CN117026171B - Method for preparing PEM electrolytic cell porous diffusion layer based on pulse laser deposition technology - Google Patents
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- 238000000034 method Methods 0.000 title claims abstract description 34
- 238000009792 diffusion process Methods 0.000 title claims abstract description 31
- 230000008021 deposition Effects 0.000 title claims abstract description 18
- 238000005516 engineering process Methods 0.000 title abstract description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 72
- 239000010936 titanium Substances 0.000 claims abstract description 72
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 72
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052786 argon Inorganic materials 0.000 claims abstract description 14
- 239000002923 metal particle Substances 0.000 claims abstract description 11
- 239000007789 gas Substances 0.000 claims abstract description 7
- 238000000151 deposition Methods 0.000 claims description 18
- 239000002086 nanomaterial Substances 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 11
- 238000005245 sintering Methods 0.000 claims description 7
- 239000002105 nanoparticle Substances 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 3
- 238000004549 pulsed laser deposition Methods 0.000 claims description 2
- 238000003487 electrochemical reaction Methods 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000002184 metal Substances 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000010408 film Substances 0.000 description 14
- 239000001257 hydrogen Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 230000003197 catalytic effect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 238000011161 development Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000005265 energy consumption Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 235000003642 hunger Nutrition 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000037351 starvation Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
- C25B1/04—Hydrogen or oxygen by electrolysis of water
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
- C25B11/031—Porous electrodes
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- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
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- C25B11/036—Bipolar electrodes
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
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Abstract
The invention relates to a method for preparing a porous diffusion layer of a PEM (PEM) electrolytic cell based on a pulse laser deposition technology, which comprises the following steps: placing titanium-based PTL in a vacuum cavity, and reducing the cavity air pressure to 10 ‑3 Filling argon after Pa; pulse laser beams with pulse width of 10ps are emitted by a picosecond laser, the diameter of a spot of the pulse laser beam is 3mm before focusing, the beam is focused to the diameter of 100 mu m by a field lens system, and then a scanning path of the focused spot on a titanium target is controlled by a galvanometer system to bombard the titanium metal target, so that the titanium metal target is gasified and diffused; the gasified titanium metal particles collide with argon gas to reduce speed in the diffusion process, and the titanium-based PTL at the top of the cavity is solidified and grown into a porous film layer consisting of hundred-nanometer-level titanium metal particles; the invention can improve the bubble removal capability of the electrolytic cell under the working condition of high current density, effectively remove bubbles generated by electrochemical reaction and avoid the performance attenuation of the electrolytic cell under the working condition of high current density.
Description
[ technical field ]
The invention belongs to the technical field of PEM water electrolysis hydrogen production, and particularly relates to a method for preparing a PEM electrolytic tank porous diffusion layer based on a pulse laser deposition technology.
[ background Art ]
The hydrogen energy can be obtained through various ways such as primary energy, secondary energy, industrial field and the like, has the advantages of high heat value, easy storage, reproducibility and the like, can be widely applied to industries such as industry, building, traffic and electric power, and is an important carrier for constructing a multi-element energy supply system mainly based on clean energy in the future. The development and utilization technology level of continuously improving hydrogen energy is an important direction of new world energy technology transformation. At present, the green hydrogen preparation using the water electrolysis technology only accounts for 4% of the total hydrogen production amount, but most of hydrogen is sourced from petrochemical raw materials and industrial byproduct hydrogen, and cannot meet the requirement of sustainable development of future energy.
The Proton Exchange Membrane (PEM) electrolyzed water technology has the characteristics of high equipment integration level, high hydrogen production rate, low energy consumption, safety, environmental protection, high hydrogen production purity and high hydrogen production pressure, can adapt to the fluctuation characteristic of renewable energy power generation, is easy to combine with renewable energy consumption and the like, and is an ideal technical scheme for directly coupling wind, light, water and electricity hydrogen production in the future. However, the expensive capital equipment costs limit the further development of PEM electrolyzed water technology. Therefore, to reduce the equipment cost and subsequent operating costs of PEM electrolyzed water, it is desirable to increase the current density without decreasing the operating efficiency. Under the working condition of high current density operation, the electrolytic tank can generate a large amount of bubbles through electrochemical reaction, so that a mass transfer channel is blocked, and the water shortage of a catalytic area is caused when the mass transfer channel is severe, so that the performance is obviously reduced. A titanium-based porous diffusion layer (PTL) sandwiched between a catalyst layer and a flow field serves the functions of transporting water on the anode side, removing oxygen, conducting electrons, etc., and is a core component of PEM electrolyzed water, as shown in fig. 1. The wettability of the PTL is reasonably regulated, so that bubbles can be smoothly removed, and the PTL is an important research direction for improving the performance of the PEM electrolytic cell.
Generally, a more hydrophilic (hydrophobic) surface will facilitate the removal of bubbles, while titanium and titanium oxide surfaces are hydrophilic, it is still unavoidable that bubbles clog the porous structure under high current density conditions. Therefore, the introduction of surface nanostructures, which is necessary for further hydrophilic treatment of PTL materials, is one of the important directions for future development of PTL.
In summary, with the existing titanium-based PTL, the PEM electrolyzer anode under high current density conditions increases due to bubbles generated by the electrochemical reaction, thereby blocking the porous structure, impeding the transmission of water from the flow field to the catalytic layer, resulting in water starvation and severe mass transfer loss, and further reducing the performance and durability of the fuel cell.
Therefore, it would be of great importance if a method could be provided for preparing a superhydrophilic PTL surface to achieve a surface that can effectively remove gas bubbles from the catalytic layer to the flow field within the porous structure, thereby solving the problem of reduced cell performance under high current density conditions.
[ summary of the invention ]
The invention aims to solve the defects and provide a method for preparing a PEM (PEM) electrolytic cell porous diffusion layer based on a pulse laser deposition technology, which can improve the bubble removal capability of the electrolytic cell under a high-current-density operation condition, effectively remove bubbles generated by electrochemical reaction, avoid the performance attenuation of the electrolytic cell under the high-current-density operation condition, and further improve the performance of the electrolytic cell.
In order to achieve the aim, a method for preparing a porous diffusion layer of a PEM (PEM) electrolytic cell based on a pulse laser deposition technology is designed, and comprises the following steps: 1) Firstly, placing a titanium-based PTL in a vacuum cavity 1, and arranging a titanium target 6 below the titanium-based PTL to reduce the air pressure of the vacuum cavity 1 to 10 -3 -10 -5 Filling argon after Pa; 2) Then, a picosecond laser 7 is utilized to emit a pulse laser beam 8 with the pulse width of 8-100ps, the diameter of a light spot of the pulse laser beam 8 is 3-6mm before focusing, the beam is focused to the diameter of 50-400 mu m through a field lens system, and then a scanning path of a focused light spot on a titanium target 6 is controlled through a galvanometer system to bombard the titanium metal target, so that the titanium metal target is gasified/plasma-diffused; 3) The gasified titanium metal particles collide with argon gas to reduce speed in the diffusion process, and the titanium-based PTL at the top of the cavity is solidified and grown into a porous film layer composed of hundred-nanometer-level titanium metal particles.
Further, the method also comprises the step of high-temperature sintering: sintering the titanium-based PTL porous film layer after laser deposition for 2-4 hours in a vacuum environment at 900-1100 ℃, so that the stability of the porous film layer, especially the surface nano structure, can be improved.
Further, the average output power of the pulse laser beam 8 is 100W-200W, the pulse frequency is 300kHz-1000kHz, the target base distance is 25mm-50mm, the deposition time is 5-10 minutes, and the average particle size distribution of particles can be reduced by properly increasing the target base distance.
Further, the pressure of the inert gas argon for deposition is 10-30Pa, and the pressure can ensure that the porosity of the porous film layer and the average particle size of the particles are in a proper range.
Further, the porous film layer is composed of nano particles with the particle size of 10-30 nanometers, the nano structure scale is about 10-300nm, and the thickness of the porous film layer is smaller than 1 micrometer, so that the inner wall surface infiltration characteristic of the titanium-based PTL is better changed from hydrophilic to super-hydrophilic, and the bubble removal capability inside the electrolytic cell is better promoted.
Preferably, in step 1), the air pressure of the vacuum cavity 1 is reduced to 10 -3 Filling argon after Pa; in the step 2), a picosecond laser 7 is utilized to emit a pulse laser beam 8 with a pulse width of 10ps, the diameter of a spot of the pulse laser beam 8 before focusing is 3mm, the beam is focused to a diameter of 100 mu m through a field lens system, and then a scanning path of a focused spot on a titanium target 6 is controlled through a galvanometer system.
On the other hand, the invention also provides a titanium-based porous diffusion layer, which is prepared according to the method.
In a third aspect, the present invention provides the use of a titanium-based porous diffusion layer as described above in a PEM electrolyser.
In a fourth aspect, the present invention also provides a PEM electrolyser comprising a porous diffusion layer made according to the above method.
Compared with the prior art, the ultra-hydrophilic surface is introduced into the titanium-based PTL by using an ultra-fast laser pulse deposition technology, so that bubbles generated by an electrochemical reaction of the catalytic layer can be rapidly removed, and the mass transfer loss under the working condition of high current density (1.5A/cm < 2 >) is effectively reduced; the method solves the problems of regulation and preparation of the ultra-hydrophilic surface of the titanium-based PTL, can effectively remove bubbles generated by electrochemical reaction, avoids performance attenuation of the electrolytic tank under the condition of large electric density working condition, and provides technical support for wettability design of PEM electrolytic water PTL.
In summary, the present invention provides a method for preparing a superhydrophilic PTL surface, which can effectively remove bubbles from a catalytic layer to a flow field in a porous structure, so as to solve the problem of reduced performance of an electrolytic cell under a high current density working condition, thereby laying a solid engineering foundation for cost reduction of a PEM electrolytic cell, and being worthy of popularization and application.
