EP1147580A4 - Gas laser - Google Patents

Gas laser

Info

Publication number
EP1147580A4
EP1147580A4 EP99952771A EP99952771A EP1147580A4 EP 1147580 A4 EP1147580 A4 EP 1147580A4 EP 99952771 A EP99952771 A EP 99952771A EP 99952771 A EP99952771 A EP 99952771A EP 1147580 A4 EP1147580 A4 EP 1147580A4
Authority
EP
European Patent Office
Prior art keywords
gas laser
laser
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP99952771A
Other languages
German (de)
French (fr)
Other versions
EP1147580A2 (en
Inventor
Oded Anner
Shlomo Turgeman
Haim Mukatel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LIGHTLASE Ltd
Original Assignee
LIGHTLASE Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LIGHTLASE Ltd filed Critical LIGHTLASE Ltd
Publication of EP1147580A2 publication Critical patent/EP1147580A2/en
Publication of EP1147580A4 publication Critical patent/EP1147580A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08059Constructional details of the reflector, e.g. shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/04Arrangements for thermal management
    • H01S3/041Arrangements for thermal management for gas lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08018Mode suppression
    • H01S3/0804Transverse or lateral modes
    • H01S3/0805Transverse or lateral modes by apertures, e.g. pin-holes or knife-edges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/081Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813Configuration of resonator
    • H01S3/0815Configuration of resonator having 3 reflectors, e.g. V-shaped resonators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
EP99952771A 1998-10-26 1999-10-26 Gas laser Withdrawn EP1147580A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL12676598A IL126765A0 (en) 1998-10-26 1998-10-26 Gas laser
IL12676598 1998-10-26
PCT/IL1999/000566 WO2000025393A2 (en) 1998-10-26 1999-10-26 Gas laser

Publications (2)

Publication Number Publication Date
EP1147580A2 EP1147580A2 (en) 2001-10-24
EP1147580A4 true EP1147580A4 (en) 2002-07-24

Family

ID=11072071

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99952771A Withdrawn EP1147580A4 (en) 1998-10-26 1999-10-26 Gas laser

Country Status (5)

Country Link
EP (1) EP1147580A4 (en)
JP (1) JP2002528918A (en)
AU (1) AU6485599A (en)
IL (1) IL126765A0 (en)
WO (1) WO2000025393A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3760111B2 (en) * 2000-05-19 2006-03-29 知夫 藤岡 Cylindrical straight slab type gas laser
JP3357341B2 (en) * 2000-05-19 2002-12-16 知夫 藤岡 Cylindrical straight slab type gas laser

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5434881A (en) * 1992-09-30 1995-07-18 Siemens Aktiengesellschaft Diffusion-cooled CO2 stripline laser having reduced ignition voltage
US5479428A (en) * 1992-01-22 1995-12-26 Mitsubishi Denki Kabushiki Kaisha Laser apparatus
DE4424726C1 (en) * 1994-07-13 1996-02-01 Rofin Sinar Laser Gmbh Coaxial waveguide laser with stable resonator
US5528619A (en) * 1994-05-13 1996-06-18 Deutsche Forschungsanstalt Fuer Luft-Und Raumfahrt E.V. Gas discharge structure

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3778605D1 (en) * 1986-01-29 1992-06-04 Fanuc Ltd GAS LASER WITH HIGH FREQUENCY EXCITATION.
FR2635232B1 (en) * 1988-08-04 1990-09-28 Soudure Autogene Francaise APPARATUS FOR DELIVERING A LASER BEAM
US5590147A (en) * 1994-12-19 1996-12-31 The Morgan Curcible Company Plc Side-pumped lasers

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5479428A (en) * 1992-01-22 1995-12-26 Mitsubishi Denki Kabushiki Kaisha Laser apparatus
US5434881A (en) * 1992-09-30 1995-07-18 Siemens Aktiengesellschaft Diffusion-cooled CO2 stripline laser having reduced ignition voltage
US5528619A (en) * 1994-05-13 1996-06-18 Deutsche Forschungsanstalt Fuer Luft-Und Raumfahrt E.V. Gas discharge structure
DE4424726C1 (en) * 1994-07-13 1996-02-01 Rofin Sinar Laser Gmbh Coaxial waveguide laser with stable resonator

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
BETHEL J W ET AL: "A new scalable annular CO2 laser with high specific output power", OPTICS COMMUNICATIONS, NORTH-HOLLAND PUBLISHING CO. AMSTERDAM, NL, vol. 145, no. 1-6, 1998, pages 352 - 358, XP004102723, ISSN: 0030-4018 *

Also Published As

Publication number Publication date
IL126765A0 (en) 1999-08-17
JP2002528918A (en) 2002-09-03
AU6485599A (en) 2000-05-15
WO2000025393A3 (en) 2000-08-10
EP1147580A2 (en) 2001-10-24
WO2000025393A2 (en) 2000-05-04

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