CN214066158U - High-resistance film testing system - Google Patents
High-resistance film testing system Download PDFInfo
- Publication number
- CN214066158U CN214066158U CN202022310744.7U CN202022310744U CN214066158U CN 214066158 U CN214066158 U CN 214066158U CN 202022310744 U CN202022310744 U CN 202022310744U CN 214066158 U CN214066158 U CN 214066158U
- Authority
- CN
- China
- Prior art keywords
- measuring device
- resistance
- hardness
- resistance film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
The utility model relates to a high resistant membrane test system and test method thereof, including loading and unloading device, hardness measuring device, thickness measuring device, luminance measuring device, resistance measuring device, adhesive force measuring device and controlling means. The utility model discloses an useful part lies in: the hardness, the thickness, the light transmission effect, the resistance value and the adhesive force of the high-resistance film can be respectively tested through the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device, so that the labor input is reduced, and the testing efficiency is improved; in addition, the high-resistance film is uniformly loaded and unloaded through the loading and unloading device, so that the continuity of the detection process is ensured, the missing detection probability is reduced, the detection accuracy is improved, and the whole space occupation is reduced.
Description
Technical Field
The utility model relates to a high resistant membrane test field especially relates to a high resistant membrane test system.
Background
The In-Cell anti-interference high-resistance coating is formed by coating an anti-interference and anti-static high-resistance coating In a liquid crystal pixel of a liquid crystal display, wherein the resistance of the coating reaches 10^8 ohm, and the In-Cell anti-interference high-resistance coating is a functional film which has the functions of preventing touch signal interference and static electricity.
In-Cell: the touch sensing circuit is arranged in the display panel, and the touch sensor function is embedded in a box formed between the thin film transistor array substrate and the color filter, so that the use of various materials such as optical cement can be effectively reduced, the light transmission is improved, and the thickness of a display device is reduced. The product of coating film needs to be detected after the coating film is finished, and the prior art detects the product manually, so that the detection efficiency is low, and the missing detection risk exists.
SUMMERY OF THE UTILITY MODEL
In order to overcome at least partial defect among the prior art, the embodiment of the utility model provides a high resistant membrane test system, it can accomplish the detection to the coating film product fast.
The utility model provides a technical scheme as follows: the utility model provides a high resistant membrane test system, includes discharge apparatus, hardness measuring device, thickness measuring device, luminance measuring device, resistance measuring device, adhesive force measuring device and controlling means, wherein:
the hardness measuring device is used for detecting the hardness of the high-resistance film and comparing the hardness with a preset hardness value to obtain a test result;
the thickness measuring device is used for detecting the thickness of the high-resistance film and comparing the thickness with a preset thickness value to obtain a test result;
the brightness measuring device is used for detecting the light transmission effect of the high-resistance film and comparing the light transmission effect with the preset light transmission rate to obtain a test result;
the resistance measuring device is used for detecting the resistance of the high-resistance film and comparing the resistance with a preset resistance value to obtain a test result;
the adhesive force measuring device is used for detecting the adhesive force of the high-resistance film and comparing the adhesive force with a preset resistance value to obtain a test result;
the upper discharging device is used for transferring the high-resistance die to be detected to detection stations of the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device, and the upper discharging device is also used for moving qualified or unqualified products out of the detection stations;
the control device is in signal connection with the loading and unloading device, the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device and is used for controlling the loading and unloading device, the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device.
Further, go up discharge apparatus includes the rolling disc and follows a plurality of manipulator that the circumferencial direction of rolling disc set up detection recess and waste product groove have been seted up on the rolling disc, the manipulator be used for with the high resistant membrane is placed detect the recess, detect the station or in the waste product groove, go up discharge apparatus still includes the drive rolling disc pivoted servo motor, servo motor with controlling means signal connection.
Furthermore, the hardness measuring device comprises a hardness testing table and a hardness tester arranged on the hardness testing table, the hardness testing table comprises a supporting rod with adjustable height and a supporting table surface connected to the supporting rod, a limiting groove is formed in the supporting table surface, and the bottom surface of the hardness tester is positioned in the limiting groove.
