FR2237226A1 - Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer - Google Patents
Negative resist formation - using polydiallylorthophthalate electron sensitive resist layerInfo
- Publication number
- FR2237226A1 FR2237226A1 FR7410722A FR7410722A FR2237226A1 FR 2237226 A1 FR2237226 A1 FR 2237226A1 FR 7410722 A FR7410722 A FR 7410722A FR 7410722 A FR7410722 A FR 7410722A FR 2237226 A1 FR2237226 A1 FR 2237226A1
- Authority
- FR
- France
- Prior art keywords
- polydiallylorthophthalate
- resist layer
- electron sensitive
- formation
- negative resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
In a conventional process for producing a negative resist by selectively exposing a resist layer to an electon beam to insolubilise the exposed zones and then removing the unexposed zones with a solvent, the improvement consists in using polydiallylorthophthalate as the resist layer. The negative resist has high thermal stability and good adhesion to the substrate.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34927673A | 1973-04-09 | 1973-04-09 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2237226A1 true FR2237226A1 (en) | 1975-02-07 |
Family
ID=23371652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7410722A Pending FR2237226A1 (en) | 1973-04-09 | 1974-03-28 | Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS502939A (en) |
BE (1) | BE813367A (en) |
DE (1) | DE2416543A1 (en) |
FR (1) | FR2237226A1 (en) |
IT (1) | IT1009421B (en) |
NL (1) | NL7404549A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5359367A (en) * | 1976-11-10 | 1978-05-29 | Hitachi Ltd | Formation of electron beam resist image |
JPS6022633U (en) * | 1983-07-23 | 1985-02-16 | 天龍木材株式会社 | wooden flooring |
JPS62144343U (en) * | 1986-03-06 | 1987-09-11 | ||
JPH0524769U (en) * | 1991-09-10 | 1993-03-30 | チヨダウーテ株式会社 | Calcium silicate board |
-
1974
- 1974-03-28 FR FR7410722A patent/FR2237226A1/en active Pending
- 1974-04-03 NL NL7404549A patent/NL7404549A/xx unknown
- 1974-04-04 IT IT6808874A patent/IT1009421B/en active
- 1974-04-05 BE BE142905A patent/BE813367A/en unknown
- 1974-04-05 DE DE19742416543 patent/DE2416543A1/en active Pending
- 1974-04-08 JP JP49039764A patent/JPS502939A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2416543A1 (en) | 1974-10-24 |
JPS502939A (en) | 1975-01-13 |
NL7404549A (en) | 1974-10-11 |
IT1009421B (en) | 1976-12-10 |
BE813367A (en) | 1974-07-31 |
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