CN206902227U - Magnetron rotational structure, magnetron assembly and reaction chamber - Google Patents
Magnetron rotational structure, magnetron assembly and reaction chamber Download PDFInfo
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- CN206902227U CN206902227U CN201720555439.XU CN201720555439U CN206902227U CN 206902227 U CN206902227 U CN 206902227U CN 201720555439 U CN201720555439 U CN 201720555439U CN 206902227 U CN206902227 U CN 206902227U
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Abstract
The utility model provides a kind of magnetron rotational structure, first rotating arm, is provided with the first rotary shaft and the second rotary shaft；First rotary shaft, is connected with driving source, to rotate and drive the first rotating arm to rotate under the driving of driving source；First rotary shaft is connected by transmission component with second rotary shaft, and the transmission component when first rotary shaft rotates driving second rotary shaft to rotate；Second turning arm, rotate axis connection with described second and be fixed with magnetron thereon；Locating part, for limiting the position of the relatively described first rotating arm of second turning arm when first rotary shaft rotates with second direction in the first direction, so that the magnetron rotates along the first different tracks and the second track.The utility model also provides a kind of magnetron assembly and reaction chamber.The utility model is not only simple in structure, and make it that technical process is simple, easily realizes.
Description
Technical field
The utility model belongs to microelectronic processing technique field, and in particular to a kind of magnetron rotational structure, magnetron pack
Part and reaction chamber.
Background technology
In sputter equipment, plasma is resulted from chamber, and the cation in plasma attracts to bombard by negative electrode
Target in chamber, knocking-on target atom are deposited on chip.At present, magnetron is added at the target back side, by plasma
Electronics in body is strapped in corresponding chamber interior target material surface, due to adding the run duration of electronics, so that
Electronics and ionized gas collision opportunity is wanted to increase, so as to obtain highdensity plasma, there is provided high sedimentation rate；Simultaneously
In order that wafer surface is equably sputtered, usual magnetron is to be rotated under the driving of motor relative to target center.
In recent years, the hole sidewalls deposition film of high-aspect-ratio was caused to become possibility, one of which with the development of technology
The technology being widely used is self ionizing technology (SIP), and in this art, the sputtering particle of sub-fraction is adsorbed to depth
Kong Zhong.Fig. 1 is the structural representation of typical self ionizing sputtering chamber, referring to Fig. 1, reaction chamber 1 includes the He of upper cavity 11
Lower chamber 12, upper cavity 11 include the target 111 being sputtered positioned at roof lower surface and the insulation shell above roof
112, deionized water 113 is filled with insulation shell, magnetron 114 is located in deionized water 113, and magnetron 114 is in electricity
Central shaft under the driving of machine 115 around target rotates；Lower chamber 12 includes the electrostatic for bearing wafer positioned at cavity bottom
Chuck 121 and vacuum system 122, vacuum system 122 are used for the vacuum for changing chamber.
Reaction chamber described in Fig. 1 both can apply to the deposition on such as TaN/Ta barrier layers, can be used for such as Cu
The deposition of inculating crystal layer.Wherein, first, deposit different types of film, it may be necessary to which the different circumference around target center are to target
Inner ring or fringe region sputtered, to reach more preferable technological effect；Second, if only carried out to the fringe region of target
Corrosion, the redeposition (re-deposition) for the central area of target not being corroded to will be caused, in order to avoid redeposition
Particle from target material surface peel off influence chamber interior environment, sputtering technology need two steps complete, the first step is, it is necessary to which magnetron exists
The deposition to chip, second step are completed in the rotation of target rim region, and magnetron rotates in target inner circle area completes cleaning target
Technique.
To realize inner circle area and fringe region switching rotation of the magnetron above target, in the prior art using Fig. 2
Shown magnetron assembly, referring to Fig. 2, rotary shaft 62 rotates under motor driving in the target back side around central shaft 60, rotate
Arm 70 is fixed with rotary shaft 62 and rotated simultaneously, and magnetron 90 can rotate around axle center 88 relative to turning arm 70, wherein, magnetron
90 include the first locating part 100, the second locating part 102, magnet 50, magnet installing plate 84；When rotary shaft 62 with motor by a certain
Magnetron 90 overcomes the elastic force of spring 96 to move to position as shown in Figure 2 under the influence of centrifugal force during high speed rotational speed,
First locating part 100 defines its position with 70 1 contacts side surfaces of turning arm, and afterwards, magnetron keeps the high speed to rotate,
Now, magnetron 90 may be implemented in the fringe region rotation of target；When rotary shaft 62 with electrode by it is a certain rotated compared with low velocity when,
Magnetron 90 moves to target center under spring force, and the second locating part 102 contacts with the another side of turning arm 70,
Afterwards, magnetron keeps the low velocity to rotate.
Problems with actual applications be present using the magnetron assembly shown in Fig. 2：
First, range of movement is limited, the profile, size for magnetron also have strict requirements, for depositing operation
There is very big limitation.
Second, because switching is by the centrifugal force in high and low friction speed rotational speed, spring force, deionized water
Fluid pressure makes a concerted effort to realize, influence factor is more, and regulation is complicated.For example, if the hydraulic pressure conversion of deionized water is corresponding
Just needing to adjust centrifugal force or spring force keeps finally constant with joint efforts, this just needs to adjust motor speed or changes spring,
Add technology difficulty.
Utility model content
The utility model is intended at least solve one of technical problem present in prior art, it is proposed that a kind of magnetron rotation
Rotation structure, magnetron assembly and reaction chamber, not only the profile to magnetron, size etc. be not strict with, moreover, not gone
The influence of the factors such as centrifugal force, spring force, deionization pressure, therefore, reliability is high and reduces technology difficulty.
One of to solve the above problems, the utility model provides a kind of magnetron rotational structure, including：
First rotating arm, it is provided with the first rotary shaft and the second rotary shaft；
First rotary shaft, is connected with driving source, first rotation is rotated and driven under the driving of driving source
Pivoted arm rotates；
First rotary shaft is connected by transmission component with second rotary shaft, and the transmission component is to described
First rotary shaft drives second rotary shaft to rotate when rotating；
Second turning arm, rotate axis connection with described second and be fixed with magnetron thereon；
Locating part, for limiting second rotation when first rotary shaft rotates with second direction in the first direction
The position of the relatively described first rotating arm of arm, so that the magnetron rotates along the first different tracks and the second track.
Preferably, the locating part includes：First locating part and the second locating part；
First locating part is arranged on the first rotating arm and set towards second turning arm；
Second locating part is arranged on second turning arm and set towards the first rotating arm；
First locating part is used to stop when first rotary shaft rotates along the first direction and second direction
Second locating part, to limit the position of the relatively described first rotating arm of second turning arm.
Preferably, first locating part includes the first projection and the second projection, and it is convex that second locating part includes the 3rd
Block and the 4th projection；
First projection is used to stop the 3rd projection when first rotary shaft rotates along the first direction；
Second projection is used to stop the 4th projection when first rotary shaft rotates along the second direction.
Preferably, first locating part includes：5th projection, second locating part are convex including the 6th projection and the 7th
Block；
5th projection is used to hinder respectively when first rotary shaft rotates along the first direction and second direction
Keep off the 6th projection and the 7th projection.
Preferably, first locating part and/or second locating part also include apparatus for adjusting position；
The apparatus for adjusting position, for adjusting corresponding first locating part or second locating part at place
Position on the first rotating arm or second turning arm.
Preferably, the transmission component includes：First pulley, the second belt wheel and timing belt；
The first pulley is fixedly installed with first rotary shaft；
Second belt wheel is fixedly installed with second rotary shaft；
The timing belt is set on the outer wall of the first pulley and the second belt wheel.
Preferably, the transmission component is gear-driven assembly.
Preferably, in addition to seal casinghousing；
The seal casinghousing is used for the first rotating arm, the bottom of first rotary shaft, second rotary shaft
Top mutually sealed with the transmission component.
The utility model also provides a kind of magnetron assembly, including magnetron and magnetron rotational structure, the magnetron
Rotational structure is used to drive the magnetron to rotate along two tracks, and the magnetron rotational structure is rotated using above-mentioned magnetron
Structure.
The utility model also provides a kind of reaction chamber, including magnetron assembly, and the magnetron assembly is arranged on chamber
The top of roof, the magnetron assembly use above-mentioned magnetron assembly.
The utility model has the advantages that：
In the utility model, driving source, which drives the first rotary shaft to rotate and driven, states first rotating arm the first rotary shaft of rotation
By transmission component the second rotary shaft can be driven to rotate during rotation；Locating part in the first rotary shaft in the first direction and second direction
Position of second turning arm with respect to first rotating arm is limited during (rotate forward and invert counterclockwise clockwise) rotation, may be implemented in just
Limitation magnetron is correspondingly located at different zones positioned at target when turning and inverting, and in the case, the first rotary shaft continues to rotate,
First rotating arm can drive the second turning arm and magnetron to rotate, so as to realize that magnetron can (can along the first different tracks
The central area of corresponding target) and the second track (fringe region that target can be corresponded to) rotation, work as driving source so as to realize
Along different directions drive the first rotary shaft when so that be fixed on second turning arm one end magnetron can respectively to target not
Sputtered with region, complete the cleaning technology of the depositing operation and target to chip, magnetron rotation provided by the utility model
Rotation structure compared with the prior art for, not only the profile to magnetron, size etc. are not strict with, moreover, not gone to centrifuge
The influence of the factors such as power, spring force, deionization pressure, therefore, reliability is high and reduces technology difficulty.
Brief description of the drawings
Fig. 1 is the structural representation of typical self ionizing sputtering chamber；
Fig. 2 is the structural representation of the magnetron assembly of prior art；
Fig. 3 is a kind of structural representation of the magnetron rotational structure in the utility model embodiment 1；
Fig. 4 is a kind of Fig. 3 working state schematic representation；
Fig. 5 is Fig. 3 another working state schematic representation；
Fig. 6 is another structural representation of the magnetron rotational structure in the utility model embodiment 1.
Embodiment
To make those skilled in the art more fully understand the technical solution of the utility model, come below in conjunction with the accompanying drawings to this
A kind of magnetron rotational structure, magnetron assembly and the reaction chamber that utility model provides are described in detail.
Embodiment 1
Fig. 3 is the structural representation for the magnetron rotational structure that the utility model embodiment provides；Referring to Fig. 3, Fig. 4 is
A kind of Fig. 3 working state schematic representation；Fig. 5 is Fig. 3 another working state schematic representation.Fig. 3-Fig. 5 is referred to, the magnetron
Rotational structure includes：First rotating arm 30, the first rotary shaft 31, the second rotary shaft 32, the second turning arm 33 and locating part.Its
In：
First rotary shaft 31 and the second rotary shaft 32 are arranged on first rotating arm 30.First rotary shaft 31 and driving source
(not shown) is connected, to be rotated under the driving of driving source and drive first rotating arm 30 to rotate；First rotary shaft 31
It is connected by transmission component with the second rotary shaft 32, transmission component when the first rotary shaft 31 rotates driving the second rotary shaft
32 rotations.
Second turning arm 33 is connected with the second rotary shaft 32 and is fixed with magnetron (in other words, the second turning arm 33 thereon
It is reserved with the fixed bit of fixed magnetron).
Locating part is used to limit the phase of the second turning arm 33 when the first rotary shaft 31 rotates with second direction in the first direction
To the position of first rotating arm 30, so that magnetron 34 rotates along the first different tracks and the second track.Specifically, locating part
35 position for limiting 33 relative first rotating arm 30 of the second turning arm when the first rotary shaft 31 is rotated in a first direction, with
Magnetron 34 is set to be rotated along the first track；And the second turning arm 33 is limited when the first rotary shaft 31 rotates in a second direction
With respect to the position of first rotating arm 30, so that magnetron 34 rotates along the second track.
The utility model realizes that the specific work process that magnetron rotates along the first track is：First, the first rotary shaft 31
(for example rotating forward) driving first rotating arm 30 rotates in the first direction, and the first rotary shaft 31 drives second by transmission component
Rotary shaft 32 rotates, the second rotary shaft 32 drive the second turning arm 33 rotate, when the first rotary shaft 31 be rotated in a first direction it is pre-
If after angle, locating part is relatively fixed the turning arm 33 of first rotating arm 30 and second, then, the first rotary shaft 31 continues along
One direction driving first rotating arm 30 rotates, and first rotating arm 30 drives the second turning arm 33 and magnetron 34 to be revolved along the first track
Turn.
The utility model realizes that the specific work process that magnetron rotates along the second track is：First, the first rotary shaft 31
(such as reversion) driving first rotating arm 30 rotates in a second direction, and the first rotary shaft 31 drives second by transmission component
Rotary shaft 32 rotates, the second rotary shaft 32 drive the second turning arm 33 rotate, when the first rotary shaft 31 rotate in a second direction it is pre-
If after angle, locating part is relatively fixed the turning arm 33 of first rotating arm 30 and second, then, the first rotary shaft 31 continues along
Two directions driving first rotating arm 30 rotates, and first rotating arm 30 drives the second turning arm 33 and magnetron 34 to be revolved along the second track
Turn.
In summary, magnetron rotational structure provided by the utility model, can make the first track correspond to the marginal zone of target
Domain, the second track correspond to the fringe region (vice versa) of target, work as the first rotary shaft 31 along different directions so as to realize
During rotation so that magnetron 34 is respectively completed the cleaning technology of the depositing operation and target to chip, this compared with the prior art and
Speech, not only the profile to magnetron, size etc. are not strict with, moreover, not gone centrifugal force, spring force, deionization pressure
Etc. the influence of factor, therefore, reliability is high and reduces technology difficulty.
In this embodiment, it is preferred that locating part includes：First locating part 35 and the second locating part 36；Wherein, the first limit
Position part 35 is arranged on first rotating arm 30 and set towards the second turning arm 33；Second locating part 36 is arranged on the second turning arm
Set on 33 and towards first rotating arm 30；First locating part 35 is used in the first rotary shaft 31 in the first direction and second direction
Stop the second locating part 36 during rotation, with the position of 33 relative first rotating arm 30 of the second turning arm of limitation.It is appreciated that this Shen
Please in, by the first locating part 35 and the second locating part 36 take up space in vertical direction bigger, therefore, first can make it that
The vertical interval of the turning arm 33 of turning arm 30 and second is set bigger, consequently facilitating the installation of part, dismounting.
It is further preferred that the first locating part 35 includes：5th projection 351, the second locating part 36 include the 6th projection 361
With the 7th projection 362；5th projection 351 is used to hinder respectively when the first rotary shaft rotates along the first direction and second direction
Keep off the 6th projection 361 and the 7th projection 362.
Below in conjunction with the operation principle of the magnetron rotational structure in Fig. 3-Fig. 5 illustratively the present embodiment.Specifically：
As shown in figure 3, the first rotary shaft 31 (rotates under the driving of the driving source of such as motor around target center axle with first
Axle 31 overlaps) it is rotated in a first direction, when such as the first rotary shaft 31 rotates forward, the rotation of the first rotary shaft 31 passes through transmission component band
(clockwise direction in Fig. 4) rotates dynamic second rotary shaft 32 in the first direction, now, because magnetron 34 is installed on the second rotation
The right-hand member of pivoted arm 33, therefore, magnetron 34 are also rotated in a first direction around the second rotary shaft 32.When the second turning arm 33 along first
After when direction have rotated predetermined angle and contact the first locating part 35, the 5th projection 351 blocks the rotation of the 6th projection 361
(as shown in Figure 4), so as to limit the position of the relative first rotating arm 30 of the second turning arm 33, now, magnetron 34 relative to
First rotating arm 30 is static, and is rotated together with first rotating arm 30 around the first rotary shaft 31, and magnetron 34 is located at target rim,
Inswept two circles 301 as shown in Figure 4 and 302 two circle areas encompassed (that is, the first track), the process can be right
The fringe region of target is sputtered, and completes the depositing operation to chip.
Correspondingly, when driving source drives the first rotary shaft 31 to rotate in a second direction, i.e., the first rotary shaft 31 rotates backward
When, the rotation of the first rotary shaft 31 drives the second rotary shaft 32 (side counterclockwise in such as Fig. 5 in a second direction by transmission component
To) rotation, now, magnetron 34 also rotates in a second direction under the drive of transmission component and the second turning arm 33.When second
After turning arm 33 has rotated in a second direction predetermined angle, the 5th projection 351 blocks the rotation of the 7th projection 362 (such as Fig. 5 institutes
Show), so as to limit the position of 33 relative first rotating arm 30 of the second turning arm, now, magnetron 34 is again relative to first
Turning arm 30 is static, and magnetron 34 is located at target medial center region, the inswept institute of two circles 303 and 304 as shown in Figure 5
The region (that is, the second track) of encirclement, can now be sputtered to the central area of target, the technique for carrying out target cleaning.
It can thus be concluded that the present embodiment controls the switching rotated and reverse of the first rotary shaft 31 to realize pair by driving source
The depositing operation of chip and the cleaning technology to target.
In such an embodiment, it is preferable the first rotary shaft 31 is arranged on the medium position of first rotating arm 30, the second rotation
Axle 32 is arranged on one end (such as Fig. 3 right-hand member) of first rotating arm 30；On the other end (left end) of first rotating arm 30 also
It is provided with the first balance weight body 37.It is appreciated that by setting the first balance weight body 37 so that can be put down by the first balance weight body 37
The weight for the other structures that weighing apparatus first rotating arm 30 one end is set, makes the weight at the both ends of first rotating arm 30 more balanced, so as to
It may insure that the rotary course of first rotating arm 30 is more reliable.In addition, can be by setting the first balance weight body 37 come magnetron 34
Size, change in shape do not interfere with the balance of rotation, can also select a greater variety of magnetrons 34 to carry out technique,
So as to increase process window.
Ibid, it is preferable that the second rotary shaft 32 is connected with the medium position of the second turning arm 33, and magnetron 34 is fixed on
One end (right-hand member in such as Fig. 3) of two turning arms 33；The other end (left end in such as Fig. 3) of second turning arm 33 is provided with
Two balance weight bodies 38.It is understood that the reasons why similar with the first balance weight body 37, not only may insure that the second turning arm 33 rotates
Process is relatively reliable；Furthermore, it is possible to increase process window.
In such an embodiment, it is preferable the first locating part 35 and/or the second locating part 36 also include apparatus for adjusting position
(not shown)；Apparatus for adjusting position is used to adjust the corresponding locating part 36 of first locating part 35 or second the first of place
Position on the turning arm 33 of turning arm 30 or second.Specifically, if the first locating part 35 includes apparatus for adjusting position, position is adjusted
Regulating device is used to adjust position of first locating part 35 on the first rotating arm 30 at place；If the second locating part 36 includes position
Adjusting means, then apparatus for adjusting position is for adjusting position of second locating part 36 on second turning arm 33 at place.Herein
, it is emphasized that in the case where the second locating part 36 includes two projections (the 6th projection 361 and the 7th projection 362), the position
Adjusting means can not only adjust the position of two projections on the second turning arm 33, and it is any convex can also to adjust two projections
Block position (that is, relative position of two projections) on the second turning arm 33.
It is understood that the first locating part and/or the second locating part 36 are adjusted at place by position regulator
The turning arm 33 of first rotating arm 30 or second on position, can adjust the first locating part 35 stop the second locating part 36 position
Put, so as to realize the first track of adjustment and/or the second track, so, can not only meet various sizes of target, the scope of application
Extensively；But also the different annular regions of same target can be scanned according to the actual requirements；Furthermore it is also possible to it need not tear open
I.e. adjustable first track of the first locating part 35 and/or the second locating part 36 and the second track are unloaded, it is convenient and swift.
Described herein to be, the utility model does not limit to the concrete structure of apparatus for adjusting position, as long as first can be realized
After the position-adjustable of the locating part 36 of locating part 35 or second, the first locating part 35 of guarantee or the adjustment of the second locating part 36 again
It is fixed.
In this embodiment, alternatively, as shown in figure 3, transmission component includes：First pulley 41, the second belt wheel 42 and same
Walk band 43；First pulley 41 is fixedly installed with the first rotary shaft 31；Second belt wheel 42 is fixedly installed with the second rotary shaft 32；It is synchronous
It is set in 43 on the outer wall of the belt wheel 42 of first pulley 41 and second.
In this embodiment, alternatively, transmission component removes the first pulley 41 that can include in Fig. 3, the and of the second belt wheel 42
Outside timing belt 43, transmission component can also be specially gear-driven assembly.As shown in fig. 6, it is specially gear that it, which is transmission component,
The structural representation of magnetron rotational structure during transmission component.Wherein, gear-driven assembly includes first gear 44, second gear
45 and idle wheel 46.Specifically, the rotary motion of the first rotary shaft 31 is inputted by first gear 44, and second is reached by idle wheel 46
Motion is transferred to the second rotary shaft 32 by gear 45, second gear 45.
Preferably, magnetron rotational structure also includes seal casinghousing, for by first rotating arm 30, first rotary shaft 31
Bottom, the top of the second rotary shaft 32 mutually seal with transmission component.Because：Magnetron rotational structure is usually when in use
It is positioned in deionized water, therefore, by setting seal casinghousing, corresponding part can be avoided to get rusty, so as to improve
The service life of magnetron rotational structure.
It should be noted that when magnetron rotational structure includes the first balance weight body 37, the first balance weight body 37 can also wrap
Include in seal casinghousing, to avoid the first balance weight body 37 from being got rusty because in deionized water.
It should be noted that the present embodiment is provided with the first balance weight body 37, and on the other end of first rotating arm 30
When second balance weight body 38 is set on the other end of two turning arms 33, the both ends of 30 and second turning arm of first rotating arm 33 can be caused
Weight it is more balanced, so as to not only can ensuring that whole magnetron rotational structure is more reliably run well.But
In practical application, the first balance weight body 37 only can also be set on the other end of first rotating arm 30；Can also be only in the second rotation
Second balance weight body 38 is set on the other end of pivoted arm 33.
It should also be noted that, in actual applications, the first locating part 35 can also include the first projection and the second projection,
Second locating part 36 includes the 3rd projection and the 4th projection；First projection is used to hinder when the first rotary shaft is rotated in a first direction
Keep off the 3rd projection；Second projection is used to stop the 4th projection when the first rotary shaft rotates in a second direction.In other words, using two
The individual one-to-one mode of projection rotates to stop, this is convex using one with above the first locating part 35 and the second locating part 36
Block stops that two projections cause the first track and the second track is adjacent compares, and so, can cause the first track and the second track
Setting scope it is wider.
Certainly, in actual applications, locating part can also only include the first locating part 35 or the second locating part 36, specifically
Ground, when only including the first locating part 35, the first locating part 35 when the first rotary shaft 31 is rotated in a first direction stopping
One side wall of the second turning arm, and stop another side wall of the second turning arm 33 when rotating in a second direction.When only wrapping
When including the second locating part 36, the second locating part 36 to when the first rotary shaft 31 is rotated in a first direction by first rotating arm 30
A side wall stop, and stopped by another side wall of first rotating arm 30 when rotating in a second direction.
Further, in the case where locating part only includes the first locating part 35, the first locating part 35 can not only include
Two projections, a projection can also be included, in the case of including two projections, two projections are respectively in the first rotation
Axle 31 stops two side walls of the second turning arm when being rotated in the first direction with second direction, this compared with including a projection,
It can make it that the setting scope of the first track and the second track is wider.
Similarly, in the case where locating part only includes the second locating part 36, the second locating part 36 can not only include two
Projection, a projection can also be included, in the case of including two projections, two projections are respectively in the first rotary shaft 31
When being rotated in the first direction with second direction by first rotating arm 30 two side walls stop, this compared with including a projection,
It can make it that the setting scope of the first track and the second track is wider.
Embodiment 2
The present embodiment provides a kind of magnetron assembly, and the magnetron assembly includes magnetron and magnetron rotational structure, magnetic
Keyholed back plate rotational structure is used to drive magnetron to rotate along at least two tracks；Wherein, magnetron rotational structure uses above-mentioned implementation
Magnetron rotational structure described in example 1.Particular content on magnetron rotational structure has been carried out in detail in above-described embodiment 1
Carefully illustrate, for details, reference can be made to the content in above-described embodiment 1, here is omitted.
Magnetron assembly in the present embodiment, as a result of the magnetron rotational structure in above-described embodiment 1, therefore,
The rotary motion of magnetron is not strict with to the profile of magnetron, size etc.；And not by deionized water pressure, spring force,
The variable effects such as deionized water Fluid pressure.
Embodiment 3
The present embodiment provides a kind of reaction chamber, and the reaction chamber includes magnetron assembly, and magnetron assembly is arranged on chamber
The top of ceiling wall, wherein, magnetron assembly is using the magnetic control component described in above-described embodiment 2.
Reaction chamber in the present embodiment, due to including the magnetic control component described in above-described embodiment 2, therefore, reaction chamber
Reliability it is high.
It is understood that embodiment of above is merely to illustrate that principle of the present utility model and used exemplary
Embodiment, but the utility model is not limited thereto.For those skilled in the art, this is not being departed from
In the case of the spirit and essence of utility model, various changes and modifications can be made therein, and these variations and modifications are also considered as this reality
With new protection domain.
Claims (10)
- A kind of 1. magnetron rotational structure, it is characterised in that including：First rotating arm, it is provided with the first rotary shaft and the second rotary shaft；First rotary shaft, is connected with driving source, the first rotating arm is rotated and driven under the driving of driving source Rotation；First rotary shaft is connected by transmission component with second rotary shaft, and the transmission component is to described first Rotary shaft drives second rotary shaft to rotate when rotating；Second turning arm, rotate axis connection with described second and be fixed with magnetron thereon；Locating part, for limiting the second turning arm phase when first rotary shaft rotates with second direction in the first direction To the position of the first rotating arm, so that the magnetron rotates along the first different tracks and the second track.
- 2. magnetron rotational structure according to claim 1, it is characterised in that the locating part includes：First locating part With the second locating part；First locating part is arranged on the first rotating arm and set towards second turning arm；Second locating part is arranged on second turning arm and set towards the first rotating arm；First locating part is used for when first rotary shaft rotates along the first direction and second direction described in stop Second locating part, to limit the position of the relatively described first rotating arm of second turning arm.
- 3. magnetron rotational structure according to claim 2, it is characterised in that first locating part includes the first projection With the second projection, second locating part includes the 3rd projection and the 4th projection；First projection is used to stop the 3rd projection when first rotary shaft rotates along the first direction；It is described Second projection is used to stop the 4th projection when first rotary shaft rotates along the second direction.
- 4. magnetron rotational structure according to claim 2, it is characterised in that first locating part includes：5th is convex Block, second locating part include the 6th projection and the 7th projection；5th projection is used to stop institute respectively when first rotary shaft rotates along the first direction and second direction State the 6th projection and the 7th projection.
- 5. magnetron rotational structure according to claim 2, it is characterised in that first locating part and/or described Two locating parts also include apparatus for adjusting position；The apparatus for adjusting position, for adjusting corresponding first locating part or second locating part described in place Position on first rotating arm or second turning arm.
- 6. magnetron rotational structure according to claim 1, it is characterised in that the transmission component includes：First pulley, Second belt wheel and timing belt；The first pulley is fixedly installed with first rotary shaft；Second belt wheel is fixedly installed with second rotary shaft；The timing belt is set on the outer wall of the first pulley and the second belt wheel.
- 7. magnetron rotational structure according to claim 1, it is characterised in that the transmission component is gear drive group Part.
- 8. magnetron rotational structure according to claim 1, it is characterised in that also including seal casinghousing；The seal casinghousing is used for the first rotating arm, the bottom of first rotary shaft, second rotary shaft Portion mutually seals with the transmission component.
- 9. a kind of magnetron assembly, including magnetron and magnetron rotational structure, the magnetron rotational structure is used to drive institute State magnetron to rotate along two tracks, it is characterised in that the magnetron rotational structure uses claim 1-8 any one institute The magnetron rotational structure stated.
- 10. a kind of reaction chamber, including magnetron assembly, the magnetron assembly is arranged on the top of chamber roof, its feature It is, the magnetron assembly is using the magnetron assembly described in claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201720555439.XU CN206902227U (en) | 2017-05-18 | 2017-05-18 | Magnetron rotational structure, magnetron assembly and reaction chamber |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201720555439.XU CN206902227U (en) | 2017-05-18 | 2017-05-18 | Magnetron rotational structure, magnetron assembly and reaction chamber |
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| CN206902227U true CN206902227U (en) | 2018-01-19 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN108950499B (en) * | 2017-05-18 | 2023-10-13 | 北京北方华创微电子装备有限公司 | Magnetron rotating structure, magnetron assembly and reaction chamber |
| CN110205592A (en) * | 2018-02-28 | 2019-09-06 | 北京北方华创微电子装备有限公司 | Driven by magnetron mechanism, magnetic control source and magnetron sputtering apparatus |
| CN110205592B (en) * | 2018-02-28 | 2020-06-19 | 北京北方华创微电子装备有限公司 | Magnetron driving mechanism, magnetron source and magnetron sputtering equipment |
| CN110894590A (en) * | 2018-09-13 | 2020-03-20 | 北京北方华创微电子装备有限公司 | Magnetron sputtering method, control module and equipment for magnetron sputtering equipment |
| CN110894590B (en) * | 2018-09-13 | 2021-08-13 | 北京北方华创微电子装备有限公司 | Magnetron sputtering method, control module and equipment for magnetron sputtering equipment |
| CN114156149A (en) * | 2021-11-25 | 2022-03-08 | 北京北方华创微电子装备有限公司 | Magnetron device and semiconductor processing equipment |
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