EP0627330A1 - Process for making engraved markings covered with contrasting material - Google Patents

Process for making engraved markings covered with contrasting material Download PDF

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Publication number
EP0627330A1
EP0627330A1 EP94810320A EP94810320A EP0627330A1 EP 0627330 A1 EP0627330 A1 EP 0627330A1 EP 94810320 A EP94810320 A EP 94810320A EP 94810320 A EP94810320 A EP 94810320A EP 0627330 A1 EP0627330 A1 EP 0627330A1
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Prior art keywords
protective layer
contrast material
deposited
substrate
layer
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EP94810320A
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German (de)
French (fr)
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EP0627330B1 (en
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Branko Glavan
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/225—Removing surface-material, e.g. by engraving, by etching by engraving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/04—Producing precipitations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/222—Removing surface-material, e.g. by engraving, by etching using machine-driven mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/228—Removing surface-material, e.g. by engraving, by etching by laser radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Definitions

  • the present invention relates to a method for obtaining an engraved imprint provided with a contrast material, on a metallic or ceramic substrate, according to which the substrate is temporarily covered, before etching, with a protective layer.
  • This method is intended in particular for obtaining imprints engraved on watch glasses, in particular rotating glasses bearing numbers and graduations.
  • the engraving is generally carried out with acid.
  • the image of the imprint to be engraved on the substrate is formed by decal, then the substrate is galvanically coated with a protective layer.
  • the decal is then removed, followed by acid etching, after which the protective layer is removed in turn chemically.
  • PVD cathode sputtering
  • the object of the present invention is to obtain an engraved imprint provided with a contrast material which obviates the defects of the imprints imprinted by known methods, more precisely to obtain an imprint in which the contrast material is deposited very cleanly and has a great adhesion to the substrate.
  • the method according to the invention is characterized in that after etching, a contrasting material of metallic or mineral type is deposited under vacuum, before removing the protective layer, then the protective layer is removed and, with it the contrast material deposited on this protective layer, so that the construction material remains only in the imprint.
  • the contrast material has a hardness and adhesion much higher than that of a varnish and this also on the protective layer. It was therefore thought first of all that it would be very difficult to remove the protective layer, this being protected by the deposited contrast material. However, it has been found that it is possible to chemically attack a metallic protective layer through the layer of contrast material, either by dislocating the latter by heat treatment, or by using the porosity of the contrast material. .
  • a protective lead layer dislocates the layer of construction material deposited on the lead by heating the lead to its melting point.
  • This method can be applied with any protective layer having a melting point substantially lower than that of the substrate.
  • Vacuum deposition of the contrast material can also be done by vacuum metallization or by ion implantation.
  • the protective layer may also consist of a varnish of a different nature from the varnish used for the decal. In this case, the removal of these varnishes is not done by selective dissolution, so as not to remove the protective layer with the decal.
  • the engraving can be carried out with acid or mechanically.
  • the method according to the invention makes it possible to obtain a deposit of contrast material having good adhesion, good chemical resistance and, in the case of vacuum metallization, a wide choice of colors.
  • a decal 2 is deposited, consisting of a varnish (phase A).
  • the method described so far is a known method of engraving.
  • the chosen composition is then deposited by cathode sputtering (PVD), for example a carbide or a titanium nitride, which forms a layer 6 over the entire surface of the substrate, that is to say as well on the lead layer 3 as in imprint 5.
  • PVD cathode sputtering
  • the substrate is then heated to the lead melting temperature, which has the effect of dislocating the decorative layer 6 deposited on the lead.
  • the lead is then eliminated in a bath, for example an ERNE bath, and the browning is also removed by dissolution.
  • a substrate 1 is obtained having an etched imprint covered with a layer 7 of contrast material. This layer has very high strength and excellent adhesion.
  • This method can be used with various substrates, for example a gold, platinum, titanium, metal, ceramic or glass substrate.
  • the decorative layer 6 could also be deposited by ion implantation. The adhesion of the layer would be even better. Another solution is to deposit the decorative layer 6 by vacuum metallization. The layer obtained has an average adhesion, but on the other hand a much wider choice of colors than by sputtering. However, such a layer has good chemical resistance.
  • the engraving process is susceptible to many variations.
  • the savings layer 2 could in particular consist of a photoresist layer.
  • the protective layer 3 which has the function of effectively protecting the part during the etching, it must at the same time have different physical or chemical characteristics from the substrate and from the decorative layer 6 to allow an effective unraveling of this layer of protection without damaging the piece and the decorative layer deposited in the engraved imprint.
  • a galvanically deposited protective layer it is possible to use for example lead, a mixture of tin and lead, indium, gallium, gold, nickel, etc. Removing these layers without removing the decorative layer can be selectively by several methods, such as selective chemical attack, supercooling or the use of the porosity of the decorative layers.
  • the protective layer 3 can also consist of a varnish.
  • This varnish will, for example, be of a different nature from the varnish constituting the sparing layer 2 to allow the selective dissolution of the latter. It is also possible to cover the entire substrate with any varnish and to remove this varnish, on the surface to be etched, by laser attack.
  • the protective layer 3 could be in photoresist.
  • the surface to be etched 4 would then be released by photolithography.
  • the engraving could also be carried out mechanically, for example by means of a numerically controlled machine.
  • a protective layer which, unlike the state C shown in the drawing, completely covers the surface of the substrate. The process then takes place as previously according to E and F.
  • the engraving could be performed by laser.
  • the deposition of a contrast material by vacuum deposition also has the advantage of being able to be carried out at relatively low temperatures which no permanent deformation of the substrate. Such methods are also environmentally friendly.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

The process relates to the etching of a metal, ceramic or glass substrate, in which the substrate (1) is temporarily covered, before etching, with a protective layer (3). The process consists in vacuum depositing a contrast material (6), of the metallic or inorganic type, before removing the protective layer, and then in removing the protective layer and, with it, the contrast material deposited on this layer, in such a way that the contrast material remains only in the impression. The contrast material is preferably deposited by sputtering, but it can also be deposited by vacuum metallisation or by ion implantation. The contrast material is deposited very cleanly and adheres strongly to the substrate. <IMAGE>

Description

La présente invention concerne un procédé d'obtention d'une empreinte gravée pourvue d'un matériau de contraste, sur un substrat métallique ou céramique, selon lequel le substrat est recouvert temporairement, avant gravage, d'une couche de protection.The present invention relates to a method for obtaining an engraved imprint provided with a contrast material, on a metallic or ceramic substrate, according to which the substrate is temporarily covered, before etching, with a protective layer.

Ce procédé est destiné en particulier à l'obtention d'empreintes gravées sur des lunettes de montre, en particulier des lunettes tournantes portant des chiffres et des graduations.This method is intended in particular for obtaining imprints engraved on watch glasses, in particular rotating glasses bearing numbers and graduations.

Il est connu de revêtir les empreintes gravées d'un vernis de contraste de manière à rendre cette gravure bien visible. Le vernis est déposé grossièrement dans l'empreinte de manière à bien remplir celle-ci et le surplus de vernis est éliminé mécaniquement. Lors de cette dernière opération, il arrive fréquemment que du vernis soit arraché de l'empreinte et que la pièce gravée ne présente plus la qualité exigée ce qui représente un déchet. En raison de la faible adhérence du vernis sur le métal le vernis peut se détacher à l'usage, par exemple au porter de la montre. Pour des produits de haute gamme, un tel incident peut causer un tort considérable à la renommée du produit.It is known to coat the engraved imprints with a contrast varnish so as to make this engraving clearly visible. The varnish is roughly deposited in the impression so as to fill it well and the excess varnish is removed mechanically. During this last operation, it frequently happens that varnish is torn from the impression and that the engraved part no longer has the required quality, which represents waste. Due to the low adhesion of the varnish to the metal, the varnish can come off during use, for example when wearing the watch. For high-end products, such an incident can cause considerable damage to the reputation of the product.

Le gravage est généralement effectué à l'acide. A cet effet l'image de l'empreinte à graver sur le substrat est formée par décalque, puis le substrat est revêtu galvaniquement d'une couche protectrice. Le décalque est ensuite éliminé, puis il est procédé au gravage à l'acide, après quoi la couche protectrice est éliminée à son tour chimiquement.The engraving is generally carried out with acid. To this end, the image of the imprint to be engraved on the substrate is formed by decal, then the substrate is galvanically coated with a protective layer. The decal is then removed, followed by acid etching, after which the protective layer is removed in turn chemically.

Il est par ailleurs connu de déposer sous vide des matériaux de type métallique ou minéral sur des substrats. Il est notamment connu de déposer des compositions très dures par pulvérisation cathodique (PVD) pour donner à l'ensemble de la surface d'une pièce une grande résistance à l'abrasion et/ou un aspect particulier.It is also known to deposit under vacuum materials of metallic or mineral type on substrates. It is notably known to deposit very hard compositions by cathode sputtering (PVD) to give the entire surface of a part a high resistance to abrasion and / or a particular appearance.

La présente invention a pour but d'obtenir une empreinte gravée pourvue d'un matériau de contraste obviant aux défauts des empreintes gravées par les procédés connus, plus précisément d'obtenir une empreinte dans laquelle le matériau de contraste est déposé très proprement et présente une grande adhérence au substrat.The object of the present invention is to obtain an engraved imprint provided with a contrast material which obviates the defects of the imprints imprinted by known methods, more precisely to obtain an imprint in which the contrast material is deposited very cleanly and has a great adhesion to the substrate.

Le procédé selon l'invention est caractérisé en ce qu'après gravage, on dépose sous vide un matériau de contraste de type métallique ou minéral, avant d'éliminer la couche de protection, puis qu'on élimine la couche de protection et, avec elle le matériau de contraste déposé sur cette couche de protection, de telle manière que le matériau de constrate ne subsiste que dans l'empreinte.The method according to the invention is characterized in that after etching, a contrasting material of metallic or mineral type is deposited under vacuum, before removing the protective layer, then the protective layer is removed and, with it the contrast material deposited on this protective layer, so that the construction material remains only in the imprint.

En général, le matériau de contraste présente une dureté et une adhérence bien supérieure à celle d'un vernis et ceci également sur la couche de protection. On a dès lors pensé tout d'abord qu'il serait très difficile d'éliminer la couche de protection, celle-ci étant protégée par le matériau de contraste déposé. Or, il s'est avéré qu'il est possible d'attaquer chimiquement une couche de protection métallique à travers la couche de matériau de contraste, soit en disloquant celle-ci par un traitement thermique, soit en utilisant la porosité du matériau de contraste.In general, the contrast material has a hardness and adhesion much higher than that of a varnish and this also on the protective layer. It was therefore thought first of all that it would be very difficult to remove the protective layer, this being protected by the deposited contrast material. However, it has been found that it is possible to chemically attack a metallic protective layer through the layer of contrast material, either by dislocating the latter by heat treatment, or by using the porosity of the contrast material. .

Par exemple, dans le cas d'un dépôt par pulvérisation cathodique, qui permet d'obtenir des dépôts très résistant avec une excellente adhérence sur un substrat métallique tel que l'acier inox, l'or, le platine, le titane, les métaux durs ou les céramiques, le dépôt d'une couche de protection en plomb permet de disloquer la couche de matériau de constrate déposée sur le plomb par le chauffage du plomb à son point de fusion. Cette méthode peut être appliquée avec toute couche de protection présentant un point de fusion sensiblement inférieur à celui du substrat.For example, in the case of sputtering deposition, which makes it possible to obtain very resistant deposits with excellent adhesion to a metallic substrate such as stainless steel, gold, platinum, titanium, metals hard or ceramic, depositing a protective lead layer dislocates the layer of construction material deposited on the lead by heating the lead to its melting point. This method can be applied with any protective layer having a melting point substantially lower than that of the substrate.

Le dépôt sous vide du matériau de contraste peut également se faire par métallisation sous vide ou par implantation ionique.Vacuum deposition of the contrast material can also be done by vacuum metallization or by ion implantation.

La couche de protection peut être également constituée d'un vernis de nature différente du vernis utilisé pour le décalque. Dans ce cas, l'élimination de ces vernis se fait pas dissolution sélective, de manière à ne pas éliminer la couche de protection avec le décalque.The protective layer may also consist of a varnish of a different nature from the varnish used for the decal. In this case, the removal of these varnishes is not done by selective dissolution, so as not to remove the protective layer with the decal.

Le gravage peut être exécuté à l'acide ou mécaniquement. Dans tous les cas, le procédé selon l'invention permet d'obtenir un dépôt de matériau de contraste présentant une bonne adhérence, une bonne résistance chimique et, dans le cas d'une métallisation sous vide, un vaste choix de couleurs.The engraving can be carried out with acid or mechanically. In all cases, the method according to the invention makes it possible to obtain a deposit of contrast material having good adhesion, good chemical resistance and, in the case of vacuum metallization, a wide choice of colors.

Un exemple de mise en oeuvre du procédé selon l'invention sera décrit ci-après en relation avec le dessin annexé dont la figure unique représente schématiquement un substrat dans les différentes phases du procédé.An example of implementation of the method according to the invention will be described below in relation to the attached drawing, the single figure of which schematically represents a substrate in the different phases of the method.

Sur un substrat 1 en acier inox, par exemple une lunette de montre, on dépose une décalque 2 constitué d'un vernis (phase A).On a stainless steel substrate 1, for example a watch bezel, a decal 2 is deposited, consisting of a varnish (phase A).

Après séchage, dégraissage chimique, neutralisation-activation, on procède à un pré-dorage, puis au dépôt d'une couche de plomb 3 dans un bain galvanique (par exemple ERNE pendant 10 min à raison de 1 A/dm² à une température de 20°C), cette couche de plomb constituant une couche de protection recouvrant toute la surface du substrat à l'exception du décalque 2 (phase B). Le décalque 2 est ensuite éliminé dans un bain (par exemple un bain de BERLEX pendant 30 min). On obtient l'état représenté en C.After drying, chemical degreasing, neutralization-activation, a pre-browning is carried out, followed by the deposition of a layer of lead 3 in a galvanic bath (for example ERNE for 10 min at a rate of 1 A / dm² at a temperature of 20 ° C), this lead layer constituting a protective layer covering the entire surface of the substrate with the exception of decal 2 (phase B). Decal 2 is then removed in a bath (for example a BERLEX bath for 30 min). We obtain the state represented in C.

Il est ensuite procédé au gravage à l'acide par attaque à l'acide de la surface 4 découverte par l'élimination du vernis 2. Le gravage se fait par exemple dans un bain de FeCl3 à 50°C et °Bé 40. On obtient une empreinte 5 (phase D).It is then carried out with acid etching by acid attack of the surface 4 discovered by the elimination of the varnish 2. The etching is done for example in a FeCl3 bath at 50 ° C and 40 ° Bé. obtains an imprint 5 (phase D).

Le procédé décrit jusqu'ici est un procédé connu de gravage.The method described so far is a known method of engraving.

On dépose ensuite par pulvérisation cathodique (PVD) la composition choisie, par exemple un carbure ou un nitrure de titane, qui forme une couche 6 sur toute la surface du substrat, c'est-à-dire aussi bien sur la couche de plomb 3 que dans l'empreinte 5. Cet état est représenté en E.The chosen composition is then deposited by cathode sputtering (PVD), for example a carbide or a titanium nitride, which forms a layer 6 over the entire surface of the substrate, that is to say as well on the lead layer 3 as in imprint 5. This state is represented in E.

On chauffe ensuite le substrat jusqu'à la température de fusion du plomb ce qui a pour effet de disloquer la couche décorative 6 déposée sur le plomb. Le plomb est ensuite éliminé dans un bain, par exemple un bain ERNE, et le dorage est également éliminé par dissolution. On obtient finalement un substrat 1 présentant une empreinte gravée recouverte d'une couche 7 de matériau de contraste. Cette couche présente une très grande résistance et une excellente adhérence.The substrate is then heated to the lead melting temperature, which has the effect of dislocating the decorative layer 6 deposited on the lead. The lead is then eliminated in a bath, for example an ERNE bath, and the browning is also removed by dissolution. Finally, a substrate 1 is obtained having an etched imprint covered with a layer 7 of contrast material. This layer has very high strength and excellent adhesion.

Ce procédé peut être utilisé avec divers substrats, par exemple un substrat en or, en platine, en titane, en métal, en céramique ou en verre.This method can be used with various substrates, for example a gold, platinum, titanium, metal, ceramic or glass substrate.

La couche décorative 6 pourrait également être déposée par implantation ionique. L'adhérence de la couche serait encore meilleure. Une autre solution consiste à déposer la couche décorative 6 par métallisation sous vide. La couche obtenue présente une adhérence moyenne, mais par contre un choix de couleurs beaucoup plus vaste que par pulvérisation cathodique. Une telle couche présente par contre une bonne résistance chimique.The decorative layer 6 could also be deposited by ion implantation. The adhesion of the layer would be even better. Another solution is to deposit the decorative layer 6 by vacuum metallization. The layer obtained has an average adhesion, but on the other hand a much wider choice of colors than by sputtering. However, such a layer has good chemical resistance.

Le processus de gravage est susceptible de nombreuses variantes. La couche d'épargne 2 pourrait notamment être constituée d'une couche de photorésiste.The engraving process is susceptible to many variations. The savings layer 2 could in particular consist of a photoresist layer.

Quant à la couche de protection 3, qui a pour fonction de protéger la pièce efficacement pendant le gravage, elle doit posséder en même temps des caractéristiques physiques ou chimiques différentes du substrat et de la couche décorative 6 pour permettre un défaisage efficace de cette couche de protection sans endommager la pièce et la couche décorative déposée dans l'empreinte gravée. Dans le cas d'une couche de protection déposée galvaniquement, il est possible d'utiliser par exemple du plomb, un mélange d'étain et de plomb, de l'indium, du gallium, de l'or, du nickel, etc. L'enlèvement de ces couches, sans enlever la couche décorative peut se faire sélectivement par plusieurs méthode, telles qu'attaque sélective chimique, surfusion ou l'utilisation de la porosité des couches de décoration.As for the protective layer 3, which has the function of effectively protecting the part during the etching, it must at the same time have different physical or chemical characteristics from the substrate and from the decorative layer 6 to allow an effective unraveling of this layer of protection without damaging the piece and the decorative layer deposited in the engraved imprint. In the case of a galvanically deposited protective layer, it is possible to use for example lead, a mixture of tin and lead, indium, gallium, gold, nickel, etc. Removing these layers without removing the decorative layer can be selectively by several methods, such as selective chemical attack, supercooling or the use of the porosity of the decorative layers.

La couche de protection 3 peut également être constituée d'un vernis. Ce vernis sera, par exemple, de nature différente du vernis constituant la couche d'épargne 2 pour permettre la dissolution sélective de ce dernier. Il est également possible de recouvrir tout le substrat d'un vernis quelconque et d'éliminer ce vernis, sur la surface à graver, par attaque au laser.The protective layer 3 can also consist of a varnish. This varnish will, for example, be of a different nature from the varnish constituting the sparing layer 2 to allow the selective dissolution of the latter. It is also possible to cover the entire substrate with any varnish and to remove this varnish, on the surface to be etched, by laser attack.

Dans le cas d'un substrat en verre, la couche de protection 3 pourrait être en photorésiste. La surface à graver 4 serait alors dégagée par photolithographie.In the case of a glass substrate, the protective layer 3 could be in photoresist. The surface to be etched 4 would then be released by photolithography.

Le gravage pourrait être également exécuté mécaniquement, par exemple au moyen d'une machine à commande numérique. Dans ce cas, on commence par revêtir le substrat d'une couche de protection, laquelle à la différence de l'état C représenté au dessin, recouvre entièrement la surface du substrat. Le procédé se déroule ensuite comme précédemment selon E et F.The engraving could also be carried out mechanically, for example by means of a numerically controlled machine. In this case, we start by coating the substrate with a protective layer, which, unlike the state C shown in the drawing, completely covers the surface of the substrate. The process then takes place as previously according to E and F.

Le gravage pourrait être exécuté au laser.The engraving could be performed by laser.

