EP1292965A1 - Column simultaneously focusing a particle beam and an optical beam - Google Patents
Column simultaneously focusing a particle beam and an optical beamInfo
- Publication number
- EP1292965A1 EP1292965A1 EP01919529A EP01919529A EP1292965A1 EP 1292965 A1 EP1292965 A1 EP 1292965A1 EP 01919529 A EP01919529 A EP 01919529A EP 01919529 A EP01919529 A EP 01919529A EP 1292965 A1 EP1292965 A1 EP 1292965A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- column according
- focusing
- electrode
- optical
- outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
- H01J37/228—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination and light collection take place in the same area of the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/082—Catadioptric systems using three curved mirrors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/121—Lenses electrostatic characterised by shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/248—Components associated with the control of the tube
- H01J2237/2482—Optical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31749—Focused ion beam
Definitions
- the present invention relates to an optical column capable of focusing both an ion beam and a photon beam on the same area.
- the invention finds a particularly advantageous application in the field of analysis and repair and manufacturing of integrated circuits.
- the focused ion beams such as ion beams or electron, are now widely used to carry various types of analysis and manufacturing operations on integrated circuits, including characterization, identification, analysis design and failures, depassivation. vapor deposition under vacuum, micro-machining, etc. These operations are carried out by means of a column producing a particle beam intended to be focused on the integrated circuit at the place provided for carrying out the desired intervention .
- Such a column comprises, for example, an ion source, such as the Ga + ions produced from liquid metal, which after extraction form an ion beam, which is then treated by a focusing device comprising a number of carried electrodes at potentials determined so as to form a system of electrostatic lenses capable of focusing the ion beam on the integrated circuit.
- a focusing device comprising a number of carried electrodes at potentials determined so as to form a system of electrostatic lenses capable of focusing the ion beam on the integrated circuit.
- Each electrode of the focusing device in particular the output electrode, is constituted by a series of metal electrodes having a hole for the passage of the particle beam. It is important to note here that the shape of the different electrodes, as well as the diameter of the holes plays a decisive role in the aberrations, in particular spherical and chromatic, of the particle focusing device.
- Some columns for producing ion beams also comprises an optical focusing device, a mirror objective Cassegrain-Schwartzfield (C S), for example, terminated by an outlet opening positioned proximate to the surface of a sample subjected to the ion beam.
- C S Cassegrain-Schwartzfield
- French patent No. 2,437,695 discloses an ionic emission lens associated with a CS type mirror objective.
- the ion lens part the elements of which consist of two pierced electrodes and of the sample itself, is located between said object and the mirror lens.
- the holes of the electrodes of the ion focusing device must, at the same time, be large enough to offer the optical beam a geometric extent allowing sufficient illumination of the sample, and relatively small so as not to degrade the quality of the ion beam by high aberrations.
- the diameter finally chosen for the exit hole is therefore a compromise which is neither satisfactory for the extent of the optical beam nor for the focusing of the ion beam.
- a technical problem to be solved by the object of the present invention is to propose a column for producing a focused particle beam, comprising:
- a particle focusing device comprising an output electrode having an outlet hole for the passage of the particle beam
- the solution to the technical problem posed consists, according to the present invention, in that said outlet opening is transparent to the light beam, while said outlet electrode is formed by a metal insert held in said opening and pierced with a central hole forming said outlet hole.
- the column, object of the invention introduces independence between the diameter of the outlet hole of the particle focusing device and the diameter of the outlet opening of the optical focusing device. It is therefore possible to adjust the diameter of the central hole of the metal insert to an optimal value to reduce the aberrations of the output electrode, without prejudicing the digital aperture of the optical beam, which is determined by the diameter of the opening transparent to the optical beam.
- the particle focusing device comprising an intermediate electrode
- said electrode metal insert projects from the opening towards said intermediate electrode.
- the particle production column according to the invention is capable of a large number of applications. Among others:
- Figure 1 is a partial side view in section of a column for producing a particle beam, according to a first embodiment according to the invention.
- Figure 2 is a partial side view in section of a column for producing a particle beam, according to a second embodiment according to the invention.
- Figure 1 is shown partially in section of a tubing string of a particle beam to be focused on an integrated circuit 1.
- the axis of the particle beam which coincides with the axis of the column, is referenced by the letter A.
- the column of figure 1 applies to all kinds of charged particles, electrons or ions, we will take in the following the example of an ion beam.
- the part of the column illustrated in FIG. 1 essentially comprises a device 100 for focusing the ion beam on the integrated circuit 1.
- This device 100 comprises three electrodes, namely an input electrode 110 grounded, an electrode intermediate 120 brought to a non-zero potential V, positive or negative, of 20 keN for example, and an output electrode 130 also grounded. These electrodes 110, 120, 130 are contained between side walls 140 of the column, grounded.
- the intermediate electrode 120 is a complex electrode in two parts, consisting of a first intermediate electrode
- This device 200 makes it possible to focus the optical beam F on the sample 1 as well and therefore to form the enlarged image of the sample, as to collect the opti radiation ( ⁇ e emitted by said sample or by the atomized atoms, following ion bombardment
- the optical beam F is obtained by means of a light source, not shown, generally arranged laterally with respect to the column with reference parallel to the axis A by a 45 ° mirror placed on said axis and pierced with a hole for passage of the ion beam.
- the optical focusing device 200 is a Cassegrain type mirror objective comprising a first convex spherical mirror 210 located on the path of the optical beam F and a second concave spherical mirror 220 focusing on the integrated circuit 1 the beam coming from the first mirror 210.
- the latter is provided with a hole 21 1 to allow passage of the ion beam through the second intermediate electrode 122, the assembly formed by the first mirror 210 and said second intermediate electrode 122 being held in the center of the column by a metal tripod 212 providing great transparency to the optical beam.
- a metal tripod 212 providing great transparency to the optical beam.
- the optical focusing device 200 also includes an outlet opening 230 itself comprising a window 240 transparent to the photons of the optical beam F, held by its edges to the outer casing of the grounded column.
- the outlet electrode 130 is formed by a metal insert, passing through the window 240, the holding of which is ensured by the said window 240 and being drilled in the middle of a central hole 131 for the outlet of the electrode 130.
- the transparent window 240 is provided electrically conductive.
- it can be a glass plate covered with at least one conductive layer 241, such as indium and / or tin oxide.
- the outlet hole 131 a diameter of small value, compatible with the resolution desired for the ion beam, while retaining independently, an aperture 230 of larger diameter, providing the optical beam with a geometrical extent allowing sufficient digital aperture, and therefore obtaining a good quality optical image of the sample 1 observed.
- the outlet window 240 could just as easily be constituted by a solid material transparent to photons and any conductor of electricity.
- the metal insert 130 projects from the surface of the window 240 towards the second intermediate electrode 122, this so as to protect said window in the event of an electrical breakdown, this occurring between the insert 130 and the second electrode 122.
- the optical focusing device 200 of the embodiment of the invention presented in FIG. 2 is a mirror lens 210. 220 of the Cassegrain type brought to a high voltage, for example between 10 and 20 keN.
- a first mirror 300 is placed in the axis A of the ion beam, between the first 121 and second 122 intermediate electrodes and, more precisely, between the first intermediate electrode 121 and the mirror lens 210, 220 of the Cassegrain type.
- This mirror 300 is pierced with a hole 310 intended for the passage of the ion beam. It is oriented substantially at 45 ° relative to the axis A so as to deflect the optical beam F by approximately 90 °, laterally, in the direction of a second mirror 320 disposed in the space between the side walls 140 of the column and the room 120.
- This second mirror 300 is placed in the axis A of the ion beam, between the first 121 and second 122 intermediate electrodes and, more precisely, between the first intermediate electrode 121 and the mirror lens 210, 220 of the Cassegrain type.
- This mirror 300 is pierced with a hole 310 intended for the passage of the ion beam. It is oriented substantially at 45 ° relative to the axis
- 320 is itself oriented at 45 ° relative to the axis A. It deflects the beam F by 90 ° in the same direction as that of this axis. parallel to this one.
- the diameter of the hole 1 1 1 formed at the end of the input electrode 110. which is intended to allow the ion beam A to pass, but which does not have a function, unlike the embodiment of the Figure 1, to let the optical beam pass, can be reduced to values of the order of a millimeter.
- the deflection plates 10, located upstream of the input electrode 110 no longer have to undergo anti-reflection treatment necessary for the good conduction of the optical beam.
- the artefacts due to the interaction of the light beam with the walls of the ion optical elements, which existed upstream of the first mirror 300, in particular at the level of the deflection plates 10 of the embodiment of FIG. 1, and which in particular reduced the quality of the interpretation of the images obtained, are eliminated.
- the opening 230 does not include a window 240, but a set of metal tabs or, at the very least, electrically conductive. These legs, for example three in number, form a metal tripod 250 held by the edges of the outer casing of the grounded column which delimit the opening 230. They ensure good maintenance of the insert 130 while preserving the transparency property of the opening 230 to the optical beam.
- the outlet hole 131 it is possible to choose, for the outlet hole 131, a diameter of small value, compatible with the desired resolution for the ion beam, any retaining, independently, an opening 230 of larger diameter, providing the optical beam with a geometrical extent allowing sufficient illumination of the sample 1 observed.
- the legs of the metal tripod 212 intended to hold the assembly formed by the mirror 210 and the second intermediate electrode 122, are curved so as to increase their distance from the legs of the tripod 250 and the output electrode 130. Therefore, the risks of breakdown are limited, as well as the electric field distortions caused by the tripod.
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0003501A FR2806527B1 (en) | 2000-03-20 | 2000-03-20 | SIMULTANEOUS FOCUSING COLUMN OF PARTICLE BEAM AND OPTICAL BEAM |
FR0003501 | 2000-03-20 | ||
PCT/FR2001/000812 WO2001071766A1 (en) | 2000-03-20 | 2001-03-19 | Column simultaneously focusing a particle beam and an optical beam |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1292965A1 true EP1292965A1 (en) | 2003-03-19 |
Family
ID=8848259
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01919529A Withdrawn EP1292965A1 (en) | 2000-03-20 | 2001-03-19 | Column simultaneously focusing a particle beam and an optical beam |
Country Status (6)
Country | Link |
---|---|
US (3) | US7045791B2 (en) |
EP (1) | EP1292965A1 (en) |
AU (1) | AU2001246611A1 (en) |
FR (1) | FR2806527B1 (en) |
TW (1) | TW591703B (en) |
WO (1) | WO2001071766A1 (en) |
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- 2001-03-20 TW TW090106480A patent/TW591703B/en not_active IP Right Cessation
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See references of WO0171766A1 * |
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US7045791B2 (en) | 2006-05-16 |
AU2001246611A1 (en) | 2001-10-03 |
US7573050B2 (en) | 2009-08-11 |
US20060097198A1 (en) | 2006-05-11 |
US20030102436A1 (en) | 2003-06-05 |
TW591703B (en) | 2004-06-11 |
US7297948B2 (en) | 2007-11-20 |
US20080111084A1 (en) | 2008-05-15 |
FR2806527A1 (en) | 2001-09-21 |
WO2001071766A1 (en) | 2001-09-27 |
FR2806527B1 (en) | 2002-10-25 |
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