GB1214462A - Improvements in light sensitive materials - Google Patents

Improvements in light sensitive materials

Info

Publication number
GB1214462A
GB1214462A GB1120068A GB1120068A GB1214462A GB 1214462 A GB1214462 A GB 1214462A GB 1120068 A GB1120068 A GB 1120068A GB 1120068 A GB1120068 A GB 1120068A GB 1214462 A GB1214462 A GB 1214462A
Authority
GB
United Kingdom
Prior art keywords
alkylene
unexposed
acids
receiving sheet
mole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1120068A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB1493266A external-priority patent/GB1197182A/en
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Priority to GB1120068A priority Critical patent/GB1214462A/en
Priority to DE19671547794 priority patent/DE1547794A1/en
Publication of GB1214462A publication Critical patent/GB1214462A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0525—Patterning by phototackifying or by photopatterning adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0537—Transfer of pre-fabricated insulating pattern

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

1,214,462. Photo-sensitive materials. KODAK Ltd. (EASTMAN KODAK Ltd.). March 7, 1968 [Dec.7, 1966], No.11200/68. Divided out of 1,214,461. Heading G2C. A light-sensitive material comprises a supported layer of a polyester having a tackifying temperature of less than 30‹C, a crystallinity of 10-80% as determined by X-ray diffraction, and composed of 50 mole % of two dicarboxylic acid residues in which 5-45 mole % of the residues have the group -CH = CH-CO-. The acids may be reacted with dihydric alcohol and extensive lists of acids and alcohols are given; but preferred acids are derived from p-phenylene diacrylic acid or fumaric acid, and preferred dihydric alcohols are aliphatic α, #, - diols which may have the residue alkylene-O- alkylene, alkylene-O-cyclohexane-O-alkylene. The material is imagewise exposed to light and then uniformly heated and (i) the unexposed resin is transferred to a metal receiving sheet as in Specification 1,197,182 or to a receiving sheet to make multi-colour images as in 1,214,461 (ii) toned with pigments or dipped in a dye bath, or (iii) sprayed with a crazing solvent which promotes crystallization of the unexposed resin, or (iv) the exposed areas allowed to transparentize under the action of the heat. In the examples, the unexposed areas are transferred as above and (i) dusted with coloured toner, (ii) react with a coloured reactant present in the transfer sheet; the other reactant being present in the unexposed material on (iii) used as a lithographic plate if a hydrophilic receiving sheet is used.
GB1120068A 1966-04-04 1966-12-07 Improvements in light sensitive materials Expired GB1214462A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1120068A GB1214462A (en) 1966-04-04 1966-12-07 Improvements in light sensitive materials
DE19671547794 DE1547794A1 (en) 1966-04-04 1967-03-15 Thermophotographic material

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB1493266A GB1197182A (en) 1966-04-04 1966-04-04 Formation of Metal Patterns
GB2122066 1966-05-12
US59599866A 1966-11-21 1966-11-21
GB1120066 1966-12-07
GB1120068A GB1214462A (en) 1966-04-04 1966-12-07 Improvements in light sensitive materials

Publications (1)

Publication Number Publication Date
GB1214462A true GB1214462A (en) 1970-12-02

Family

ID=27516078

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1120068A Expired GB1214462A (en) 1966-04-04 1966-12-07 Improvements in light sensitive materials

Country Status (2)

Country Link
DE (1) DE1547794A1 (en)
GB (1) GB1214462A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5045432A (en) * 1990-07-17 1991-09-03 Eastman Kodak Company Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2000072C (en) * 1988-10-04 1997-03-18 Akihiro Mouri Image forming method and image forming medium
US20050026083A1 (en) * 2003-07-30 2005-02-03 Hannoch Ron Translucent polyester for enhancing contrast in lithographic printing members

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5045432A (en) * 1990-07-17 1991-09-03 Eastman Kodak Company Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates

Also Published As

Publication number Publication date
DE1547794A1 (en) 1970-01-08

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee