FR2253772A1 - Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc. - Google Patents

Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc.

Info

Publication number
FR2253772A1
FR2253772A1 FR7343321A FR7343321A FR2253772A1 FR 2253772 A1 FR2253772 A1 FR 2253772A1 FR 7343321 A FR7343321 A FR 7343321A FR 7343321 A FR7343321 A FR 7343321A FR 2253772 A1 FR2253772 A1 FR 2253772A1
Authority
FR
France
Prior art keywords
unsatd
photopolymerisable
prepn
maleic anhydride
esterified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7343321A
Other languages
French (fr)
Other versions
FR2253772B3 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
QUADRIMETAL OFFSET
Original Assignee
QUADRIMETAL OFFSET
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by QUADRIMETAL OFFSET filed Critical QUADRIMETAL OFFSET
Priority to FR7343321A priority Critical patent/FR2253772A1/en
Publication of FR2253772A1 publication Critical patent/FR2253772A1/en
Application granted granted Critical
Publication of FR2253772B3 publication Critical patent/FR2253772B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Photopolymerisable or photolinkable compsns. for the prepn. of lithographic plates and photoresists layers are claimed which comprise maleic anhydride polymers or copolymers with a vinyl or styrene monomer and esterified by an unsatd. alcohol or polyol which is itself partially esterified by an unsatd. aliphatic acid, the (co)polymer being of formula: where R1, R2 and R3 are H or alkyl, R1 may also be alkoxy, and R2 a polyol whose OH gps., except at least one, are esterified by an unsatd. aliphatic acid. The compsn. pref. comprise 20-100%, based on (I) of a polyol acrylate monomer (II). Used in the prodn. of offset printing plates and printed circuits. The unexposed compsn. can be removed by aqs. alkaline soln. after exposure of a layer to actinic light and, particularly when (II) is present, is mechanically strong during development and has a long lasting hardness during use.
FR7343321A 1973-12-05 1973-12-05 Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc. Granted FR2253772A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7343321A FR2253772A1 (en) 1973-12-05 1973-12-05 Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7343321A FR2253772A1 (en) 1973-12-05 1973-12-05 Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc.

Publications (2)

Publication Number Publication Date
FR2253772A1 true FR2253772A1 (en) 1975-07-04
FR2253772B3 FR2253772B3 (en) 1976-10-15

Family

ID=9128737

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7343321A Granted FR2253772A1 (en) 1973-12-05 1973-12-05 Photopolymerisable maleic anhydride (co)polymers - soluble in alkaline medium, for prepn. of photoresist etc.

Country Status (1)

Country Link
FR (1) FR2253772A1 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0104863A2 (en) * 1982-09-21 1984-04-04 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate
EP0499271A1 (en) * 1991-02-15 1992-08-19 Kawasaki Steel Corporation Photosensitive resin
EP0591916A2 (en) * 1992-10-07 1994-04-13 MAN Roland Druckmaschinen AG Ink-printing process and printing ink for offset printing
EP0740208A1 (en) * 1995-04-27 1996-10-30 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US5849462A (en) * 1995-04-27 1998-12-15 Minnesota Mining & Manufacturing Company Negative-acting no-process printing plates
WO1999019369A2 (en) 1997-10-16 1999-04-22 Sun Chemical Corporation PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME
JP2016089151A (en) * 2014-10-30 2016-05-23 住友化学株式会社 Compound and colored curable resin composition

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0104863A2 (en) * 1982-09-21 1984-04-04 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate
EP0104863A3 (en) * 1982-09-21 1986-04-16 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate
EP0499271A1 (en) * 1991-02-15 1992-08-19 Kawasaki Steel Corporation Photosensitive resin
EP0591916A2 (en) * 1992-10-07 1994-04-13 MAN Roland Druckmaschinen AG Ink-printing process and printing ink for offset printing
EP0591916A3 (en) * 1992-10-07 1994-05-18 Roland Man Druckmasch Printing ink for offset printing
WO1996034316A1 (en) * 1995-04-27 1996-10-31 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
EP0740208A1 (en) * 1995-04-27 1996-10-30 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
US5849462A (en) * 1995-04-27 1998-12-15 Minnesota Mining & Manufacturing Company Negative-acting no-process printing plates
US6027857A (en) * 1995-04-27 2000-02-22 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
US6171735B1 (en) 1995-04-27 2001-01-09 3M Innovative Properties Company Negative-acting no-process printing plates
WO1999019369A2 (en) 1997-10-16 1999-04-22 Sun Chemical Corporation PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME
US6559222B1 (en) 1997-10-16 2003-05-06 Sun Chemical Corporation Photoneutralization of pH sensitive aqueous polymeric dispersions and methods for using same
JP2016089151A (en) * 2014-10-30 2016-05-23 住友化学株式会社 Compound and colored curable resin composition

Also Published As

Publication number Publication date
FR2253772B3 (en) 1976-10-15

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