FR2983773B1 - PROCESS FOR PREPARING SURFACES - Google Patents

PROCESS FOR PREPARING SURFACES

Info

Publication number
FR2983773B1
FR2983773B1 FR1161423A FR1161423A FR2983773B1 FR 2983773 B1 FR2983773 B1 FR 2983773B1 FR 1161423 A FR1161423 A FR 1161423A FR 1161423 A FR1161423 A FR 1161423A FR 2983773 B1 FR2983773 B1 FR 2983773B1
Authority
FR
France
Prior art keywords
preparing
new process
preparing surfaces
grafted
hierarchical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1161423A
Other languages
French (fr)
Other versions
FR2983773A1 (en
Inventor
Christophe Navarro
Stephanie Magnet
Xavier Chevalier
Raluca Tiron
Christophe Couderc
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Arkema France SA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1161423A priority Critical patent/FR2983773B1/en
Application filed by Commissariat a lEnergie Atomique CEA, Arkema France SA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to US14/363,868 priority patent/US9527108B2/en
Priority to EP12810352.0A priority patent/EP2788442B1/en
Priority to CN201280069344.7A priority patent/CN104114655B/en
Priority to KR1020147018949A priority patent/KR101768296B1/en
Priority to ES12810352.0T priority patent/ES2585104T3/en
Priority to PT128103520T priority patent/PT2788442T/en
Priority to JP2014545335A priority patent/JP6021935B2/en
Priority to PCT/FR2012/052813 priority patent/WO2013083919A1/en
Priority to SG11201403044VA priority patent/SG11201403044VA/en
Priority to PL12810352T priority patent/PL2788442T3/en
Publication of FR2983773A1 publication Critical patent/FR2983773A1/en
Application granted granted Critical
Publication of FR2983773B1 publication Critical patent/FR2983773B1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
    • B05D3/107—Post-treatment of applied coatings
    • B05D3/108—Curing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/52—Two layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/56—Three layers or more
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
    • C09D125/02—Homopolymers or copolymers of hydrocarbons
    • C09D125/04—Homopolymers or copolymers of styrene
    • C09D125/08—Copolymers of styrene
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
    • C09D125/02—Homopolymers or copolymers of hydrocarbons
    • C09D125/04—Homopolymers or copolymers of styrene
    • C09D125/08—Copolymers of styrene
    • C09D125/14—Copolymers of styrene with unsaturated esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/02—Stable Free Radical Polymerisation [SFRP]; Nitroxide Mediated Polymerisation [NMP] for, e.g. using 2,2,6,6-tetramethylpiperidine-1-oxyl [TEMPO]

Abstract

L'invention concerne un nouveau procédé de préparation de surface utilisant une combinaison d'au moins deux polymères, distincts ou non, greffés de façon hiérarchique ou multiple sur une surface ainsi que l'utilisation de ce nouveau procédé de préparation, en particulier dans les applications de contrôle de l'énergie de surface d'un support. L'invention peut permettre de structurer un polymère à blocs avec un minimum de défauts.The invention relates to a new process for preparing a surface using a combination of at least two polymers, distinct or not, grafted in a hierarchical or multiple manner onto a surface, as well as the use of this new process for preparing, in particular in support surface energy control applications. The invention can make it possible to structure a block polymer with a minimum of defects.

FR1161423A 2011-12-09 2011-12-09 PROCESS FOR PREPARING SURFACES Expired - Fee Related FR2983773B1 (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
FR1161423A FR2983773B1 (en) 2011-12-09 2011-12-09 PROCESS FOR PREPARING SURFACES
PCT/FR2012/052813 WO2013083919A1 (en) 2011-12-09 2012-12-05 Method for preparing surfaces
CN201280069344.7A CN104114655B (en) 2011-12-09 2012-12-05 method for preparing surface
KR1020147018949A KR101768296B1 (en) 2011-12-09 2012-12-05 Method for preparing surfaces
ES12810352.0T ES2585104T3 (en) 2011-12-09 2012-12-05 Surface Preparation Procedure
PT128103520T PT2788442T (en) 2011-12-09 2012-12-05 Method for preparing surfaces
US14/363,868 US9527108B2 (en) 2011-12-09 2012-12-05 Method for preparing surfaces
EP12810352.0A EP2788442B1 (en) 2011-12-09 2012-12-05 Method for preparing surfaces
SG11201403044VA SG11201403044VA (en) 2011-12-09 2012-12-05 Method for preparing surfaces
PL12810352T PL2788442T3 (en) 2011-12-09 2012-12-05 Method for preparing surfaces
JP2014545335A JP6021935B2 (en) 2011-12-09 2012-12-05 How to make a surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1161423A FR2983773B1 (en) 2011-12-09 2011-12-09 PROCESS FOR PREPARING SURFACES

Publications (2)

Publication Number Publication Date
FR2983773A1 FR2983773A1 (en) 2013-06-14
FR2983773B1 true FR2983773B1 (en) 2014-10-24

Family

ID=45558295

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1161423A Expired - Fee Related FR2983773B1 (en) 2011-12-09 2011-12-09 PROCESS FOR PREPARING SURFACES

Country Status (11)

Country Link
US (1) US9527108B2 (en)
EP (1) EP2788442B1 (en)
JP (1) JP6021935B2 (en)
KR (1) KR101768296B1 (en)
CN (1) CN104114655B (en)
ES (1) ES2585104T3 (en)
FR (1) FR2983773B1 (en)
PL (1) PL2788442T3 (en)
PT (1) PT2788442T (en)
SG (1) SG11201403044VA (en)
WO (1) WO2013083919A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102100767B1 (en) * 2013-11-26 2020-04-21 엘지디스플레이 주식회사 Organic Light Emitting Display Apparatus and Method for Manufacturing The Same
FR3019477B1 (en) * 2014-04-03 2023-03-17 Commissariat Energie Atomique SURFACE FUNCTIONALIZATION PROCESS
FR3025616A1 (en) * 2014-09-10 2016-03-11 Arkema France METHOD FOR CONTROLLING THE DEFECT RATE IN FILMS OBTAINED WITH MIXTURES OF BLOCK COPOLYMERS AND POLYMERS
FR3030526B1 (en) * 2014-12-18 2018-06-15 Arkema France RADICAL POLYMERIZATION OF LOW TEMPERATURE ALCOXYAMINES
US10131735B2 (en) 2014-12-18 2018-11-20 Arkema France Low-temperature radical polymerisation of alkoxyamines
FR3031751B1 (en) 2015-01-21 2018-10-05 Arkema France METHOD OF REDUCING DEFECTS IN AN ORDINATED BLOCK COPOLYMER FILM
FR3031749B1 (en) 2015-01-21 2018-09-28 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS
FR3031748B1 (en) 2015-01-21 2018-09-28 Arkema France METHOD FOR REDUCING THE ASSEMBLY TIME OF ORDINATED BLOCK COPOLYMER FILMS
FR3031750B1 (en) 2015-01-21 2018-09-28 Arkema France PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
FR3045644A1 (en) * 2015-12-18 2017-06-23 Arkema France PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
FR3045642A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS
FR3045643A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS
FR3074181B1 (en) * 2017-11-28 2020-11-06 Arkema France HYDROSOLUBLE COPOLYMERIC COMPOSITION WITH NEUTRAL PH
FR3075800B1 (en) * 2017-12-21 2020-10-09 Arkema France ANTI-STICK COATS FOR TRANSFER PRINTING PROCESSES

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FR2730240A1 (en) * 1995-02-07 1996-08-09 Atochem Elf Sa STABILIZATION OF A POLYMER BY A STABLE FREE RADICAL
KR970064016U (en) * 1996-05-31 1997-12-11 Front panel of VSI
JP2001326173A (en) * 2000-05-16 2001-11-22 Hitachi Ltd Pattern-forming method
JP5074725B2 (en) * 2005-11-25 2012-11-14 古河電気工業株式会社 Metal material for electric and electronic parts, method for producing the same, and electric and electronic parts using the metal material for electric and electronic parts
JP4673266B2 (en) * 2006-08-03 2011-04-20 日本電信電話株式会社 Pattern forming method and mold
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US8623458B2 (en) * 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
KR101892623B1 (en) * 2011-04-29 2018-08-30 삼성디스플레이 주식회사 Random copolymer for forming neutral surface and methods of manufacturing and using thereof
US8691925B2 (en) * 2011-09-23 2014-04-08 Az Electronic Materials (Luxembourg) S.A.R.L. Compositions of neutral layer for directed self assembly block copolymers and processes thereof

Also Published As

Publication number Publication date
ES2585104T3 (en) 2016-10-03
JP6021935B2 (en) 2016-11-09
KR101768296B1 (en) 2017-08-14
US9527108B2 (en) 2016-12-27
KR20140102285A (en) 2014-08-21
WO2013083919A1 (en) 2013-06-13
SG11201403044VA (en) 2014-09-26
US20140370198A1 (en) 2014-12-18
CN104114655B (en) 2017-07-11
EP2788442A1 (en) 2014-10-15
CN104114655A (en) 2014-10-22
PT2788442T (en) 2016-08-01
JP2015513475A (en) 2015-05-14
EP2788442B1 (en) 2016-04-27
FR2983773A1 (en) 2013-06-14
PL2788442T3 (en) 2017-01-31

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