Le dépôt d'un matériau de contraste par déposition sous vide, qu'il s'agisse de pulvéristion cathodique, de métallisation sous vide ou d'implantation ionique, a en outre pour avantage de pouvoir être effectué à des températures relativement basses n'entraînant pas de déformation permanente du substrat. De tels procédés sont en outre respectueux de l'environnement.The deposition of a contrast material by vacuum deposition, whether it is cathode sputtering, vacuum metallization or ion implantation, also has the advantage of being able to be carried out at relatively low temperatures which no permanent deformation of the substrate. Such methods are also environmentally friendly.

Claims (10)

Procédé d'obtention d'une empreinte gravée (5) pourvue d'un matériau de contraste (7), sur un substrat métallique, en céramique ou en verre (1), selon lequel le substrat est recouvert temporairement, avant gravage, d'une couche de protection (3), caractérisé en ce qu'après gravage, on dépose sous vide un matériau de contraste (6) de type métallique ou minéral, avant d'éliminer la couche de protection (3), puis qu'on élimine la couche de protection (3) et, avec elle le matériau de contraste déposé sur cette couche de protection, de telle manière que le matériau de contraste ne subsiste que dans l'empreinte (7).Method for obtaining an engraved imprint (5) provided with a contrast material (7), on a metallic, ceramic or glass substrate (1), according to which the substrate is temporarily covered, before engraving, with a protective layer (3), characterized in that after engraving, a contrast material (6) of metallic or mineral type is deposited under vacuum, before eliminating the protective layer (3), then eliminating the protective layer (3) and, with it the contrast material deposited on this protective layer, so that the contrast material remains only in the imprint (7). Procédé selon la revendication 1, caractérisé en ce que le matériau de contraste est déposé par pulvérisation cathodique.Method according to claim 1, characterized in that the contrast material is deposited by sputtering. Procédé selon la revendication 1, caractérisé en ce que le matériau de contraste est déposé par métallisation sous vide.Method according to claim 1, characterized in that the contrast material is deposited by vacuum metallization. Procédé selon la revendication 1, caractérisé en ce que le matériau de contraste est déposé par implantation ionique.Method according to claim 1, characterized in that the contrast material is deposited by ion implantation. Procédé selon l'une des revendications 1 à 4, caractérisé en ce que la couche de protection (3) est une couche galvanique.Method according to one of claims 1 to 4, characterized in that the protective layer (3) is a galvanic layer. Procédé selon la revendication 5, caractérisé en ce que la couche de protection (3) présente un point de fusion sensiblement inférieur à celui du substrat et du matériau de contraste (6) déposé et que, pour éliminer la couche de protection, on chauffe le substrat à la température de fusion de la couche de protection de manière à disloquer la couche de matériau de contraste déposée sur la couche de protection de manière à permettre l'attaque chimique de la couche de protection.Method according to claim 5, characterized in that the protective layer (3) has a melting point substantially lower than that of the substrate and of the contrast material (6) deposited and that, in order to eliminate the protective layer, the substrate is heated to the melting temperature of the protective layer so as to dislocate the layer of contrast material deposited on the protective layer so as to allow chemical attack on the protective layer. Procédé selon la revendication 5, caractérisé en ce que la couche de protection est constituée de plomb, d'étain-plomb, d'indium, de gallium d'or ou de nickel.Method according to claim 5, characterized in that the protective layer consists of lead, tin-lead, indium, gallium of gold or nickel. Procédé selon l'une des revendications 1 à 4, caractérisé en ce que la couche de protection est un vernis, la surface à graver étant, par exemple, dégagée par attaque au laser.Method according to one of claims 1 to 4, characterized in that the protective layer is a varnish, the surface to be etched being, for example, released by laser attack. Procédé selon l'une des revendications 1 à 7, caractérisé en ce que le gravage est effectué à l'acide ou mécaniquement.Method according to one of claims 1 to 7, characterized in that the etching is carried out with acid or mechanically. Procédé selon la revendication 9, dans lequel l'endroit de l'empreinte à graver est protégé par un vernis avant le dépôt de la couche de protection également constituée d'un vernis, caractérisé en ce que qu'on utilise deux vernis de natures différentes permettant la dissolution sélective du seul vernis protégeant la surface à graver.Method according to claim 9, in which the place of the imprint to be engraved is protected by a varnish before the deposition of the protective layer also consisting of a varnish, characterized in that two varnishes of different natures are used allowing the selective dissolution of the only varnish protecting the surface to be engraved.
EP19940810320 1993-06-03 1994-06-01 Process for making engraved markings covered with contrasting material Expired - Lifetime EP0627330B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH165593A CH684915B5 (en) 1993-06-03 1993-06-03 Method for obtaining an etched impression provided with a contrast material.
CH1655/93 1993-06-03

