DE60217771D1 - Exposure system, projection exposure apparatus and method of making an article - Google Patents

Exposure system, projection exposure apparatus and method of making an article

Info

Publication number
DE60217771D1
DE60217771D1 DE60217771T DE60217771T DE60217771D1 DE 60217771 D1 DE60217771 D1 DE 60217771D1 DE 60217771 T DE60217771 T DE 60217771T DE 60217771 T DE60217771 T DE 60217771T DE 60217771 D1 DE60217771 D1 DE 60217771D1
Authority
DE
Germany
Prior art keywords
article
making
exposure apparatus
projection exposure
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60217771T
Other languages
German (de)
Other versions
DE60217771T3 (en
DE60217771T2 (en
Inventor
Toshihiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26619491&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60217771(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP2001228796A external-priority patent/JP3605053B2/en
Priority claimed from JP2001232682A external-priority patent/JP3605055B2/en
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE60217771D1 publication Critical patent/DE60217771D1/en
Application granted granted Critical
Publication of DE60217771T2 publication Critical patent/DE60217771T2/en
Publication of DE60217771T3 publication Critical patent/DE60217771T3/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60217771T 2001-07-27 2002-07-25 Exposure system, projection exposure apparatus and method of making an article Expired - Lifetime DE60217771T3 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001228796 2001-07-27
JP2001228796A JP3605053B2 (en) 2001-07-27 2001-07-27 Illumination optical system, exposure apparatus and device manufacturing method
JP2001232682A JP3605055B2 (en) 2001-07-31 2001-07-31 Illumination optical system, exposure apparatus and device manufacturing method
JP2001232682 2001-07-31
EP02255194A EP1280008B2 (en) 2001-07-27 2002-07-25 Illumination system, projection exposure apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
DE60217771D1 true DE60217771D1 (en) 2007-03-15
DE60217771T2 DE60217771T2 (en) 2007-06-14
DE60217771T3 DE60217771T3 (en) 2012-02-09

Family

ID=26619491

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217771T Expired - Lifetime DE60217771T3 (en) 2001-07-27 2002-07-25 Exposure system, projection exposure apparatus and method of making an article

Country Status (6)

Country Link
US (1) US6919951B2 (en)
EP (1) EP1280008B2 (en)
KR (2) KR100486073B1 (en)
CN (1) CN1199086C (en)
DE (1) DE60217771T3 (en)
TW (1) TW594847B (en)

