CN1507001A - CRT electron gun with gradually reduced electron beam hole size - Google Patents
CRT electron gun with gradually reduced electron beam hole size Download PDFInfo
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- CN1507001A CN1507001A CNA021555168A CN02155516A CN1507001A CN 1507001 A CN1507001 A CN 1507001A CN A021555168 A CNA021555168 A CN A021555168A CN 02155516 A CN02155516 A CN 02155516A CN 1507001 A CN1507001 A CN 1507001A
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Abstract
The present invention is CRT electron gun with gradually reduced electron beam hole size. The electron gun includes one cathode, one electron beam forming area and one electronic lens area. The cathode generates electrons carrying energy; the electron beam forming area set between the display screen and the cathode includes several first charging grids, each of which has at least one first polar hole to accept electrons and form electron beam, arranged in some interval; and the electronic lens area set between the electron beam forming area and the display screen includes several second charging grids, each of which has at least one second polar hole with gradually reduced size along the direction from the display screen to the electron beam forming area, arranged in some interval. Electron beam after passing through the second polar hole is focused onto the display screen with raised focusing sensitivity and thus improved image quality.
Description
Technical field
The invention relates to a kind of electron gun of cathode ray tube, especially refer to a kind of electron gun that dwindles the cathode ray tube of electron beam utmost point hole dimension gradually, with the spherical aberration in effective attenuating electron beam (Spherical Aberration) phenomenon, and further improve the structure of image analytic degree (Video imageresolution).
Background technology
Be used in the electron gun in monochrome or the color cathode ray tube (CRT) traditionally, the electronics (electron) of its band energy is to be launched by a negative electrode (cathode), and the electron beam forming area of this electron gun of directive (Beam Forming Region), this electron beam forming area is by the G1 control utmost point (control grid), form towards the part of this G2 anode etc. on the burnt poly-grid of one G2 anode (screen grid) and a G3, the band energy electron that negative electrode in this cathode ray tube (cathode) is produced, directly directive and passing is offered the utmost point hole that is in line and arranges on these grids, with in this electronics forms the district, formation has the electron beam of less and rounded section, after this electron beam forms the district by this electronics, will be by directive one electronics convergent lens (focus lens), this electron lens (focus lens), can be distinguished into a pre-convergent lens (pre-focus lens) and a main convergent lens (main focus lens), assembled to the fluorescent layer of the display screen of cathode-ray pipe respectively to make these electron beams, form a minimum convergent point, so, when these electron beams are to the whole screen of cathode-ray pipe the time, promptly to produce the video image that desire is play with high-velocity scanning on this display screen.
Generally speaking, the size in the electron beam utmost point hole on these grids is all very little, with the G1 control utmost point (control grid) and G2 anode (screen grid) is example, diameter in utmost point hole is generally only about 0.3 millimeter to 0.8 millimeter on it, and the electron beam utmost point Kong Ze that offers towards the part of this G2 anode on the burnt poly-grid of G3 is bigger, its diameter is generally between 1 millimeter to 2 millimeters, as for, the electron beam utmost point hole of being offered on the subsequent gate such as remainder and G4 on the burnt poly-grid of G3, its diameter is then bigger, with the electron gun in the color cathode ray tube is example, and the electron beam utmost point bore dia of being offered on these subsequent gate is generally between 4.5 millimeters to 7.5 millimeters.By the above as can be known, in the electron gun of color cathode ray tube, be positioned at main convergent lens and form the electron beam utmost point hole of being offered on the grid in district (main focus lens region), based on considering during common lens (commonlens) on the design electron gun, more near the display screen person, its diameter is bigger, in the electron gun of monochromatic cathode ray tube, it is bigger that main convergent lens forms the electron beam utmost point bore dia of being offered on district's (main focus lens region) inner grid, then may be bigger.
In addition, after electron beam forms the district by this electronics, will reach and impact the space electric field that is produced between each electronics mutually, and make the direction of the diameter of electron beam, become big gradually because of wherein with the radial velocity of energy electron along the directive display screen.
Traditionally, the electron beam utmost point hole size of being offered on each grid of an electron gun all has identical aperture, the reason that this equal aperture is identical, be to run through wherein for an axle (mandrel), make, make these grids can be accurately positioned on the same straight line at these grids of assembling.
Therefore, when electron beam forms the district by this electronics, and its diameter is when the direction of directive display screen enlarges gradually, this electronics forms the convergence effect (focusingeffect) that each grid produced in the district, will be different because of its position, wherein, will become gradually because of the diameter of electron beam greatly, and electron beam will be produced stronger convergence effect more near the grid of display screen.Otherwise, heal away from the grid of display screen, will be less because of the diameter of electron beam, only electron beam is produced more weak convergence effect, this more weak convergence effect, astigmatism (astigmatism) takes place through the electron beam behind deflection scanning yoke (deflection yoke) deviation in military order on its focus point (deflected beam spot) size, and the increase of landing of beam or projection distance (electronic beam ' s landingor throw distance), also will cause defocusing phenomenon (out-of-focus), at these astigmatisms and defocusing phenomenon, general all is to see through these grids away from display screen, apply bigger dynamically poly-voltage (dynamic focus voltage), so that these phenomenons are revised, otherwise, the design condition of whole electron gun promptly must significantly be changed.
Summary of the invention
Because the electron beam that electron gun produced of aforementioned conventional cathode ray tube, behind the deflection scanning yoke deviation, on its focus spot size astigmatism takes place easily, and will be because of landing of beam or projection distance increase, and cause shortcomings such as defocusing phenomenon, the inventor is that a kind of electron gun that dwindles the color cathode ray tube of electron beam utmost point hole dimension is gradually invented out in research, phase can effectively reduce electron beam phenomenons such as astigmatism and mistake Jiao take place on the display screen of cathode ray tube under the situation that need not to apply than big dynamic convergence voltage by designed electron gun.
A purpose of the present invention, be that a kind of electron gun that dwindles the cathode ray tube of electron beam utmost point hole dimension gradually is being provided, this electron gun comprises a negative electrode one electron beam forming area (Beam FormingRegion) and an electron lens (electrostatic lens) district; Wherein this negative electrode is in order to produce the electronics of band energy; This electron beam forming area is to be located between display screen and this negative electrode, and with this cathode arrangement at same linear position, electronics with the receiving belt energy, and with these the band energy electrons be transformed into electron beam, this electron beam forming area comprises a plurality of spaced first group of charging grid, at least be provided with first utmost point hole that is arranged in a linear more than on each grid, after making these band energy electrons pass these first utmost point holes, electron beam can increase its section configuration in the path of passing through of this electron beam forming area and this display screen; This electron lens area is to be located between this electron beam forming area and this display screen, this electron lens area comprises a plurality of spaced second group of charging grid, at least be provided with second utmost point hole that is arranged in a linear more than on each grid, the size in these second utmost point holes is the directions along this display screen to this electron beam forming area, dwindle gradually, make these electron beams after passing these second utmost point holes, can focus on this display screen, increasing of the sensitivity of this electron lens area, and effectively improve the image quality on the display screen to the electron beam focusing effect.
Description of drawings
Fig. 1 is the vertical section schematic diagram of the electron gun of a kind of cathode ray tube that dwindles electron beam utmost point hole dimension gradually of the present invention;
Fig. 2 is the vertical section schematic diagram of a preferred embodiment electron gun of the present invention;
Fig. 2 a-Fig. 2 d is in preferred embodiment of the present invention shown in Figure 2, respectively along 2a-2a, 2b-2b, 2c-2c and 2d-2d hatching, the schematic cross section of this electron gun that is presented;
Fig. 3 is the vertical section schematic diagram of another preferred embodiment electron gun of the present invention;
Fig. 3 a-Fig. 3 f is in preferred embodiment of the present invention shown in Figure 3, respectively along the cross-sectional upper thread of 3a-3a, 3b-3b, 3c-3c, 3d-3d, 3e-3e and 3f-3f, the schematic cross section of this electron gun that is presented.
The figure number explanation:
Electron gun ... 10,40,70
G1 controls the utmost point ... 12,42,72
The G2 anode ... 14,44,74
The G3 grid ... 16
The G31 grid ... 46,76
The G32 grid ... 48,78
The G33 grid ... 56,80
The G34 grid ... 82
The G4 grid ... 18,84
The G5 grid ... 20
The G6 grid ... 22
Electron beam forming area ... 36,64,75
Negative electrode ... k
The dynamic focusing lens ... 37,66,77
Main focusing lens ... 38,68,79
Display screen ... 30
Electron beam ... 34,65
Embodiment
Consult shown in Figure 1, it is the vertical section schematic diagram of CRT electrom gun 10 of the present invention, this electron gun 10 is a kind of four polar forms (quadrupole-type) electron guns, this electron gun 10 comprises a negative electrode k, to produce the electronics of band energy, and make its directive one G1 control utmost point (control grid) 12 and one G2 anode (screen grid) 14, and run through linearly corresponding utmost point hole of arranging on it.If this electron gun 10 is one can produce the electron gun (multi-beam electrongun) of multigroup electron beams, to comprise on this electron gun 10 that then two extra negative electrodes are (for the purpose of simplifying drawing in addition, this two extra negative electrode is not exposed among Fig. 1), these negative electrodes are to be horizontal linear array, producing the electronics of three groups of band energy, and make these electronics directive and run through set corresponding utmost point hole on the G1 control utmost point (controlgrid) 12 and G2 anode (the screen grid) 14 respectively.
In the present invention, the electron beam forming area of this electron gun 10 (BFR) 36 comprises on this G1 control utmost point 12, this G2 anode 14 and a G3 grid 16 part towards this G2 anode 14, comprise dynamic focusing lens (dynamic focus lens) 37 on this electron gun 10 in addition, these dynamic focusing lens 37 comprise on another part, a G4 grid 18 and the G5 grid 20 of this G3 grid 16 part towards this G4 grid 18.Being used in the electron gun 10 that can produce three groups of electron beams in the color cathode ray tube with one is example, three groups of electron beams 34 that this electron gun 10 is produced (for simplicity, only show one group of electron beam among Fig. 1, shown in dotted line wherein), be to see through set main focusing lens (mainfocus lens) 38 on it, assemble to a display screen 30 of cathode-ray pipe, this main focusing lens 38 comprises the another part and a G6 grid 22 of this G5 grid 20.Generally speaking, this G1 control utmost point 12 is to remain on zero potential, and this G2 anode 14 and G4 grid 18 are to be connected to same voltage V respectively
G2 Voltage source 26, its voltage V
G2Be to maintain between 400-750 volt scope, 20 of this G3 grid 16 and G5 grids are connected to same focus voltage V
FVoltage source 28, be to be connected to an accelerating voltage as for 22 of this G6 grids, or anode (for the purpose of simplifying drawing, this anode is not shown among Fig. 1).
Consult shown in Figure 1 again, three band energy electrons that negative electrode k is produced of the electron gun 10 of this color cathode ray tube, after passing this electron beam forming area 36, form three groups of electron beams 34, respectively this electron beam 34 will be because of the effect of the field effect (beam ' s space-charge effect) of electron beam and the radial velocity of these electronics (the longitudinal axis Z-Z ' of vertical this electron gun 10 of its direction), pass these dynamic focusing lens 37 and main focusing lens 38 in regular turn, and bump during this display screen 30 in, to radially enlarge gradually along it, this phenomenon, make the basal area of this electron beam 34,, increase gradually along its projecting direction.
In the present invention, be the sensitivity (focussensitivity) of 10 pairs of electron beam 34 focusing effects of electron gun, the respectively aperture in this utmost point hole that electron beam on these dynamic focusing lens 37 can be passed through reduces gradually towards this negative electrode k direction.So, when the 16a aperture, utmost point hole of another part of this G3 grid 16 is d1, the 18a aperture, utmost point hole of this G4 grid 18 will be d2,20a aperture, utmost point hole towards the part of this G4 grid 18 on this G5 grid 20 will be d3, and d3＞d2＞d1, to cooperate electron beam towards the swedged gradually phenomenon of this negative electrode k direction, reach the sensitivity (focus sensitivity) that increases by 10 pairs of electron beam 34 focusing effects of this electron gun, and the astigmatism of correcting electronic bundle (astigmatism), make it maintain minimum sphere astigmatism (minimum sphericalaberration).
When making electron gun 10 of the present invention, consult shown in Figure 1 again, be to utilize an axle 32 (shown in Fig. 1 dotted line) to run through these utmost point holes that are arranged on the grids such as this G1, G2, G3, G4, G5 and G6 on the same straight line, this axle 32 is axis bodies of a stepped convergent, the axis body diameter in each stage, just can make the utmost point hole of this grid respectively nested on it respectively, these grids are positioned on this axle 32 with being spaced apart, after treating that assembling is finished, again this axle 32 is extracted out, promptly form electron gun of the present invention.
Consult shown in Figure 2, it is the vertical section schematic diagram of CRT electrom gun 40 in the preferred embodiment of the present invention, this electron gun 40 is a kind of bipotential (bi-potential) electron guns, this electron gun 40 comprises a negative electrode k, to produce the electronics of band energy, the directive one G1 control utmost point (controlgrid) 42 and a G2 anode (screen grid) 44, and run through linearly corresponding utmost point hole of arranging on it, formed electron beam (for simplicity, only show one group of electron beam among Fig. 2, shown in dotted line wherein), will pass a G31 grid 46 in regular turn, one G32 grid 48, linearly corresponding utmost point hole of arranging on one a G33 grid 50 and the G4 grid 52.If this electron gun 40 is one can produce the electron gun of multigroup electron beams, to comprise on this electron gun 10 that then two extra negative electrodes are (for the purpose of simplifying drawing in addition, this two extra negative electrode is not exposed among Fig. 2), these negative electrodes are to be horizontal linear array, producing the electronics of band energy, and make these electronics directive and run through corresponding utmost point hole set on each grid respectively.
In this preferred embodiment, the electron beam forming area of electron gun (BFR) 64 comprises this G1 control utmost point 42, on this G2 anode 44 and this G31 grid 46 towards the part of this G2 anode 44, this electron gun 10 still comprises dynamic focusing lens (dynamic focus lens) 66 and one main focusing lenss (mainfocus lens) 68, wherein these dynamic focusing lens 66 comprise another part of this G31 grid 46, on one a G32 grid 48 and the G33 grid 50 towards the part of this G32 grid 48,68 of this main focusing lenss comprise the another part and a G4 grid 52 of this G33 and grid 50, and wherein this G4 grid 52 is to be connected to a focus voltage E
bVoltage source 62, this voltage source 62 provides the voltage that makes electron beam focus on, this G31 grid 46 and G33 grid 50 are to be connected to an identical dynamic electric voltage (dynamicvoltage) V respectively
d Voltage source 58,48 of this G32 grids are to be connected to fixed voltage (fixedvoltage) V
sVoltage source 60, as this fixed voltage V that is supplied to this G32 grid 48
s, with the dynamic electric voltage V that is supplied to this G31 grid 46 and G33 grid 50
d(in time change) in conjunction with after, can produce first and second dynamic four utmost points (dynamic quadrupoles) 54 and 56 (consult among Fig. 2 shown in the dotted line).This first and second dynamic four utmost points (dynamic quadrupoles) 54 and 56 will form lens that change (time variable) in time respectively, in order to the compensation astigmatism that deflection scanning yoke caused influence (astigmatism effect), wherein this first dynamic gate 54 is the parts that are formed on the another part of this G32 grid 48 and the G33 grid 50 towards this G32 grid 48, and these second dynamic four utmost points 56 are the parts that are formed on the another part of this G31 grid 46 and the G32 grid 48 towards this G31 grid 46.
Consult shown in Figure 2 again, because the band energy electron that the negative electrode k of the electron gun 40 of this color cathode ray tube is produced, after passing this electron beam forming area 64, to form electron beam 65, and make this electron beam 65 pass these dynamic focusing lens 66 and main focusing lens 68 in regular turn, bump is to this display screen, and in this process, electron beam 65 will radially enlarge gradually along it.Therefore, in the present invention, be the sensitivity (focus sensitivity) that increases by 40 pairs of electron beam 65 focusing effects of this electron gun, can make the respectively aperture in this utmost point hole that makes electron beam pass through on these dynamic focusing lens 66, reduce gradually towards this negative electrode k direction, promptly when the 46a aperture, utmost point hole of another part on this G31 grid 46 is d1,48a aperture, utmost point hole on this G32 grid 48 on the part of this G31 grid 46 will be d2, the 48b aperture, utmost point hole of another part will be d3 on this G32 grid 48,50a aperture, utmost point hole on this G33 grid 50 on the part of this G32 grid 48 will be d4, and make set utmost point pore diameter size on these dynamic focusing lens 66 interior each grids, consult shown in Fig. 2 a one Fig. 2 d, be d4＞d3＞d2＞d1 in regular turn, to cooperate electron beam 65 towards the swedged gradually phenomenon of this negative electrode k direction, astigmatism (astigmatism) to electron beam is proofreaied and correct, and makes it maintain minimum sphere astigmatism (minimum sphericalaberration).
Consult shown in Figure 3, it is the vertical section schematic diagram of CRT electrom gun 70 in another preferred embodiment of inventing, this electron gun 70 also is a kind of bipotential electron gun, this electron gun 70 comprises a negative electrode k, to produce the electronics of band energy, and make its directive one G1 control the utmost point (control grid) 72 and G2 anode (screen grid) 74, and run through the utmost point hole that is arranged in a linear on it, form electron beam 65 (for simplicity, only show one group of electron beam among Fig. 3, shown in dotted line wherein), and make this electron beam 65 pass a G31 grid 76 in regular turn, one G32 grid 78, one G33 grid 80, linearly corresponding utmost point hole of arranging on one a G34 grid 82 and the G4 grid 84.If this electron gun 70 is one can produce the electron gun of multigroup electron beams, to comprise on this electron gun 70 that then two extra negative electrodes are (for the purpose of simplifying drawing in addition, this two extra negative electrode is not exposed among Fig. 3), these negative electrodes are to be horizontal linear array, producing the electronics of three groups of band energy, and make these electronics directive and run through respectively set corresponding utmost point hole on this grid respectively.
In this another preferred embodiment, the electron beam forming area of this electron gun (BFR) 75 comprises this G1 control utmost point 72, on this G2 anode 74 and this G31 grid 76 towards the part of this G2 anode 74, this electron gun 70 also comprises dynamic focusing lens (dynamic focus lens) 77 and one main focusing lenss (main focus lens) 79, wherein these dynamic focusing lens 77 comprise another part of this G31 grid 76, one G32 grid 78, on this G33 grid 80 and this G34 grid 82 towards the part of this G33 grid 80,79 of this main focusing lenss comprise another part and this G4 grid 84 of this G34 grid 82, and wherein this G32 grid 78 and G34 grid 82 are to be connected to an identical dynamic electric voltage (dynamic voltage) V respectively
d Voltage source 90, this dynamic electric voltage source V
dBe to change time with the electron beam scanning display screen, 80 of this G31 grid 76 and G33 grids are to be connected to a fixed voltage (fixed voltage) V
sVoltage source 92,84 of this G4 grids are to be connected to an anode voltage (anode voltage) E
bVoltage source 94, to provide electron beam to focus on and to accelerate to the required voltage of this display screen.As the dynamic electric voltage V that is supplied to this G32 grid 78 and G34 grid 82
d, with the fixed voltage that is supplied to this G31 grid 76 and G33 grid 80 (fixed voltage) V
sIn conjunction with after, to in its dynamic focusing lens (dynamic focus) 77, produce three dynamic four utmost points (dynamicquadrupoles) 86,87 and 88 (consult among Fig. 3 shown in the dotted line), wherein these first dynamic four utmost points 86 are the parts that are formed on another part of G33 grid 80 and this G34 grid 82 towards this G33 grid 80, these second dynamic four utmost points 87 are the parts that are formed on the another part of this G32 grid 78 and the G33 grid 80 towards this G32 grid 78, and the 3rd dynamic four utmost points 88 are the parts that are formed on another part of this G31 grid 76 and this G32 grid 78 towards this G31 grid 76.This first, second and third dynamic level Four (dynamic quadrupoles) 86,87 and 88 is formed can time dependent dynamic focusing lens 77, mainly are in order to the compensation astigmatism that deflection scanning yoke caused influence (astigmatism effect).
Consult shown in Figure 3 again, the band energy electron that the negative electrode k of the electron gun 70 of this color cathode ray tube is produced, after passing this electron beam forming area 75, to form electron beam 65, these electron beams 65 are after passing these dynamic focusing lens 77 and main focusing lens 79 in regular turn, these electron beams 65 will clash into to this display screen, owing in this process, will radially enlarge gradually.The present invention is for increasing the sensitivity (focus sensitivity) of 70 pairs of electron beam 65 focusing effects of this electron gun, can make the respectively aperture in this utmost point hole that makes electron beam pass through on these dynamic focusing lens 77, dwindle gradually towards this negative electrode k direction, promptly when the 76a aperture, utmost point hole of another part on this G31 grid 76 is d1,78a aperture, utmost point hole on this G32 grid 78 on the part of this G31 grid 76 will be d2, the 78b aperture, utmost point hole of another part will be d3 on this G32 grid 78,80a aperture, utmost point hole on this G33 grid 80 on the part of this G32 grid 78 will be d4, the 80b aperture, utmost point hole of another part will be d5 on this G33 grid 80, and set utmost point pore diameter size on each grid in these dynamic focusing lens 77, consult shown in Fig. 3 a-Fig. 3 f, be d5＞d4＞d3＞d2＞d1 in regular turn, to cooperate electron beam 65, proofread and correct its astigmatism (astigmatism) towards the swedged gradually phenomenon of this negative electrode k direction.
Claims (8)
1, a kind of electron gun that dwindles the cathode ray tube of electron beam utmost point hole dimension gradually, this electron gun comprises:
One negative electrode, this negative electrode are in order to produce the electronics of band energy;
One electron beam forming area, this electron beam forming area is to be located between a display screen and this negative electrode of this cathode ray tube, and with this cathode arrangement at same linear position, electronics with the receiving belt energy, and should be with energy electron to be transformed into electron beam, this electron beam forming area comprises a plurality of spaced first group of charging grid, at least be provided with first utmost point hole that is arranged in a linear more than on each grid, after making this band energy electron pass this first utmost point hole, electron beam can increase its section configuration in the path of passing through of this electron beam forming area and this display screen;
One electron lens area, this electron lens area is to be located between this electron beam forming area and this display screen, this electron lens area comprises a plurality of spaced second group of charging grid, at least be provided with second utmost point hole that is arranged in a linear more than on each grid, the size in this second utmost point hole is the direction along this electron beam forming area in this display screen, dwindle gradually, make this electron beam after passing this second utmost point hole, can focus on this display screen.
2, electron gun according to claim 1, it is characterized in that: also comprise two negative electrodes on this electron gun, this negative electrode is to be horizontal linear array, producing the electronics of three groups of band energy, and makes this electronics directive and run through corresponding utmost point hole set on this charging grid respectively.
3, electron gun according to claim 1 is characterized in that: this electron beam forming area comprises on a G1 control utmost point, a G2 anode and the G3 grid part towards this G2 anode.
4, electron gun according to claim 3 is characterized in that: this electron lens area comprises another part of this G 3 grids and a plurality of between between this G3 grid and this display screen and the grid of the space that is arranged in a linear.
5, electron gun according to claim 2 is characterized in that: this electron lens area comprises at least more than one dynamic quadrupole lens, with the astigmatism of correcting electronic bundle on this display screen.
6, electron gun according to claim 5 is characterized in that: respectively this dynamic quadrupole lens comprises the charging grid more than at least two.
7, electron gun according to claim 2 is characterized in that: this electron lens area comprises at least more than one dynamic two utmost point lens, with the astigmatism of correcting electronic bundle on this display screen.
8, electron gun according to claim 7 is characterized in that: respectively these dynamic two utmost point lens comprise the charging grid more than at least two.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA021555168A CN1507001A (en) | 2002-12-09 | 2002-12-09 | CRT electron gun with gradually reduced electron beam hole size |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA021555168A CN1507001A (en) | 2002-12-09 | 2002-12-09 | CRT electron gun with gradually reduced electron beam hole size |
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| Publication Number | Publication Date |
|---|---|
| CN1507001A true CN1507001A (en) | 2004-06-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA021555168A Pending CN1507001A (en) | 2002-12-09 | 2002-12-09 | CRT electron gun with gradually reduced electron beam hole size |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103376343A (en) * | 2012-04-28 | 2013-10-30 | 中国科学院电子学研究所 | Electronic gun system capable of moving inter-electrode distances for high current electron beam analysis meter |
-
2002
- 2002-12-09 CN CNA021555168A patent/CN1507001A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103376343A (en) * | 2012-04-28 | 2013-10-30 | 中国科学院电子学研究所 | Electronic gun system capable of moving inter-electrode distances for high current electron beam analysis meter |
| CN103376343B (en) * | 2012-04-28 | 2015-11-04 | 中国科学院电子学研究所 | A kind of removable die opening electron gun system for high current electron beam analyzer |
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