DE102005021985A1 - Sound generation and emission method for cleaning articles immersed in fluid involves generating signals that are modulated according to frequency or intensity - Google Patents
Sound generation and emission method for cleaning articles immersed in fluid involves generating signals that are modulated according to frequency or intensity Download PDFInfo
- Publication number
- DE102005021985A1 DE102005021985A1 DE200510021985 DE102005021985A DE102005021985A1 DE 102005021985 A1 DE102005021985 A1 DE 102005021985A1 DE 200510021985 DE200510021985 DE 200510021985 DE 102005021985 A DE102005021985 A DE 102005021985A DE 102005021985 A1 DE102005021985 A1 DE 102005021985A1
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- DE
- Germany
- Prior art keywords
- frequency
- intensity
- signals
- generating
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Abstract
Description
Technisches GebietTechnical area
Die Erfindung bezieht sich auf das Reinigen von Materialen mit Schall. Insbesondere bezieht sich die Erfindung auf ein Verfahren sowie eine Vorrichtung zum Reinigen von Materialien in der Waferprozessierung.The This invention relates to the cleaning of materials with sound. In particular, the invention relates to a method as well an apparatus for cleaning materials in wafer processing.
Stand der TechnikState of the art
Für die Materialreinigung sind unter anderem Ultraschallsysteme bekannt. Sie arbeiten im Kilo- und Megahertzbereich. Sie werden dafür eingesetzt, Verunreinigungen in Bereichen zu entfernen, in denen mechanische System allenfalls geringe oder keine Erfolge erzielen können. Dabei werden definierte Frequenzen verwendet, die durch entstehende Resonanzen die Materialien entfernen.For the material cleaning Among other ultrasound systems are known. They work in the kilo and Megahertz range. You will for it used to remove contaminants in areas where Mechanical system achieve little or no success at best can. In this case, defined frequencies are used, which are created by Resonances remove the materials.
Ferner finden solche Ultraschallsysteme Anwendung, um störende Blasen und/oder Gaspolster in gasförmigen Lösungsgemischen zu entfernen.Further Such ultrasound systems find application to annoying bubbles and / or gas cushion in gaseous solution mixtures to remove.
Durch eine definierte Auswahl von Frequenzen ist es ausführbar, dass die Reinigungswirkung entsprechend verbessert wird. Ebenfalls ist es möglich, das Prozessergebnis des Reinigungsvorgangs durch geometrische Anordnung des Schallgebers, die unterschiedliche Wahl eines Generators zur Erzeugung von Signalen, die an den Schallgeber übermittelt werden, sowie durch ausgewählte Flüssigkeiten zu verbessern.By a defined selection of frequencies makes it executable that the cleaning effect is improved accordingly. Also is it is possible the process result of the cleaning process by geometric arrangement of the sounder, the different choice of a generator for Generation of signals that are transmitted to the sounder, as well as by selected liquids to improve.
Es zeigte sich jedoch der Nachteil, dass kleine Strukturen durch diese Art der Bearbeitung zerstört werden. Dies wird dadurch bewirkt, dass bei der Beschallung Interferenzen entstehen, die zyklisch wiederkehrend sind und dadurch aufgrund entstehender Resonanzen Strukturzerstörung bewirken. Die Strukturzerstörungen zeigen sich besonders im Bereich der Halbleitertechnologie, da hier mikrofeine Strukturen vorliegen, die ungewollt beschädigt werden. Um diesem Nachteil entgegenzuwirken, wird in der Regel vorgeschlagen, die Zeit, die zur Reinigung aufgewendet wird, zu verlängern, um eine sogenannte Inhomogenität der entstehenden Referenzmuster über die Zeit zu bewirken. Bei gleichen Rahmenbedingungen für den Reinigungsprozess bleibt jedoch der Nachteil, dass die Dauer des Reinigungsprozesses erheblich verlängert wird. Ferner können in allen Fällen zyklisch wiederkehrende Interferenzen unterschiedlicher Intensitäten entstehen, die zu einer Abnahme des Wirkungsgrads des Reinigungsprozesses sowie trotzdem zu Beschädigungen des zu reinigenden Materials führen.It However, the disadvantage was that small structures through this Type of processing destroyed become. This is caused by interference in the sound arise that are cyclically recurring and therefore due resulting resonances cause structural destruction. The structural destruction show Especially in the field of semiconductor technology, since here are microfine structures present, the unintentionally damaged become. In order to counteract this disadvantage, it is generally suggested To extend the time spent on cleaning a so-called inhomogeneity the resulting reference pattern to make the time. With the same basic conditions for the cleaning process However, the disadvantage remains that the duration of the cleaning process considerably extended becomes. Furthermore, can in all cases cyclically recurring interferences of different intensities arise which leads to a decrease in the efficiency of the cleaning process as well anyway to damage lead the material to be cleaned.
In
der
Aufgabe der ErfindungObject of the invention
Die Aufgabe der Erfindung besteht in der Vermeidung der bei der Reinigungswirkung entstehenden Zerstörungen zu vermeiden.The The object of the invention is to avoid the cleaning effect resulting destruction to avoid.
Lösung der AufgabeSolution of the task
Der erfindungswesentliche Gedanke besteht darin, ein Verfahren sowie eine Vorrichtung zur Anwendung des erfindungsgemäßen Verfahrens mit einer stochastisch modulierten Schallsteuerung vorzuschlagen, so dass zumindest ein großer Anteil von alternierenden Frequenzerscheinungen vermieden wird.Of the Thought essential to the invention is a method and a device for applying the method according to the invention with a stochastic to propose modulated sound control, so that at least one greater Proportion of alternating frequency phenomena is avoided.
Somit werden erfindungsgemäß ein Verfahren gemäß Anspruch 1 sowie eine Vorrichtung gemäß Anspruch 4 vorgeschlagen.Consequently become a method according to the invention according to claim 1 and a device according to claim 4 proposed.
Vorteile der ErfindungAdvantages of the invention
Einer der wesentlichen Vorteile der Erfindung besteht darin, dass insbesondere stationäre Interferenzen vermieden werden, wodurch Beschädigungen an den zu reinigenden Materialien vermieden werden. Erfindungsgemäß wird dies dadurch erreicht, dass die an sich entstehenden Interferenzen delokalisiert werden. Die Realisierung erfolgt durch eine stochastische Modulation des Generators bzw. des Schallgebers, so dass die einzelnen Interferenzmuster entzerrt werden, in dem sie zeitlich und räumlich in unterschiedlichen Intensitäten entstehen.one The main advantages of the invention is that in particular stationary Interference is avoided, causing damage to be cleaned Materials are avoided. According to the invention, this is achieved by that the resulting interferences are delocalized. The realization is done by a stochastic modulation of the Generator or the sounder, so that the individual interference pattern be equalized in that they temporally and spatially in different intensities arise.
Eine alternative Ausführung besteht darin, dass anstelle eines durch einen Zufallsgenerator erzeugten Frequenzbereichs eine Ansteuerung des Schallgebers über Daten aus einer Datenbank erfolgt, wobei die Daten selbst über einen Zufallsgenerator erzeugt werden.A alternative design is that instead of one by a random number generator generated frequency range control of the sounder via data is done from a database, the data itself via a Random generator can be generated.
Bei beiden Ausführungen zeichnen sich das Verfahren und die Vorrichtung, mit der das Verfahren durchzuführen ist, dadurch aus, dass eine nicht konstante bzw. nicht stationäre Modulation erfolgt, wobei die Werteparameter Frequenz und Intensität oder wahlweise einer der beiden Werteparameter per Zufall erzeugt werden.In both embodiments, the method and the device with which the method is to be carried out, characterized in that a non-constant or non-stationary modulation takes place, wherein the value parameters frequency and intensity or alternatively one of the two value parameters are generated by chance.
Ein weiterer Vorteil der Erfindung liegt in der Herstellung. Zum Erreichen eines besseren Reinigungsergebnisses ohne Verlängerung der besagten Prozesszeit sind keine weiteren Schallgeber oder Generatoren notwendig, so dass es auch nicht erforderlich ist, jeden einzelnen Schallgeber unterschiedlich anzusteuern, wodurch erhebliche Herstellungskosten eingespart werden können.One Another advantage of the invention is in the production. To reach a better cleaning result without extension of the said process time No further sound generators or generators are necessary, so that It also does not require every single sounder different to drive, whereby significant manufacturing costs can be saved can.
Vorteilhafterweise können Generator und Schallgeber ein Bauteil bilden.advantageously, can Generator and sounder form a component.
Das Verfahren selbst ist an keinen Frequenzbereich gebunden, so dass das Verfahren auf den jeweiligen Reinigungsprozess optimal einstellbar ist.The Method itself is not bound to any frequency range, so that the process can be optimally adjusted to the respective cleaning process is.
Das Verfahren kann überall dort eingesetzt werden, bei dem stationäre Interferenzen zu einer Zerstörung, Schädigung, Inhomogenität oder zu einem abnehmenden Wirkungsgrad in Bezug auf den Reinigungsprozess führen.The Procedure can be anywhere where stationary interference destroys, damages, inhomogeneity or to a decreasing efficiency with respect to the cleaning process to lead.
Zeichnungendrawings
Es zeigen:It demonstrate:
Beschreibung eines AusführungsbeispielsDescription of an embodiment
In
Aufgrund
des eingekoppelten Schallsignals, das beispielsweise die Frequenzen
gemäß
In
Hingegen
werden bei modulierten Frequenzen, wie aus
- 11
- Vorrichtungcontraption
- 22
- Generatorgenerator
- 33
- Signalsignal
- 44
- Schallgebersounder
- 55
- Schallsignalsound signal
- 66
- Flüssigkeitliquid
- 77
- Waferwafer
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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DE200510021985 DE102005021985A1 (en) | 2005-05-09 | 2005-05-09 | Sound generation and emission method for cleaning articles immersed in fluid involves generating signals that are modulated according to frequency or intensity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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DE200510021985 DE102005021985A1 (en) | 2005-05-09 | 2005-05-09 | Sound generation and emission method for cleaning articles immersed in fluid involves generating signals that are modulated according to frequency or intensity |
Publications (1)
Publication Number | Publication Date |
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DE102005021985A1 true DE102005021985A1 (en) | 2006-11-16 |
Family
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Family Applications (1)
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DE200510021985 Ceased DE102005021985A1 (en) | 2005-05-09 | 2005-05-09 | Sound generation and emission method for cleaning articles immersed in fluid involves generating signals that are modulated according to frequency or intensity |
Country Status (1)
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DE (1) | DE102005021985A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112009002186B4 (en) * | 2008-09-09 | 2016-03-03 | Mitsubishi Electric Corp. | Ultrasonic generator and device for its attachment |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834871A (en) * | 1996-08-05 | 1998-11-10 | Puskas; William L. | Apparatus and methods for cleaning and/or processing delicate parts |
-
2005
- 2005-05-09 DE DE200510021985 patent/DE102005021985A1/en not_active Ceased
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834871A (en) * | 1996-08-05 | 1998-11-10 | Puskas; William L. | Apparatus and methods for cleaning and/or processing delicate parts |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112009002186B4 (en) * | 2008-09-09 | 2016-03-03 | Mitsubishi Electric Corp. | Ultrasonic generator and device for its attachment |
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OP8 | Request for examination as to paragraph 44 patent law | ||
8131 | Rejection |