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US7423730B2 (en) * 2003-05-28 2008-09-09 Asml Netherlands B.V. Lithographic apparatus
JP2005033179A (en) 2003-06-18 2005-02-03 Canon Inc Exposure device and manufacturing method for device
US7911584B2 (en) * 2003-07-30 2011-03-22 Carl Zeiss Smt Gmbh Illumination system for microlithography
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JP2005109304A (en) 2003-10-01 2005-04-21 Canon Inc Lighting optical system and aligner
JP2005141158A (en) * 2003-11-10 2005-06-02 Canon Inc Illumination optical system and aligner
JP4630567B2 (en) * 2004-04-23 2011-02-09 キヤノン株式会社 Exposure apparatus and device manufacturing method
EP1814147A4 (en) * 2004-11-17 2010-06-02 Nikon Corp Lighting apparatus, exposure apparatus and micro device manufacturing method
EP1811547A4 (en) * 2005-02-03 2010-06-02 Nikon Corp Optical integrator, illumination optical device, exposure device, and exposure method
JP2006303370A (en) * 2005-04-25 2006-11-02 Canon Inc Aligner and device manufacturing method using it
KR101309880B1 (en) * 2005-05-13 2013-09-17 칼 짜이스 에스엠티 게엠베하 A six-mirror euv projection system with low incidence angles
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DE102006059024A1 (en) * 2006-12-14 2008-06-19 Carl Zeiss Smt Ag Projection exposure equipment for microlithography, has illuminating optical unit for illuminating object field in object plane and correction screen is arranged in or adjacent to aperture diaphragm plane of projection optical unit
US7965378B2 (en) * 2007-02-20 2011-06-21 Asml Holding N.V Optical system and method for illumination of reflective spatial light modulators in maskless lithography
US20080257883A1 (en) 2007-04-19 2008-10-23 Inbev S.A. Integrally blow-moulded bag-in-container having an inner layer and the outer layer made of the same material and preform for making it
US20080259298A1 (en) * 2007-04-19 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20150266621A1 (en) 2007-04-19 2015-09-24 Anheuser-Busch Inbev S.A. Integrally Blow-Moulded Bag-in-Container Having Interface Vents Opening to the Atmosphere at Location Adjacent to Bag's Mouth, Preform for Making It; and Processes for Producing the Preform and Bag-in-Container
JP4986754B2 (en) * 2007-07-27 2012-07-25 キヤノン株式会社 Illumination optical system and exposure apparatus having the same
EP3252801A1 (en) * 2007-08-10 2017-12-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US7719661B2 (en) * 2007-11-27 2010-05-18 Nikon Corporation Illumination optical apparatus, exposure apparatus, and method for producing device
JP5241270B2 (en) * 2008-02-27 2013-07-17 キヤノン株式会社 Illumination optical system, exposure apparatus using the same, and device manufacturing method
JP2009253214A (en) * 2008-04-10 2009-10-29 Canon Inc Exposure device and device manufacturing method
JP2009267188A (en) 2008-04-28 2009-11-12 Canon Inc Immersion exposure apparatus and device manufacturing method
TW201006112A (en) * 2008-07-29 2010-02-01 Delta Electronics Inc Sensor-controlled flushing device and method and system for managing power thereof
JP5142892B2 (en) * 2008-09-03 2013-02-13 キヤノン株式会社 Illumination optical system and exposure apparatus
DE102008046699B4 (en) 2008-09-10 2014-03-13 Carl Zeiss Smt Gmbh Imaging optics
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
JP5534910B2 (en) * 2009-04-23 2014-07-02 ギガフォトン株式会社 Extreme ultraviolet light source device
US20100283978A1 (en) * 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
US9099292B1 (en) * 2009-05-28 2015-08-04 Kla-Tencor Corporation Laser-sustained plasma light source
JP2011077142A (en) * 2009-09-29 2011-04-14 Nikon Corp Illumination optical apparatus, aligner, and device manufacturing method
DE102009045491A1 (en) 2009-10-08 2010-11-25 Carl Zeiss Smt Ag Illumination lens for illumination of object field of projection lens of illumination system for extreme UV-projection microlithography during manufacturing e.g. nano structured component, has aperture shading distribution of facets
WO2011065374A1 (en) 2009-11-24 2011-06-03 株式会社ニコン Image-forming optical system, exposure apparatus, and device producing method
US9703204B2 (en) 2010-04-02 2017-07-11 Nikon Corporation Light source apparatus, optical apparatus, exposure apparatus, device manufacturing method, illuminating method, exposure method, and method for manufacturing optical apparatus
JP5220136B2 (en) * 2011-01-01 2013-06-26 キヤノン株式会社 Illumination optical system, exposure apparatus, and device manufacturing method
EP2506291A1 (en) * 2011-03-28 2012-10-03 Excico France Method and apparatus for forming a straight line projection on a semiconductor substrate
US8823921B2 (en) 2011-08-19 2014-09-02 Ultratech, Inc. Programmable illuminator for a photolithography system
US8845163B2 (en) 2012-08-17 2014-09-30 Ultratech, Inc. LED-based photolithographic illuminator with high collection efficiency
DE102013204444A1 (en) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Illumination optics for a mask inspection system and mask inspection system with such illumination optics
DE102013223935A1 (en) 2013-11-22 2015-05-28 Carl Zeiss Smt Gmbh Illumination system for EUV exposure lithography
JP6362095B2 (en) * 2014-06-17 2018-07-25 キヤノン株式会社 Illumination apparatus, exposure apparatus, adjustment method, and article manufacturing method
CN104317169B (en) * 2014-11-03 2016-03-30 北京理工大学 A kind of extreme ultraviolet photolithographic corrugated plate illuminator
CN107430348B (en) * 2015-03-02 2021-09-24 Asml荷兰有限公司 Radiation system
JP6761306B2 (en) * 2016-08-30 2020-09-23 キヤノン株式会社 Illumination optics, lithography equipment, and article manufacturing methods
JP6567005B2 (en) * 2017-08-31 2019-08-28 キヤノン株式会社 Exposure apparatus, adjustment method, and article manufacturing method
US10775700B2 (en) 2018-08-14 2020-09-15 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and method for exposing wafer
KR102497600B1 (en) 2020-11-27 2023-02-08 (주)아이앤유앤아이 Functional brassiere

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Also Published As

Publication number Publication date
KR20050002699A (en) 2005-01-10
TW594847B (en) 2004-06-21
KR20030010568A (en) 2003-02-05
DE60217771T3 (en) 2012-02-09
EP1280008B1 (en) 2007-01-24
KR100486073B1 (en) 2005-04-29
KR100478683B1 (en) 2005-03-24
DE60217771T2 (en) 2007-06-14
EP1280008A2 (en) 2003-01-29
EP1280008B2 (en) 2011-09-14
US6919951B2 (en) 2005-07-19
CN1400507A (en) 2003-03-05
EP1280008A3 (en) 2004-05-26
US20030031017A1 (en) 2003-02-13
CN1199086C (en) 2005-04-27

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