CN117687277A

CN117687277A - Control method, device and equipment of photoresist stripping equipment and storage medium

Info

Publication number: CN117687277A
Application number: CN202311692717.2A
Authority: CN
Inventors: 陈文翥
Original assignee: LG Display Optoelectronics Technology China Co Ltd
Current assignee: LG Display Optoelectronics Technology China Co Ltd
Priority date: 2023-12-11
Filing date: 2023-12-11
Publication date: 2024-03-12

Abstract

The invention discloses a control method, a device, equipment and a storage medium of photoresist stripping equipment, wherein the method comprises the following steps: monitoring a state signal generated by the photoresist stripping equipment; if the state signal is an idle signal, inquiring configuration information generated for the photoresist stripping equipment; circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information so as to maintain the temperature in the photoresist stripping equipment; and if the state signal is an operation signal, continuously spraying stripping liquid in the photoresist stripping equipment to strip the photoresist on the substrate. The constant temperature characteristic of the stripping liquid is reused, the stripping liquid is periodically sprayed when the photoresist stripping equipment is idle, so that the temperature inside the photoresist stripping equipment is maintained, the yield of photoresist on a stripped substrate is maintained, the hardware of the photoresist stripping equipment is prevented from being modified, the main modification is to control the procedure of spraying the stripping liquid, and the modified threshold is greatly reduced.

Description

Control method, device and equipment of photoresist stripping equipment and storage medium

Technical Field

The present invention relates to the field of semiconductor technologies, and in particular, to a method, an apparatus, a device, and a storage medium for controlling a photoresist stripping device.

Background

After patterning a TFT (Thin Film Transistor ) substrate by an Etching (patterning) process, the substrate is put into a photoresist stripping apparatus to strip photoresist covered by the pattern of the circuit material.

The substrate is put into photoresist stripping equipment according to batches, and a certain time interval exists between the batches.

As shown in fig. 1, when the time interval is long, the photoresist stripping apparatus stops operating, the inside of the photoresist stripping apparatus gradually cools, the temperature 100 drops, and a sudden drop phenomenon 101 occurs frequently, at this time, the substrate is put into the photoresist stripping apparatus, and the photoresist stripping apparatus is operated again, and although the temperature 100 rises again, the process failure is easily caused by the lower temperature 100.

Disclosure of Invention

The invention provides a control method, a device, equipment and a storage medium of photoresist stripping equipment, which are used for solving the problems of maintaining the temperature in the photoresist stripping equipment and maintaining the yield of photoresist on a stripped substrate when the substrate is not put into the equipment.

According to an aspect of the present invention, there is provided a control method of a photoresist stripping apparatus, comprising:

Monitoring a state signal generated by the photoresist stripping equipment;

if the state signal is an idle signal, inquiring configuration information generated for the photoresist stripping equipment;

circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information so as to maintain the temperature in the photoresist stripping equipment;

and if the state signal is an operation signal, continuously spraying stripping liquid in the photoresist stripping equipment to strip the photoresist on the substrate.

According to another aspect of the present invention, there is provided a control device of a photoresist stripping apparatus, comprising:

the state signal monitoring module is used for monitoring a state signal generated by the photoresist stripping equipment;

the configuration information inquiry module is used for inquiring configuration information generated for the photoresist stripping equipment if the state signal is an idle signal;

the no-load operation module is used for circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information so as to maintain the temperature in the photoresist stripping equipment;

and the load operation module is used for continuously spraying stripping liquid in the photoresist stripping equipment to strip the photoresist on the substrate if the state signal is an operation signal.

According to another aspect of the present invention, there is provided an electronic apparatus including:

at least one processor; and

a memory communicatively coupled to the at least one processor; wherein,

the memory stores a computer program executable by the at least one processor to enable the at least one processor to perform the method of controlling the photoresist stripping apparatus according to any one of the embodiments of the present invention.

According to another aspect of the present invention, there is provided a computer-readable storage medium storing a computer program for causing a processor to execute a control method of the photoresist stripping apparatus according to any one of the embodiments of the present invention.

In this embodiment, a status signal generated by the photoresist stripping apparatus is monitored; if the state signal is an idle signal, inquiring configuration information generated for the photoresist stripping equipment; circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information so as to maintain the temperature in the photoresist stripping equipment; and if the state signal is an operation signal, continuously spraying stripping liquid in the photoresist stripping equipment to strip the photoresist on the substrate. The constant temperature characteristic of the stripping liquid is multiplexed, the stripping liquid is periodically sprayed when the photoresist stripping equipment is idle, so that the temperature inside the photoresist stripping equipment is maintained, the yield of photoresist on a stripped substrate is maintained, the hardware of the photoresist stripping equipment is prevented from being modified, the modified procedure of spraying the stripping liquid is mainly used for controlling the modified threshold, the time of spraying the stripping liquid can be reduced by periodically spraying the stripping liquid, the quantity of the stripping liquid entering an exhaust pipeline of the photoresist stripping equipment along with air flow is reduced, the waste amount of the stripping liquid is reduced, and the increase of production cost is reduced.

It should be understood that the description in this section is not intended to identify key or critical features of the embodiments of the invention or to delineate the scope of the invention. Other features of the present invention will become apparent from the description that follows.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is an exemplary graph of a temperature dip in a photoresist stripping apparatus;

fig. 2 is a flowchart of a control method of a photoresist stripping apparatus according to a first embodiment of the present invention;

FIG. 3 is a schematic illustration of a removal process according to a first embodiment of the present invention;

FIG. 4 is a schematic flow chart of a periodic spray of stripping liquid in a photoresist stripping apparatus according to a first embodiment of the present invention;

FIG. 5 is a schematic diagram of a photoresist stripping apparatus and a photoresist tank according to a first embodiment of the present invention;

FIG. 6 is a diagram showing an example of constant temperature in a photoresist stripping apparatus according to a first embodiment of the present invention;

fig. 7 is a flowchart of a control method of a photoresist stripping apparatus according to a second embodiment of the present invention;

fig. 8 is a schematic structural view of a control device of a photoresist stripping apparatus according to a third embodiment of the present invention;

fig. 9 is a schematic structural diagram of an electronic device according to a fourth embodiment of the present invention.

Detailed Description

In order that those skilled in the art will better understand the present invention, a technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, shall fall within the scope of the present invention.

