FR1075634A - Notched wheel grinding device to observe the work performed - Google Patents

Notched wheel grinding device to observe the work performed

Info

Publication number
FR1075634A
FR1075634A FR1075634DA FR1075634A FR 1075634 A FR1075634 A FR 1075634A FR 1075634D A FR1075634D A FR 1075634DA FR 1075634 A FR1075634 A FR 1075634A
Authority
FR
France
Prior art keywords
observe
grinding device
work performed
wheel grinding
notched wheel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
French (fr)
Inventor
Hans Gu Nther Lux
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1075634A publication Critical patent/FR1075634A/en
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/12—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with apertures for inspecting the surface to be abraded

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
FR1075634D 1953-03-12 1953-03-12 Notched wheel grinding device to observe the work performed Expired FR1075634A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1075634T 1953-03-12

Publications (1)

Publication Number Publication Date
FR1075634A true FR1075634A (en) 1954-10-19

Family

ID=9607260

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1075634D Expired FR1075634A (en) 1953-03-12 1953-03-12 Notched wheel grinding device to observe the work performed

Country Status (1)

Country Link
FR (1) FR1075634A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0738561A1 (en) * 1995-03-28 1996-10-23 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations
US5964643A (en) * 1995-03-28 1999-10-12 Applied Materials, Inc. Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
US6524164B1 (en) 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US6537133B1 (en) 1995-03-28 2003-03-25 Applied Materials, Inc. Method for in-situ endpoint detection for chemical mechanical polishing operations
US6676717B1 (en) 1995-03-28 2004-01-13 Applied Materials Inc Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US6716085B2 (en) 2001-12-28 2004-04-06 Applied Materials Inc. Polishing pad with transparent window
US6719818B1 (en) 1995-03-28 2004-04-13 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US6849152B2 (en) 1992-12-28 2005-02-01 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US6876454B1 (en) 1995-03-28 2005-04-05 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US6910944B2 (en) 1995-03-28 2005-06-28 Applied Materials, Inc. Method of forming a transparent window in a polishing pad
US6991517B2 (en) 1999-02-04 2006-01-31 Applied Materials Inc. Linear polishing sheet with window
US6994607B2 (en) 2001-12-28 2006-02-07 Applied Materials, Inc. Polishing pad with window
US7001242B2 (en) 2002-02-06 2006-02-21 Applied Materials, Inc. Method and apparatus of eddy current monitoring for chemical mechanical polishing
US7037403B1 (en) 1992-12-28 2006-05-02 Applied Materials Inc. In-situ real-time monitoring technique and apparatus for detection of thin films during chemical/mechanical polishing planarization
US7264536B2 (en) 2003-09-23 2007-09-04 Applied Materials, Inc. Polishing pad with window

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7569119B2 (en) 1992-12-28 2009-08-04 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for detection of thin films during chemical/mechanical polishing planarization
US6849152B2 (en) 1992-12-28 2005-02-01 Applied Materials, Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US7024063B2 (en) 1992-12-28 2006-04-04 Applied Materials Inc. In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
US7582183B2 (en) 1992-12-28 2009-09-01 Applied Materials, Inc. Apparatus for detection of thin films during chemical/mechanical polishing planarization
US7037403B1 (en) 1992-12-28 2006-05-02 Applied Materials Inc. In-situ real-time monitoring technique and apparatus for detection of thin films during chemical/mechanical polishing planarization
US6860791B2 (en) 1995-03-28 2005-03-01 Applied Materials, Inc. Polishing pad for in-situ endpoint detection
EP0738561A1 (en) * 1995-03-28 1996-10-23 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations
US8556679B2 (en) 1995-03-28 2013-10-15 Applied Materials, Inc. Substrate polishing metrology using interference signals
US6719818B1 (en) 1995-03-28 2004-04-13 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US6537133B1 (en) 1995-03-28 2003-03-25 Applied Materials, Inc. Method for in-situ endpoint detection for chemical mechanical polishing operations
US5964643A (en) * 1995-03-28 1999-10-12 Applied Materials, Inc. Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
US6876454B1 (en) 1995-03-28 2005-04-05 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US6875078B2 (en) 1995-03-28 2005-04-05 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
EP1108501A2 (en) * 1995-03-28 2001-06-20 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations
US6910944B2 (en) 1995-03-28 2005-06-28 Applied Materials, Inc. Method of forming a transparent window in a polishing pad
US8092274B2 (en) 1995-03-28 2012-01-10 Applied Materials, Inc. Substrate polishing metrology using interference signals
US7841926B2 (en) 1995-03-28 2010-11-30 Applied Materials, Inc. Substrate polishing metrology using interference signals
US7775852B2 (en) 1995-03-28 2010-08-17 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
EP1108501A3 (en) * 1995-03-28 2001-12-05 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations
US8506356B2 (en) 1995-03-28 2013-08-13 Applied Materials, Inc. Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US7118450B2 (en) 1995-03-28 2006-10-10 Applied Materials, Inc. Polishing pad with window and method of fabricating a window in a polishing pad
US7731566B2 (en) 1995-03-28 2010-06-08 Applied Materials, Inc. Substrate polishing metrology using interference signals
US7011565B2 (en) 1995-03-28 2006-03-14 Applied Materials, Inc. Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
US6676717B1 (en) 1995-03-28 2004-01-13 Applied Materials Inc Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
US7255629B2 (en) 1995-03-28 2007-08-14 Applied Materials, Inc. Polishing assembly with a window
US6991517B2 (en) 1999-02-04 2006-01-31 Applied Materials Inc. Linear polishing sheet with window
US7189141B2 (en) 1999-09-14 2007-03-13 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US7677959B2 (en) 1999-09-14 2010-03-16 Applied Materials, Inc. Multilayer polishing pad and method of making
US6524164B1 (en) 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US6896585B2 (en) 1999-09-14 2005-05-24 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US7198544B2 (en) 2001-12-28 2007-04-03 Applied Materials, Inc. Polishing pad with window
US6994607B2 (en) 2001-12-28 2006-02-07 Applied Materials, Inc. Polishing pad with window
US6716085B2 (en) 2001-12-28 2004-04-06 Applied Materials Inc. Polishing pad with transparent window
US7591708B2 (en) 2002-02-06 2009-09-22 Applied Materials, Inc. Method and apparatus of eddy current monitoring for chemical mechanical polishing
US7001242B2 (en) 2002-02-06 2006-02-21 Applied Materials, Inc. Method and apparatus of eddy current monitoring for chemical mechanical polishing
US7264536B2 (en) 2003-09-23 2007-09-04 Applied Materials, Inc. Polishing pad with window
US7547243B2 (en) 2003-09-23 2009-06-16 Applied Materials, Inc. Method of making and apparatus having polishing pad with window

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