Further, the thickness measuring device comprises a reference table board and a thickness detecting mechanism arranged on one side of the reference table board, and the thickness detecting mechanism is a film thickness step machine.
Further, the luminance measuring device includes a light source and a luminance detecting device that detects luminance of the light transmitted through the high-resistance film, and the high-resistance film is disposed between the light source and the luminance detecting device.
Further, resistance measuring device includes that resistance detects base, first detection head, second detect head and resistance detector, first detection head sets up in the recess that resistance detection base upper surface was seted up, the setting that the second detected that the head can reciprocate is in the recess top, first detection head with the second detect the head all with resistance detector is connected.
Furthermore, the adhesive force measuring device comprises a scribing table, a scribing mechanism and a camera, wherein the scribing mechanism comprises a transverse scribing knife, a longitudinal scribing knife, a transverse driving structure connected to the transverse scribing knife and a longitudinal driving structure connected to the longitudinal scribing knife, and the shooting direction of the camera is over against the high-resistance film placed on the scribing table.
Furthermore, the detection groove is a rectangular groove matched with the high-resistance film, the detection groove corresponds to the upper discharging device, the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device respectively, and the waste groove is an annular groove formed in the rotating disc.
The utility model discloses for prior art's beneficial effect: the utility model relates to a high resistant membrane test system, including loading and unloading device, hardness measuring device, thickness measuring device, luminance measuring device, resistance measuring device, adhesive force measuring device and controlling means, can test hardness, thickness, printing opacity effect, resistance value and adhesive force of high resistant membrane respectively through hardness measuring device, thickness measuring device, luminance measuring device, resistance measuring device and adhesive force measuring device, reduce the human input, improve efficiency of software testing; in addition, the high-resistance film is uniformly loaded and unloaded through the loading and unloading device, so that the continuity of the detection process is ensured, the missing detection probability is reduced, the detection accuracy is improved, and the whole space occupation is reduced.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts
FIG. 1 is a signal connection schematic of a high resistance film test system.
Fig. 2 is a schematic diagram of the overall structure of the high resistance film test system (excluding the control device).
Fig. 3 is a schematic structural view of the hardness measuring device of fig. 2.
Fig. 4 is a schematic structural view of the luminance measuring apparatus of fig. 2.
Fig. 5 is a schematic structural diagram of the resistance measuring apparatus in fig. 2.
Fig. 6 is a schematic structural view of the adhesion force measuring device of fig. 2.
Detailed Description
The present invention will be described more fully hereinafter with reference to the accompanying drawings and specific embodiments, it is to be understood that the specific embodiments are merely illustrative of some embodiments, and that other embodiments may be made by those skilled in the art without the use of inventive faculty, and the scope of the invention is not limited thereto.
Referring to fig. 1-6, the present invention provides a high resistance film testing system in a preferred embodiment, which includes an upper discharging device 1, a hardness measuring device 2, a thickness measuring device 3, a brightness measuring device 4, a resistance measuring device 5, an adhesive force measuring device 6 and a control device, wherein:
the hardness measuring device 2 is used for detecting the hardness of the high-resistance film and comparing the hardness with a preset hardness value to obtain a test result;
the thickness measuring device 3 is used for detecting the thickness of the high-resistance film and comparing the thickness with a preset thickness value to obtain a test result;
the brightness measuring device 4 is used for detecting the light transmission effect of the high-resistance film and comparing the light transmission effect with the preset light transmission rate to obtain a test result;
the resistance measuring device 5 is used for detecting the resistance of the high-resistance film and comparing the resistance with a preset resistance value to obtain a test result;
the adhesive force measuring device 6 is used for detecting the adhesive force of the high-resistance film and comparing the adhesive force with a preset resistance value to obtain a test result;
the loading and unloading device 1 is used for transferring a high-resistance die to be detected to a detection station of the hardness measuring device 2, the thickness measuring device 3, the brightness measuring device 4, the resistance measuring device 5 and the adhesive force measuring device 6, and the loading and unloading device 1 is also used for moving a product which is qualified or unqualified in detection out of the detection station;
the control device 7 is in signal connection with the loading and unloading device 1, the hardness measuring device 2, the thickness measuring device 3, the brightness measuring device 4, the resistance measuring device 5 and the adhesive force measuring device 6, and is used for controlling the loading and unloading device 1, the hardness measuring device 2, the thickness measuring device 3, the brightness measuring device 4, the resistance measuring device 5 and the adhesive force measuring device 6.
Referring to fig. 2, in the above embodiment, the upper discharging device 1 includes a rotating disc 11 and a plurality of manipulators 12 arranged along the circumferential direction of the rotating disc 11, a detection groove 13 and a waste product slot 14 are formed on the rotating disc 11, the manipulators 12 are used for placing the high-resistance film into the detection groove 13, the detection station or the waste product slot 14, and the upper discharging device 1 further includes a servo motor for driving the rotating disc 11 to rotate, and the servo motor is in signal connection with the control device.
Referring to fig. 2 and 3, in the above embodiment, the hardness measuring device 2 includes a hardness testing table 21 and a hardness tester 22 disposed on the hardness testing table 21, the hardness testing table 21 includes a height-adjustable supporting rod 211 and a supporting table 212 connected to the supporting rod 211, a limiting groove (not shown) is formed on the supporting table 212, and a bottom surface of the hardness tester 22 is located in the limiting groove.
Referring to fig. 2, in the above embodiment, the thickness measuring device 3 includes a reference table and a thickness detecting mechanism (not shown) provided on one side of the reference table (not shown), and the thickness detecting mechanism is a film thickness step machine. In the actual implementation process, other thickness measuring instruments such as a magnetic induction coating thickness gauge, an eddy current coating thickness gauge, a fluorescent X-ray instrument coating thickness gauge and the like can be adopted according to actual needs.
Referring to fig. 2 and 4, in the above embodiment, the luminance measuring device 4 includes the light source 41 and the luminance detecting device 42 that detects the luminance of the light transmitted through the high-resistance film, which is disposed between the light source 41 and the luminance detecting device 42. In practical implementation, the brightness detection device 42 may employ a spectral brightness meter or the like according to practical needs.
Referring to fig. 2 and 5, in the above embodiment, the resistance measuring device 5 includes a resistance detecting base 51, a first detecting head 52, a second detecting head 53 and a resistance detector 54, the first detecting head 52 is disposed in a groove formed on an upper surface of the resistance detecting base 51, the second detecting head 52 is disposed above the groove in a vertically movable manner, and both the first detecting head 52 and the second detecting head 53 are connected to the resistance detector 54. In practical use, the high-resistance film is first placed in the groove of the resistance detection base 51 through the loading and unloading device 1, the lower surface of the high-resistance film is in contact with the first detection head 52, then the second detection head 52 is moved to the upper surface of the high-resistance film, and the resistance of the high-resistance film is detected by the resistance detector 54.
Referring to fig. 2 and 6, in the above embodiment, the adhesion force measuring device 6 includes a scribing table 61, a scribing mechanism 62, and a camera 63, the scribing mechanism 62 includes a transverse scribing blade 621, a longitudinal scribing blade 622, a transverse driving structure (not shown) connected to the transverse scribing blade 621, and a longitudinal driving structure (not shown) connected to the longitudinal scribing blade 622, and the shooting direction of the camera 63 faces the high resistance film placed on the scribing table 61.
In the above embodiment, the detection groove 13 is a rectangular groove matched with the high resistance film, the detection groove 13 corresponds to the upper discharging device 1, the hardness measuring device 2, the thickness measuring device 3, the brightness measuring device 4, the resistance measuring device 5 and the adhesion measuring device 6, respectively, and the waste groove 14 is an annular groove formed in the rotating disc 11.
Referring to fig. 1 and 2, the middle and high resistance film testing system of the present invention comprises the following steps: the high-resistance film is moved to the rotating disc 11 from the feeding trolley 7 through the loading and unloading device 1, the rotating disc 11 is controlled to rotate through the control device 7, and then the high-resistance film is moved to the detection station through the loading and unloading device 1; the high-resistance film is detected sequentially through a hardness measuring device 2, a thickness measuring device 3, a brightness measuring device 4 and a resistance measuring device 5, and when any one of the high-resistance films is unqualified, the unqualified high-resistance film is transferred to a waste product tank 14 through an upper discharging device 1; when the hardness measuring device 2, the thickness measuring device 3, the brightness measuring device 4 and the resistance measuring device 5 are qualified in detection, the high-resistance film is transferred to a detection groove 13 of the rotating disc 11 through the upper discharging device 1, and when the rotating disc 11 rotates to detect that the qualified high-resistance film rotates to an initial position, the high-resistance film is discharged through the upper discharging device 1.
The high-resistance film is subjected to sampling inspection through an adhesive force measuring device 6, and the high-resistance film detected by a hardness measuring device 2, a thickness measuring device 3, a brightness measuring device 4 and a resistance measuring device 5 is randomly grabbed to a scribing table 61 through an upper unloading device; then, the high-resistance film is scribed by a scribing mechanism 62, after scribing is finished, an adhesive tape is pasted on the scribed part, and then the adhesive tape is quickly torn up; then, the scribing part of the high-resistance film is shot through the camera 63, the scribing area is observed through a display connected to the control device, and the adhesive force of the high-resistance film is calculated.
The present invention has been explained by using specific embodiments, and the explanation of the above embodiments is only used to help understand the method and the core idea of the present invention; meanwhile, for the general technical personnel in the field, according to the idea of the present invention, there are changes in the specific implementation and application scope, to sum up, the content of the present specification should not be understood as the limitation of the present invention.
Claims (8)
1. The utility model provides a high resistant membrane test system which characterized in that, includes discharge apparatus, hardness measuring device, thickness measuring device, luminance measuring device, resistance measuring device, adhesive force measuring device and controlling means, wherein:
the hardness measuring device is used for detecting the hardness of the high-resistance film and comparing the hardness with a preset hardness value to obtain a test result;
the thickness measuring device is used for detecting the thickness of the high-resistance film and comparing the thickness with a preset thickness value to obtain a test result;
the brightness measuring device is used for detecting the light transmission effect of the high-resistance film and comparing the light transmission effect with the preset light transmission rate to obtain a test result;
the resistance measuring device is used for detecting the resistance of the high-resistance film and comparing the resistance with a preset resistance value to obtain a test result;
the adhesive force measuring device is used for detecting the adhesive force of the high-resistance film and comparing the adhesive force with a preset resistance value to obtain a test result;
the upper discharging device is used for transferring the high-resistance die to be detected to detection stations of the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device, and the upper discharging device is also used for moving qualified or unqualified products out of the detection stations;
the control device is in signal connection with the loading and unloading device, the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device and is used for controlling the loading and unloading device, the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesive force measuring device.
2. The high-resistance film testing system according to claim 1, wherein the upper discharging device comprises a rotating disc and a plurality of manipulators arranged along the circumferential direction of the rotating disc, a detection groove and a waste product groove are formed in the rotating disc, the manipulators are used for placing the high-resistance film into the detection groove, the detection station or the waste product groove, the upper discharging device further comprises a servo motor for driving the rotating disc to rotate, and the servo motor is in signal connection with the control device.
3. The high resistance film testing system according to claim 1, wherein the hardness measuring device comprises a hardness testing table and a hardness tester arranged on the hardness testing table, the hardness testing table comprises a supporting rod with adjustable height and a supporting table surface connected to the supporting rod, a limiting groove is formed on the supporting table surface, and the bottom surface of the hardness tester is positioned in the limiting groove.
4. The high resistance film test system according to claim 1, wherein the thickness measurement device comprises a reference table and a thickness detection mechanism arranged on one side of the reference table, and the thickness detection mechanism is a film thickness step machine.
5. The high resistance film test system according to claim 1, wherein the luminance measuring means includes a light source and a luminance detecting means for detecting luminance of light transmitted through the high resistance film, and the high resistance film is disposed between the light source and the luminance detecting means.
6. The high resistance film test system according to claim 1, wherein the resistance measurement device comprises a resistance detection base, a first detection head, a second detection head and a resistance detector, the first detection head is arranged in a groove formed in the upper surface of the resistance detection base, the second detection head is arranged above the groove in a manner of moving up and down, and the first detection head and the second detection head are both connected with the resistance detector.
7. The high-resistance film testing system according to claim 1, wherein the adhesion force measuring device comprises a scribing table, a scribing mechanism and a camera, the scribing mechanism comprises a transverse scribing knife, a longitudinal scribing knife, a transverse driving structure connected to the transverse scribing knife and a longitudinal driving structure connected to the longitudinal scribing knife, and the shooting direction of the camera is opposite to the high-resistance film placed on the scribing table.
8. The high resistance film test system according to claim 2, wherein the detection groove is a rectangular groove matched with the high resistance film, the detection groove corresponds to the upper discharging device, the hardness measuring device, the thickness measuring device, the brightness measuring device, the resistance measuring device and the adhesion force measuring device respectively, and the waste groove is an annular groove formed on the rotating disc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022310744.7U CN214066158U (en) | 2020-10-16 | 2020-10-16 | High-resistance film testing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022310744.7U CN214066158U (en) | 2020-10-16 | 2020-10-16 | High-resistance film testing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214066158U true CN214066158U (en) | 2021-08-27 |
Family
ID=77397992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022310744.7U Active CN214066158U (en) | 2020-10-16 | 2020-10-16 | High-resistance film testing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214066158U (en) |
-
2020
- 2020-10-16 CN CN202022310744.7U patent/CN214066158U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9207161B2 (en) | Film adhesion detection device and method thereof | |
| CN201644407U (en) | Three-dimensional dimension automatic sorting machine | |
| CN101444779A (en) | Magnet size automatic measuring and sorting unit | |
| CN103424623A (en) | Resistivity measurement device | |
| CN110346369A (en) | The two-sided on-line detection device of defects of upper and lower Linear slide platform formula | |
| CN207636025U (en) | A kind of automatic high speed glass monitor station | |
| CN109668833A (en) | A kind of high-precision two-sided on-line detection device of defects | |
| CN101398464A (en) | Circuit pattern inspection device | |
| CN214066158U (en) | High-resistance film testing system | |
| TWM269975U (en) | Screw inspection machinery | |
| CN206074046U (en) | A kind of lithium battery welds testing equipment | |
| CN207014942U (en) | Full-automatic backlight film sticking machine | |
| US20200341304A1 (en) | Measuring device and a measuring system | |
| CN112212921A (en) | High-resistance film testing system and testing method thereof | |
| CN209764048U (en) | Film thickness measuring device | |
| CN103235003B (en) | Vacuum thermal insulation board heat conductivity coefficient detection device | |
| CN102017114A (en) | Substrate quality tester | |
| CN207832924U (en) | The short-circuit detecting and voltage detecting system of pcb board on a kind of assembly line | |
| CN110361056A (en) | Super capacitor comprehensive parameters detection system | |
| CN205879421U (en) | Antifriction bearing friction torque detection device | |
| TWM569492U (en) | Measuring device for detecting roughness and deformation of wafer ring | |
| CN211825732U (en) | Non-contact film pressing backlight panel detection device and backlight panel automatic detection line | |
| CN113909137A (en) | Lens detection device | |
| CN207662494U (en) | A kind of guide wave radar liquid level gauge continuous detection apparatus | |
| TWI282417B (en) | Automated optical inspection method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |