-10 | Agc Glass Europe | Hollow cathode plasma source |
US20170309458A1 (en) | 2015-11-16 | 2017-10-26 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US10559452B2 (en) | 2015-11-16 | 2020-02-11 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US9721765B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
US9721764B2 (en) | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |