DE3680716D1 - SPECTROSCOPY DEVICE FOR SURFACE ANALYSIS. - Google Patents

SPECTROSCOPY DEVICE FOR SURFACE ANALYSIS.

Info

Publication number
DE3680716D1
DE3680716D1 DE8686303888T DE3680716T DE3680716D1 DE 3680716 D1 DE3680716 D1 DE 3680716D1 DE 8686303888 T DE8686303888 T DE 8686303888T DE 3680716 T DE3680716 T DE 3680716T DE 3680716 D1 DE3680716 D1 DE 3680716D1
Authority
DE
Germany
Prior art keywords
specimen
microscopy
surface analysis
devices
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686303888T
Other languages
German (de)
Inventor
Edmund M Cashell
Liam Mcdonnell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEKSCAN Ltd
Original Assignee
TEKSCAN Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TEKSCAN Ltd filed Critical TEKSCAN Ltd
Application granted granted Critical
Publication of DE3680716D1 publication Critical patent/DE3680716D1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00Investigating or analyzing materials by the use of thermal means
    • G01N25/72Investigating presence of flaws
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252Tubes for spot-analysing by electron or ion beams; Microanalysers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/06Electron- or ion-optical arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/44Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46Static spectrometers
    • H01J49/48Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/482Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with cylindrical mirrors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1702Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

In an apparatus for surface analysis microscopy, a number of analysis devices (5, 11) are mounted on an ultra-high vacuum chamber (1). The devices (5, 11) include a beam source for locally heating a selected region of a specimen and a temperature-detector for monitoring the heating of the selected region, as well as an electron gun (11) and an analyser (5) for detecting emission from a specimen region subjected to electron bombardment. An ion gun may also be provided. The apparatus enables thermal microscopy of a specimen to be carried out in conjunction with other surface analysis techniques including, inter alia, scanning electron microscopy and Auger electron microscopy, within a single apparatus and during a single experimental operation. A novel configuration of cylindrical mirror analyser facilitates mounting a multiplicity of analysis devices on the chamber in a compact manner for studying a specimen at a single position.
DE8686303888T 1985-05-21 1986-05-22 SPECTROSCOPY DEVICE FOR SURFACE ANALYSIS. Expired - Fee Related DE3680716D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IE127885A IE58049B1 (en) 1985-05-21 1985-05-21 Surface analysis microscopy apparatus

Publications (1)

Publication Number Publication Date
DE3680716D1 true DE3680716D1 (en) 1991-09-12

Family

ID=11024790

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686303888T Expired - Fee Related DE3680716D1 (en) 1985-05-21 1986-05-22 SPECTROSCOPY DEVICE FOR SURFACE ANALYSIS.

Country Status (6)

Country Link
US (1) US4860224A (en)
EP (1) EP0202937B1 (en)
JP (1) JPS61271736A (en)
AT (1) ATE66069T1 (en)
DE (1) DE3680716D1 (en)
IE (1) IE58049B1 (en)

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DE3803424C2 (en) * 1988-02-05 1995-05-18 Gsf Forschungszentrum Umwelt Method for the quantitative, depth-differential analysis of solid samples
JP2759680B2 (en) * 1989-07-19 1998-05-28 株式会社日立製作所 Analysis system
US5036708A (en) * 1990-03-09 1991-08-06 North Dakota State University Rheo-photoacoustic ft-ir spectroscopic method and apparatus
JPH04357440A (en) * 1990-08-20 1992-12-10 Shiseido Co Ltd Photoacoustic cell and photoacoustic measuring apparatus
KR940007963A (en) * 1992-09-03 1994-04-28 오오가 노리오 Polishing method for plate net and transmission electron microscope sample
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5734164A (en) * 1996-11-26 1998-03-31 Amray, Inc. Charged particle apparatus having a canted column
FR2760528B1 (en) * 1997-03-05 1999-05-21 Framatome Sa METHOD AND DEVICE FOR PHOTOTHERMAL EXAMINATION OF A MATERIAL
FR2760529B1 (en) * 1997-03-05 1999-05-28 Framatome Sa PROCESS FOR PHOTOTHERMAL EXAMINATION OF A PART
US6236455B1 (en) * 1998-06-26 2001-05-22 Battelle Memorial Institute Photoacoustic spectroscopy sample cells and methods of photoacoustic spectroscopy
US6184523B1 (en) 1998-07-14 2001-02-06 Board Of Regents Of The University Of Nebraska High resolution charged particle-energy detecting, multiple sequential stage, compact, small diameter, retractable cylindrical mirror analyzer system, and method of use
JP2000268756A (en) * 1999-03-12 2000-09-29 Toshiba Corp Charged particle beam apparatus and control method for charged particle beam
JP4178741B2 (en) * 2000-11-02 2008-11-12 株式会社日立製作所 Charged particle beam apparatus and sample preparation apparatus
US6696692B1 (en) 2000-11-06 2004-02-24 Hrl Laboratories, Llc Process control methods for use with e-beam fabrication technology
AUPR749801A0 (en) * 2001-09-05 2001-09-27 Generation Technology Research Pty Ltd Apparatus for presenting a sample of material for analysis
US6995847B2 (en) 2002-05-24 2006-02-07 Honeywell International Inc. Methods and systems for substrate surface evaluation
US20090056475A1 (en) * 2002-11-27 2009-03-05 Takata Seat Belts, Inc. Seat belt comfort measuring system
US20060026807A1 (en) * 2003-08-07 2006-02-09 Carnevali Jeffrey D Quick release mounting apparatus
US7401527B2 (en) * 2006-10-11 2008-07-22 Toyota Motor Engineering & Manufacturing North America, Inc. Windshield wiper pressure sensor
US8555710B2 (en) * 2011-03-14 2013-10-15 Battelle Memorial Institute Systems and methods for analyzing liquids under vacuum
US9274059B2 (en) 2011-03-14 2016-03-01 Battelle Memorial Institute Microfluidic electrochemical device and process for chemical imaging and electrochemical analysis at the electrode-liquid interface in-situ
US10505234B2 (en) 2011-03-14 2019-12-10 Battelle Memorial Institute Battery cell and n situ battery electrode analysis method
US10598609B2 (en) 2011-03-14 2020-03-24 Battelle Memorial Institute Universal liquid sample device and process for high resolution transmission electron microscope imaging and multimodal analyses of liquid sample materials
CN103852479A (en) * 2014-02-12 2014-06-11 中国科学院物理研究所 Light emitting cathode testing system for exploring efficient light cathode material
CN104062312B (en) * 2014-06-09 2017-04-12 清华大学 X-ray photoelectron spectroscopy (XPS) analysis method and system for researching interaction of plasma and material surface
CN108760867B (en) * 2018-03-13 2020-10-09 上海科技大学 Combined structure of UHV (ultra high Voltage) equipment interconnected in-situ reaction pool and built-in mass spectrum electric quadrupole rod
CN109444192A (en) * 2018-11-27 2019-03-08 金华职业技术学院 A kind of high pressure sample test device of pulsed laser heating
US11101102B2 (en) * 2019-08-28 2021-08-24 The Board Of Trustees Of The Leland Stanford Junior University Photoabsorption microscopy using electron analysis
CN113008917B (en) * 2021-03-19 2022-12-06 中国工程物理研究院机械制造工艺研究所 Macro-micro comprehensive detection method for surface damage of hard and brittle optical crystal

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JPS49118493A (en) * 1973-03-12 1974-11-12
DE2340372A1 (en) * 1973-08-09 1975-02-20 Max Planck Gesellschaft DOUBLE FOCUSING MASS SPECTROMETER HIGH ENTRANCE APERTURE
DE2347946A1 (en) * 1973-09-24 1975-04-10 Max Planck Gesellschaft QUADRUPOLE FIELD MASS ANALYZER HIGH ENTRANCE APERTURE
US3878392A (en) * 1973-12-17 1975-04-15 Etec Corp Specimen analysis with ion and electrom beams
US4050084A (en) * 1976-07-14 1977-09-20 Cbs Inc. Comb filter for television signals having adaptive features
FR2410271A1 (en) * 1977-11-29 1979-06-22 Anvar IMPROVEMENTS IN MICROANALYSIS PROCESSES INVOLVING X-RADIATION
GB1601890A (en) * 1978-05-31 1981-11-04 Sira Institute Apparatus and method for indicating stress in an object
US4334844A (en) * 1979-12-05 1982-06-15 Tokyo Metropolitan Government Replica film of specimen for electron microscopy apparatus
US4296323A (en) * 1980-03-10 1981-10-20 The Perkin-Elmer Corporation Secondary emission mass spectrometer mechanism to be used with other instrumentation
EP0057290A1 (en) * 1981-02-02 1982-08-11 Hoogovens Groep B.V. Temperature scanner
JPS59177846A (en) * 1983-03-28 1984-10-08 Fujitsu Ltd Electron beam device
JPS6037644A (en) * 1983-08-10 1985-02-27 Anelva Corp Surface analyzer device
GB8322017D0 (en) * 1983-08-16 1983-09-21 Vg Instr Ltd Charged particle energy spectrometer
US4578584A (en) * 1984-01-23 1986-03-25 International Business Machines Corporation Thermal wave microscopy using areal infrared detection
US4564758A (en) * 1984-02-01 1986-01-14 Cameca Process and device for the ionic analysis of an insulating sample
US4628468A (en) * 1984-04-13 1986-12-09 Exxon Production Research Co. Method and means for determining physical properties from measurements of microstructure in porous media
US4567767A (en) * 1984-05-14 1986-02-04 The Board Of Trustees Of The Leland Stanford Junior University Method and apparatus for very low temperature acoustic microscopy
JPS60243958A (en) * 1984-05-18 1985-12-03 Hitachi Ltd Ion beam device
FR2575597B1 (en) * 1984-12-28 1987-03-20 Onera (Off Nat Aerospatiale) APPARATUS FOR VERY HIGH RESOLUTION ION MICROANALYSIS OF A SOLID SAMPLE
US4680467A (en) * 1986-04-08 1987-07-14 Kevex Corporation Electron spectroscopy system for chemical analysis of electrically isolated specimens

Also Published As

Publication number Publication date
IE58049B1 (en) 1993-06-16
EP0202937B1 (en) 1991-08-07
JPS61271736A (en) 1986-12-02
EP0202937A3 (en) 1988-01-07
IE851278L (en) 1986-11-22
ATE66069T1 (en) 1991-08-15
EP0202937A2 (en) 1986-11-26
US4860224A (en) 1989-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee