CN217222765U

CN217222765U - Cleaning device for cleaning particle pollutants and production system

Info

Publication number: CN217222765U
Application number: CN202220999364.5U
Authority: CN
Inventors: 史继英; 毛薰钰
Original assignee: Sichuan Boteng Chuangda Intelligent Technology Co ltd
Current assignee: Sichuan Boteng Chuangda Intelligent Technology Co ltd
Priority date: 2022-04-26
Filing date: 2022-04-26
Publication date: 2022-08-19
Anticipated expiration: 2032-04-26

Abstract

The utility model provides a belt cleaning device and production system for rinsing particulate pollutant relates to cleaning equipment and makes technical field. The working principle of the cleaning device is as follows: the nitrogen-argon mixed supercritical fluid generated by the supercritical fluid production system is sprayed out through a nozzle of a spraying mechanism, a workpiece to be cleaned on a lower placing table is cleaned, and particle pollutants on the workpiece are peeled off from the workpiece; the laminar flow generating device generates clean laminar flow, takes away stripped particle pollutants, and prevents the particle pollutants from being attached to the surface of the workpiece again. Adopt the embodiment of the utility model provides a belt cleaning device can promote the cleaning performance to micron, submicron order, nanometer particle pollutant.

Description

Cleaning device for cleaning particle pollutants and production system

Technical Field

The utility model relates to a cleaning equipment makes the field, particularly, relates to a belt cleaning device and production system for rinsing particulate contamination.

Background

In the fields of photoelectric information technology and precision machine manufacturing, along with the deep development of industrial manufacturing technology, the requirement on manufacturing precision is higher and higher, and the highest processing precision reaches submicron or nanometer level. Control of contaminants on the surface of a processing device is promoted as the processing accuracy increases. The particle pollutants remained on the surface can have certain influence on the surface quality of the processed product and the optical performance and the electronic performance of the product, and can cause the product to be scrapped when the particle pollutants are serious. In the precision processing of semiconductor devices, optical devices, control of surface residual contaminants is often required to be limited to micron or submicron levels. The newly published standards of the international organization for standardization also extend the controllable range of surface particle residues down to submicron levels, and thus ultrafine particle contaminants are highly regarded in modern industrial production and scientific research.

Particle pollutants are inevitably generated in the production and processing processes of semiconductor devices, optical lenses, metal devices and the like, and the removal of residual particle pollutants on the surface is an extremely important process after the production and processing. At present, a plurality of methods for removing residual particle pollutants on the surface in the precision manufacturing industry, such as spraying, wiping, cleaning, ultrasonic cleaning, high-pressure spraying, cleaning with chemical reagents, air knife blowing, laser cleaning and the like, are very effective cleaning methods. However, for micron and submicron particle contaminants, cleaning is difficult due to the relatively large electrostatic attraction, van der waals forces, etc. between the particles and the surface molecules.

However, the current cleaning equipment and process have poor cleaning effect on micron, submicron and nano-scale particle pollutants.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a belt cleaning device and production system for rinsing particle pollutant aims at promoting the cleaning performance to micron, submicron order, nanometer particle pollutant.

The embodiment of the utility model is realized like this:

in a first aspect, the utility model provides a belt cleaning device for rinsing particulate pollutants, including rinsing the cavity and being used for producing the supercritical fluid production system of supercritical fluid, be provided with in the rinsing cavity and be used for placing the platform of placing of waiting to rinse the work piece, a blowing gas production system for jetting supercritical fluid and being used for producing the sweeping gas, the feed end of supercritical fluid production system with be used for carrying the pipeline intercommunication of nitrogen argon mixture, the discharge end of supercritical fluid production system and the feed end intercommunication of jet mechanism, the spout on the jet mechanism is just to placing the platform to peel off the pollutant on waiting to rinse the work piece;

the discharge end of the blowing gas production system is positioned above the side of the placing table, so that blowing gas generated by the blowing gas production system can take away pollutants stripped from the surface of the workpiece to be cleaned.

In an alternative embodiment, a vacuum system for pumping out the gas in the cleaning cavity is further connected to the cleaning cavity.

In an alternative embodiment, the cleaning device further comprises a gas displacement system for displacing the gas in the cleaning cavity before cleaning, and the discharge end of the gas displacement system is communicated with the cleaning cavity.

In an optional embodiment, the system further comprises a gas supply system, and the discharge end of the gas supply system is respectively communicated with the gas inlet ends of the supercritical fluid production system, the purge gas production system and the gas replacement system.

In an optional embodiment, the spraying mechanism comprises a laval nozzle, the distance between the outlet of the laval nozzle and the placing table is 0.5cm-2cm, and the included angle between the laval nozzle and the horizontal plane where the placing table is located is 30-45 degrees.

In an alternative embodiment, a driving mechanism for driving the placing table to move is further included.

In an alternative embodiment, a heating mechanism for heating the lower side of the workpiece to be cleaned on the placing table is provided on the placing table.

In an alternative embodiment, a first feeding sealing door is arranged on one side of the cleaning cavity, and a first discharging sealing door is arranged on the opposite side; a first transfer box for loading unwashed workpieces is arranged at a position corresponding to the first feeding sealing door outside the cleaning cavity, and a second transfer box for loading cleaned workpieces is arranged at a position corresponding to the first discharging sealing door outside the cleaning cavity.

In an optional embodiment, a feeding chamber for sealing a first feeding sealing door is further connected to the outer wall of the cleaning cavity, the first transfer box is located in the feeding chamber, and a second feeding sealing door opposite to the first feeding sealing door is further arranged on the feeding chamber;

the outer wall of the cleaning cavity is also connected with a discharging chamber used for sealing the first discharging sealing door, the second transfer box is positioned in the discharging chamber, and the discharging chamber is also provided with a second discharging sealing door opposite to the first discharging sealing door;

the cleaning device further comprises a transfer mechanism for transferring the work pieces between the first transfer cassette, the placing table, and the second transfer cassette.

In a second aspect, the present invention provides a production system, which includes a processing device and a cleaning device according to any one of the above embodiments, wherein the processing device is used for processing a workpiece cleaned by the cleaning device.

The embodiment of the utility model provides a beneficial effect is: the mixed supercritical fluid of nitrogen argon that produces through supercritical fluid production system spouts through the spout of injection mechanism, places the bench below and washs the work piece of treating to will treat to wash the pollutant on the work piece and peel off, produce the sweeping gas through sweeping gas production system and will peel off the pollutant of work piece and take away. Adopt the embodiment of the utility model provides a belt cleaning device can promote the cleaning performance to micron, submicron, nanometer particle pollutant.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.

Fig. 1 is a schematic structural view of a cleaning device provided by an embodiment of the present invention.

100-washing device; 001-a workpiece to be cleaned; 110-cleaning the cavity; 120-supercritical fluid production system; 130-a placement table; 140-a spray mechanism; 150-a purge gas production system; 160-vacuum system; 170-gas displacement system; 180-a gas supply system; 111-first feed seal gate; 112-first discharge sealing gate; 113-a first transfer box; 114-a second transport cassette; 115-a feeding chamber; 116-a second feed sealing gate; 117-discharge chamber; 118-second discharge sealing gate; 119-a transport mechanism.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention, as generally described and illustrated in the figures herein, may be arranged and designed in a wide variety of different configurations.

Thus, the following detailed description of the embodiments of the present invention, presented in the accompanying drawings, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.

It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.

In the description of the present invention, it should be noted that the terms "center", "vertical", "horizontal", "inside", "outside", and the like indicate the position or positional relationship based on the position or positional relationship shown in the drawings, or the position or positional relationship which the products of the present invention are conventionally placed when in use, and are only for convenience of description and simplification of the description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.

Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.

In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Referring to fig. 1, an embodiment of the present invention provides a cleaning apparatus 100 for cleaning particulate contaminants, including a cleaning chamber 110 and a supercritical fluid production system 120 for generating a supercritical fluid, wherein the supercritical fluid generated by the supercritical fluid production system 120 is used to clean a workpiece 001 to be cleaned in the cleaning chamber 110.

Specifically, the cleaning chamber 110 is a main space of the cleaning process, and is preferably isolated from the outside to ensure parameters such as temperature and pressure inside the cleaning chamber during the cleaning process.

Specifically, a placing table 130 for placing the workpiece 001 to be cleaned and an injection mechanism 140 for injecting supercritical fluid are arranged in the cleaning cavity 110, a feeding end of the supercritical fluid production system 120 is communicated with a pipeline for conveying a nitrogen-argon mixed material, a discharging end of the supercritical fluid production system 120 is communicated with a feeding end of the injection mechanism 140, and a nozzle on the injection mechanism 140 is opposite to the placing table 130 so as to strip off pollutants on the workpiece to be cleaned. The nitrogen and argon mixed material is used to deliver nitrogen (or liquid nitrogen) and argon, and the supercritical fluid production system 120 uses the nitrogen and argon mixed material to generate a nitrogen and argon mixed supercritical fluid to clean the workpiece 001 to be cleaned.

It should be noted that the nitrogen-argon mixed supercritical fluid can further improve the cleaning effect on micron, submicron and nano-scale particle pollutants compared with the carbon dioxide supercritical fluid, and the coating cannot be dissolved.

Specifically, the supercritical fluid production system 120 is an existing apparatus for producing a supercritical fluid having advantages of a density close to liquid, a viscosity close to gas, a large diffusion coefficient, a small viscosity, and the like.

In some embodiments, the spraying mechanism 140 comprises a laval nozzle, the distance between the outlet of the laval nozzle and the placing table is 0.5cm-2cm, and the included angle between the laval nozzle and the horizontal plane of the placing table is 30-45 degrees. Supercritical fluid (N) ₂ Ar is mixed) is sprayed out through a Laval nozzle in a spraying system in a supersonic speed to obtain a gas, liquid and solid mixture, solid particles reach the surface of a workpiece and are sublimated instantly due to the sudden temperature rise to generate micro-area explosion, and huge impact force is formed in the micro-area where the explosion occurs, and the impact force peels off and removes the particle (micron, submicron or nanometer) pollutants adhered to the surface of the workpiece. The adjustment of the angle and distance of the Laval nozzle can be adjusted according to the requirement.

In some embodiments, a driving mechanism (not shown) for driving the placing table 130 to move is further included, so as to move the placing table 130 to perform overall cleaning on the workpiece 001 to be cleaned. Specifically, the specific structure of the driving mechanism is not limited, and may be a driving member such as a general motor.

In some embodiments, a heating mechanism (not shown) for heating the lower side of the workpiece 001 to be cleaned on the placing table 130 is disposed on the placing table 130, so that the lower temperature of the workpiece 001 to be cleaned is higher than the upper temperature, and a thermophoresis phenomenon is generated, so that the removed particles move upwards, and the probability of secondary pollution is reduced. Specifically, the heating mechanism may be a general electric heating structure, and may be configured to heat the lower side of the workpiece 001 to be cleaned.

In order to improve the cleaning effect, a purge gas production system 150 for generating purge gas is disposed in the cleaning chamber 110, and a discharge end of the purge gas production system 150 is located above the side of the placing table 130, so as to generate purge gas through the purge gas production system 150 to take away the contaminants peeled off from the workpiece 001 to be cleaned. The purge gas may be nitrogen or argon, and may be ejected in a direction parallel to the surface of the workpiece 001 to be cleaned by the purge gas production system 150 to purge, thereby taking away the stripped contaminants.

In some embodiments, the purge gas production system 150 may be a general showerhead structure capable of ejecting the purge gas, and the specific structure is not limited to a great extent.

In another embodiment, the purge gas production system 150 may be a device that generates gas in a laminar flow state to further enhance the purging effect.

In some embodiments, the cleaning chamber 110 is further connected to a vacuum system 160 for pumping out the gas in the cleaning chamber 110, the vacuum system 160 can maintain the cleaning chamber 110 in a negative pressure state during the cleaning process, so that the substance coming out of the nozzle has a larger kinetic energy, and the larger kinetic energy makes the contaminants more easily peel off the surface of the workpiece; purge gas produced by the purge gas production system 150 may also be exhausted through the vacuum system 160. Specifically, the vacuum system 160 may be located on a side remote from the purge gas production system 150 so that the purge gas is exhausted from the vacuum system 160 after passing over the surface of the workpiece 001 to be cleaned.

In some embodiments, the cleaning apparatus 100 further comprises a gas displacement system 170 for displacing gas within the cleaning chamber 110 prior to cleaning, the discharge end of the gas displacement system 170 being in communication with the cleaning chamber 110. Before cleaning, nitrogen or argon is introduced from the gas replacement system 170 at the left end of the cleaning cavity 110, and the vacuum system 160 at the right end of the cleaning cavity 110 discharges the gas with particle impurities to replace the gas in the cleaning cavity 110, so that the cavity is clean, and the inert gas does not react with the workpiece.

Specifically, the gas replacement system 170 may be a pipeline for conveying gas, and the specific structure is not limited.

In some embodiments, the cleaning apparatus 100 further includes a gas supply system 180, and a discharge end of the gas supply system 180 is respectively communicated with gas inlet ends of the supercritical fluid production system 120, the purge gas production system 150, and the gas replacement system 170, and is used for supplying gas to the supercritical fluid production system 120, the purge gas production system 150, and the gas replacement system 170, so as to provide high-purity liquid nitrogen, liquid argon, nitrogen, argon, and other raw materials for the three systems.

In other embodiments, the supercritical fluid production system 120, the purge gas production system 150, and the gas replacement system 170 may not share one gas supply system 180, and each gas supply system may correspond to different gas supply units, so as to flexibly select the gas used by each system.

In order to facilitate the transfer of the workpiece 001 to be cleaned, a first feeding sealing door 111 is arranged on one side of the cleaning cavity 110, and a first discharging sealing door 112 is arranged on the opposite side; a first transfer box 113 for loading unwashed workpieces is provided at a position corresponding to the first feed sealing door 111 outside the cleaning chamber 110, and a second transfer box 114 for loading cleaned workpieces is provided at a position corresponding to the first discharge sealing door 112 outside the cleaning chamber 110. The unwashed workpieces in the first transfer cassette 113 are transferred to the placing table 130 through the first feed seal gate 111 and washed, and then the washed workpieces are transferred to the second transfer cassette 114 through the first discharge seal gate 112 and stored.

In order to prevent the workpiece from being polluted by the outside, a feeding chamber 115 for closing the first feeding sealing door 111 is further connected to the outer wall of the cleaning chamber 110, the first transfer box 113 is located in the feeding chamber 115, and a second feeding sealing door 116 opposite to the first feeding sealing door 111 is further arranged on the feeding chamber 115; the outer wall of the cleaning cavity 110 is further connected with a discharging chamber 117 for sealing the first discharging sealing door 112, the second transfer box 114 is located in the discharging chamber 117, and the discharging chamber 117 is further provided with a second discharging sealing door 118 opposite to the first discharging sealing door 112. The feeding chamber 115 and the discharging chamber 117 can isolate the workpiece from the outside and the cleaning cavity 110, so as to avoid the pollution of the outside to the workpiece.

In actual operation, the inlet chamber 115 and the outlet chamber 117 may also use the gas supply system 180 to provide gas to replace the gas in the inner space, thereby further avoiding the influence on the workpiece. In addition, the gas replacement system 170 can be used to balance the pressures of the discharge chamber 117, the feed chamber 115, and the cleaning chamber 110 during the transportation of the wafer before and after cleaning.

In some embodiments, the washing device 100 further includes a transfer mechanism 119 for transferring the workpiece between the first transfer cassette 113, the placing table 130, and the second transfer cassette 114. The transfer mechanism 119 may be a general robot structure, and may be a mechanism capable of transferring a workpiece.

Specifically, the first feeding sealing door 111, the first discharging sealing door 112, the second feeding sealing door 116 and the second discharging sealing door 118 may be of an existing electrically controlled door structure, and are kept in a sealing state with the casing of the cleaning chamber 110 when closed by performing an opening and closing operation outside the cleaning chamber 110.

In the actual operation process, the feeding chamber 115 is used for placing the first transfer box 113, after the first transfer box 113 is placed in the feeding chamber 115, the second feeding sealing door 116 is closed, and the feeding chamber 115 is filled with clean gas; when the transfer mechanism 119 takes out the cleaning workpiece, the first feeding sealing door 111 is opened, and after the workpiece is taken out, the first feeding sealing door 111 is closed; when the first transfer box 113 is taken out, the second feeding sealing door 116 is opened, and after the first transfer box 113 is taken out, the second feeding sealing door 116 is closed and clean gas is introduced for replacement, so that the pollution of the outside to the cleaning cavity 110 and the feeding chamber 115 is reduced.

In the actual operation process, the discharging chamber 117 is used for placing the second transfer box 114, after the second transfer box 114 is placed in the discharging chamber 117, the second discharging sealing door 118 is closed, and clean gas is introduced into the discharging chamber 117 to replace the polluted gas brought in from the outside; when the transfer mechanism 119 places the cleaned workpiece into the second transfer box 114, the first discharge sealing door 112 is opened, and after the placement is finished, the first discharge sealing door 112 is closed; when taking out second transportation box 114, second ejection of compact sealing door 118 is opened, takes out the back, and second ejection of compact sealing door 118 closes to let in clean gas replacement, above mode can reduce the external pollution to washing cavity 110, ejection of compact room 117.

Specifically, the kind of the workpiece 001 to be cleaned is not limited, and may be a silicon wafer or the like, and is not particularly limited herein.

The embodiment of the utility model provides a production system is still provided, including the belt cleaning device 100 of any one of processingequipment and aforementioned embodiment, processingequipment is used for processing the work piece after belt cleaning device 100 washs.

Specifically, the specific form of the processing apparatus is not limited, and may be selected according to the product to be produced, such as the structure for processing products such as semiconductor devices, optical lenses, metal devices, and the like.

To sum up, the utility model provides a belt cleaning device and production system for rinsing particulate contamination, the mixed supercritical fluid of nitrogen argon that produces through supercritical fluid production system washs through the spout blowout of injection mechanism to placing the bench work piece of treating that washs the below to will treat to wash the pollutant on the work piece and peel off, produce through the blowing gas production system that the blowing gas will follow the pollutant of waiting to rinse and peel off on the work piece and take away. Adopt the embodiment of the utility model provides a belt cleaning device has following advantage:

(1) by using N ₂ Ar is used as cleaning agent due to N ₂ The Ar has good stability, only can strip pollutants from the surface of a workpiece, cannot damage a coating, cannot pollute the environment and is a bulk gas; compared with the prior art that carbon dioxide is used as a cleaning agent, the method has the advantages of high removal efficiency and no damage to the coating on the surface of the workpiece to be cleaned;

(2) after the particle pollutants are stripped, the lower end of the workpiece is heated by a heating mechanism to generate a thermophoresis phenomenon, and the pollutants tend to move upwards, so that the pollutants are prevented from being attached to the workpiece again;

(3) generating purge gas by using a purge gas production system, taking away the pollutants stripped from the workpiece, and discharging the pollutants from the cavity through a vacuum system; the blowing gas production system can also be designed into a laminar flow generating device to generate laminar flow;

(4) the feeding chamber and the discharging chamber are used as transfer spaces, so that the cleaning cavity can not be contacted with outside polluted air, the cleanliness of the working environment is improved, and the cleaning effect is ensured.

The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes will occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A cleaning device for cleaning particle pollutants is characterized by comprising a cleaning cavity and a supercritical fluid production system for generating supercritical fluid, wherein a placing platform for placing a workpiece to be cleaned, an injection mechanism for injecting the supercritical fluid and a blowing gas production system for generating blowing gas are arranged in the cleaning cavity, the feeding end of the supercritical fluid production system is communicated with a pipeline for conveying a nitrogen-argon mixed material, the discharging end of the supercritical fluid production system is communicated with the feeding end of the injection mechanism, and a nozzle on the injection mechanism is opposite to the placing platform so as to strip the pollutants on the workpiece to be cleaned;

the discharge end of the blowing gas production system is positioned above the side of the placing table, so that blowing gas is generated by the blowing gas production system to take away pollutants stripped from the surface of the workpiece to be cleaned.

2. The cleaning device of claim 1, wherein a vacuum system is further connected to the cleaning chamber for evacuating air from the cleaning chamber.

3. The cleaning apparatus defined in claim 2, further comprising a gas displacement system for displacing gas within the cleaning chamber prior to cleaning, the gas displacement system having a discharge end in communication with the cleaning chamber.

4. The cleaning apparatus defined in claim 3, further comprising a gas supply system, a discharge end of the gas supply system being in communication with a gas inlet end of the supercritical fluid production system, the purge gas production system, and the gas displacement system, respectively.

5. The cleaning device according to claim 1, wherein the spraying mechanism comprises a laval nozzle, the distance between the outlet of the laval nozzle and the placing table is 0.5cm-2cm, and the included angle between the laval nozzle and the horizontal plane of the placing table is 30-45 degrees.

6. The washing apparatus as claimed in claim 1, further comprising a driving mechanism for driving the placing table to move.

7. The cleaning apparatus according to claim 6, wherein a heating mechanism for heating a lower side of the workpiece to be cleaned on the placing table is provided on the placing table.

8. The cleaning device according to claim 1, wherein a first feeding sealing gate is arranged at one side of the cleaning cavity, and a first discharging sealing gate is arranged at the opposite side; the first feeding sealing door corresponding position outside the cleaning cavity is provided with a first transfer box for loading unwashed workpieces, and the first discharging sealing door corresponding position outside the cleaning cavity is provided with a second transfer box for loading cleaned workpieces.

9. The cleaning device according to claim 8, wherein an inlet chamber for closing the first feeding sealing door is further connected to an outer wall of the cleaning cavity, the first transporting box is located in the inlet chamber, and a second feeding sealing door opposite to the first feeding sealing door is further arranged on the inlet chamber;

the outer wall of the cleaning cavity is also connected with a discharge chamber used for sealing the first discharge sealing door, the second transfer box is positioned in the discharge chamber, and the discharge chamber is also provided with a second discharge sealing door opposite to the first discharge sealing door;

the cleaning apparatus further includes a transfer mechanism for transferring the workpiece between the first transfer cassette, the placing table, and the second transfer cassette.

10. A production system comprising a processing apparatus for processing a workpiece cleaned by the cleaning apparatus and the cleaning apparatus according to any one of claims 1 to 9.