FI952622A0 - Process for silylation of inorganic oxides - Google Patents

Process for silylation of inorganic oxides

Info

Publication number
FI952622A0
FI952622A0 FI952622A FI952622A FI952622A0 FI 952622 A0 FI952622 A0 FI 952622A0 FI 952622 A FI952622 A FI 952622A FI 952622 A FI952622 A FI 952622A FI 952622 A0 FI952622 A0 FI 952622A0
Authority
FI
Finland
Prior art keywords
silylation
inorganic oxides
prepd
finely
polar
Prior art date
Application number
FI952622A
Other languages
Finnish (fi)
Swedish (sv)
Other versions
FI116832B (en
FI952622A (en
Inventor
Herbert Barthel
Mario Heinemann
Franz Herrmann
August Altenbuchner
Original Assignee
Wacker Chemie Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6519579&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FI952622(A0) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Wacker Chemie Gmbh filed Critical Wacker Chemie Gmbh
Publication of FI952622A0 publication Critical patent/FI952622A0/en
Publication of FI952622A publication Critical patent/FI952622A/en
Application granted granted Critical
Publication of FI116832B publication Critical patent/FI116832B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/12Water-insoluble compounds
    • C11D3/124Silicon containing, e.g. silica, silex, quartz or glass beads
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D19/00Degasification of liquids
    • B01D19/02Foam dispersion or prevention
    • B01D19/04Foam dispersion or prevention by addition of chemical substances
    • B01D19/0404Foam dispersion or prevention by addition of chemical substances characterised by the nature of the chemical substance
    • B01D19/0409Foam dispersion or prevention by addition of chemical substances characterised by the nature of the chemical substance compounds containing Si-atoms
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14Methods for preparing oxides or hydroxides in general
    • C01B13/145After-treatment of oxides or hydroxides, e.g. pulverising, drying, decreasing the acidity
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12Treatment with organosilicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/43Thickening agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/66Additives characterised by particle size
    • C09D7/67Particle size smaller than 100 nm
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/32Materials not provided for elsewhere for absorbing liquids to remove pollution, e.g. oil, gasoline, fat
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/22Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/08Ingredients agglomerated by treatment with a binding agent

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Dispersion Chemistry (AREA)
  • Nanotechnology (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Paper (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)

Abstract

Silylation of very finely-divided inorganic oxides (I) comprises treating (I) with a very fine aerosol of liquid silylating agent(s) which is hardly volatile in the entire process temp. range. Also claimed is highly non-polar pyrogenic SiO2 (II) prepd. in this way.
FI952622A 1994-06-01 1995-05-30 Method for silylation of inorganic oxides FI116832B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4419234 1994-06-01
DE4419234A DE4419234A1 (en) 1994-06-01 1994-06-01 Process for the silylation of inorganic oxides

Publications (3)

Publication Number Publication Date
FI952622A0 true FI952622A0 (en) 1995-05-30
FI952622A FI952622A (en) 1995-12-02
FI116832B FI116832B (en) 2006-03-15

Family

ID=6519579

Family Applications (1)

Application Number Title Priority Date Filing Date
FI952622A FI116832B (en) 1994-06-01 1995-05-30 Method for silylation of inorganic oxides

Country Status (15)

Country Link
US (2) US5686054A (en)
EP (1) EP0686676B1 (en)
JP (1) JP2918092B2 (en)
CN (1) CN1051747C (en)
AT (1) ATE169948T1 (en)
AU (1) AU669647B2 (en)
BR (1) BR9502619A (en)
CA (1) CA2149821C (en)
DE (2) DE4419234A1 (en)
ES (1) ES2121261T3 (en)
FI (1) FI116832B (en)
NO (1) NO316383B1 (en)
RU (1) RU2137712C1 (en)
TW (1) TW311904B (en)
UA (1) UA43328C2 (en)

Families Citing this family (123)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6191122B1 (en) 1996-03-29 2001-02-20 DEGUSSA HüLS AKTIENGESELLSCHAFT Partially hydrophobic precipitated silicas
IN191468B (en) * 1996-03-29 2003-12-06 Degussa
DE19742761A1 (en) * 1997-09-27 1999-04-01 Gerd Dr Rossmy Amphiphilic particles or molecules which are predominantly hydrophilic and predominantly hydrophobic domains are anisotropically distributed on their surface
DE19756831A1 (en) * 1997-12-19 1999-07-01 Wacker Chemie Gmbh Silicon dioxide, which carries partially or completely silylated polysilicic acid chains on its surface
DE19757210A1 (en) * 1997-12-22 1999-07-01 Degussa Hydrophobicized, pyrogenic oxides
AU2105199A (en) * 1998-01-15 1999-08-02 Cabot Corporation Method of preparing organically modified silica
EP1047734B1 (en) * 1998-01-15 2004-10-27 Cabot Corporation Method of preparing treated silica
DE69902223T2 (en) * 1998-01-15 2003-01-23 Cabot Corp POLYFUNCTIONAL ORGANOSILANE TREATMENT OF SILICA
US5981131A (en) * 1998-07-27 1999-11-09 Mitsubishi Chemical America, Inc. Electrostatic toner composition to enhance copy quality by rejection of ghosting and method of manufacturing same
US6383466B1 (en) * 1998-12-28 2002-05-07 Battelle Memorial Institute Method of dehydroxylating a hydroxylated material and method of making a mesoporous film
US6174926B1 (en) 1999-01-13 2001-01-16 Cabot Corporation Method of preparing organically modified silica
GB9927431D0 (en) * 1999-11-22 2000-01-19 Ciba Sc Holding Ag Casting resin and process for the fabrication of resin molds
GB2357497A (en) * 1999-12-22 2001-06-27 Degussa Hydrophobic silica
DE19963187B4 (en) * 1999-12-27 2006-10-26 Deutsche Amphibolin-Werke Von Robert Murjahn Gmbh & Co. Kg Aqueous coating material with dirt and water repellent effect, process for its preparation and its use
EP1173523B2 (en) * 2000-02-29 2013-08-14 Aluminium Féron GmbH & Co. Method for producing a layered material and layered material thus obtained
US20010036437A1 (en) * 2000-04-03 2001-11-01 Andreas Gutsch Nanoscale pyrogenic oxides
EP1145862B1 (en) 2000-04-11 2004-03-17 Degussa AG Coating compositions for ink jet media
DE10109484A1 (en) * 2001-02-28 2002-09-12 Degussa Surface-modified, doped, pyrogenic oxides
US6861115B2 (en) * 2001-05-18 2005-03-01 Cabot Corporation Ink jet recording medium comprising amine-treated silica
ATE330256T1 (en) 2001-07-11 2006-07-15 Seiko Epson Corp NON-MAGNETIC SINGLE-COMPONENT TONER, METHOD OF PRODUCTION AND IMAGE RECORDING APPARATUS
DE10138492A1 (en) * 2001-08-04 2003-02-13 Degussa Hydrophobic, non-tempered precipitated silica with a high degree of whiteness
DE10145162A1 (en) * 2001-09-13 2003-04-10 Wacker Chemie Gmbh Silylated silica with low levels of silicon-bonded hydroxy groups useful in toners, developers, charge control agents and flow improvers for powder systems and in crosslinkable polymer and resin compositions
DE10150274A1 (en) 2001-10-12 2003-04-30 Wacker Chemie Gmbh Silica with a homogeneous silylating agent layer
JP3886363B2 (en) * 2001-11-14 2007-02-28 電気化学工業株式会社 Method for producing hydrophobic silica fine powder
DE10211313A1 (en) 2002-03-14 2003-10-02 Wacker Chemie Gmbh Multiple emulsions
DE10239425A1 (en) * 2002-08-28 2004-03-11 Degussa Ag coating formulations
DE10260323A1 (en) * 2002-12-20 2004-07-08 Wacker-Chemie Gmbh Water-wettable silylated metal oxides
WO2004074176A1 (en) * 2003-02-20 2004-09-02 Wacker-Chemie Gmbh Method for stabilising dispersions
US7241704B1 (en) 2003-03-31 2007-07-10 Novellus Systems, Inc. Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups
US7176144B1 (en) 2003-03-31 2007-02-13 Novellus Systems, Inc. Plasma detemplating and silanol capping of porous dielectric films
US7208389B1 (en) 2003-03-31 2007-04-24 Novellus Systems, Inc. Method of porogen removal from porous low-k films using UV radiation
US7265061B1 (en) 2003-05-09 2007-09-04 Novellus Systems, Inc. Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties
DE10330020A1 (en) * 2003-07-03 2005-01-20 Degussa Ag Highly filled silane preparation
US7169375B2 (en) * 2003-08-29 2007-01-30 General Electric Company Metal oxide nanoparticles, methods of making, and methods of use
DE10342828A1 (en) * 2003-09-17 2005-04-14 Degussa Ag High purity pyrogenic silica
DE10343411B4 (en) * 2003-09-19 2009-07-23 Gallus Druckmaschinen Gmbh Rotary printing machine and method for making freely accessible a printing cylinder or a linear guide cylinder
US7390537B1 (en) 2003-11-20 2008-06-24 Novellus Systems, Inc. Methods for producing low-k CDO films with low residual stress
US20050205102A1 (en) * 2004-01-30 2005-09-22 Philip Morris Usa Inc. Method of making surface modified silica gel
US7381662B1 (en) 2004-03-11 2008-06-03 Novellus Systems, Inc. Methods for improving the cracking resistance of low-k dielectric materials
US7341761B1 (en) 2004-03-11 2008-03-11 Novellus Systems, Inc. Methods for producing low-k CDO films
US7094713B1 (en) 2004-03-11 2006-08-22 Novellus Systems, Inc. Methods for improving the cracking resistance of low-k dielectric materials
DE102004014704A1 (en) * 2004-03-25 2005-10-13 Wacker-Chemie Gmbh Particle-stabilized emulsions
US7781351B1 (en) 2004-04-07 2010-08-24 Novellus Systems, Inc. Methods for producing low-k carbon doped oxide films with low residual stress
US7253125B1 (en) 2004-04-16 2007-08-07 Novellus Systems, Inc. Method to improve mechanical strength of low-k dielectric film using modulated UV exposure
US7622400B1 (en) 2004-05-18 2009-11-24 Novellus Systems, Inc. Method for improving mechanical properties of low dielectric constant materials
DE102004039212A1 (en) * 2004-08-12 2006-03-02 Wacker-Chemie Gmbh Rheology control of Pickering emulsion by electrolytes
US7326444B1 (en) 2004-09-14 2008-02-05 Novellus Systems, Inc. Methods for improving integration performance of low stress CDO films
US9659769B1 (en) 2004-10-22 2017-05-23 Novellus Systems, Inc. Tensile dielectric films using UV curing
US7790633B1 (en) 2004-10-26 2010-09-07 Novellus Systems, Inc. Sequential deposition/anneal film densification method
US7695765B1 (en) 2004-11-12 2010-04-13 Novellus Systems, Inc. Methods for producing low-stress carbon-doped oxide films with improved integration properties
US7166531B1 (en) 2005-01-31 2007-01-23 Novellus Systems, Inc. VLSI fabrication processes for introducing pores into dielectric materials
US7510982B1 (en) 2005-01-31 2009-03-31 Novellus Systems, Inc. Creation of porosity in low-k films by photo-disassociation of imbedded nanoparticles
DE102005006870A1 (en) * 2005-02-14 2006-08-24 Byk-Chemie Gmbh Surface-modified nanoparticles, process for their preparation and their use
DE102005007753A1 (en) * 2005-02-18 2006-08-31 Wacker Chemie Ag Particles with low specific surface area and high thickening effect
DE102005012409A1 (en) 2005-03-17 2006-09-21 Wacker Chemie Ag Aqueous dispersions of partially hydrophobic silicic acids
US8980769B1 (en) 2005-04-26 2015-03-17 Novellus Systems, Inc. Multi-station sequential curing of dielectric films
US8137465B1 (en) 2005-04-26 2012-03-20 Novellus Systems, Inc. Single-chamber sequential curing of semiconductor wafers
US8454750B1 (en) 2005-04-26 2013-06-04 Novellus Systems, Inc. Multi-station sequential curing of dielectric films
US8889233B1 (en) 2005-04-26 2014-11-18 Novellus Systems, Inc. Method for reducing stress in porous dielectric films
US8282768B1 (en) 2005-04-26 2012-10-09 Novellus Systems, Inc. Purging of porogen from UV cure chamber
DE102005035442A1 (en) 2005-07-28 2007-05-16 Wacker Chemie Ag Stabilized HDK suspensions to reinforce reactive resins
US7892985B1 (en) 2005-11-15 2011-02-22 Novellus Systems, Inc. Method for porogen removal and mechanical strength enhancement of low-k carbon doped silicon oxide using low thermal budget microwave curing
ES2757566T3 (en) 2005-12-16 2020-04-29 Nouryon Chemicals Int Bv Preparation method of a silica-based stationary phase separation material
US9308520B2 (en) 2005-12-16 2016-04-12 Akzo Nobel N.V. Silica based material
US8110493B1 (en) 2005-12-23 2012-02-07 Novellus Systems, Inc. Pulsed PECVD method for modulating hydrogen content in hard mask
US7381644B1 (en) 2005-12-23 2008-06-03 Novellus Systems, Inc. Pulsed PECVD method for modulating hydrogen content in hard mask
US20090030222A1 (en) * 2006-01-19 2009-01-29 Dow Corning Corporation Systems and methods for functionalizing particulates with silane-containing materials
US7923376B1 (en) 2006-03-30 2011-04-12 Novellus Systems, Inc. Method of reducing defects in PECVD TEOS films
DE102006014875A1 (en) * 2006-03-30 2007-10-04 Wacker Chemie Ag Particle, useful in e.g. a surface coating and a molded body, comprises a polymerization product of a polyadditionable, polycondensable or polymerizable siloxane and/or silane; and solid particulates
US7527838B2 (en) * 2006-04-06 2009-05-05 Momentive Performance Materials Inc. Architectural unit possessing translucent silicone rubber component
DE102006017592A1 (en) 2006-04-13 2007-10-18 Wacker Chemie Ag Rheology control of strongly basic liquids
CN101522821B (en) * 2006-08-06 2013-07-03 比克化学股份有限公司 Surface-modified particles and production method
CA2658447C (en) * 2006-08-06 2013-07-02 Byk-Chemie Gmbh Surface-modified particles and production method
JP5133993B2 (en) * 2006-09-01 2013-01-30 キャボット コーポレイション Surface-treated metal oxide particles
US20080070146A1 (en) 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
US8455165B2 (en) 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
US8435474B2 (en) 2006-09-15 2013-05-07 Cabot Corporation Surface-treated metal oxide particles
US8202502B2 (en) 2006-09-15 2012-06-19 Cabot Corporation Method of preparing hydrophobic silica
US8465991B2 (en) * 2006-10-30 2013-06-18 Novellus Systems, Inc. Carbon containing low-k dielectric constant recovery using UV treatment
US10037905B2 (en) 2009-11-12 2018-07-31 Novellus Systems, Inc. UV and reducing treatment for K recovery and surface clean in semiconductor processing
US7851232B2 (en) 2006-10-30 2010-12-14 Novellus Systems, Inc. UV treatment for carbon-containing low-k dielectric repair in semiconductor processing
US7906174B1 (en) 2006-12-07 2011-03-15 Novellus Systems, Inc. PECVD methods for producing ultra low-k dielectric films using UV treatment
US20080145545A1 (en) * 2006-12-15 2008-06-19 Bret Ja Chisholm Metal oxide and sulfur-containing coating compositions, methods of use, and articles prepared therefrom
DE102006061057A1 (en) 2006-12-22 2008-06-26 Wacker Chemie Ag Organofunctional silicone resin layers on metal oxides
US8242028B1 (en) 2007-04-03 2012-08-14 Novellus Systems, Inc. UV treatment of etch stop and hard mask films for selectivity and hermeticity enhancement
DE102007024963A1 (en) 2007-05-30 2008-12-04 Wacker Polymer Systems Gmbh & Co. Kg Process for the preparation of insulating coatings
US7622162B1 (en) 2007-06-07 2009-11-24 Novellus Systems, Inc. UV treatment of STI films for increasing tensile stress
US8501856B2 (en) * 2007-07-13 2013-08-06 Momentive Performance Materials Inc. Curable silicon-containing compositions possessing high translucency
DE102007033448A1 (en) 2007-07-18 2009-01-22 Wacker Chemie Ag Highly dispersed metal oxides with a high positive surface charge
DE102007035955A1 (en) * 2007-07-30 2009-02-05 Evonik Degussa Gmbh Surface-modified, pyrogenic silicas
DE102007035956A1 (en) * 2007-07-30 2009-02-05 Evonik Degussa Gmbh Surface-modified, pyrogenic silicas
US8211510B1 (en) 2007-08-31 2012-07-03 Novellus Systems, Inc. Cascaded cure approach to fabricate highly tensile silicon nitride films
DE102007055879A1 (en) 2007-12-19 2009-06-25 Wacker Chemie Ag Hydrophobization of silicas and oxidizing conditions
DE102008041466A1 (en) * 2008-08-22 2010-02-25 Wacker Chemie Ag Aqueous dispersions of hydrophobic silicic acids
US9050623B1 (en) 2008-09-12 2015-06-09 Novellus Systems, Inc. Progressive UV cure
FR2937338B1 (en) * 2008-10-17 2013-03-22 Biomerieux Sa REACTIONAL MEDIUM FOR THE DETECTION AND / OR IDENTIFICATION OF BACTERIA OF THE GENUS LEGIONELLA
DE102008054592A1 (en) 2008-12-12 2010-06-17 Wacker Chemie Ag Pyrogenic silica produced in a small capacity production plant
JP5730279B2 (en) * 2009-03-18 2015-06-03 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Modified silica particles and dust-proof polymer composition containing them
JP4893836B2 (en) * 2010-01-29 2012-03-07 オムロン株式会社 One-part epoxy resin composition and use thereof
FR2979107A1 (en) * 2011-08-16 2013-02-22 Bluestar Silicones France PROCESS FOR THE PREPARATION OF SILICA GRAFTED BY AN ORGANOSILICIE COMPOUND
DE102011084048A1 (en) 2011-10-05 2013-04-11 Wacker Chemie Ag Building material dry formulations containing polymer powder
DE102012203826A1 (en) 2012-03-12 2013-09-12 Wacker Chemie Ag Process for the surface modification of particulate solids
WO2013156337A1 (en) * 2012-04-20 2013-10-24 Evonik Degussa Gmbh Reinforced epoxy resin adhesive
EP2781558B1 (en) 2013-03-19 2016-12-14 Evonik Degussa GmbH Modified compound containing silicic acid and silicone rubber containing the said composition
DE102013224210A1 (en) 2013-11-27 2015-05-28 Wacker Chemie Ag Silanized highly hydrophobic silicas
DE102013224206A1 (en) * 2013-11-27 2015-05-28 Wacker Chemie Ag Surface-modified particulate metal oxides
DE102013226494A1 (en) 2013-12-18 2015-06-18 Wacker Chemie Ag Modification of the surfaces of metal oxides by means of chain-like structures
FR3020766B1 (en) * 2014-05-07 2020-05-08 Pylote INDIVIDUALIZED INORGANIC PARTICLES
DE102015214883A1 (en) 2015-08-04 2017-02-09 Wacker Chemie Ag Process for the production of moldings
DE102015216505A1 (en) 2015-08-28 2017-03-02 Wacker Chemie Ag Silica moldings with low thermal conductivity
US10400071B2 (en) 2015-11-09 2019-09-03 Wacker Chemie Ag Silicone compositions for producing elastomeric molded parts by means of ballistic methods
US10676641B2 (en) 2015-11-26 2020-06-09 Wacker Chemie Ag Highly viscous silicone compositions for producing elastomeric molded parts by means of ballistic generative methods
CN108349157B (en) 2016-08-26 2020-03-27 瓦克化学股份公司 Method for producing shaped bodies
US9847221B1 (en) 2016-09-29 2017-12-19 Lam Research Corporation Low temperature formation of high quality silicon oxide films in semiconductor device manufacturing
KR102123926B1 (en) 2017-02-23 2020-06-18 와커 헤미 아게 A production method for producing a molded body using a support material made of wax
DE102017209782A1 (en) 2017-06-09 2018-12-13 Evonik Degussa Gmbh Process for thermal insulation of an evacuable container
WO2019185135A1 (en) 2018-03-28 2019-10-03 Wacker Chemie Ag Generative method for producing molded bodies
EP3597615A1 (en) 2018-07-17 2020-01-22 Evonik Operations GmbH Granular mixed oxide material and thermal insulating composition on its basis
MX2021000626A (en) 2018-07-18 2021-03-25 Evonik Operations Gmbh Process for hydrophobizing shaped insulation-material bodies based on silica at ambient pressure.
KR102057036B1 (en) * 2019-10-04 2019-12-18 박희대 Thermoplastic hot-melt film with excellent adhesive strength mixed with hydrophobic nano silica
US20230002627A1 (en) 2020-01-14 2023-01-05 Evonik Operations Gmbh Silica-based hydrophobic granular material with an increased polarity
WO2021144181A1 (en) 2020-01-14 2021-07-22 Evonik Operations Gmbh Fumed silica with modified surface activity
CN116745374A (en) 2021-03-05 2023-09-12 瓦克化学股份公司 Siloxane functionalized silica

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1163784C2 (en) * 1962-03-30 1973-05-03 Degussa Process for the surface treatment of highly dispersed oxides
GB1348372A (en) * 1970-02-16 1974-03-13 Ici Ltd Foam-compatible powder compositions
US3830738A (en) * 1970-02-16 1974-08-20 Ici Ltd Surface treatment of particulate solids
US3963627A (en) * 1970-02-16 1976-06-15 Imperial Chemical Industries Limited Surface treatment of particulate solids
DE2344388B2 (en) * 1973-09-03 1978-06-22 Elektroschmelzwerk Kempten Gmbh, 8000 Muenchen Process for making hydrophobic silica
US4036933A (en) * 1974-01-18 1977-07-19 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler Highly-active, finely divided super-dry silicon dioxide
DE2403783C2 (en) * 1974-01-26 1982-10-21 Bayer Ag, 5090 Leverkusen Process for the production of hydrophobic fumed silica
DE2513608C2 (en) * 1975-03-27 1982-08-05 Degussa Ag, 6000 Frankfurt Process for the hydrophobization of silicas and silicates with organosilanes
DE2620737C2 (en) * 1976-05-11 1982-07-29 Wacker-Chemie GmbH, 8000 München Process for the preparation of fumed silica
DE2728490C2 (en) * 1977-06-24 1981-09-17 Degussa Ag, 6000 Frankfurt Process for the hydrophobization of silica
DE3211431A1 (en) * 1982-03-27 1983-09-29 Degussa Ag, 6000 Frankfurt METHOD FOR HYDROPHOBIZING PYROGEN-PRODUCED SILICON DIOXIDE
DE3616133A1 (en) * 1985-09-25 1987-11-19 Merck Patent Gmbh SPHERICAL SIO (DOWN ARROW) 2 (DOWN ARROW) PARTICLES
DE3707226A1 (en) * 1987-03-06 1988-09-15 Wacker Chemie Gmbh METHOD FOR PRODUCING HIGHLY DISPERSAL METAL OXIDE WITH AMMONIUM-FUNCTIONAL ORGANOPOLYSILOXANE MODIFIED SURFACE AS A POSITIVELY CONTROLLING CHARGING AGENT FOR TONER
US5614177A (en) * 1987-11-04 1997-03-25 Rhone-Poulenc Chimie Dentifrice-compatible silica particulates
JPH0657337B2 (en) * 1988-11-18 1994-08-03 キヤボツト コーポレーシヨン Low bulk density material continuous processing method
US5153030A (en) * 1988-11-18 1992-10-06 Cabot Corporation Continuous treatment process for particulate material
DE3913938A1 (en) * 1989-04-27 1990-10-31 Degussa PRESSLINGS BASED ON PYROGEN-PRODUCED TITANIUM DIOXIDE, METHOD FOR THE PRODUCTION THEREOF AND THEIR USE
DE3919940A1 (en) * 1989-06-19 1990-12-20 Merck Patent Gmbh DISPERSIONS OF SPHERICAL INORGANIC PARTICLES
JPH0616971A (en) * 1992-06-30 1994-01-25 Nippon Shirika Kogyo Kk Method for improving alkali resistance of coating material
DE4221716A1 (en) * 1992-07-02 1994-01-05 Wacker Chemie Gmbh Process for the hydrophobization of pyrogenically produced silicon dioxide
JP3146679B2 (en) * 1992-08-31 2001-03-19 三菱マテリアル株式会社 Hydrophobic metal oxide powder
JP3318997B2 (en) * 1993-02-03 2002-08-26 三菱マテリアル株式会社 Hydrophobic silica powder, its production method and developer for electrophotography

Also Published As

Publication number Publication date
AU2037595A (en) 1996-01-04
DE59503235D1 (en) 1998-09-24
DE4419234A1 (en) 1995-12-07
RU2137712C1 (en) 1999-09-20
NO952158D0 (en) 1995-05-31
RU95109149A (en) 1997-06-20
CA2149821C (en) 2000-05-16
BR9502619A (en) 1996-01-02
UA43328C2 (en) 2001-12-17
CA2149821A1 (en) 1995-12-02
NO952158L (en) 1995-12-04
EP0686676B1 (en) 1998-08-19
CN1121044A (en) 1996-04-24
ES2121261T3 (en) 1998-11-16
AU669647B2 (en) 1996-06-13
TW311904B (en) 1997-08-01
CN1051747C (en) 2000-04-26
JP2918092B2 (en) 1999-07-12
FI116832B (en) 2006-03-15
EP0686676A1 (en) 1995-12-13
JPH07330324A (en) 1995-12-19
FI952622A (en) 1995-12-02
NO316383B1 (en) 2004-01-19
ATE169948T1 (en) 1998-09-15
US5686054A (en) 1997-11-11
US5851715A (en) 1998-12-22

Similar Documents

Publication Publication Date Title
FI952622A0 (en) Process for silylation of inorganic oxides
EP0748219B8 (en) Compounds for the treatment of disorders related to vasculogenesis and/or angiogenesis
NL300433I2 (en) Methods and compositions for the treatment of glomerulonephritis.
NO934304L (en) Procedure for the treatment of fluoroalumosilicate glass
DE69420006D1 (en) Wound dressing
ES2093361T3 (en) TREATMENT OF NEURODEGENERATIVE DISEASES.
FI950909A (en) The fatty acid derivatives
DE59102459D1 (en) Lead-zinc-borosilicate glass and use of the glass.
NO944339L (en) Melatonin derivatives for use in the treatment of sleep disorders
NO944340L (en) Melatonin derivatives for use in the treatment of desynchronization states
NO972114D0 (en) Process for the treatment of H2S-containing gas streams
NO942756D0 (en) Treatment of glaucoma
NO943723D0 (en) Use of quinoline-3-carboxamide compounds for the treatment of diabetes
ATE179152T1 (en) DEVICE FOR THE SURFACE TREATMENT OF HOLLOW GLASS BODY
FI945402A0 (en) Process for the treatment of halogen compounds in Procedure for the treatment of halogen compounds containing process or flue gases containing process or flue gases
ITMO920071A0 (en) DYNAMIC FILTER FOR THE TREATMENT OF POLLUTED FLUIDS
FR2694500B1 (en) Versatile nebulizer for the treatment of the respiratory tract.
NO962812D0 (en) Procedure for the treatment of pneumonia
NO964291D0 (en) Procedure for the treatment of allergic rhinitis
NO902984D0 (en) DEVICE FOR HEAT TREATMENT OF BODY LIQUIDS.
NO862454D0 (en) PROCEDURE FOR THE TREATMENT OF PEROXYDE WHITE DISPOSAL.
AU2521495A (en) Device for the treatment of waste gases
PL54336Y1 (en) Nasal bougie for treating nasal sinuses
GR3017993T3 (en) Device for the treatment of waste gases containing gaseous pollutants.
KR970001540U (en) Device for controlling the properties of hood lifter

Legal Events

Date Code Title Description
PC Transfer of assignment of patent

Owner name: WACKER CHEMIE AG

Free format text: WACKER CHEMIE AG

FG Patent granted

Ref document number: 116832

Country of ref document: FI