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EP0627330A1 true EP0627330A1 (en) 1994-12-07
EP0627330B1 EP0627330B1 (en) 1997-05-02

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EP (1) EP0627330B1 (en)
CH (1) CH684915B5 (en)
DE (1) DE69402913D1 (en)

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FR2744066A1 (en) * 1996-01-30 1997-08-01 Otis Elevator Co Method of laser printing on e.g. metal, wood etc.
WO2009009254A1 (en) * 2007-07-09 2009-01-15 Nike, Inc. Method for manufacturing layered elements with incisions
FR2927839A1 (en) * 2008-02-22 2009-08-28 Novatec Sa Traceability marking and reading method for e.g. bottle in wine, alcohol or spirits field, involves combining hardened marking obtained by cutting or deformation coating so that marking is read and interpreted

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Publication number Priority date Publication date Assignee Title
CN108394224B (en) * 2017-02-07 2020-06-26 王京 Method for inlaying pure gold wire and pure silver wire on ancient porcelain scrap

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CH344654A (en) * 1955-07-30 1960-02-15 Vogt Alois Dr Process for the production of sharply defined raised characters on a substrate
GB957292A (en) * 1963-04-24 1964-05-06 Iwatani & Co A method of forming an etched and coloured pattern
GB2013723A (en) * 1978-02-07 1979-08-15 Sambonet Spa Decoration patterns on metallic surfaces
GB2017010A (en) * 1978-03-27 1979-10-03 Toppan Printing Co Ltd Coloured decorative metal panel

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CH344654A (en) * 1955-07-30 1960-02-15 Vogt Alois Dr Process for the production of sharply defined raised characters on a substrate
GB957292A (en) * 1963-04-24 1964-05-06 Iwatani & Co A method of forming an etched and coloured pattern
GB2013723A (en) * 1978-02-07 1979-08-15 Sambonet Spa Decoration patterns on metallic surfaces
GB2017010A (en) * 1978-03-27 1979-10-03 Toppan Printing Co Ltd Coloured decorative metal panel

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2744066A1 (en) * 1996-01-30 1997-08-01 Otis Elevator Co Method of laser printing on e.g. metal, wood etc.
US5851335A (en) * 1996-01-30 1998-12-22 Otis Elevator Company Method and compositions for laser imprinting AND articles imprinted using such methods and compositions
US5919853A (en) * 1996-01-30 1999-07-06 Otis Elevator Company Method and compositions for laser imprinting and articles imprinted using such methods and composition
WO2009009254A1 (en) * 2007-07-09 2009-01-15 Nike, Inc. Method for manufacturing layered elements with incisions
CN101730487B (en) * 2007-07-09 2011-06-22 耐克国际有限公司 Method for manufacturing layered elements with incisions
US8008599B2 (en) 2007-07-09 2011-08-30 Nike, Inc. Method for manufacturing layered elements with incisions
EP3025607A1 (en) * 2007-07-09 2016-06-01 NIKE Innovate C.V. Method for manufacturing layered elements with incisions
FR2927839A1 (en) * 2008-02-22 2009-08-28 Novatec Sa Traceability marking and reading method for e.g. bottle in wine, alcohol or spirits field, involves combining hardened marking obtained by cutting or deformation coating so that marking is read and interpreted

Also Published As

Publication number Publication date
DE69402913D1 (en) 1997-06-05
EP0627330B1 (en) 1997-05-02
CH684915B5 (en) 1995-08-15
CH684915GA3 (en) 1995-02-15

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