It should be noted that the terms "first," "second," and the like in the description and the claims of the present invention and the above figures are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that the embodiments of the invention described herein may be implemented in sequences other than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

Example 1

Fig. 2 is a flowchart of a control method of a photoresist stripping apparatus according to a first embodiment of the present invention, where the method may be performed by a control device of the photoresist stripping apparatus, and the control device of the photoresist stripping apparatus may be implemented in hardware and/or software, and the control device of the photoresist stripping apparatus may be configured in an electronic apparatus, where the control method is applicable to a case where the photoresist stripping apparatus is idle and the spraying of the stripping liquid is stopped circularly to maintain the temperature inside the photoresist stripping apparatus. As shown in fig. 2, the method includes:

step 201, monitoring a state signal generated by a photoresist stripping device.

Generally, the overall process of a TFT involves numerous processes from substrate cleaning, photoresist coating, exposure, development, etching, to removal (Strip), and the like.

The removal (Strip) is the last step of the TFT process after the etching process, and the step is to complete the patterning of the desired circuit material by stripping the photoresist component remaining in the deposited layer.

As shown in fig. 3, the photoresist is a photosensitive liquid that reacts to light and generates chemical changes, and in the TFT overall process, a negative or positive photoresist coated on a TFT substrate 301 is appropriately irradiated with light in a predetermined manner to generate a pattern 302 of a circuit substance, and an uncoated portion of the photoresist is removed in an etching process so that the photoresist 303 remains on the pattern 302 of the circuit substance.

The photoresist 303 has been completed, and the remaining photoresist 303 is not required for the subsequent process, so that a Stripper (also referred to as a removal solution) can be used to cleanly dissolve the photoresist 303 in the Strip process, and damage to the underlying substrate layer is prevented, and the subsequent process can continue to determine whether an abnormality exists, thereby forming a complete TFT product.

The type of stripping solution may be selected according to the requirements of the removal (Strip) process, for example, the type of stripping solution includes solvent-based stripping solution, aqueous stripping solution, and the like.

As shown in fig. 4, the photoresist stripping apparatus may generate different status signals in different states and transmit the status signals to other apparatuses so as to monitor the state of the photoresist stripping apparatus according to the status signals.

For example, when the substrate is put into the photoresist stripping apparatus, the state signal generated by the photoresist stripping apparatus is an operation signal Run, and when the substrate is not put into the photoresist stripping apparatus, the state signal generated by the photoresist stripping apparatus is an Idle signal Idle.

As shown in fig. 5, the stripping liquid 503 sprayed from the photoresist stripping apparatus 501 is stored in a chemical Tank 502 (Tank) independent of the photoresist stripping apparatus 501, the chemical Tank 502 is generally disposed below the photoresist stripping apparatus 501, and the pump body 504 pumps the stripping liquid 503 from the chemical Tank 502 to the photoresist stripping apparatus 501 while the photoresist stripping apparatus 501 is in operation, and a plurality of spray heads 505 in the photoresist stripping apparatus 501 are sprayed.

In general, a PCW (Process Cooling Water, process cooling water system), a Heater (heating bar) and other temperature adjusting devices are disposed in the chemical tank 502, so that the temperature of the stripping liquid can be kept constant, the effect of spraying the stripping liquid on the photoresist stripping device 501 to strip photoresist is ensured, and the sprayed stripping liquid is collected at the bottom of the photoresist stripping device 501 and flows back into the chemical tank 502, so that recycling of the stripping liquid is realized.

As shown in fig. 4, when the substrate is put into the photoresist stripping apparatus, the photoresist stripping apparatus generates an operation signal Run, at which time the photoresist stripping apparatus sprays a stripping liquid (On), and when the substrate is not put into the photoresist stripping apparatus, the photoresist stripping apparatus generates an Idle signal Idle, at which time, if the photoresist stripping apparatus starts a dry operation, i.e., continuously spraying the stripping liquid (On), the temperature of the stripping liquid can be transferred to the inside of the photoresist stripping apparatus, maintaining the temperature in the photoresist stripping apparatus constant.

In this way, although the hardware of the photoresist stripping equipment is prevented from being modified (such as adding temperature adjusting equipment such as PCW and Heater), the modification cost is reduced, stripping liquid enters an exhaust pipeline of the photoresist stripping equipment along with air flow in the continuous spraying process, the stripping liquid is lost and cannot be recycled, the waste amount of the stripping liquid is increased, and the production cost is increased.

In this embodiment, the status signal of the photoresist stripping device may be monitored, and the photoresist stripping device may be flexibly controlled according to the status signal, that is, when the substrate is put into the photoresist stripping device, the stripping liquid is periodically sprayed in the photoresist stripping device, and under the condition of maintaining the temperature in the photoresist stripping device constant, the waste of the stripping liquid is reduced as much as possible, the production cost is reduced as much as possible, and when the substrate is not put into the photoresist stripping device, the stripping liquid is continuously sprayed, so as to ensure that the photoresist on the substrate is stripped normally.

Step 202, if the status signal is an idle signal, inquiring configuration information generated for the photoresist stripping equipment.

If the state signal generated by the photoresist stripping device is monitored to be an idle signal, which indicates that the substrate is not put into the photoresist stripping device, the configuration information generated by the photoresist stripping device, namely the configuration information applicable to the photoresist stripping device, can be queried locally or from a server.

The configuration information generated by the photoresist stripper may refer to configuration information generated by the current photoresist stripper, that is, configuration information which is individually applicable to the current photoresist stripper, or configuration information generated by a plurality of photoresist strippers having the same process parameters (such as model number of photoresist stripper, type of stripper, concentration of stripper, temperature of stripper, etc.), that is, configuration information which is commonly applicable to a plurality of photoresist strippers having the same process parameters, which is not limited in this embodiment.

In addition, the configuration information may be information for controlling the photoresist stripping apparatus to periodically spray the stripping liquid.

As shown in fig. 4, the periodicity may refer to an operation in which the spraying of the stripping liquid (Off) is stopped in the photoresist stripping apparatus and the spraying of the stripping liquid (On) is stopped in the photoresist stripping apparatus, the spraying of the stripping liquid (Off) is stopped in the photoresist stripping apparatus and the spraying of the stripping liquid (On) is performed before and after the photoresist stripping apparatus, there is no other operation therebetween, the operations of a plurality of cycles are performed before and after the operation, and there is no other operation between the adjacent two cycles, thereby forming the operation of periodically spraying the stripping liquid.

Further, since the periodic spraying of the stripping liquid is performed after the continuous spraying of the stripping liquid (On) by the photoresist stripping apparatus and the stripping of the photoresist On the substrate, in one cycle of operation, the operation of stopping the spraying of the stripping liquid (On) in the photoresist stripping apparatus is performed before the operation of stopping the spraying of the stripping liquid (Off) in the photoresist stripping apparatus is performed after the operation of stopping the spraying of the stripping liquid (Off) in the photoresist stripping apparatus is performed, so that the operation of stopping the spraying of the stripping liquid (Off) in the photoresist stripping apparatus can be performed after the continuous spraying of the stripping liquid (On) by the photoresist stripping apparatus and the stripping of the photoresist On the substrate.

Illustratively, the configuration information includes a stop duration and an operation duration, wherein the stop duration is a time to stop spraying the stripping liquid, and the operation duration is a time to spray the stripping liquid.

In one cycle of operation, the spraying of the stripping liquid in the photoresist stripping apparatus is stopped at the stop time period, and the spraying of the stripping liquid in the photoresist stripping apparatus is performed at the run time period, at least the temperature in the photoresist stripping apparatus can be maintained constant.

In addition, other information may be used in the configuration information to control the photoresist stripping apparatus to periodically spray the stripping liquid, for example, the flow rate of the spraying stripping liquid and the stop time, etc., in addition to the stop time and the running time, which is not limited in this embodiment.

Further, at least one of the following conditions is set for the stop duration and the operation duration:

1. the sum between the stop duration and the run duration is less than or equal to the first time threshold.

The present condition can be expressed as:

T _Off +T _On ≤T ₁

wherein T is _Off For stopping time, T _On For run time, T ₁ Is a first time threshold (e.g., 40 minutes, 50 minutes, 60 minutes, etc.).

Because the photoresist stripping equipment has a monitoring mechanism, the photoresist stripping equipment stops running for a long time and reports errors, in the condition, the period of the constraint stop time length and the running time length as a whole is limited, the sum value between the constraint stop time length and the running time length (namely the time length of one period) is smaller than or equal to a first time threshold, wherein the first time threshold is smaller than or equal to the error reporting time of the photoresist stripping equipment, the error reporting of the photoresist stripping equipment due to the long-time stop of the photoresist stripping equipment is avoided, and the normal running of the photoresist stripping equipment is ensured.

2. The difference between the stop duration and the run duration is greater than or equal to the second time threshold.

The present condition can be expressed as:

T _Off -T _On ≥T ₂

wherein T is _Off For stopping time, T _On For run time, T ₂ Is a second time threshold (e.g., 10 minutes, 20 minutes, 30 minutes, etc.).

In practical applications, the stop time is longer than the running time, that is, the time for stopping spraying the stripping liquid in the photoresist stripping apparatus is longer than the time for spraying the stripping liquid in the photoresist stripping apparatus, and the temperature in the photoresist stripping apparatus can also be maintained constant.

In the condition, the difference between the constraint stop time length and the operation time length is larger than or equal to the second time threshold, and the difference between the stop time length and the operation time length can be increased, so that the duty ratio of the stop time length and the duty ratio of the operation time length are increased, the duty ratio of the operation time length is compressed, the waste of stripping liquid is reduced, and the production cost is reduced.

3. The stop time period is greater than or equal to the third time threshold.

The present condition can be expressed as:

T _Off ≥T ₃

wherein T is _Off For stopping time, T ₃ Is a third time threshold (e.g., 10 minutes, 20 minutes, 30 minutes, etc.).

4. The run-time length is greater than or equal to the fourth time threshold.

The present condition can be expressed as:

T _On ≥T ₄

wherein T is _On For run time, T ₄ Is a fourth time threshold (e.g., 1 minute, 2 minutes, 3 minutes, etc.).

In the two conditions, the stop time is greater than or equal to the third time threshold, and the running time is greater than or equal to the fourth time threshold, so that the minimum time of one period can be restrained, the frequency of circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment is reduced, and the loss caused to the photoresist stripping equipment is reduced.

Typically, the first time threshold is greater than the second, third and fourth time thresholds(T ₁ ＞T ₂ 、T ₃ 、T ₄ ) The third time threshold is greater than the fourth time threshold (T ₃ ＞T ₄ ) The second time threshold is less than or equal to the difference (T) ₂ ≤(T ₃ -T ₄ ))。

Of course, the above conditions for restricting the stopping time period and the running time period are only examples, and the conditions for restricting the stopping time period and the running time period may be restricted alone or may be combined (especially, four conditions may be combined). In addition, in addition to the above conditions of the stopping time period and the running time period constraint, those skilled in the art may also adopt other conditions of the stopping time period and the running time period constraint according to actual needs, which is not limited in this embodiment.

And 203, circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information so as to maintain the temperature in the photoresist stripping equipment.

In the process that the substrate is not put into the photoresist stripping equipment, information for controlling the photoresist stripping equipment to periodically spray the stripping liquid can be read from the configuration information, and the stripping liquid is stopped to be sprayed and sprayed in the photoresist stripping equipment circularly according to the information so as to realize the periodic spraying of the stripping liquid, and at the moment, the stripping liquid is used for maintaining the constant temperature in the photoresist stripping equipment.

Wherein, the circulation of stopping the spraying of the peeling liquid and the spraying of the peeling liquid may refer to performing the operation of stopping the spraying of the peeling liquid, performing the operation of spraying the peeling liquid after the completion of the operation of stopping the spraying of the peeling liquid, re-performing the operation of stopping the spraying of the peeling liquid after the completion of the operation of spraying the peeling liquid, re-performing the operation of spraying the peeling liquid after the re-completion of the operation of stopping the spraying of the peeling liquid, and so on.

Further, as shown in fig. 6, maintaining the temperature 601 inside the photoresist stripping apparatus constant may mean that the temperature 601 inside the photoresist stripping apparatus fluctuates around a target temperature value (e.g., 50 ℃) such that the temperature 601 inside the photoresist stripping apparatus as a whole is within a temperature range (e.g., [49 ℃,51 ℃) that expands up and down based on the target temperature value.

In one example, the stop duration and the run duration may be read from the configuration information.

In the photoresist stripping apparatus, the spraying of the stripping liquid is stopped in accordance with the stop time period and the spraying of the stripping liquid is performed in accordance with the operation time period to maintain the temperature inside the photoresist stripping apparatus.

Wherein, stopping spraying the stripping liquid according to the stopping time period may refer to stopping the spraying of the stripping liquid for the stopping time period, and spraying the stripping liquid according to the running time period may refer to spraying the stripping liquid for the running time period.

Then, the circulation of stopping the spraying of the peeling liquid according to the stop time period and the spraying of the peeling liquid according to the operation time period may refer to the execution of the operation of stopping the spraying of the peeling liquid according to the stop time period, the execution of the operation of spraying the peeling liquid according to the operation time period after the completion of the execution of the operation of spraying the peeling liquid according to the operation time period, the execution of the operation of stopping the spraying of the peeling liquid according to the stop time period after the completion of the execution of the operation of spraying the peeling liquid according to the operation time period, the execution of the operation of spraying the peeling liquid according to the operation time period after the completion of the execution of the operation of stopping the peeling liquid according to the operation time period, and the like.

And 204, continuously spraying stripping liquid in the photoresist stripping equipment to strip the photoresist on the substrate if the state signal is an operation signal.

As shown in fig. 4, if it is monitored that the state signal generated by the photoresist stripping apparatus is an operation signal (Run), indicating that the substrate has been put into the photoresist stripping apparatus, at this time, the periodic spraying of the stripping liquid in the photoresist stripping apparatus may be stopped, and in turn, the stripping liquid (On) may be continuously sprayed in the photoresist stripping apparatus, at this time, the stripping liquid functions to strip the photoresist On the substrate.

Example two

Fig. 7 is a flowchart of a control method of a photoresist stripping apparatus according to a second embodiment of the present invention, where the operation of learning configuration information is added on the basis of the foregoing embodiment. As shown in fig. 7, the method includes:

step 701, generating various configuration information for photoresist stripping equipment.

In the situations that the photoresist stripping device does not learn configuration information, the photoresist stripping device adjusts process parameters, the photoresist stripping device fails, and the like, the configuration information can be learned by the photoresist stripping device.

In the process of learning the configuration information, various types of information for controlling the photoresist stripping device to periodically spray the stripping liquid can be generated for the photoresist stripping device by using modes such as exhaustion, integer programming and the like as the configuration information.

In practical application, the configuration information includes a stopping time period and an operating time period, wherein the stopping time period is a time period for stopping spraying the stripping liquid, and the operating time period is a time period for spraying the stripping liquid.

Then, the different stopping time durations and the different running time durations can be combined in an exhaustion mode, an integer programming mode and the like to generate various configuration information for the photoresist stripping device.

For example, a preset third time threshold may be used as a start stop period, and a plurality of stop periods may be set for the photoresist stripping apparatus at intervals of a preset first step (e.g. 3 minutes, 5 minutes, etc.).

Then, the stop duration may be expressed as:

T _Off ＝T ₃ +nStep ₁

wherein T is _Off For stopping time, T ₃ Step is a third time threshold ₁ For the first step, n is a natural number.

And setting a plurality of operation time lengths for the photoresist stripping equipment at each interval of a preset second step length by taking a preset fourth time threshold as an initial operation time length.

Then the run length can be expressed as:

T _On ＝T ₄ +mStep ₂

wherein T is _On For run time, T ₄ Step is a fourth time threshold ₂ For the second step, m is a natural number.

Combining each stopping time length and each running time length into a plurality of sets, respectively calculating the sum value between the stopping time length and the running time length in each set, comparing the sum value between the stopping time length and the running time length with a first time threshold value, calculating the difference value between the stopping time length and the running time length, and comparing the difference value between the stopping time length and the running time length with a second time threshold value.

And if the sum value of the stopping time length and the running time length is smaller than or equal to the first time threshold value and the difference value between the stopping time length and the running time length is larger than or equal to the second time threshold value, writing the stopping time length and the running time length in the set into configuration information.

And if the sum value of the stopping time length and the running time length is greater than the first time threshold value and/or the difference value between the stopping time length and the running time length is less than the second time threshold value, discarding the stopping time length and the running time length in the set.

Further, various configuration information may be generated separately for the current photoresist stripping apparatus, or may be generated for photoresist stripping apparatuses having the same process parameters, which is not limited in this embodiment.

If multiple configuration information is generated for the current photoresist stripping device independently, the multiple configuration information can be cached in the current photoresist stripping device, and the current photoresist stripping device waits for testing the multiple configuration information.

If multiple configuration information is generated for multiple photoresist stripping apparatuses having the same process parameters, the multiple configuration information may be distributed to the multiple photoresist stripping apparatuses having the same process parameters using load balancing (e.g., ha Xiqu remainder algorithm, sequential distribution according to ID, etc.), etc., waiting for the multiple photoresist stripping apparatuses having the same process parameters to test the respective distributed configuration information.

Step 702, controlling the dry running of the photoresist stripping device to spray stripping liquid in the photoresist stripping device.

During the process of testing the configuration information by the photoresist stripping device, a monitoring mechanism of the photoresist stripping device can be forbidden so as not to falsely trigger an abnormal alarm.

The environment inside the photoresist stripping device is initialized every time the configuration information is tested, and at this time, the photoresist stripping device is controlled to perform a dry operation, which is to spray stripping liquid in the photoresist stripping device when the substrate is not put into the photoresist stripping device.

And 703, if the duration of the idle operation of the photoresist stripping device reaches the working condition threshold, circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping device according to the configuration information, and detecting a plurality of circulation temperature values in the photoresist stripping device.

In the process of the dry running of the photoresist stripping equipment, a timer can be started to count the time length of the dry running of the photoresist stripping equipment, and if the time length of the dry running of the photoresist stripping equipment reaches a preset working condition threshold value, the initialization of the environment inside the photoresist stripping equipment is finished, and the temperature inside the photoresist stripping equipment is stable.

At this time, information for controlling the photoresist stripping apparatus to periodically spray the stripping liquid may be read from the configuration information to be tested, and the spraying of the stripping liquid may be stopped in the photoresist stripping apparatus according to the information.

And in the process of circularly stopping spraying the stripping liquid and spraying the stripping liquid, a temperature sensor of the photoresist stripping equipment can be called, and a plurality of temperature values are detected in the photoresist stripping equipment according to a preset frequency and recorded as circulating temperature values.

Step 704, detecting validity of the configuration information in maintaining the temperature in the photoresist stripping apparatus according to the plurality of circulating temperature values.

The plurality of discrete circulating temperature values can be fit to a change curve of the temperature in the photoresist stripping equipment, the state of the change curve of the temperature is evaluated, and the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment can be determined.

When the temperature change curve shows a flat state, which indicates that the internal temperature of the photoresist stripping apparatus is constant, it can be determined that the effectiveness of the configuration information in maintaining the internal temperature of the photoresist stripping apparatus is effective.

When the state of the temperature change curve is jitter, the phenomenon that the temperature in the photoresist stripping equipment suddenly drops is indicated, and the effectiveness of the configuration information in maintaining the temperature in the photoresist stripping equipment can be determined to be invalid.

In one embodiment of the present invention, step 704 may include the steps of:

step 7041, setting a target temperature value.

In this embodiment, a temperature value for normal operation may be set as the target temperature value for the photoresist stripping apparatus.

In one case, a rated temperature value at the time of stripping the photoresist may be queried for the photoresist stripping apparatus as a target temperature value.

Typically, the rated temperature value is a temperature value set by a manufacturer producing the photoresist stripping apparatus at an ideal operation for the photoresist stripping apparatus before the photoresist stripping apparatus leaves the factory.

In another case, when the photoresist stripping device runs empty, a temperature sensor of the photoresist stripping device is called, a plurality of temperature values in the photoresist stripping device are detected according to a preset frequency and recorded as idle temperature values, and the idle temperature values are sequenced according to time sequence and can be used as a temperature sequence.

And traversing the temperature sequence, and calculating an average value of idle temperature values at the tail part of the temperature sequence to be used as a target temperature value.

The idle temperature values at the tail of the temperature sequence may refer to N (N is a positive integer) idle temperature values or M (M is a positive number) idle temperature values at the last of the temperature sequence sequencing.

At the initial stage of the environmental initialization inside the photoresist stripping device, the temperature inside the photoresist stripping device may be in a rising stage and not stable, while at the final stage of the environmental initialization inside the photoresist stripping device, the temperature inside the photoresist stripping device is very likely to be stable, and at the final stage of the environmental initialization inside the photoresist stripping device, the temperature is an idle temperature value at the tail part of the temperature sequence, therefore, the idle temperature value at the tail part of the temperature sequence is selected to calculate a target temperature value, and the target temperature value can be ensured to conform to the temperature when the actual working condition is stable.

Step 7042, respectively floating up the first value and floating down the second value on the basis of the target temperature value to obtain a temperature range.

And floating a first value (such as 1 ℃) on the basis of the target temperature value, namely adding the target temperature value and the first value to obtain an upper limit value.

And floating downwards a second value (such as 1 ℃) on the basis of the target temperature value, namely subtracting the target temperature value from the second value to obtain a lower limit value.

The upper limit value and the lower limit value constitute a temperature range, and a reasonable error range deviating from the target temperature value is indicated.

Step 7043, taking absolute value of the difference between the previous cycle temperature value and the next cycle temperature value as the temperature deviation for the two adjacent cycle temperature values.

Step 7044, calculating an average value among all the temperature deviations to obtain a temperature discrete value.

In the process of circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment, the temperature (namely, the circulation temperature value) in the photoresist stripping equipment is reduced by stopping spraying the stripping liquid, and the temperature (namely, the circulation temperature value) in the photoresist stripping equipment is increased by spraying the stripping liquid, so that the change curve of the temperature in the photoresist stripping equipment is fluctuated.

In order to make the temperature in the photoresist stripping apparatus as stable as possible, the amplitude of fluctuation in the temperature profile in the photoresist stripping apparatus should be reduced as much as possible.

Therefore, the two adjacent circulating temperature values can be combined into a temperature pair according to the time sequence, for the two adjacent circulating temperature values in the temperature pair, the difference value between the circulating temperature value ordered in the front position and the circulating temperature value ordered in the rear position is calculated, and the absolute value is taken as the temperature deviation.

Calculating an average value of all the temperature deviations, namely calculating the sum value of the sum of all the temperature deviations, subtracting one from the number of all the circulating temperature values as a total deviation to obtain the number of temperature pairs, and calculating the ratio between the total deviation and the number of the temperature pairs to be recorded as a temperature discrete value, so that the temperature discrete value can represent the amplitude of fluctuation of a temperature change curve in the photoresist stripping equipment.

Then, the temperature discrete value can be expressed as:

wherein M is a temperature discrete value, t _i+1 For the (i+1) th cycle temperature value (i.e. the previous cycle temperature value), t _i Is the i-th cycle temperature value (namely the subsequent cycle temperature value), |t _i+1 -t _i I is the temperature deviation, n is the number of circulating temperature values.

Step 7045, determining that the validity of the configuration information in maintaining the temperature in the photoresist stripping apparatus is valid if all the circulating temperature values are within the temperature range and the temperature dispersion value is less than or equal to the temperature threshold.

Step 7046, determining that the validity of the configuration information in maintaining the temperature in the photoresist stripping apparatus is invalid if at least one of the cyclical temperature values is outside the temperature range and/or the temperature discrete value is greater than the temperature threshold.

All cycling temperature values are compared to a temperature range, and temperature discrete values are compared to a temperature threshold.

If all the circulating temperature values are within the temperature range (i.e., all the circulating temperature values are greater than or equal to the lower limit value of the temperature range and less than or equal to the upper limit value of the temperature range), and the temperature dispersion value is less than or equal to the temperature threshold value, which means that all the circulating temperature values in the photoresist stripping apparatus deviate from the target temperature values within a reasonable error range, and the amplitude of fluctuation of the temperature change curve in the photoresist stripping apparatus is small, it can be determined that the effectiveness of the configuration information in maintaining the temperature in the photoresist stripping apparatus is effective.

If the at least one circulating temperature value is outside the temperature range (i.e., the at least one circulating temperature value is less than the lower limit value of the temperature range, or greater than the upper limit value of the temperature range), and/or the temperature dispersion value is greater than the temperature threshold value, which indicates that the at least one circulating temperature value in the photoresist stripping apparatus deviates from the target temperature value outside a reasonable error range, and/or the fluctuation amplitude of the temperature change curve in the photoresist stripping apparatus is greater, resulting in the probability of occurrence of a bad problem on the substrate being increased, then it may be determined that the effectiveness of the configuration information in maintaining the temperature in the photoresist stripping apparatus is ineffective.

Step 705, if the validity is valid, the configuration information is applied to the photoresist stripping device.

If the current photoresist stripping device completes the test on the various configuration information, or if the plurality of photoresist stripping devices with the same process parameters complete the test on the various configuration information, test results of all the configuration information can be collected, the configuration information which is effective in maintaining the temperature in the photoresist stripping device can be selected, and any configuration information can be selected from the configuration information to be applied to the current photoresist stripping device or the plurality of photoresist stripping devices with the same process parameters.

When the configuration information is applied to a plurality of photoresist stripping devices with the same process parameters, the configuration file can be distributed to the plurality of photoresist stripping devices with the same process parameters in an internal industrial Internet of things mode or the like to take effect.

In a specific implementation, the number x of configuration information that is valid may be counted as valid.

If the number x is a single (x=1), the configuration information may be directly applied to the current photoresist stripping apparatus or a plurality of photoresist stripping apparatuses having the same process parameters.

If the number x is a plurality of (x is more than or equal to 2), respectively reading the stopping time length and the running time length from a plurality of effective configuration information.

And calculating the ratio of the operation time length to the total time length as an operation ratio, wherein the total time length is the sum value of the stop time length and the operation time length.

Then, the operation ratio can be expressed as:

wherein S is the operation proportion, T _Off For stopping time period T _On For the duration of operation, T _Off +T _On I.e. the total duration.

Comparing the operation proportion corresponding to the plurality of effective configuration information, and applying the configuration information with the smallest operation proportion to the current photoresist stripping equipment or a plurality of photoresist stripping equipment with the same technological parameters.

The operation proportion is minimum, the operation proportion is increased to the greatest extent, the operation proportion is compressed to the greatest extent, and therefore waste of stripping liquid is reduced to the greatest extent, and production cost is reduced to the greatest extent.

Step 706, monitoring a status signal generated by the photoresist stripping apparatus.

And step 707, if the status signal is an idle signal, inquiring configuration information generated for the photoresist stripping equipment.

Step 708, circulating the stripping liquid spraying and the stripping liquid spraying in the photoresist stripping device according to the configuration information so as to maintain the temperature inside the photoresist stripping device.

Step 709, if the status signal is an operation signal, continuously spraying a stripping solution in the photoresist stripping device to strip the photoresist on the substrate.

Example III

Fig. 8 is a schematic structural diagram of a control device of a photoresist stripping apparatus according to a third embodiment of the present invention. As shown in fig. 8, the apparatus includes:

a status signal monitoring module 801, configured to monitor a status signal generated by the photoresist stripping apparatus;

a configuration information query module 802, configured to query configuration information generated for the photoresist stripping device if the status signal is an idle signal;

a no-load operation module 803 for circulating and stopping the spraying of the stripping liquid in the photoresist stripping apparatus according to the configuration information to maintain the temperature inside the photoresist stripping apparatus;

and the load operation module 804 is configured to continuously spray a stripping solution in the photoresist stripping apparatus to strip the photoresist on the substrate if the status signal is an operation signal.

In one embodiment of the present invention, the idle operation module 803 includes:

a time length reading module for reading the stop time length and the operation time length from the configuration information;

and the circulation operation module is used for circulating to stop spraying the stripping liquid according to the stop time and spraying the stripping liquid according to the running time in the photoresist stripping equipment so as to maintain the temperature in the photoresist stripping equipment.

In one embodiment of the present invention, at least one of the stop duration and the running duration is as follows:

the sum of the stopping time length and the running time length is smaller than or equal to a first time threshold value;

the difference between the stopping time length and the running time length is greater than or equal to a second time threshold;

the stop time period is greater than or equal to a third time threshold;

the run-time is greater than or equal to a fourth time threshold.

In one embodiment of the present invention, further comprising:

the configuration information generation module is used for generating various configuration information for the photoresist stripping equipment;

the environment initialization module is used for controlling the photoresist stripping equipment to run idle so as to spray stripping liquid in the photoresist stripping equipment;

the test control module is used for circularly stopping spraying the stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information if the length of time of the idle operation of the photoresist stripping equipment reaches a working condition threshold value, and detecting a plurality of circulating temperature values in the photoresist stripping equipment;

the validity detection module is used for detecting the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment according to a plurality of circulating temperature values;

And the configuration information application module is used for applying the configuration information to the photoresist stripping equipment if the validity is valid.

In one embodiment of the present invention, the configuration information generation module includes:

the photoresist stripping device comprises a stopping time length generation module, a photoresist stripping device and a photoresist stripping device, wherein the stopping time length generation module is used for setting a plurality of stopping time lengths for the photoresist stripping device with a preset third time threshold as an initial stopping time length, and each interval of the preset first step length is the time for stopping spraying stripping liquid;

the operation time length generation module is used for setting a plurality of operation time lengths for the photoresist stripping equipment at each interval by taking a preset fourth time threshold as an initial operation time length, wherein the operation time length is the time of spraying stripping liquid;

and the time length combination module is used for writing the stopping time length and the running time length into configuration information if the sum value of the stopping time length and the running time length is smaller than or equal to a first time threshold value and the difference value between the stopping time length and the running time length is larger than or equal to a second time threshold value.

In one embodiment of the present invention, the validity detection module includes:

The target temperature value setting module is used for setting a target temperature value;

the temperature range generation module is used for respectively floating the first value and the second value on the basis of the target temperature value to obtain a temperature range;

and the temperature deviation calculation module is used for taking absolute values of differences between the former circulation temperature value and the latter circulation temperature value as temperature deviations for two adjacent circulation temperature values.

The temperature discrete value calculation module is used for calculating the average value among all the temperature deviations to obtain a temperature discrete value;

the effective determining module is used for determining that the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment is valid if all the circulating temperature values are in the temperature range and the temperature discrete value is smaller than or equal to a temperature threshold value;

and the invalidation determining module is used for determining that the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment is invalid if at least one circulating temperature value is out of the temperature range and/or the temperature discrete value is larger than a temperature threshold value.

In one embodiment of the present invention, the target temperature value setting module includes:

The rated temperature value query module is used for querying the rated temperature value of the photoresist stripping equipment when stripping photoresist, and taking the rated temperature value as a target temperature value;

or,

the temperature sequence detection module is used for detecting a plurality of idle temperature values in the photoresist stripping equipment as a temperature sequence when the photoresist stripping equipment runs empty;

and the tail calculation module is used for calculating an average value of the idle temperature values at the tail of the temperature sequence to be used as a target temperature value.

In one embodiment of the present invention, the configuration information application module includes:

the quantity counting module is used for counting the quantity of the configuration information with the validity being valid;

a single application module for applying the configuration information to the photoresist stripping apparatus if the number is single;

the multi-configuration analysis module is used for reading the stop duration and the operation duration from the configuration information if the number is a plurality of;

the operation proportion calculation module is used for calculating the ratio between the operation duration and the total duration, and the total duration is the sum value of the stop duration and the operation duration as an operation proportion;

And the proportion application module is used for applying the configuration information with the minimum operation proportion to the photoresist stripping equipment.

The control device of the photoresist stripping equipment provided by the embodiment of the invention can execute the control method of the photoresist stripping equipment provided by any embodiment of the invention, and has the corresponding functional modules and beneficial effects of executing the control method of the photoresist stripping equipment.

Example IV

Fig. 9 shows a schematic diagram of an electronic device 10 that may be used to implement an embodiment of the invention. Electronic devices are intended to represent various forms of digital computers, such as laptops, desktops, workstations, personal digital assistants, servers, blade servers, mainframes, and other appropriate computers. The components shown herein, their connections and relationships, and their functions, are meant to be exemplary only, and are not meant to limit implementations of the inventions described and/or claimed herein.

As shown in fig. 9, the electronic device 10 includes at least one processor 11, and a memory, such as a Read Only Memory (ROM) 12, a Random Access Memory (RAM) 13, etc., communicatively connected to the at least one processor 11, in which the memory stores a computer program executable by the at least one processor, and the processor 11 may perform various appropriate actions and processes according to the computer program stored in the Read Only Memory (ROM) 12 or the computer program loaded from the storage unit 18 into the Random Access Memory (RAM) 13. In the RAM 13, various programs and data required for the operation of the electronic device 10 may also be stored. The processor 11, the ROM 12 and the RAM 13 are connected to each other via a bus 14. An input/output (I/O) interface 15 is also connected to bus 14.

Various components in the electronic device 10 are connected to the I/O interface 15, including: an input unit 16 such as a keyboard, a mouse, etc.; an output unit 17 such as various types of displays, speakers, and the like; a storage unit 18 such as a magnetic disk, an optical disk, or the like; and a communication unit 19 such as a network card, modem, wireless communication transceiver, etc. The communication unit 19 allows the electronic device 10 to exchange information/data with other devices via a computer network, such as the internet, and/or various telecommunication networks.

The processor 11 may be a variety of general and/or special purpose processing components having processing and computing capabilities. Some examples of processor 11 include, but are not limited to, a Central Processing Unit (CPU), a Graphics Processing Unit (GPU), various specialized Artificial Intelligence (AI) computing chips, various processors running machine learning model algorithms, digital Signal Processors (DSPs), and any suitable processor, controller, microcontroller, etc. The processor 11 performs the respective methods and processes described above, such as a control method of the photoresist stripping apparatus.

In some embodiments, the method of controlling the photoresist stripping apparatus may be implemented as a computer program tangibly embodied on a computer-readable storage medium, such as the storage unit 18. In some embodiments, part or all of the computer program may be loaded and/or installed onto the electronic device 10 via the ROM 12 and/or the communication unit 19. When the computer program is loaded into the RAM 13 and executed by the processor 11, one or more steps of the control method of the photoresist stripping apparatus described above may be performed. Alternatively, in other embodiments, the processor 11 may be configured to perform the control method of the photoresist stripping apparatus in any other suitable way (e.g. by means of firmware).

Various implementations of the systems and techniques described here above may be implemented in digital electronic circuitry, integrated circuit systems, field Programmable Gate Arrays (FPGAs), application Specific Integrated Circuits (ASICs), application Specific Standard Products (ASSPs), systems On Chip (SOCs), load programmable logic devices (CPLDs), computer hardware, firmware, software, and/or combinations thereof. These various embodiments may include: implemented in one or more computer programs, the one or more computer programs may be executed and/or interpreted on a programmable system including at least one programmable processor, which may be a special purpose or general-purpose programmable processor, that may receive data and instructions from, and transmit data and instructions to, a storage system, at least one input device, and at least one output device.

A computer program for carrying out methods of the present invention may be written in any combination of one or more programming languages. These computer programs may be provided to a processor of a general purpose computer, special purpose computer, or other programmable data processing apparatus, such that the computer programs, when executed by the processor, cause the functions/acts specified in the flowchart and/or block diagram block or blocks to be implemented. The computer program may execute entirely on the machine, partly on the machine, as a stand-alone software package, partly on the machine and partly on a remote machine or entirely on the remote machine or server.

In the context of the present invention, a computer-readable storage medium may be a tangible medium that can contain, or store a computer program for use by or in connection with an instruction execution system, apparatus, or device. The computer readable storage medium may include, but is not limited to, an electronic, magnetic, optical, electromagnetic, infrared, or semiconductor system, apparatus, or device, or any suitable combination of the foregoing. Alternatively, the computer readable storage medium may be a machine readable signal medium. More specific examples of a machine-readable storage medium would include an electrical connection based on one or more wires, a portable computer diskette, a hard disk, a Random Access Memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disc read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the foregoing.

To provide for interaction with a user, the systems and techniques described here can be implemented on an electronic device having: a display device (e.g., a CRT (cathode ray tube) or LCD (liquid crystal display) monitor) for displaying information to a user; and a keyboard and a pointing device (e.g., a mouse or a trackball) through which a user can provide input to the electronic device. Other kinds of devices may also be used to provide for interaction with a user; for example, feedback provided to the user may be any form of sensory feedback (e.g., visual feedback, auditory feedback, or tactile feedback); and input from the user may be received in any form, including acoustic input, speech input, or tactile input.

The systems and techniques described here can be implemented in a computing system that includes a background component (e.g., as a data server), or that includes a middleware component (e.g., an application server), or that includes a front-end component (e.g., a user computer having a graphical user interface or a web browser through which a user can interact with an implementation of the systems and techniques described here), or any combination of such background, middleware, or front-end components. The components of the system can be interconnected by any form or medium of digital data communication (e.g., a communication network). Examples of communication networks include: local Area Networks (LANs), wide Area Networks (WANs), blockchain networks, and the internet.

The computing system may include clients and servers. The client and server are typically remote from each other and typically interact through a communication network. The relationship of client and server arises by virtue of computer programs running on the respective computers and having a client-server relationship to each other. The server can be a cloud server, also called a cloud computing server or a cloud host, and is a host product in a cloud computing service system, so that the defects of high management difficulty and weak service expansibility in the traditional physical hosts and VPS service are overcome.

Example five

The embodiments of the present invention also provide a computer program product comprising a computer program which, when executed by a processor, implements a method of controlling a photoresist stripper apparatus as provided by any of the embodiments of the present invention.

Computer program product in the implementation, the computer program code for carrying out operations of the present invention may be written in one or more programming languages, including an object oriented programming language such as Java, smalltalk, C ++ and conventional procedural programming languages, such as the "C" programming language or similar programming languages. The program code may execute entirely on the user's computer, partly on the user's computer, as a stand-alone software package, partly on the user's computer and partly on a remote computer or entirely on the remote computer or server. In the case of a remote computer, the remote computer may be connected to the user's computer through any kind of network, including a Local Area Network (LAN) or a Wide Area Network (WAN), or may be connected to an external computer (for example, through the Internet using an Internet service provider).

It should be appreciated that various forms of the flows shown above may be used to reorder, add, or delete steps. For example, the steps described in the present invention may be performed in parallel, sequentially, or in a different order, so long as the desired results of the technical solution of the present invention are achieved, and the present invention is not limited herein.

The above embodiments do not limit the scope of the present invention. It will be apparent to those skilled in the art that various modifications, combinations, sub-combinations and alternatives are possible, depending on design requirements and other factors. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the scope of the present invention.

Claims

1. A control method of a photoresist stripping apparatus, comprising:

monitoring a state signal generated by the photoresist stripping equipment;

2. The method of claim 1, wherein the circulating the stopping the spraying of the stripping liquid and the spraying of the stripping liquid within the photoresist stripper apparatus in accordance with the configuration information to maintain the temperature inside the photoresist stripper apparatus comprises:

reading the stopping time length and the running time length from the configuration information;

in the photoresist stripping equipment, circularly stopping spraying the stripping liquid according to the stopping time period and spraying the stripping liquid according to the running time period so as to maintain the temperature in the photoresist stripping equipment;

wherein, the stopping time length and the running time length are at least one of the following conditions:

the stop time period is greater than or equal to a third time threshold;

the run-time is greater than or equal to a fourth time threshold.

3. The method according to claim 1 or 2, further comprising:

Generating various configuration information for the photoresist stripping equipment;

controlling the photoresist stripping equipment to run idle so as to spray stripping liquid in the photoresist stripping equipment;

if the time length of the idle running of the photoresist stripping equipment reaches a working condition threshold value, circularly stopping spraying stripping liquid and spraying the stripping liquid in the photoresist stripping equipment according to the configuration information, and detecting a plurality of circulating temperature values in the photoresist stripping equipment;

detecting the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment according to a plurality of circulating temperature values;

and if the validity is valid, the configuration information is applied to the photoresist stripping equipment.

4. A method according to claim 3, wherein the generating a plurality of configuration information for the photoresist stripping apparatus comprises:

setting a plurality of stopping time periods for the photoresist stripping equipment at each interval by taking a preset third time threshold as an initial stopping time period, wherein the stopping time period is the time for stopping spraying stripping liquid;

setting a plurality of operation time lengths for the photoresist stripping equipment at each interval by taking a preset fourth time threshold as an initial operation time length, wherein the operation time length is the time of spraying stripping liquid;

And if the sum value of the stopping time length and the running time length is smaller than or equal to a first time threshold value and the difference value between the stopping time length and the running time length is larger than or equal to a second time threshold value, writing the stopping time length and the running time length into configuration information.

5. The method of claim 3, wherein said detecting the validity of said configuration information in maintaining the temperature within said photoresist stripper apparatus in accordance with a plurality of said cyclical temperature values comprises:

setting a target temperature value;

respectively floating up a first value and floating down a second value on the basis of the target temperature value to obtain a temperature range;

taking absolute values of differences between the former circulation temperature value and the latter circulation temperature value as temperature deviation for two adjacent circulation temperature values;

calculating the average value among all the temperature deviations to obtain a temperature discrete value;

if all the circulating temperature values are in the temperature range and the temperature discrete value is smaller than or equal to a temperature threshold value, determining that the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment is valid;

and if at least one of the circulating temperature values is out of the temperature range and/or the temperature discrete value is larger than a temperature threshold value, determining that the validity of the configuration information in maintaining the temperature in the photoresist stripping equipment is invalid.

6. The method of claim 5, wherein the setting the target temperature value comprises:

inquiring a rated temperature value when stripping photoresist from the photoresist stripping equipment to serve as a target temperature value;

or,

detecting a plurality of idle temperature values in the photoresist stripping equipment as a temperature sequence when the photoresist stripping equipment runs in air;

and calculating an average value of the idle temperature values at the tail part of the temperature sequence to be used as a target temperature value.

7. The method of claim 3, wherein applying the configuration information to the photoresist stripping apparatus if the validity is valid comprises:

counting the number of the configuration information for which the validity is valid;

if the number is single, applying the configuration information to the photoresist stripping apparatus;

if the number is a plurality of, reading the stopping time length and the running time length from the configuration information;

calculating the ratio of the operation duration to the total duration, wherein the total duration is the sum of the stop duration and the operation duration as an operation proportion;

and applying the configuration information with the minimum operation proportion to the photoresist stripping equipment.

8. A control device of a photoresist stripping apparatus, characterized by comprising:

9. An electronic device, the electronic device comprising:

at least one processor; and

a memory communicatively coupled to the at least one processor; wherein,

the memory stores a computer program executable by the at least one processor to enable the at least one processor to perform the control method of the photoresist stripping apparatus of any one of claims 1 to 7.

10. A computer-readable storage medium, characterized in that the computer-readable storage medium stores a computer program for causing a processor to execute a control method of the resist stripping apparatus as claimed in any one of claims 1 to 7.