GB0005929D0 - Method of forming a masking pattern on a surface - Google Patents
Method of forming a masking pattern on a surfaceInfo
- Publication number
- GB0005929D0 GB0005929D0 GBGB0005929.5A GB0005929A GB0005929D0 GB 0005929 D0 GB0005929 D0 GB 0005929D0 GB 0005929 A GB0005929 A GB 0005929A GB 0005929 D0 GB0005929 D0 GB 0005929D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- forming
- masking pattern
- masking
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
- B41J11/00214—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
- B41J11/002—Curing or drying the ink on the copy materials, e.g. by heating or irradiating
- B41J11/0021—Curing or drying the ink on the copy materials, e.g. by heating or irradiating using irradiation
- B41J11/00218—Constructional details of the irradiation means, e.g. radiation source attached to reciprocating print head assembly or shutter means provided on the radiation source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0081—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1208—Pretreatment of the circuit board, e.g. modifying wetting properties; Patterning by using affinity patterns
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/006—Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/009—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using thermal means, e.g. infrared radiation, heat
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0094—Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4069—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020017015220A KR100760197B1 (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
JP2001516021A JP2003506886A (en) | 1999-05-27 | 2000-05-30 | Method of forming masking pattern on surface |
CA002375365A CA2375365A1 (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
US09/937,979 US6849308B1 (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
IL14660100A IL146601A0 (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
AU50904/00A AU5090400A (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
EP00935358A EP1163552B2 (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
DE60004798T DE60004798T3 (en) | 1999-05-27 | 2000-05-30 | Method for producing a mask on a surface |
PCT/GB2000/002077 WO2001011426A1 (en) | 1999-05-27 | 2000-05-30 | Method of forming a masking pattern on a surface |
AT00935358T ATE248388T1 (en) | 1999-05-27 | 2000-05-30 | METHOD FOR PRODUCING A MASK ON A SURFACE |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9912437A GB2350321A (en) | 1999-05-27 | 1999-05-27 | Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
GB0005929D0 true GB0005929D0 (en) | 2000-05-03 |
GB2352688A GB2352688A (en) | 2001-02-07 |
Family
ID=10854336
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9912437A Withdrawn GB2350321A (en) | 1999-05-27 | 1999-05-27 | Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition |
GB0005929A Withdrawn GB2352688A (en) | 1999-05-27 | 2000-03-10 | Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9912437A Withdrawn GB2350321A (en) | 1999-05-27 | 1999-05-27 | Method of forming a masking or spacer pattern on a substrate using inkjet droplet deposition |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR100760197B1 (en) |
GB (2) | GB2350321A (en) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002049051A2 (en) * | 2000-12-14 | 2002-06-20 | Kemet Electronics Corporation | Method of applying masking material |
US7189344B2 (en) * | 2001-03-12 | 2007-03-13 | Ivoclar Vivadent Ag | Method for producing a synthetic material part |
WO2002099850A2 (en) * | 2001-06-01 | 2002-12-12 | Litrex Corporation | Interchangeable microdeposition head apparatus and method |
DE10239002B4 (en) * | 2001-09-11 | 2007-04-12 | Heidelberger Druckmaschinen Ag | Inkjet printhead with drying device |
DE10149998C2 (en) * | 2001-10-11 | 2003-08-14 | Otb Oberflaechentechnik Berlin | Process and system for the selective electroplating of metal surfaces |
KR100475162B1 (en) * | 2002-05-09 | 2005-03-08 | 엘지.필립스 엘시디 주식회사 | Liquid Crystal Display and Method of Fabricating the same |
JP2004012902A (en) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | Plotting device and plotting method using the plotting device |
JP4519641B2 (en) | 2002-07-01 | 2010-08-04 | インカ・ディジタル・プリンターズ・リミテッド | Printing with ink |
GB2396331A (en) | 2002-12-20 | 2004-06-23 | Inca Digital Printers Ltd | Curing ink |
US7175712B2 (en) | 2003-01-09 | 2007-02-13 | Con-Trol-Cure, Inc. | Light emitting apparatus and method for curing inks, coatings and adhesives |
US7671346B2 (en) | 2003-01-09 | 2010-03-02 | Con-Trol-Cure, Inc. | Light emitting apparatus and method for curing inks, coatings and adhesives |
US7211299B2 (en) | 2003-01-09 | 2007-05-01 | Con-Trol-Cure, Inc. | UV curing method and apparatus |
US7137696B2 (en) | 2003-01-09 | 2006-11-21 | Con-Trol-Cure, Inc. | Ink jet UV curing |
US20040164325A1 (en) * | 2003-01-09 | 2004-08-26 | Con-Trol-Cure, Inc. | UV curing for ink jet printer |
ATE435589T1 (en) * | 2003-09-02 | 2009-07-15 | Pixdro Ltd | METHOD AND SYSTEM FOR CREATING FINE LINES USING INKJET TECHNOLOGY |
US9039401B2 (en) | 2006-02-27 | 2015-05-26 | Microcontinuum, Inc. | Formation of pattern replicating tools |
US9307648B2 (en) * | 2004-01-21 | 2016-04-05 | Microcontinuum, Inc. | Roll-to-roll patterning of transparent and metallic layers |
EP1706432A4 (en) * | 2004-01-23 | 2008-09-03 | Con Trol Cure Inc | Light emitting apparatus and method for curing inks, coatings and adhesives |
NL1026013C2 (en) * | 2004-04-23 | 2005-10-25 | Otb Group Bv | Method and device for accurately applying structures to a substrate. |
US7354845B2 (en) | 2004-08-24 | 2008-04-08 | Otb Group B.V. | In-line process for making thin film electronic devices |
DE102004036827B4 (en) * | 2004-07-29 | 2009-11-26 | Eastman Kodak Co. | microwave heating |
DE102004036826A1 (en) * | 2004-07-29 | 2006-03-23 | Eastman Kodak Co. | Microwave heating device with irradiation device |
JP4800324B2 (en) | 2004-12-30 | 2011-10-26 | フォーセン テクノロジー インク | Exposure equipment |
EP1777997A1 (en) * | 2005-10-18 | 2007-04-25 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | Method for preparing a conductive circuit device |
US20070238261A1 (en) * | 2006-04-05 | 2007-10-11 | Asml Netherlands B.V. | Device, lithographic apparatus and device manufacturing method |
US20070237899A1 (en) * | 2006-04-05 | 2007-10-11 | David Sawoska | Process for creating a pattern on a copper surface |
CN101461057A (en) * | 2006-06-05 | 2009-06-17 | 陶氏康宁公司 | Electronic package and method of preparing same |
US7674300B2 (en) | 2006-12-28 | 2010-03-09 | Kimberly-Clark Worldwide, Inc. | Process for dyeing a textile web |
US8182552B2 (en) | 2006-12-28 | 2012-05-22 | Kimberly-Clark Worldwide, Inc. | Process for dyeing a textile web |
US7740666B2 (en) | 2006-12-28 | 2010-06-22 | Kimberly-Clark Worldwide, Inc. | Process for dyeing a textile web |
US8551556B2 (en) * | 2007-11-20 | 2013-10-08 | Palo Alto Research Center Incorporated | Method for obtaining controlled sidewall profile in print-patterned structures |
US8632613B2 (en) | 2007-12-27 | 2014-01-21 | Kimberly-Clark Worldwide, Inc. | Process for applying one or more treatment agents to a textile web |
WO2010077132A1 (en) | 2008-12-31 | 2010-07-08 | Draka Comteq B.V. | Uvled apparatus for curing glass-fiber coatings |
DE102009008997B4 (en) | 2009-02-14 | 2011-04-07 | Ursula Blessing | Device for directing light rays |
WO2010105365A1 (en) * | 2009-03-18 | 2010-09-23 | Exfo Photonic Solutions Inc. | Distributed light sources for photo-reactive curing |
DK2388239T3 (en) | 2010-05-20 | 2017-04-24 | Draka Comteq Bv | Curing apparatus using angled UV LEDs |
US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
ES2435647T3 (en) | 2010-06-07 | 2013-12-20 | Luxexcel Holding B.V. | Method for printing optical structures |
EP2418183B1 (en) | 2010-08-10 | 2018-07-25 | Draka Comteq B.V. | Method for curing coated glass fibres providing increased UVLED intensitiy |
EP2474404B1 (en) | 2011-01-06 | 2014-12-03 | LUXeXcel Holding B.V. | Print head, upgrade kit for a conventional inkjet printer, printer and method for printing optical structures |
US8356879B1 (en) | 2011-09-09 | 2013-01-22 | Hewlett-Packard Development Company, L.P. | Nozzle plate cleaning |
US8573766B2 (en) | 2011-09-16 | 2013-11-05 | Lumen Dynamics Group Inc. | Distributed light sources and systems for photo-reactive curing |
US8916482B2 (en) | 2012-04-02 | 2014-12-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of making a lithography mask |
KR101386001B1 (en) * | 2012-06-25 | 2014-04-16 | 한국전기연구원 | Method for Manufacturing 3-Dimensional Micro-structure by Localized Flash Synthesis with Microwave Heating |
US9589797B2 (en) | 2013-05-17 | 2017-03-07 | Microcontinuum, Inc. | Tools and methods for producing nanoantenna electronic devices |
EP2937147B1 (en) * | 2014-04-22 | 2016-11-16 | AKK GmbH | Method with a stencil for structuring a surface by etching |
US20160311161A1 (en) * | 2015-04-23 | 2016-10-27 | Pixelteq, Inc. | Spectral gradient filter production using surface applied array optimized 3d shadow masks |
FR3052880B1 (en) * | 2016-06-21 | 2019-01-25 | H.E.F. | SYSTEM AND METHOD FOR MAKING AN OPTICAL MASK FOR SURFACE MICRO-TEXTURATION, INSTALLATION AND SURFACE MICRO-TEXTURING METHOD |
CN111902510B (en) | 2018-03-21 | 2022-07-15 | 3M创新有限公司 | High temperature resistant masking adhesive composition |
BR112021013770A2 (en) * | 2019-01-29 | 2021-09-21 | Henkel IP & Holding GmbH | CONTROLLED PRINTING SURFACE AND METHOD OF FORMING TOPOGRAPHIC FEATURES ON A CONTROLLED PRINTING SURFACE |
CN114832744B (en) * | 2022-05-31 | 2023-08-18 | 北京印刷学院 | Hydrogel-based liquid core microcapsule and preparation method and application thereof |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3728337A1 (en) * | 1987-08-25 | 1989-03-16 | Goerlitz Computerbau Gmbh | Method for producing etched printed circuit boards |
DE3740149A1 (en) * | 1987-11-26 | 1989-06-08 | Herbert Dr Strohwald | Method for producing a conductor pattern on a substrate |
US5132248A (en) * | 1988-05-31 | 1992-07-21 | The United States Of America As Represented By The United States Department Of Energy | Direct write with microelectronic circuit fabrication |
GB9403682D0 (en) * | 1994-02-25 | 1994-04-13 | Univ Edinburgh | Direct printing of etch masks under computer control |
JP2865578B2 (en) * | 1994-10-25 | 1999-03-08 | 富士通株式会社 | Method for forming resist pattern, printed wiring board obtained by the method, and apparatus for forming the same |
JP3529476B2 (en) * | 1995-03-02 | 2004-05-24 | 株式会社東芝 | Method for manufacturing color filter and liquid crystal display device |
JPH09219019A (en) * | 1996-02-13 | 1997-08-19 | Nippon Sheet Glass Co Ltd | Formation of texture on magnetic disk |
CA2306384A1 (en) * | 1997-10-14 | 1999-04-22 | Patterning Technologies Limited | Method of forming an electronic device |
AU4186699A (en) * | 1998-05-20 | 1999-12-06 | Intermec Ip Corp. | Method and apparatus for making electrical traces, circuits and devices |
-
1999
- 1999-05-27 GB GB9912437A patent/GB2350321A/en not_active Withdrawn
-
2000
- 2000-03-10 GB GB0005929A patent/GB2352688A/en not_active Withdrawn
- 2000-05-30 KR KR1020017015220A patent/KR100760197B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20020034083A (en) | 2002-05-08 |
GB2350321A (en) | 2000-11-29 |
GB2352688A (en) | 2001-02-07 |
KR100760197B1 (en) | 2007-09-20 |
GB9912437D0 (en) | 1999-07-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |