CN2612536Y - Depth of parallelism adjusting device for nanometer transfer printing - Google Patents
Depth of parallelism adjusting device for nanometer transfer printing Download PDFInfo
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- CN2612536Y CN2612536Y CN 03257537 CN03257537U CN2612536Y CN 2612536 Y CN2612536 Y CN 2612536Y CN 03257537 CN03257537 CN 03257537 CN 03257537 U CN03257537 U CN 03257537U CN 2612536 Y CN2612536 Y CN 2612536Y
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- transfer printing
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- parallelism adjusting
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Abstract
The utility model relates to a parallelism-adjusting device for nanometer transfer printing, which comprises a transfer printing unit and a carring unit. The transfer printing unit comprises a first template and a mould on the first template. The carring unit comprises a second template and a placode on the second template. A parallelism-adjusting device, which is connected with the first template or the second template, comprises an obturate elastic membrane and liquid covered by the obturate elastic membrane. The transfer printing unit or the carring unit is driven by a force source. Transfer printing is achieved by connecting between the mould and shaping material. The parallelism-adjusting is pressed. Transfer printing parallelism and even pressing between the transfer printing mould and the placode are adjusted, and shaping quality of nanometer transfer printing is improved greatly.
Description
Technical field
The utility model is the parallelism adjusting instrument that is used for the nanometer transfer printing about a kind of, but the parallelism adjusting instrument of particularly simple and real-time response about a kind of start.
Background technology
Along with integrated circuit to live width require more and more narrow, utilize traditional photo lithographic printing (Photo Lithography) processing procedure to add man-hour, if the live width of design is less than the wavelength (Wave Length) of light source, then will make the difficulty of smaller szie processing significantly improve because of being subject to the diffraction limit of light; In addition, also do not develop as yet on micro-nano feature structure now and some suitable volume production process technologies, (Nano-Imprint Lithography NIL) gives birth to because of fortune to cause the nanometer transfer technique.Except reaching the demand of littler live width, but it also have processing fast, advantages such as the low large tracts of land processing of cost, meet the demand on the industry.
The action principle of nanometer transfer technique is meant the transfer printing power of utilizing, with the nanostructured feature that designs in advance on the mould, be transferred to a formable material layer that is coated on the substrate (Substrate), this formable material layer generally is to be selected from as polymethyl methacrylate high molecular polymer materials such as (PMMA), to borrow its shaping, then carry out follow-up manufacture of semiconductor, reach required nano-scale live width structure.Be the operation workflow figure of nanometer transfer technique shown in Fig. 3 A to Fig. 3 C, it is by intensification-transfer printing-cooling-demoulding step, finish whole transfer printing program, the intensification action of Fig. 3 A is the formable material layer 23 that makes coating on this substrate 21, reaches the required operating temperature of transfer printing; The transfer printing action then is shown in Fig. 3 B, utilization is fixed on first template 12 and the mould 11 with nanostructured 13, borrow the driving of a drive source 14, move to the substrate 21 that is fixed on second template 26, when mould 11 with begin to exert pressure after formable material layer 23 on the substrate 21 contacts, the feature on this mould 11 is transferred on this formable material layer 23; After making this formable material layer 23 reduce to proper temperature again, shown in Fig. 3 C, this mould 11 is separated with formable material layer 23, carry out the demoulding operation, promptly finish the transfer printing program of this nanometer transfer technique.
For this technology, when carrying out the transfer printing action, evenly whether the depth of parallelism between this mould and substrate and transfer printing power, it is the key factor of decision transfer printing quality, and because this mould and substrate are to be separately fixed on this first template and second template, therefore, the uniformity of its transfer printing power be again show as this first, the uniformity that second template is exerted pressure, therefore as long as exert pressure uniformity and the depth of parallelism of transfer process have deviation slightly, or because of part processing and assembly failure, cause the depth of parallelism skew between mould and substrate, promptly may influence its transfer printing precision, even damage meticulous nanostructured on this substrate or this mould; Simultaneously, if compare with traditional hot forming technology (Hot Embossing), this nanometer transfer technique is because transfer printing precision requires higher, its depth of parallelism is more strict with the requirement of evenly exerting pressure, the manufacturing processing and the assembly precision of just existing transfer printing molding apparatus obviously can't reach the depth of parallelism and the requirement of even transfer printing power of nanometer transfer printing.
Be example now with the 5th, 993, No. 189 patents of the U.S. shown in Figure 4, the prior art is the mould 63 that fixedly has nanostructured with microscope carrier 61 on, and with microscope carrier 62 bearing substrates 64 once, this time microscope carrier 62 is to be guiding with as shown in the figure guide pillar 65, upwards exerts pressure and finishes the transfer printing action.Not designing in this transfer device has parallelism adjusting instrument, is easy to mismachining tolerance or assembly failure because of parts such as template and guide pillars 65, forms mould 63 and 64 not good problems of the depth of parallelism of substrate; In addition, PCT patent WO0169317 case as shown in Figure 5, the rear of its roller mould 71 and substrate 72, respectively with an oil hydraulic cylinder piston 73 independently, 74 connect, to borrow the start of this piston 73, make this mould 71 and substrate 72 produce contacting and exert pressure, finish the transfer printing action, and by the finite elasticity distortion of the O shape of these oil hydraulic cylinder 75 inboards ring 76 (O-Ring), carry out the depth of parallelism adjustment when both fail joined in parallel at it, just this device is with two oil hydraulic cylinders 75,77 starts can cause the increase of structure and driving complexity, and its oil hydraulic system also have the not good shortcoming of control response.
In addition, the 6th, 482, No. 742 patents of the U.S. as shown in Figure 6 have similar problem too.It is to utilize elastic cuff 81 to seal the mould 82 and substrate 83 of storehouse, and after being placed on a pressure chamber 84, inlet channel 85 at this pressure chamber 84 pours into high-pressure fluid, by means of the pressure of this fluid this mould 82 exerted pressure and to finish the transfer printing action, again in transfer printing after by the outlet channel 86 fluid is discharged, again substrate 83 is taken out, just the sealing of this equipment and transfer process are very complicated and consuming time, be unfavorable for producing fast and in a large number, be difficult to meet business demand, and its mould 82 needs through storehouse with substrate 83, sealing, insert, complex steps such as high pressure-charging and decompression just can be finished processing, extremely is difficult for reaching the requirement of precision positioning; As for PCT patent WO0142858 case shown in Figure 7, it is configuration one pressure chamber 92 below substrate 91,91 of this pressure chamber 92 and substrates are with an elastic membrane 93 at interval, form the transfer printing action after in this pressure chamber 92, pouring into high-pressure fluid, this designs not only complex structure, and in the start process, need carry out supercharging and decompression action respectively, not only expend a large amount of energy and the anxiety of contaminated environment is also arranged.
Therefore, develop a kind of parallelism adjusting instrument that can be used for the nanometer transfer printing, make the error of processing and assembly precision with compensation, and then can reach evenly and exert pressure, and significantly improve nanometer transfer printing quality, simultaneously, with effect such as simple in structure, with low cost, real-time response and start complexity be low, be an important topic that needs to be resolved hurrily.
The utility model content
For overcoming the shortcoming of above-mentioned prior art, the purpose of this utility model is to provide a kind of parallelism adjusting instrument that can evenly exert pressure to the nanometer transfer printing.
A purpose more of the present utility model is to provide a kind of parallelism adjusting instrument that can not injure mould and substrate.
Another purpose of the present utility model is to provide a kind of parallelism adjusting instrument simple in structure and with low cost.
But another purpose of the present utility model is to provide a kind of parallelism adjusting instrument of real-time response.
Another purpose of the present utility model is to provide a kind of not to be needed previous operations and moves simple parallelism adjusting instrument.
Therefore, for reaching above-mentioned and other purpose, the parallelism adjusting instrument that is used for the nanometer transfer printing that the utility model provides comprises: transfer printing unit has one first template and the transfer printing mould that is fixed on this first template at least; Load bearing unit has one second template at least and is fixed on this second template and is coated with the substrate of formable material layer; Parallelism adjusting mechanism comprises the fluid of an airtight elastic membrane and coating thereof, and at least with this first template or second template in one connect and put; And drive source, in order to drive in this transfer printing unit and the load bearing unit at least one, make this transfer printing contact with this formable material layer and carry out transfer printing, and borrow its contact to make this parallelism adjusting mechanism pressurized, adjust this transfer printing with the transfer printing depth of parallelism between mould and this substrate with mould.
If this parallelism adjusting mechanism is to connect to put on this first template, then it is to be fixed between this first template and this transfer printing usefulness mould, if this parallelism adjusting mechanism is to connect to put on this second template, then it is to be fixed between this second template and this substrate, to adjust this transfer printing respectively when the pressurized with the depth of parallelism between mould and the substrate; Wherein, the elastic membrane of above-mentioned parallelism adjusting mechanism is macromolecular material or other pliability structures such as rubber, plastics, and the fluid that it coated then can be liquid or gas arbitrarily.
In addition, this parallelism adjusting mechanism also comprises one in order to detect the pressure sensor that it is subjected to pressure pressure, detects to carry out a real-time pressure, and borrows the process of a predefined pressure-this nanometer transfer printing of time control curve controlled; Simultaneously, this transfer printing unit and load bearing unit also can connect respectively and place a large-area locating platform, to strengthen the horizontal location effect in the transfer process.
In sum, the parallelism adjusting instrument that the utility model proposed, be based on high-freedom degree, real-time response with do not damage under the prerequisite of mould and substrate, can be at this transfer printing unit with after load bearing unit contacts, pressurized by this airtight elastic membrane and fluid, inhomogeneous exerting pressure during the compensation transfer printing, just when both depth of parallelisms are not good, can borrow the in good time distortion of this elastic membrane, the passive adjustment of carrying out the real-time depth of parallelism, the very wide and direction-free restriction of its adjustable angle, and this fluid also can borrow its characteristic, makes the substrate uniform-compression of this load bearing unit, reach the demand of effective and high-quality transfer printing, fluid in the flexible again film is very sensitive to the induction of pressure, can make response to pressure in real time, therefore can in time adjust the depth of parallelism; Simultaneously, because this transfer printing unit and load bearing unit are to distinguish independent start, rather than insert an enclosure body in the utility model, so do not need the previous operations of any complexity before the transfer printing, not only simple in structure, with low cost, volume production fast also.
Description of drawings
Fig. 1 is embodiment 1 side view of parallelism adjusting instrument of the present utility model;
Fig. 2 is embodiment 2 side views of parallelism adjusting instrument of the present utility model;
Fig. 3 A to Fig. 3 C is the action flow chart of nanometer transfer technique;
Fig. 4 is the nanometer transfer device schematic diagram of the 5th, 993, No. 189 patent cases of the U.S.;
Fig. 5 is the nanometer transfer device schematic diagram of PCT patent WO0169317 case;
Fig. 6 is the nanometer transfer device schematic diagram of the 6th, 482, No. 742 patent cases of the U.S.;
Fig. 7 is the nanometer transfer device schematic diagram of PCT patent WO0142858 case.
The specific embodiment
Embodiment 1
The preferred embodiment that is used for nanometer transfer printing parallelism adjusting instrument 1 of the present utility model is as shown in Figure 1, it is to become transfer printing unit 10 with a mould 11, first template 12 with drive source 14 matched combined, and by the guiding of many guide rods 15, it can be moved to load bearing unit 20, wherein, be to be formed with nanostructured to be transferred 13 on this mould 11; 20 of this load bearing units comprise that one places second template 26 on the locating platform 31, these second template, 26 inner installings one can be born the elastic membrane 24 of high pressure and sealing, be filled with fluid 25 in its film, this elastic membrane 24 and the fluid 25 that coats thereof are formed a parallelism adjusting mechanism 27; Simultaneously, this load bearing unit is that a substrate 21 that is coated with formable material layer 23 is set, and it is by the vacuum adsorption force of an adsorption plate 22 and on being adsorbed in, and makes nanostructured 13 surfaces of this formable material layer 23 towards this mould 11.
Has pore (not mark) on this adsorption plate 22, it is together with this substrate fixed thereon 21, place this to be installed with on the elastic membrane 24 of second template 26 in the lump, to utilize the horizontal location ability of this locating platform 31, carry out the accurate contraposition (Alignment) between this substrate 21 and the mould 11, promote the precision of nanometer transfer printing; Be to distribute to dispose a plurality of heaters 51 on this first template 12, it and be distributed in Fast Heating unit between this substrate 21 and the mould 11 (mark), together the formable material layer 23 on this substrate 21 is heated, and make temperature rise to a scheduled operation temperature, carry out the transfer printing action; Dispose mold cools down device 41 too on this first template 12, then dispose substrate cooler 42 on this adsorption plate 22, they all are after transfer printing is finished, and the mould 11 and the substrate 21 that are in contact with one another are lowered the temperature to carry out stripping operation.
In this parallelism adjusting instrument 1, as shown in Figure 1, also be provided with a pressure sensor 55, it is to be installed in this parallelism adjusting mechanism 27, in the nanometer transfer process, pressure when detecting this mould 11 and contacting with formable material layer 23, a real-time pressure monitoring can be controlled transfer process whereby.Its practice can be by the pressure that a pre-establishes-time operating curve, contact with formable material layer 23 and pressure when rising to certain value at this mould 11, order pressure between the two remains on this definite value, and keep the several seconds, the demoulding after finishing transfer printing, decompression, visual transfer materials of the numerical relation of its pressure and time and accuracy requirement obtain by experiment; Be pressure sensor 55 installation positions shown in Figure 1 only for present embodiment designs, its position there is no certain limitation, it only need be installed in can detect the position that this course of exerting pressure pressure changes and get final product.
Therefore, utilize parallelism adjusting instrument 1 of the present utility model, can carry out following nanometer transfer step: it is earlier with a plurality of heaters 51 of these first template, 12 configurations and be distributed in Fast Heating unit (marking) between this substrate 21 and the mould 11, to 23 heating of the formable material layer on this substrate 21, make the temperature of this formable material layer 23 rise to a transfer operation temperature; Utilize the drive source 14 of this transfer printing unit 10 again, drive this first template 12 and mould 11 fixed thereon, move to borrow these guide rod 15 its directions of control to this load bearing unit 20; When this transfer printing unit 10 contacts with load bearing unit 20, and make nanostructured 13 on this mould 11 with after formable material layer 23 on this substrate 21 contacts, the operation of can exerting pressure, this moment is because the elastic membrane 24 that is arranged on this load bearing unit 20 has pliability, to carry out the depth of parallelism adjustment of a passive type along with the direction of exerting pressure of this transfer printing unit 10, make this mould 11 can reach the desirable depth of parallelism in the moment that contacts with substrate 21, and then can in transfer process, keep the demand of operation to the depth of parallelism, and can borrow this fluid 25 that elastic membrane 24 coats, it is born uniformly exert pressure; When this drive source 14 is slowly exerted pressure, this pressure sensor 55 that is positioned on the elastic membrane 24 will carry out real-time pressure detecting, by pressure planning control that pre-establishes and the circuit controls of carrying out transfer printing power; Then, after the transfer printing action is finished, promptly utilize mold cools down device 41 that is positioned at this first template 12 and the substrate cooler 42 that is positioned at this adsorption plate 22 to lower the temperature, after making this mould 11 and the temperature of substrate 21 reduce to proper temperature, borrow this drive source 14 to drive this transfer printing unit 10 and carry out the demoulding, separate this mould 11 and formable material layer 23, finish whole transfer printing program; In addition, before carrying out this transfer process, can be earlier at this mould 11 and the high-volatile anti-adhesion coating (not mark) of being stained with of 21 coatings of substrate one deck, to help the demoulding.
Embodiment 2
Shown in Figure 2 is the embodiment 2 of parallelism adjusting instrument 1 of the present utility model, compare with this embodiment 1, it is that just this elastic membrane 24 that is coated with fluid 25 is configured in this transfer printing unit 10 with the parallelism adjusting mechanism 27 of the utility model design, can reach the purpose that the depth of parallelism is adjusted equally; This design is in transfer printing unit 10 configurations one location template 28, and this elastic membrane 24 placed between this locating template 28 and this first template 12, to carry out transfer printing and this mould 11 when contacting with substrate 21, borrow its contact force and this to play the pliability of shape film 24, adjust the mould 11 of this transfer printing unit 10, to reach the depth of parallelism and the demand of evenly exerting pressure, its member configuration is identical with the above embodiments 1, so locate no longer repeat specification.
The elastic membrane 24 of the utility model design also can be configured in this transfer printing unit 10 and the load bearing unit 20 simultaneously, between the locating template 28 that just simultaneously it is configured in transfer printing unit 10 and first template 12 and between second template 26 and adsorption plate 22 of load bearing unit 20 (marking).The exerting pressure of above-mentioned proposition/pressurized configuration is the configuration that generally existing nanometer transfer printing processing procedure adopts, and the utility model still can apply to for example this substrate 21 be placed transfer printing unit 10, and this mould 11 is placed load bearing unit 20 etc. on the various equivalent; Simultaneously, above-mentioned locating platform 31 in order to the reinforcement horizontal location also can be set up the template that is used to locate this transfer printing unit 10, can reach or strengthen the accurate positioning of this transfer process equally.
In sum, the parallelism adjusting instrument that is used for the nanometer transfer printing of the present utility model, really can improve the problem of existing apparatus, its characteristic is to utilize an elastic membrane to carry out depth of parallelism adjustment, and provides uniformly with the fluid of its inner sealing and to exert pressure, and does not need any depth of parallelism that adds to adjust drive source, can reduce processing and assembly error, and then avoid the problem that causes because of drive source vibration, and simultaneously, with effects such as simple in structure, with low cost, real-time response and action complexity are low.
Claims (12)
1. a parallelism adjusting instrument that is used for the nanometer transfer printing is characterized in that, this device comprises:
Transfer printing unit has one first template and the transfer printing mould that is fixed on this first template at least;
Load bearing unit has one second template at least and is fixed on this second template and is coated with the substrate of formable material layer;
Parallelism adjusting mechanism comprises the fluid of an airtight elastic membrane and coating thereof, and at least with this first template and second template in one connect and put; And
Drive source, at least drive in this transfer printing unit and the load bearing unit, make this transfer printing contact with this formable material layer and carry out transfer printing, and borrow its contact to make this parallelism adjusting mechanism pressurized, adjust the transfer printing depth of parallelism between this transfer printing usefulness mould and this substrate with mould.
2. parallelism adjusting instrument as claimed in claim 1 is characterized in that, if this parallelism adjusting mechanism connects and puts on this first template, then it is to be fixed on this first template and this transfer printing with between the mould, to adjust the depth of parallelism of this transfer printing usefulness mould when the pressurized.
3. parallelism adjusting instrument as claimed in claim 1 is characterized in that, if this parallelism adjusting mechanism connects and puts on this second template, then it is to be fixed between this second template and this substrate, to adjust the depth of parallelism of this substrate when the pressurized.
4. parallelism adjusting instrument as claimed in claim 1 is characterized in that, the elastic membrane of this parallelism adjusting mechanism is to become in the cohort one with other pliability structural group by macromolecular materials such as rubber, plastics.
5. parallelism adjusting instrument as claimed in claim 1 is characterized in that this parallelism adjusting mechanism also comprises the pressure sensor that is subjected to pressure pressure in order to detection, detects to carry out a real-time pressure.
6. parallelism adjusting instrument as claimed in claim 1 is characterized in that, wherein at least one is can connect to put at a locating platform for this transfer printing unit and load bearing unit, the locating effect during with the reinforcement transfer printing.
7. parallelism adjusting instrument as claimed in claim 1 is characterized in that, the gear unit that this drive source is made up of linear motor and oil hydraulic cylinder or servo motor and ball driving screw.
8. parallelism adjusting instrument as claimed in claim 1 is characterized in that, this formable material layer is to be selected from a kind of in the cohort of being made up of high molecular polymer, metal, formable material such as nonmetal.
9. parallelism adjusting instrument as claimed in claim 1 is characterized in that, this formable material layer and this transfer printing are with being coated with the anti-adhesion coating of being stained with of one deck on the mould.
10. parallelism adjusting instrument as claimed in claim 1 is characterized in that, this transfer printing is a kind of with in vacuum adsorption force, mechanical force and the electromagnetic force with mould and substrate, is to be separately fixed on this transfer printing unit and this load bearing unit.
11. parallelism adjusting instrument as claimed in claim 1 is characterized in that, is equiped with heating member on this transfer printing unit and the load bearing unit, is warming up to a scheduled operation temperature when carrying out transfer printing.
12. parallelism adjusting instrument as claimed in claim 1 is characterized in that, is equiped with cooling piece on this transfer printing unit and the load bearing unit, is cooled to a proper temperature after finishing transfer printing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03257537 CN2612536Y (en) | 2003-05-12 | 2003-05-12 | Depth of parallelism adjusting device for nanometer transfer printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03257537 CN2612536Y (en) | 2003-05-12 | 2003-05-12 | Depth of parallelism adjusting device for nanometer transfer printing |
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| Publication Number | Publication Date |
|---|---|
| CN2612536Y true CN2612536Y (en) | 2004-04-21 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 03257537 Expired - Lifetime CN2612536Y (en) | 2003-05-12 | 2003-05-12 | Depth of parallelism adjusting device for nanometer transfer printing |
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| CN (1) | CN2612536Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7547205B2 (en) | 2005-04-27 | 2009-06-16 | Industrial Technology Research Institute | Microimprint/nanoimprint uniform pressing apparatus |
-
2003
- 2003-05-12 CN CN 03257537 patent/CN2612536Y/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7547205B2 (en) | 2005-04-27 | 2009-06-16 | Industrial Technology Research Institute | Microimprint/nanoimprint uniform pressing apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |
Expiration termination date: 20130512 Granted publication date: 20040421 |