CN213447284U - Magnetron sputtering target baffle device - Google Patents
Magnetron sputtering target baffle device Download PDFInfo
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- CN213447284U CN213447284U CN202022510040.4U CN202022510040U CN213447284U CN 213447284 U CN213447284 U CN 213447284U CN 202022510040 U CN202022510040 U CN 202022510040U CN 213447284 U CN213447284 U CN 213447284U
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- baffle
- sliding block
- cam
- magnetron sputtering
- sputtering target
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Abstract
The utility model discloses a magnetron sputtering target baffle device, which comprises a baffle body and a baffle driving mechanism; the baffle actuating mechanism comprises a driving shaft, an elastic structural component, a sliding block and a cam, wherein one end of the elastic structural component is fixedly connected with the driving shaft in a sleeved mode, the other end of the elastic structural component is connected with the sliding block, the sliding block is relatively connected with the other end of the elastic structural component and is provided with the cam, the cam is coaxially fixed with the driving shaft, the sliding block is connected with the driving shaft in a sleeved mode, one side of the sliding block is connected with the baffle body into a whole, the sliding block is provided with a groove in one side where the cam is connected, one side of the groove is an oblique guide surface, and the other side of the. The utility model provides a baffle device only comprises parts such as cam, slider, has simple structure, the reliable advantage of operation, and makes convenience, low cost.
Description
Technical Field
The utility model relates to a surface treatment technical field specifically relates to a magnetron sputtering target retaining device.
Background
With the continuous improvement of the performance of the thin film device, the line width is smaller and smaller, and the requirement on the magnetron sputtering film layer is higher and higher. The multi-cavity cluster type magnetron coating equipment can avoid cross contamination among target materials, but is high in cost and difficult to bear by most scientific research institutions and enterprises in China, the method of integrating the coating equipment with the plurality of magnetron sputtering targets in one process chamber to replace the multi-cavity cluster type magnetron coating equipment is continuously adopted, the method arranges the plurality of sputtering targets in the same process chamber, each sputtering target is provided with an independent baffle, and in the magnetron sputtering coating process, the effect that the plurality of sputtering targets share one process chamber without cross contamination is realized, so that the cost is saved. However, the existing baffle device has the problems that the whole structure is complex, the installation and the maintenance are inconvenient, and moving parts below the sputtering target are easily affected by sputtering substances to cause clamping stagnation and the like.
SUMMERY OF THE UTILITY MODEL
The utility model mainly aims to provide a magnetron sputtering target baffle device, which aims at solving the technical problem.
In order to achieve the above purpose, the magnetron sputtering target baffle device provided by the utility model comprises a baffle body and a baffle driving mechanism; the baffle actuating mechanism comprises a driving shaft, an elastic structural component, a sliding block and a cam, wherein one end of the elastic structural component is fixedly connected with the driving shaft in a sleeved mode, the other end of the elastic structural component is connected with the sliding block, the sliding block is relatively connected with the other end of the elastic structural component and is provided with the cam, the cam is coaxially fixed with the driving shaft, the sliding block is connected with the driving shaft in a sleeved mode, one side of the sliding block is connected with the baffle body into a whole, the sliding block is provided with a groove in one side where the cam is connected, one side of the groove is an oblique guide surface, and the other side of the.
Preferably, the other side of the groove is a vertical surface, and the bottom of the groove is an arc surface.
Preferably, the baffle body further comprises a connecting part, the connecting part is of an L-shaped structure, one end of the connecting part is connected with one side, away from the magnetron sputtering target, of the sliding block, and the other end of the connecting part is connected with the bottom of the baffle body.
Preferably, the drive shaft is provided with a tab extending outwardly from a surface in a radial direction of the drive shaft, the tab being connected to the resilient structure.
Preferably, a gasket is arranged between the elastic structural member and the sliding block.
Preferably, the sliding block is a polytetrafluoroethylene structure.
Preferably, the elastic structure is a spring.
In the technical scheme of the utility model, the magnetron sputtering target baffle device comprises a baffle body and a baffle driving mechanism; the baffle driving mechanism comprises a driving shaft, an elastic structural component, a sliding block and a cam, wherein one end of the elastic structural component is fixedly connected with the driving shaft in a sleeved mode, the other end of the elastic structural component is connected with the sliding block, the cam is arranged at the other end, opposite to the elastic structural component, of the sliding block, the cam is coaxially fixed with the driving shaft, the sliding block is connected with the driving shaft in a sleeved mode, one side of the sliding block is connected with the baffle body into a whole, and a groove. The utility model provides a baffle device only comprises parts such as cam, slider, has simple structure, the reliable advantage of operation, and makes convenience, low cost.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a schematic structural view of an embodiment of a magnetron sputtering target baffle device according to the present invention in a first operating state;
fig. 2 is a schematic structural diagram of an embodiment of the magnetron sputtering target baffle device of the present invention in a second operating state.
The reference numbers illustrate:
the objects, features and advantages of the present invention will be further described with reference to the accompanying drawings.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
It should be noted that all the directional indicators (such as upper, lower, left, right, front and rear … …) in the embodiment of the present invention are only used to explain the relative position relationship between the components, the motion situation, etc. in a specific posture (as shown in the drawings), and if the specific posture is changed, the directional indicator is changed accordingly.
In the present application, unless expressly stated or limited otherwise, the terms "connected" and "fixed" are to be construed broadly, e.g., "fixed" may be fixedly connected or detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
In addition, the technical solutions between the embodiments of the present invention can be combined with each other, but it is necessary to be able to be realized by a person having ordinary skill in the art as a basis, and when the technical solutions are contradictory or cannot be realized, the combination of such technical solutions should be considered to be absent, and is not within the protection scope of the present invention.
Referring to fig. 1 to 2, in an embodiment of the present invention, the magnetron sputtering target baffle device includes a baffle body 7 and a baffle driving mechanism; baffle actuating mechanism includes drive shaft 2, elastic construction spare 3, slider 5 and cam 6, the one end of elastic construction spare 3 cup joints and is fixed in drive shaft 2, the other end of elastic construction spare 3 is connected gasket 4, there is slider 5 gasket 4 below, and slider 5 is connected relatively the other end of gasket 4 is provided with cam 6, cam 6 with drive shaft 2 is coaxial fixed, slider 5 cup joint in drive shaft 2, just one side of slider 5 with baffle body 7 is connected as an organic wholely, slider 5 with one side that cam 6 meets is provided with the recess, one side of recess is the inclined spigot surface. Specifically, the shutter body 7 is bound to the slider 5. The sliding block 5 is in clearance fit with the driving shaft 2 and can drive the baffle body 7 to rotate at a certain angle in the circumferential direction. Below the slide 5 is a cam 6, which is bound to the drive shaft 2 and moves with the drive shaft 2. The protruding portion of the cam 6 is in contact with the guide surface of the slider 5 and is slidable along the guide surface. The motion of baffle body 7 is through drive shaft 2 drive cam 6, drives slider 5 by cam 6 again, and slider 5 and baffle body 7 bind the motion together and realize.
In this embodiment, the other side of the groove is a vertical surface, and the bottom of the groove may be a circular arc surface, so that the cam 6 can better move relatively along the inclined surface of the slider 5.
In this embodiment, the baffle body 7 further includes a connecting portion 8, the connecting portion 8 is an L-shaped structure, one end of the connecting portion 8 is connected to a side of the slider 5 away from the magnetron sputtering target 1, and the other end of the connecting portion 8 is connected to the bottom of the baffle body 7. Namely, the baffle body 7 and the connecting part 8 are of an integrated structure.
In this embodiment, the driving shaft 2 is provided with a protruding piece 9, the protruding piece 9 extends outwards from the surface along the radial direction of the driving shaft 2, and the protruding piece 9 is connected with the elastic structural member 3, so as to be capable of performing limit fixing on the elastic structural member 3.
Wherein, the elastic structural component 3 with be provided with gasket 4 between the slider 5, avoided the wearing and tearing between elastic structural component 3 and the slider 5, and be convenient for adjust the elasticity of elastic structural component 3.
Preferably, the sliding block 5 is made of polytetrafluoroethylene. Reducing its friction with the cam 6 and with the drive shaft 2 and with the target 1 housing.
Preferably, the elastic structure 3 is a spring.
The working process of the baffle mechanism is briefly described below with reference to fig. 1 and 2, and is simply divided into two processes:
1. the baffle body 7 completely blocks the process of the magnetron sputtering target 1. The method can be divided into two steps, wherein the first step is rotation, as shown in fig. 1, in this step, the baffle body 7 is located at other positions except under the magnetron sputtering target 1, at this time, the slide block 5, the baffle body 7 and any other component on the baffle mechanism are not in any contact with the magnetron sputtering target 1, the protruding part of the cam 6 is located at the uppermost groove of the guide surface of the slide block 5, when the driving shaft 2 drives the cam 6 to rotate in the direction of the guide surface of the slide block 5 in a downward direction, the component force of the cam 6 in the axial direction acting on the slide block 5 is balanced with the acting force of the spring and the gravity of the cam 6 and the baffle plate, so as to prevent the baffle plate from moving upwards, and the component force in the circumferential direction pushes the baffle body 7 to make circumferential rotation until the left end surface of the slide block 5 is in contact with; and a second step of lifting, as shown in fig. 2, when the left end face of the slider 5 contacts the wall of the magnetron sputtering target 1, the driving shaft 2 drives the cam 6 to continue to rotate in the direction of inclining downwards towards the guide surface of the slider 5, at this time, the component force of the cam 6 acting on the slider 5 in the circumferential direction offsets with the reaction force of the wall of the magnetron sputtering target 1 to achieve balance, the component force of the cam 6 in the axial direction is gradually greater than the component force of the spring, and the resultant force of the friction force between the magnetron sputtering target 1 and the slider 5 and the gravity of the cam 6 and the baffle plate pushes the slider 5 to move upwards in the axial direction, so that the baffle plate body 7 tightly seals the target opening of the magnetron sputtering target 1, and the effect.
2. The process of opening the shutter body 7. The method also comprises two steps: the first step is downward placement, when the baffle body 7 tightly seals the target opening of the magnetron sputtering target 1, the driving shaft 2 drives the cam 6 to rotate in the direction of the oblique upward direction of the guide surface of the slide block 5, the friction force component of the cam 6 acting on the slide block 5 in the circumferential direction offsets with the reaction force of the magnetron sputtering target 1 on the inner side of the shielding edge of the baffle body 7, so as to reach balance, in the axial direction, due to the acting force of the spring and the gravity of the slide block 5 and the baffle body 7 being greater than the friction force generated by the reaction force of the magnetron sputtering target 1 on the inner side of the shielding edge of the baffle body 7, the slide block 5 and the shielding plate move downward along the axial line until the shielding edge of the baffle body 7 leaves the magnetron sputtering target 1; the second step is rotation; the baffle body 7 is not contacted with the magnetron sputtering target 1 after the sliding block 5 is lowered, and the extending part of the cam 6 is positioned at the uppermost groove of the guide surface of the sliding block 5; at this time, the baffle body 7 and the slider 5 do not receive external force in the circumferential direction any more, and circumferential rotation is realized under the pushing of the cam 6, so that the opening function is realized.
The above only is the preferred embodiment of the present invention, not limiting the scope of the present invention, all the equivalent structure changes made by the contents of the specification and the drawings under the inventive concept of the present invention, or the direct/indirect application in other related technical fields are included in the patent protection scope of the present invention.
Claims (7)
1. A magnetron sputtering target baffle device is characterized by comprising a baffle body and a baffle driving mechanism; the baffle plate driving mechanism comprises a driving shaft, an elastic structural part, a sliding block and a cam, wherein one end of the elastic structural part is fixedly connected with the driving shaft in a sleeved mode, the other end of the elastic structural part is connected with the sliding block, the sliding block is relatively connected with the other end of the elastic structural part and is provided with the cam, the cam is coaxially fixed with the driving shaft, the sliding block is connected with the driving shaft in a sleeved mode, one side of the sliding block is connected with the baffle plate body into a whole, a groove is formed in one side, connected with the cam, of the sliding block, and one side of the groove is.
2. The magnetron sputtering target baffle device of claim 1 wherein the other side of said groove is a vertical surface and the bottom of said groove is a circular arc surface.
3. The magnetron sputtering target baffle device of claim 1 wherein the baffle body further comprises a connecting portion, the connecting portion is of an L-shaped configuration, one end of the connecting portion is connected to a side of the slider facing away from the magnetron sputtering target, and the other end of the connecting portion is connected to a bottom of the baffle body.
4. The magnetron sputter target baffle device as recited in claim 1 wherein said drive shaft is provided with tabs extending outwardly from a surface in a radial direction of said drive shaft, said tabs being connected to said resilient structure.
5. The magnetron sputter target baffle device as recited in any of claims 1 through 4 wherein a gasket is disposed between said resilient structure and said slider.
6. The magnetron sputter target baffle device as recited in any of claims 1 to 4 wherein said slider is a polytetrafluoroethylene structure.
7. The magnetron sputter target baffle device of any of claims 1 to 4 wherein said resilient structure is a spring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022510040.4U CN213447284U (en) | 2020-11-03 | 2020-11-03 | Magnetron sputtering target baffle device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022510040.4U CN213447284U (en) | 2020-11-03 | 2020-11-03 | Magnetron sputtering target baffle device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN213447284U true CN213447284U (en) | 2021-06-15 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022510040.4U Active CN213447284U (en) | 2020-11-03 | 2020-11-03 | Magnetron sputtering target baffle device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN213447284U (en) |
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2020
- 2020-11-03 CN CN202022510040.4U patent/CN213447284U/en active Active
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