CN205128495U - Wafer cleaning machine of minicrystal syntonizer - Google Patents
Wafer cleaning machine of minicrystal syntonizer Download PDFInfo
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- CN205128495U CN205128495U CN201520839462.2U CN201520839462U CN205128495U CN 205128495 U CN205128495 U CN 205128495U CN 201520839462 U CN201520839462 U CN 201520839462U CN 205128495 U CN205128495 U CN 205128495U
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Abstract
The utility model provides a wafer cleaning machine of minicrystal syntonizer which characterized in that: including a plurality of different temperature water levels shake washtrough and water tank, move the material device, different temperature water levels shake and are equipped with the board that shakes in the washtrough, the inboard that shakes is sealed to have the transducer, is provided with liquid level switch in the washtrough of shaking, different temperature water levels shake and move the material by moving the material device between the washtrough, move the material device including moving material suction means, moving material stroke control lever, moving the rotatory piece of material motor and move the material mobile device. The washtrough of shaking includes that the washing liquid shakes washtrough, hot water and sprays the washtrough of shaking, hot water low water level washtrough, hot water high water level washtrough, pure water low water level washtrough, the pure water high water level washtrough of shaking of shaking of shaking of shaking, connects gradually. The utility model discloses can get rid of the dirty and foreign matter on wafer surface effectively, make small -size wafer cleaning clean, solve fragmentation, lobe of a leaf problem that the cleaning process caused, realize hot water, pure water cyclic utilization, the guarantee quality reduces manufacturing cost, boost efficiency.
Description
Technical field
The utility model belongs to the apparatus field of quartz-crystal resonator, specifically a kind of wafer cleaning machine of minicrystal resonator.
Background technology
Along with the miniaturization of electronic terminal product, the development of portability, electronic communication market an urgent demand quartz crystal components and parts are to minicrystal resonator development that is miniaturized and high stability direction.Have miniaturization, low noise, high stability feature small-sized quartz-crystal resonator start to become the focus that people pay close attention to.Minicrystal resonance needs to use wafer to assemble in the fabrication process.Wafer needs to clean with cleaning fluid, hot water, pure water and alcohol before use, removes the dirty and foreign matter of wafer surface.But there are some problems in traditional cleaning, there is operating type improper formation wafer fragmentation in Manual-cleaning wafer, sliver, the improper foreign matter causing Manual-cleaning wafer can not remove housings completely of key job points, wafer after Manual-cleaning is superimposed, there are some watermarks in the wafer surface after usually drying, small chips does not clean up, affect electrical characteristic parameter and the reliability of product, reduce under CSAT, even client understands customer complaint handling return, simultaneously, Manual-cleaning crystal is single more heat-exchanging water, pure water, do not recycle, waste water resource, add manufacturing cost.
Summary of the invention
The purpose of this utility model is for the deficiencies in the prior art, a kind of wafer cleaning machine of minicrystal resonator is provided, can effectively remove the dirty of wafer surface and foreign matter, small chips is cleaned up, solve fragmentation, sliver problem that cleaning process causes, realize hot water, pure water recycles, ensure the quality of minicrystal resonator, reduce manufacturing cost.
The utility model realizes by the following technical solutions:
A kind of wafer cleaning machine of minicrystal resonator, it is characterized in that: comprise multiple different water-temperature water-level shake washing trough and water tank, move materials device, different water-temperature water-level shakes washing trough built with vibration plate, transducer is sealed with in vibration plate, shake in washing trough and be provided with liquid-level switch, different water-temperature water-level shakes between washing trough and moves material by moving materials device.
Above-mentioned washing trough of shaking comprises cleaning fluid washing trough, heat water-spraying washing trough, hot water low water level washing trough, hot water high water level shake washing trough, the pure water high water level of washing trough, pure water low water level that shake that shake that shake that shake and to shake washing trough, connect successively, above-mentioned water tank comprises low-temperature water heating water tank, high-temperature-hot-water water tank, pure water water tank.
The utility model moves materials device and comprises and move material suction means, move material Stroke Control bar, move material motor spill spin block and move material mobile device, wherein moves material mobile device and forms by moving material mobile platform and moving material moving track.
The utility model heat water-spraying shakes washing trough with spray head, heat water-spraying shake washing trough overflow adopt broached-tooth design.
The liquid-level switch that the utility model shakes in washing trough adopts photoelectric liquid level switch, and when cleaning fluid reach a certain height, ultrasonic wave just can be opened, and is not having cleaning fluid from damage to protect supersonic wave cleaning machine.
The different water-temperature water-level of the utility model shakes between washing trough and is provided with circulation filter, heat water-spraying's washing trough, hot water low water level shake hot water of washing trough of washing trough and hot water high water level that shakes that shakes is circulation, and pure water low water level the shake pure water of washing trough of washing trough and pure water high water level that shakes is circulation.
The utility model is owing to have employed technique scheme, can effectively remove the dirty of wafer surface and foreign matter, small chips is cleaned up, solve fragmentation, sliver problem that cleaning process causes, realize hot water, pure water recycles, ensure the quality of minicrystal resonator, reduce manufacturing cost, raising efficiency.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
Detailed description of the invention
Referring to Fig. 1, specific embodiment of the utility model is described further.
A kind of wafer cleaning machine of minicrystal resonator, comprise multiple different water-temperature water-level shake washing trough and water tank, move materials device, different water-temperature water-level shakes washing trough built with vibration plate 11, transducer 13 is sealed with in vibration plate 11, shake in washing trough and be provided with liquid-level switch 14, different water-temperature water-level shakes between washing trough and moves material by moving materials device 10.Above-mentioned washing trough of shaking comprises cleaning fluid washing trough 1, heat water-spraying washing trough 2, hot water low water level washing trough 3, hot water high water level shake washing trough 5, the pure water high water level of washing trough 4, pure water low water level that shake that shake that shake that shake and to shake washing trough 6, connect successively, different water-temperature water-level shakes in washing trough and is provided with water inlet pipe 16, adjutage 17, water inlet pipe 16 adopts magnetic valve 18 to control, and adjutage 17 adopts manual ball valve 19 to control; Above-mentioned water tank comprises low-temperature water heating water tank 7, high-temperature-hot-water water tank 8, pure water water tank 9; wherein high-temperature-hot-water water tank 8 is made up of heating tube 20, water inlet pipe 16, overflow pipe 21, adjutage 17, temperature controller 22, liquid-level switch 14 and tank box; liquid-level switch 14 adopts photoelectric liquid level switch; when hot water reach a certain height; ultrasonic wave just can be opened; to protect supersonic wave cleaning machine not having cleaning fluid from damage, the liquid-level switch on top controls water mercury 29 inflow.
The utility model heat water-spraying shakes washing trough 2 with spray head 15, heat water-spraying shake washing trough 2 overflow adopt broached-tooth design.
The utility model moves materials device 10 and comprises and move material suction means 23, move material Stroke Control bar 24, move material motor spill spin block 25 and move material mobile device 26, wherein moves material mobile device and forms by moving material mobile platform 27 and moving material moving track 28.
The different water-temperature water-level of the utility model shakes between washing trough and is provided with circulation filter 30, heat water-spraying's washing trough 2, hot water low water level shake hot water of washing trough 4 of washing trough 3 and hot water high water level that shakes that shakes is circulations, and pure water low water level the shake pure water of washing trough 6 of washing trough 5 and pure water high water level that shakes is circulations.
The utility model vibration plate 11 adopts stainless steel to screen and is welded, and vibration plate output cable and wall groove pass through stainless steel tube, nut seal.
The supersonic generator oscillating circuit of the utility model transducer 13 adopts Switching Power Supply control integration circuit, and power amplifier adopts Siemens's high power module, and with temperature and time control module, arranges the ultrasonic wave working time; With overload protective device, at overcurrent or line short, automatically fast shut-off high voltage source and vibration can export, and be unlikely to damage module.
The utility model rinse bath, water tank all adopt stainless steel argon arc welding, and pipeline adopts pvc pipe to be connected with plastic flexible pipe, can not pollute to cleaning fluid.
Wafer hand basket to be cleaned in this Novel washing groove is placed in holder 12, swings, make workpiece cleaning more thorough by motor pendulous device; Rinse bath, water tank all adopt stainless steel argon arc welding, and pipeline adopts pvc pipe to be connected with plastic flexible pipe.
The utility model is owing to have employed technique scheme, can effectively remove the dirty of wafer surface and foreign matter, small chips is cleaned up, solve fragmentation, sliver problem that cleaning process causes, realize hot water, pure water recycles, ensure the quality of minicrystal resonator, reduce manufacturing cost, raising efficiency.
Claims (8)
1. the wafer cleaning machine of a minicrystal resonator, it is characterized in that: comprise multiple different water-temperature water-level shake washing trough and water tank, move materials device, different water-temperature water-level shakes washing trough built with vibration plate, transducer is sealed with in vibration plate, shake in washing trough and be provided with liquid-level switch, different water-temperature water-level shakes between washing trough and moves material by moving materials device.
2. the wafer cleaning machine of a kind of minicrystal resonator according to claim 1, it is characterized in that: washing trough of shaking comprises cleaning fluid washing trough, heat water-spraying washing trough, hot water low water level washing trough, hot water high water level shake washing trough, the pure water high water level of washing trough, pure water low water level that shake that shake that shake that shake and to shake washing trough, connect successively, above-mentioned water tank comprises low-temperature water heating water tank, high-temperature-hot-water water tank, pure water water tank.
3. the wafer cleaning machine of a kind of minicrystal resonator according to claim 1 and 2, it is characterized in that: move materials device is provided with and move material suction means, move material Stroke Control bar, move material motor spill spin block and move material mobile device, wherein move material mobile device and form by moving material mobile platform and moving material moving track.
4. the wafer cleaning machine of a kind of minicrystal resonator according to claim 1, it is characterized in that: different water-temperature water-level shakes between washing trough and is provided with circulation filter, heat water-spraying's washing trough, hot water low water level shake hot water of washing trough of washing trough and hot water high water level that shakes that shakes is circulation, and pure water low water level the shake pure water of washing trough of washing trough and pure water high water level that shakes is circulation.
5. the wafer cleaning machine of a kind of minicrystal resonator according to claim 1 and 2, is characterized in that: the liquid-level switch shaken in washing trough, adopts photoelectric liquid level switch.
6. the wafer cleaning machine of a kind of minicrystal resonator according to claim 1 and 2, is characterized in that: vibration plate adopts stainless steel shielding to be welded, and vibration plate output cable and wall groove pass through stainless steel tube, nut seal.
7. the wafer cleaning machine of a kind of minicrystal resonator according to claim 2, is characterized in that: heat water-spraying shakes washing trough with spray head, heat water-spraying shake washing trough overflow adopt broached-tooth design.
8. the wafer cleaning machine of a kind of minicrystal resonator according to claim 1 and 2, is characterized in that: the supersonic generator oscillating circuit of transducer adopts Switching Power Supply control integration circuit, and power amplifier adopts Siemens's high power module.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520839462.2U CN205128495U (en) | 2015-10-27 | 2015-10-27 | Wafer cleaning machine of minicrystal syntonizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520839462.2U CN205128495U (en) | 2015-10-27 | 2015-10-27 | Wafer cleaning machine of minicrystal syntonizer |
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| Publication Number | Publication Date |
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| CN205128495U true CN205128495U (en) | 2016-04-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201520839462.2U Active CN205128495U (en) | 2015-10-27 | 2015-10-27 | Wafer cleaning machine of minicrystal syntonizer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106903126A (en) * | 2017-03-13 | 2017-06-30 | 大连理工大学 | A kind of auto-cleaning method of optical element solvent flashing recycling |
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2015
- 2015-10-27 CN CN201520839462.2U patent/CN205128495U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106903126A (en) * | 2017-03-13 | 2017-06-30 | 大连理工大学 | A kind of auto-cleaning method of optical element solvent flashing recycling |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170918 Address after: 321016 Zhejiang, Jinhua, Hong Hong West Road, No. 555 Patentee after: East crystal electronic Jinhua Co., Ltd. Address before: 321025 Zhejiang, Jinhua, Hong Hong West Road, No. 555 Patentee before: Dongjing Electronic Co., Ltd., Zhejiang |