CN201035171Y - Display protection screen of high light transmittance ratio transparent resin and LCD with the same - Google Patents
Display protection screen of high light transmittance ratio transparent resin and LCD with the same Download PDFInfo
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- CN201035171Y CN201035171Y CNU2007200783859U CN200720078385U CN201035171Y CN 201035171 Y CN201035171 Y CN 201035171Y CN U2007200783859 U CNU2007200783859 U CN U2007200783859U CN 200720078385 U CN200720078385 U CN 200720078385U CN 201035171 Y CN201035171 Y CN 201035171Y
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Abstract
The utility model provides a high transmittance display screen protector which is made of transparent resin, including a transparent resin substrate. At least one face of the transparent resin is orderly composed of two increase transmission and anti-reflection films of TiO2 and SiO2 or Nb2O5 and SiO2, or orderly composed of multilayer increase transmission and anti-reflection film of TiO2 and SiO2 or Nb2O5 and SiO2, which orderly form two film of TiO2 / SiO2 or Nb2O5 / SiO2 or multilayer overlapped film of TiO2 / SiO2 or Nb2O5 / SiO2 outward from the substrate. The screen protector of the utility model can lower the reflectivity, improve the transmittance and the effect of the optical image, significantly reduce the costs, and fully enhance the anti-impact and anti-destructive capacity, therefore being a safety screen protector. The utility model also provides a LCD monitor for the display screen protector.
Description
Technical field:
The utility model is relevant with LCD (LCD) protection screen, pastes before special and the panel of LCD and the display protection of the high light transmittance ratio transparent resin that prevents the reflection of display screen panel light, raising LCDs light transmission rate and display screen is shielded of assembling and use the LCD of this protection screen relevant.
Background technology:
The principle of work of LCD (LCD is to call LCD in the following text) learns, the LCD device be by backlight with the light that sends during by polaroid and liquid crystal cell, the device of control projection intensity recognition image.The brightness by liquid crystal cell (transmittance of LCD screen) and color film CF light (transmittance of CF) and backlight is depended in the brightness of LCD just.Therefore, raising LCD surface brightness and save on backlight source power improve back light source brightness simultaneously and mainly set about from following several respects: the one, improve back light source brightness, the 2nd, improve the TFT aperture ratio of pixels, the 3rd, the brightness that improves all material, also promptly increase the transmittance of material as far as possible, improve the main at present prismatic brightness film that adopts of back light source brightness and increase emission brightness with adopting the novel lamp light source and improving reflection potential; The brightness that improves all material improves the raising that the LCD surface brightness also is the transmittance of a top protection screen of important channel, particularly display screen or diaphragm.Main at present acrylic sheet (PMMA resin sheet) or the polyester film sheet (BOPET diaphragm) of adopting of top protection screen of LCD display or diaphragm.Because though resin sheet material transmittance can be up to 90% and surface-brightening, but the reflectivity single face reaches more than 4%, two-sided stack can reach more than 8%, and damage resistant not, so all do non-glare treated at present on the surface of resin sheet, light reflectivity can be dropped to below 1%, and the surface can the above scuffing of anti-pencil test hardness 2H.Because non-glare treated is resin light reflecting surface to be treated to the light scattering surface reduce light reflectivity; therefore protection screen and the actual visible light transmissivity of diaphragm that obtains no longer is more than 90%; majority all drops to about 80% even lower; the brightness of backlight emission improved by various measures and cost expenditure before display screen, present a few percent to percent ten that overall transmitance is only arranged at last, but again this transmittance has been beaten nearly 20% even more discount for anti-dazzle antireflection because of protection screen or diaphragm.(because of its material only have 80% in addition the lower filter of seeing through).Therefore, at the reflectivity that reduces panel and protection screen, increase the skin hardness scratch resistance but improve the transmittance of protection screen or diaphragm again and be everybody pursuit always the physics and the mechanical protection performance of display screen.The surface reflectivity that particularly adopts which kind of technical scheme to reduce the protection screen material has multiple scheme to continue to bring out all the time; have at resin layer surface and utilize colloidal sol---gel method depositing Ti O2 or Nb2O5/SiO2 are anti-reflection anti-reflection rete, also have and utilize surperficial dip-coating organosilicon anti-reflection layer.But because thickness is wayward; transmittance only can reach about 92%; and yield rate is not high; the surface is prone to rainbow, and basic change does not also take place for protection screen or diaphragm so far, and particularly reflectivity is less than 1%; printing opacity is more optimized low practical technique and the protection screen material of industrialization cost that reaches more than 97% and is not also had appearance greater than 93%.
The utility model content:
The purpose of this utility model is in order to overcome above deficiency, provides a kind of and can improve display brightness, reduces that to watch face light reflectivity, protection display not to be scratched and resist damages, adopt the coating technique of low-cost high-efficiency and film simultaneously be the display protection of the high light transmittance ratio transparent resin of production.Another purpose of the present utility model is for a kind of LCD of using this protection screen is provided.
The purpose of this utility model is achieved in that
The display protection of the utility model high light transmittance ratio transparent resin comprises the transparent resin substrate, composite Ti O successively at least one of transparent resin substrate
2And SiO
2, or Nb
2O
5And SiO
2Two layers of anti-reflection antireflecting rete, or overlapping successively composite Ti O
2And SiO
2, or Nb
2O
5And SiO
2Multilayer is anti-reflection antireflecting rete, they outwards form TiO successively by substrate
2/ SiO
2Two tunic layer or Nb
2O
5/ SiO
2Two tunic layer or TiO
2/ SiO
2Overlapping rete of multilayer or Nb
2O
5/ SiO
2The overlapping rete of multilayer.Substrate adopts transparent resin material, can be the thick hard sheet of 0.2mm to 3mm; Also can be the film or the diaphragm of the flexibility of 0.05mm to 0.2mm, adopt the vacuum magnetic-control sputtering method, at transparent substrate, the particularly one side of fexible film or two sides depositing Ti O
2Or Nb
2O
5/ SiO
2Rete, have than higher production efficiency of other deposition process and lower production cost.Particularly adopt the twin reaction magnetocontrol sputtering of intermediate frequency, plasma monitoring line closed loop control device (PEM system) sputtered with Ti O
2Or Nb
2O
5/ SiO
2Have than general magnetron sputtering efficient height, quality is good, strong adhesion, and scratch resistant rete owing to select this film system and membrane stack for use, makes the device fabrication specialization, makes four layers, six layers TiO easily
2Or Nb
2O
5/ SiO
2Anti-reflection film system; because of equipment no matter be plane sputter or winding film coating machine plated film can use less target position (because of target identical with target position); can more not finish four to six layers membrane stack plated film under conversion materials and the target position situation with the mode that repeats or come and go; be more economically than other anti-reflection antireflecting film accordingly; production efficiency is higher; cost is lower, makes this protection screen cheaply or the film use in a large number on LCD display that high transmission rate is arranged.
The display protection of above-mentioned high light transmittance ratio transparent resin, TiO at least two tunic layers
2Or Nb
2O
5Thickness be respectively 8nm to 20nm, SiO
2Thickness be 70nm to 140nm.Adopt this thickness at substrate two sides plating TiO
2Or Nb
2O
5/ SiO
2Two tunics, can obtain transmittance greater than 94%, better can reach 95%, two-sided superposition reflective rate is less than 2% protection screen.
The display protection of above-mentioned high light transmittance ratio transparent resin, at least one face mask layer is four layers in substrate two face mask layers, they are that to be compounded on the transparent resin substrate outwards be ground floor TiO2 or Nb by substrate successively
2O
5, second layer SiO
2, the 3rd layer of TiO
2Or Nb
2O
5, the 4th layer of SiO
2, its thicknesses of layers scope is TiO successively
2Or Nb
2O
5Be 5nm to 18nm, SiO
2Be 20nm to 50nm, TiO
2Or Nb
2O
5Be 20nm to 50nm, SiO
2For 70nm to 140nm.Adopt this thickness to plate four tunics on the substrate two sides, the protection screen transmittance better can reach 98% greater than 97%, and two-sided superposition reflective rate better is lower than 1% less than 2%.
The display protection of above-mentioned high light transmittance ratio transparent resin, at least one face mask layer in substrate two face mask layers is six layers, they are that to be compounded on the transparent resin substrate outwards be ground floor TiO by substrate successively
2Or Nb
2O
5, second layer SiO
2, the 3rd layer of TiO
2Or Nb
2O
5, the 4th layer of SiO
2, layer 5 TiO
2Or Nb
2O
5, layer 6 SiO
2, the thicknesses of layers scope outwards is TiO by glass substrate successively
2Or Nb
2O
5Be 1.5nm to 6nm, SiO
2Be 25nm to 45nm, TiO
2Or Nb
2O
5Be 8nm to 15nm, SiO
2Be 40nm to 60nm, TiO2 or Nb2O5 are 12nm to 20nm, SiO
2For 80nm to 140nm.Adopt this thickness six layers of substrate two sides platings, the protection screen transmittance better can reach 99% greater than 98%, and two-sided superposition reflective rate is less than 1%.
The display protection of above-mentioned high light transmittance ratio transparent resin, transparent resin substrate have the resin bed that at least a function of electrostatic prevention, scratch resistance, anti-caking mist, anti-pollution function is arranged on the one side at least.Adding nanometer titanium dioxide carbon in the acryl resin prescription can scratch resistance, and does not influence total light transmittance, also can lower this face reflectivity more than 1%.The cationic active agent that adds electrostatic prevention in the prescription, cationic active agent can electrostatic preventions, and surface resistance can drop to 10
12Below the Ω; the fluorocarbon activating agent can anti-caking mist and antifouling; can increase the performance of diaphragm; because of being coated with transmittance, this face of substrate improves the transmissivity of this substrate more than 1% greater than 93% acryl resin; the contribution to total light transmittance of the anti-reflection antireflection film layer of substrate another side coatings does not include; as count, overall light transmittance is greater than 93%.
The display protection of above-mentioned high light transmittance ratio transparent resin, at least one mask of protection screen has electrostatic-proof function, with the surface resistance testing tool in its surface resistance of its surface measurement less than 10
12Ω, compound one deck tin ash (SnO between the TiO2 of at least two tunic layers of the substrate of electrostatic prevention one side or resin bed and deposition or Nb2O5
2) or the antistatic semiconductor film of tin-doped indium oxide (ITO) or Al-Doped ZnO (AZO), rete is 5 layers, they are semiconductor film/TiO of electrostatic prevention
2Or Nb
2O
5/ SiO
2/ TiO
2Or Nb
2O
5/ SiO
2, preferred thickness is followed successively by: semiconductor film is 8nm to 28nm, TiO
2Or Nb
2O
5Be 5nm to 18nm, SiO
2Be 20nm to 50nm, TiO
2Or Nb
2O
5Be 20nm to 50nm, SiO
2For 70nm to 100nm.Adopt this film to tie up to substrate and simultaneously plate five layers, four layers of anti-reflection anti-reflection rete of another side plating, transmittance can reach 96%, and two-sided superposition reflective rate is less than 1.5%, also can be in requisition for all plating five layers on the two sides, an anti-static function is all had on the two sides.
The display protection of above-mentioned high light transmittance ratio transparent resin, at least one mask of protection screen has electrostatic-proof function, with the surface resistance testing tool in its surface resistance of its surface measurement less than 10
12Ω is at the TiO of at least two tunic layers of the substrate of electrostatic prevention one side or resin bed and deposition
2Or Nb
2O
5Between compound one deck tin ash (SnO
2) or the antistatic semiconductor film of tin-doped indium oxide (ITO) or Al-Doped ZnO (AZO), rete is 7 layers, they are semiconductor film/TiO of electrostatic prevention
2Or Nb
2O
5/ SiO
2/ TiO
2Or Nb
2O
5/ SiO
2/ TiO
2Or Nb
2O
5/ SiO
2Preferred thickness is followed successively by: semiconductor film is 8nm to 28nm, TiO2 or Nb
2O
5Be 2nm to 7nm, SiO
2Be 20nm to 30nm, TiO
2Or Nb
2O
5Be 40nm to 60nm, SiO
2Be 6nm to 12nm, TiO
2Or Nb
2O
5Be 25nm to 36nm, SiO
2For 70nm to 100nm.Adopt this film to tie up to substrate and simultaneously plate seven layers, six layers of anti-reflection anti-reflection rete of another side plating, transmittance can reach 98%, and two-sided superposition reflective rate is less than 1%, also can be in requisition for all plating seven layers on the two sides, an anti-static function is all had on the two sides.
The display protection of above-mentioned high light transmittance ratio transparent resin is compounded with the acrylate resin layer that substrate is increased hardness and penetrability between transparent resin substrate and rete on the one side at least of transparent resin substrate.If there is not this to increase hard formation, direct plated film on resin substrate, because substrate pencil test hardness only has HB or H, the hardness of coating surface is also carried not high, does not reach the standard of general requirement greater than 2H, and therefore applying one deck acrylate resin layer not only can improve 1 to 2 percentage point of substrate transmittance, 2H can also be provided above skin hardness, and make the plated film rear surface have pencil test hardness greater than 2H, and also can adjust prescription simultaneously, the adhesion of coatings and substrate is greatly strengthened.
The display protection of above-mentioned high light transmittance ratio transparent resin, substrate at least the compound acrylate resin layer of one side be the acryl resin of heat and/or photocuring or be the acryl resin of main modification with it.One side is coated with anti-reflection antireflecting TiO
2Or Nb
2O
5/ SiO
2Rete, another side apply acrylate resin layer, can utilize this layer resin bed, with antistatic, increase function such as hard, scratch resistance and add, utilize existing disclosed multinomial technology and prescription on substrate, to realize increasing the function of protection screen and film.
The display protection of above-mentioned high light transmittance ratio transparent resin is compounded with the pressure sensitive adhesive of acryl resin in the one side of substrate.Pressure sensitive adhesive can directly apply at the rete another side, also can all be compounded with rete on the two sides, improve that one side in office applies pressure sensitive adhesive on the basis of substrate material total light transmittance, because acrylic pressure sensitive glue material self also has transmitance greater than 93%, adopt this glue to help keeping having improved behind the plated film transmittance index of the base material of light transmittance properties.
The display protection of above-mentioned high light transmittance ratio transparent resin; the transparent resin substrate is to have flexible diaphragm; they are polyester material (PET) or polycarbonate (PC) or polymethylmethacrylate (PMMA), polyvinyl butyral (PVB) or Polyvinylchloride (PVC).The diaphragm that these are flexible, in the face of watching face to use, when needing to increase the coatings skin hardness, optimized is to apply the aforesaid acryl resin of one deck between substrate and coatings, so that coatings scratch resistance more.
Install the display protection of the above-mentioned high light transmittance ratio transparent resin of a slice before the utility model LCD, LCDs.
There is air interface therebetween in above-mentioned LCD when protection screen and display screen installing.Air interface plays a protective role, but because of having used high permeability, antiradar reflectivity protection screen to make image brighter more clear.
Above-mentioned LCD, protection screen utilize translucent adhesive or pressure sensitive adhesive and LCDs to be bonded as one.Reduce air interface and improve image definition, reduce the vacuum magnetic-control sputtering coatings of adhesive surface and reduce cost, the effect of protection LCD is played in the impact of display screen because of adopting the transparent resin substrate to bear.
Above-mentioned LCD, utilizing substrate is to have flexible transparent resin, utilizes transparent acryl resin pressure sensitive adhesive and display screen directly to paste substrate.Convenient installing reduces and pastes the waste product that produces, eliminate air interface and improve brightness and image definition, because of surperficial scratch resistance is antistatic grade for function and protecting display screen.
The display protection of the utility model high light transmittance ratio transparent resin improves the picture quality of watching, the transmittance height, and also production efficiency height, cost are low.The utility model LCD can be saved cost, improves image quality.
Description of drawings:
Fig. 1 is the utility model structural representation.
Fig. 2 is another structural representation of the utility model.
Fig. 3 is the utility model structural representation again.
Fig. 4 is the two-sided the utility model structural representation that four layers of anti-reflection antireflection layer are arranged respectively of substrate.
Fig. 5 is the two-sided the utility model structural representation that six layers of anti-reflection antireflection layer are arranged respectively of substrate.
Fig. 6 is the utility model structural representation that is coated with antistatic layer.
Fig. 7 is another structural representation of the utility model that is coated with antistatic layer.
Fig. 8 is the utility model liquid crystal display device structure synoptic diagram.
Fig. 9 is another structural representation of the utility model LCD.
Embodiment:
Embodiment 1:
Fig. 1 has provided present embodiment 1 figure.Referring to Fig. 1, the display protection 1 of high light transmittance ratio transparent resin is by transparent transparent resin substrate 4 and two layers of anti-reflection antireflecting TiO adopting the vacuum magnetic-control sputtering method to deposit successively in the one side of substrate 4
2 Rete 2 and SiO
2Rete 3 constitutes, and is SiO and form structure
2/ TiO
2The display protection 1 of the high light transmittance ratio transparent resin of/transparent resin substrate.
Embodiment 2:
Fig. 2 has provided present embodiment 2 figure.Referring to Fig. 2, the display protection 15 of high light transmittance ratio transparent resin is by transparent transparent resin substrate 4 and two layers of anti-reflection antireflecting TiO adopting the vacuum magnetic-control sputtering method to deposit successively on the two sides of substrate 4
2Rete 2 and SiO
2Rete 3 constitutes, and is SiO and form structure
2/ TiO
2/ transparent resin substrate/TiO
2/ SiO
2The display protection 15 of high light transmittance ratio transparent resin.Respectively plate two-layer anti-reflection anti-reflection rete substrate 4 two-sided, light transmission rate is greater than 94%, and two-sided superposition reflective rate is less than 2%, and the thickness of plated film optimization is: TiO
2Be 10~16nm, SiO
2Be 90~120nm.
Embodiment 3:
Fig. 3 has provided the figure of present embodiment 3, and this enforcement is basic identical with embodiment 1, and not existing together is one side and anti-reflection antireflecting TiO at substrate 4
2Being coated with the acrylate resin layer 17 that substrate is increased hardness and penetrability between the rete 2, is SiO and form structure
2/ TiO
2The display protection 16 of the high light transmittance ratio transparent resin of/acrylate resin layer/transparent resin substrate.Apply one deck acrylate resin layer and not only can improve 1 to 2 percentage point of substrate transmittance, 2H can also be provided above skin hardness, and make the plated film rear surface have pencil test hardness greater than 2H, and also can adjust prescription simultaneously, the adhesion of coatings and substrate is greatly strengthened.
Embodiment 4:
Fig. 4 has provided present embodiment 4 structural drawing.Present embodiment 4 basic with embodiment 2 with, not existing together is respectively to plate four layers of anti-reflection antireflection coatings the two-sided of substrate 4, and the formation structure is SiO
2/ TiO
2/ SiO
2/ TiO
2/ transparent resin substrate/TiO
2/ SiO
2/ TiO
2/ SiO
2The display protection 6 of high light transmittance ratio transparent resin, two-sided each light transmission rate is greater than 97%, two-sided superposition reflective rate is less than 1.5%, the thickness of plated film optimization is followed successively by: SiO
2Be 100~115nm/TiO
2Be 30~36nm/SiO
2Be 36~45nm/TiO
2Be 8~12nm/ transparent resin substrate/TiO
2Be 8~12nm/SiO
2Be 36~45nm/TiO
2Be 30~36nm/SiO
2Be 100~115nm.
Embodiment 5:
Fig. 5 has provided the figure of present embodiment 5, and this enforcement is basic identical with embodiment 4, and not existing together is respectively to plate six layers of anti-reflection antireflection coatings the two-sided of substrate 4, and the formation structure is SiO
2/ TiO
2/ SiO
2/ TiO
2/ SiO
2/ TiO
2/ transparent resin substrate/TiO
2/ SiO
2/ TiO
2/ SiO
2/ TiO
2/ SiO
2The display protection 7 of high light transmittance ratio transparent resin, light transmission rate is greater than 98.5%, two-sided superposition reflective rate is less than 1%, the thickness of plated film optimization is followed successively by: SiO
2Be 100~130nm/TiO
2Be 12~18nm/SiO
2Be 40~60nm/TiO
2Be 8~12nm/SiO
2Be 30~40nm/TiO
2Be 1~3nm/ transparent resin substrate/TiO
2Be 1~3nm/SiO
2Be 30~40nm/TiO
2Be 8~12nm/SiO
2Be 40~60nm/TiO
2Be 12~18nm/SiO
2Be 100~130nm.
Embodiment 6:
Fig. 6 has provided the figure of present embodiment 6, this enforcement is basic identical with embodiment 4, do not exist together is that one side at substrate 4 is coated with four layers of anti-reflection anti-reflection rete, deposit one deck antistatic layer 5 with the vacuum magnetic-control sputtering method between the anti-reflection anti-reflection rete of another side and the transparent resin substrate, antistatic layer 5 is Al-Doped ZnO (AZO) semiconductor film, is SiO and form structure
2/ TiO
2/ SiO
2/ TiO
2/ AZO/ transparent resin substrate/TiO
2/ SiO
2/ TiO
2/ SiO
2The display protection 8 of the high light transmittance ratio transparent resin that anti-static function is arranged, transmittance is greater than 96%, antistatic surface resistance is less than 10
11Ω, two-sided superposition reflective rate is less than 1.5%, and the thickness of plated film optimization is followed successively by: SiO
2Be 80~90nm/TiO
2Be 40~50nm/SiO
2Be 30~40nm/TiO
2Be 4~8nm/ Al-Doped ZnO (AZO), 16~20nm/ transparent resin substrate/TiO
2Be 8~10nm/SiO
2Be 36~45nm/TiO
2Be 30~36nm/SiO
2Be 100~115nm.
Embodiment 7:
Fig. 7 has provided the figure of present embodiment 7, this enforcement is basic identical with embodiment 6, do not exist together is that one side at substrate 4 is coated with six layers of anti-reflection antireflection coatings, deposit one deck antistatic layer 5 with the vacuum magnetic-control sputtering method between the anti-reflection antireflection coatings of another side and the transparent resin substrate, antistatic layer 5 is Al-Doped ZnO (AZO) semiconductor film, is SiO and form structure
2/ TiO
2/ SiO
2/ TiO
2/ SiO
2/ TiO
2/ AZO/ transparent resin substrate/TiO
2/ SiO
2/ TiO
2/ SiO
2/ TiO
2/ SiO
2The display protection 9 of the high light transmittance ratio transparent resin that anti-static function is arranged, transmittance is greater than 98%, antistatic surface resistance is less than 10
11Ω, two-sided superposition reflective rate is less than 1%, and the thickness of plated film optimization is followed successively by: SiO
2Be 80~95nm/TiO
2Be 26~34nm/SiO
2Be 6~9nm/TiO
2Be 46~56nm/SiO
2Be 23~28nm/TiO
2Be 4~7nm/ Al-Doped ZnO (AZO), 18~23nm/ transparent resin substrate/TiO
2Be 1~3nm/SiO
2Be that 30~40nm/TiO2 is 8~12nm/SiO
2Be 40~60nm/TiO
2Be 12~18nm/SiO
2Be 100~130nm.
Embodiment 8:
Fig. 8 has provided the figure of present embodiment 8, and Fig. 8 is the utility model liquid crystal display device structure synoptic diagram, and LCD is SiO by display casing 10, display 11, structure
2/ TiO
2/ SiO
2/ TiO
2/ transparent resin substrate/TiO
2/ SiO
2/ TiO
2/ SiO
2The display protection 6 of high light transmittance ratio transparent resin form, there is air interface 13 therebetween in protection screen 6 during with display screen 12 installings, during installing, makes reservation one determining deviation between protection screen 6 and the display screen 12, can obviously play the preventing collision protection effect to liquid crystal cell.
Embodiment 9:
Fig. 9 has provided the figure of present embodiment 9; this enforcement is basic identical with embodiment 8; do not exist together and do not have air interface when being protection screen 7 and display screen 12 installings therebetween; be to utilize transparent acryl resin pressure sensitive adhesive 14 that display screen 12 and protection screen 7 are bonded as one, can obviously improve the performance of falling destructive test of one meter high, 6 of display screens.
The various embodiments described above are that foregoing of the present utility model is further described, but this should be interpreted as that the scope of the above-mentioned theme of the utility model only limits to the foregoing description.All technology that realizes based on foregoing all belong to scope of the present utility model.
Claims (13)
1. the display protection of high light transmittance ratio transparent resin comprises the transparent resin substrate, it is characterized in that at least one of transparent resin substrate composite Ti O successively
2And SiO
2, or Nb
2O
5And SiO
2Two layers of anti-reflection antireflecting rete, or overlapping successively composite Ti O
2And SiO
2, or Nb
2O
5And SiO
2Multilayer is anti-reflection antireflecting rete, they outwards form TiO successively by substrate
2/ SiO
2Two tunic layer or Nb
2O
5/ SiO
2Two tunic layer or TiO
2/ SiO
2Overlapping rete of multilayer or Nb
2O
5/ SiO
2The overlapping rete of multilayer.
2. the display protection of high light transmittance ratio transparent resin as claimed in claim 1 is characterized in that TiO at least two tunic layers
2Or Nb
2O
5Thickness be 8nm to 20nm, SiO
2Thickness be 70nm to 140nm.
3. the display protection of high light transmittance ratio transparent resin as claimed in claim 1 is characterized in that at least one face mask layer is four layers in substrate two face mask layers, and they are that to be compounded on the transparent resin substrate outwards be ground floor TiO by substrate successively
2Or Nb
2O
5, second layer SiO
2, the 3rd layer of TiO
2Or Nb
2O
5, the 4th layer of SiO
2, its thicknesses of layers scope is TiO successively
2Or Nb
2O
5Be 5nm to 18nm, SiO
2Be 20nm to 50nm, TiO
2Or Nb
2O
5Be 20nm to 50nm, SiO
2For 70nm to 140nm.
4. the display protection of high light transmittance ratio transparent resin as claimed in claim 1 is characterized in that at least one face mask layer in substrate two face mask layers is six layers, and they are that to be compounded on the transparent resin substrate outwards be ground floor TiO by substrate successively
2Or Nb
2O
5, second layer SiO
2, the 3rd layer of TiO
2Or Nb
2O
5, the 4th layer of SiO
2, layer 5 TiO
2Or Nb
2O
5, layer 6 SiO
2The thicknesses of layers scope outwards is TiO by glass substrate successively
2Or Nb
2O
5Be 1.5nm to 6nm, SiO
2Be 25nm to 45nm, TiO
2Or Nb
2O
5Be 8nm to 15nm, SiO
2Be 40nm to 60nm, TiO
2Or Nb
2O
5Be 12nm to 20nm, SiO
2For 80nm to 140nm.
5. as the display protection of claim 1 or 2 or 3 or 6 described high light transmittance ratio transparent resins, it is characterized in that having at least one of the transparent resin substrate resin bed of at least a function of electrostatic prevention, scratch resistance, anti-caking mist, anti-pollution function.
6. the display protection of high light transmittance ratio transparent resin as claimed in claim 5; it is characterized in that at least one mask of protection screen has electrostatic-proof function; with the surface resistance testing tool in its surface resistance of its surface measurement less than 1012 Ω; the antistatic semiconductor film of compound one deck tin ash or tin-doped indium oxide or Al-Doped ZnO between the TiO2 of at least two tunic layers of the substrate of electrostatic prevention one side or resin bed and deposition or Nb2O5; rete is 5 layers; they are semiconductor film/TiO2 or the Nb2O5/SiO2/TiO2 or the Nb2O5/SiO2 of electrostatic prevention; preferred thickness is followed successively by: semiconductor film is 8nm to 28nm; TiO2 or Nb2O5 are 5nm to 18nm; SiO2 is 20nm to 50nm; TiO2 or Nb2O5 are 20nm to 50nm, and SiO2 is 70nm to 100nm.
7. the display protection of high light transmittance ratio transparent resin as claimed in claim 5; it is characterized in that at least one mask of protection screen has electrostatic-proof function; with the surface resistance testing tool in its surface resistance of its surface measurement less than 1012 Ω, at the TiO of the substrate of electrostatic prevention one side or resin bed and compound at least two tunic layers
2Or Nb
205Between the antistatic semiconductor film of compound one deck tin ash or tin-doped indium oxide or Al-Doped ZnO, rete is 7 layers, they are semiconductor film/TiO of electrostatic prevention
2Or Nb
2O
5/ SiO
2/ TiO
2Or Nb
2O
5/ SiO
2/ TiO
2Or Nb
2O
5/ SiO
2, preferred thickness is followed successively by: semiconductor film is 8nm to 28nm, TiO
2Or Nb
2O
5Be 2nm to 7nm, SiO
2Be 20nm to 30nm, TiO
2Or Nb
2O
5Be 40nm to 60nm, SiO
2Be 6nm to 12nm, TiO
2Or Nb
2O
5Be 25nm to 36nm, SiO
2For 70nm to 100nm.
8. the display protection of high light transmittance ratio transparent resin as claimed in claim 1 is characterized in that being compounded with the acrylate resin layer that substrate is increased hardness and penetrability between transparent resin substrate and coatings on the one side at least of transparent resin substrate.
9. as the display protection of the described high light transmittance ratio transparent resin of one of claim 1~4, it is characterized in that the one side at substrate is compounded with the pressure sensitive adhesive of acryl resin.
10. LCD is characterized in that each the display protection of high light transmittance ratio transparent resin in installing a slice claim 1 to 11 before the LCDs.
11. there is air interface therebetween in LCD as claimed in claim 10 when it is characterized in that the installing of protection screen and display screen.
12. LCD as claimed in claim 10 is characterized in that protection screen utilizes translucent adhesive or pressure sensitive adhesive and LCDs to be bonded as one.
13. LCD as claimed in claim 10, it is characterized in that utilizing substrate is to have flexible transparent resin, utilizes transparent acryl resin pressure sensitive adhesive and display screen directly to paste substrate.
Priority Applications (1)
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CNU2007200783859U CN201035171Y (en) | 2007-02-01 | 2007-02-01 | Display protection screen of high light transmittance ratio transparent resin and LCD with the same |
Applications Claiming Priority (1)
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CNU2007200783859U CN201035171Y (en) | 2007-02-01 | 2007-02-01 | Display protection screen of high light transmittance ratio transparent resin and LCD with the same |
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CN201035171Y true CN201035171Y (en) | 2008-03-12 |
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CNU2007200783859U Expired - Fee Related CN201035171Y (en) | 2007-02-01 | 2007-02-01 | Display protection screen of high light transmittance ratio transparent resin and LCD with the same |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108949050A (en) * | 2017-05-18 | 2018-12-07 | 通用汽车环球科技运作有限责任公司 | Automatically cleaning membranous system and product |
CN110452575A (en) * | 2018-05-07 | 2019-11-15 | 通用汽车环球科技运作有限责任公司 | The method for forming automatically cleaning membranous system |
US11059035B2 (en) | 2017-05-18 | 2021-07-13 | GM Global Technology Operations LLC | Self-cleaning film system and method of forming same |
US11067721B2 (en) | 2017-05-18 | 2021-07-20 | GM Global Technology Operations LLC | Textured self-cleaning film system and method of forming same |
US11260638B2 (en) | 2019-08-29 | 2022-03-01 | Shpp Global Technologies B.V. | Transparent, flexible, impact resistant, multilayer film comprising polycarbonate copolymers |
US11448872B2 (en) | 2017-05-31 | 2022-09-20 | GM Global Technology Operations LLC | Light-enhanced self-cleaning film system and method of forming same |
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2007
- 2007-02-01 CN CNU2007200783859U patent/CN201035171Y/en not_active Expired - Fee Related
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108949050A (en) * | 2017-05-18 | 2018-12-07 | 通用汽车环球科技运作有限责任公司 | Automatically cleaning membranous system and product |
US11059035B2 (en) | 2017-05-18 | 2021-07-13 | GM Global Technology Operations LLC | Self-cleaning film system and method of forming same |
US11067721B2 (en) | 2017-05-18 | 2021-07-20 | GM Global Technology Operations LLC | Textured self-cleaning film system and method of forming same |
US11448872B2 (en) | 2017-05-31 | 2022-09-20 | GM Global Technology Operations LLC | Light-enhanced self-cleaning film system and method of forming same |
CN110452575A (en) * | 2018-05-07 | 2019-11-15 | 通用汽车环球科技运作有限责任公司 | The method for forming automatically cleaning membranous system |
US11260638B2 (en) | 2019-08-29 | 2022-03-01 | Shpp Global Technologies B.V. | Transparent, flexible, impact resistant, multilayer film comprising polycarbonate copolymers |
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