[ description of the drawings ]
FIG. 1 is a schematic illustration of a titanium-based porous diffusion layer and a bubble blocking phenomenon;
FIG. 2 is a schematic illustration of the preparation of a superhydrophilic surface titanium-based porous diffusion layer of the present invention;
FIG. 3 is an enlarged view of the micro-nanostructure surface of FIG. 2;
FIG. 4 is a schematic view of a superhydrophilic titanium-based porous diffusion layer according to the present invention;
in the figure: 1. the vacuum chamber 2, the titanium-based porous diffusion layer 3, the PEM electrolytic water polar plate 4, the titanium nano-particles 5, the plasma plume 6, the titanium target 7, the picosecond laser 8, the pulse laser beam 9, the field lens/galvanometer system 10, the focused laser beam 11, the catalytic layer 12, the bubbles 13, the bipolar plate 14 and the anode flow channel (liquid water).
Detailed description of the preferred embodiments
For a better understanding of the present invention, the present disclosure includes, but is not limited to, the following detailed description, and similar techniques and methods should be considered as falling within the scope of the present protection. In order to make the technical problems, technical solutions and advantages to be solved more apparent, the following detailed description will be given with reference to the accompanying drawings.
In one aspect, the present invention provides a method for preparing a superhydrophilic PTL surface, in particular a method for preparing a porous diffusion layer of a PEM electrolytic cell based on a pulsed laser deposition technique, comprising the steps of:
1) Firstly, placing a titanium-based PTL in a vacuum cavity 1, and arranging a titanium target 6 below the titanium-based PTL to reduce the air pressure of the vacuum cavity 1 to 10 -3 -10 -5 Filling argon after Pa;
2) Then, a picosecond laser 7 is utilized to emit a pulse laser beam 8 with the pulse width of 8-100ps, the diameter of a light spot of the pulse laser beam 8 is 3-6mm before focusing, the beam is focused to the diameter of 50-400 mu m through a field lens system, and then a scanning path of a focused light spot on a titanium target 6 is controlled through a galvanometer system to bombard the titanium metal target, so that the titanium metal target is gasified/plasma-diffused;
3) The gasified titanium metal particles collide with argon gas to reduce speed in the diffusion process, and the titanium-based PTL at the top of the cavity is solidified and grown into a porous film layer consisting of hundred-nanometer-level titanium metal particles;
4) The method also comprises the step of high-temperature sintering: sintering the titanium-based PTL porous film layer after laser deposition for 2-4 hours in a vacuum environment at 900-1100 ℃, so that the stability of the porous film layer, especially the surface nano structure, can be improved.
On the other hand, the invention also provides a titanium-based porous diffusion layer, which is prepared according to the method.
In a third aspect, the present invention provides the use of a titanium-based porous diffusion layer as described above in a PEM electrolyser.
In a fourth aspect, the present invention also provides a PEM electrolyser comprising a porous diffusion layer made according to the above method.
The invention is further described below with reference to the accompanying drawings and specific examples:
as shown in fig. 2 and fig. 3, the invention provides a preparation method of a super-hydrophilic surface composed of metallic titanium nano particles, which comprises the following specific procedures:
the pressure of the vacuum cavity is reduced to 10 by an ultrafast laser vacuum pulse deposition method -3 -10 -5 After Pa (preferably down to 10) -3 Pa), argon is introduced. High-power pulse laser with 8-100ps pulse width (preferably 10ps pulse width) is emitted from the laser, the diameter of a light spot before focusing is 3-6mm (preferably 3 mm), then the light beam is focused to 50-400 mu m diameter (preferably 100 mu m diameter) through the field lens system, and then the scanning path of the focused light spot on the titanium target is controlled through the galvanometer system to bombard the titanium target, so that the titanium target is gasified/plasma-diffused. The gasified titanium metal particles collide with argon gas to reduce speed in the diffusion process, and the gasified titanium metal particles are solidified and grown into a porous film layer composed of hundred-nanometer-level titanium metal particles on the PTL at the top of the cavity.
The average output power of the laser is 100W-200W, the pulse frequency is 300kHz-1000kHz, the target base distance is 25mm-50mm, and the deposition time is 5-10 minutes; by properly increasing the target distance, the average particle size distribution of the particles can be reduced. The pressure of the inert gas for deposition is 10 Pa to 30Pa, and the pressure can ensure that the porosity of the porous film layer and the average particle diameter of the particles are in a proper range. The PTL after laser deposition is then sintered for 2-4 hours in a vacuum environment at 900-1100 ℃, so that the stability of the porous film layer, especially the surface nanostructure, can be improved.
As shown in figure 4, the porous film layer is composed of nano particles with the particle size of 10-30 nanometers, the nano structure scale is about 10-300nm, and the thickness of the porous film layer is less than 1 micrometer; therefore, the titanium nano structure deposited on the inner wall surface of the PTL porous structure by the ultrafast laser enables the infiltration characteristic of the inner wall surface of the titanium-based PTL to be changed from hydrophilic to super-hydrophilic, so that the bubble removal capability in the electrolytic cell can be greatly promoted, and particularly the mass transfer loss under the working condition of high current density can be reduced, thereby reducing the energy consumption of the electrolytic cell.
Based on the above embodiments, the present invention further provides a titanium-based porous diffusion layer, which is manufactured according to the above method; and provides the application of the titanium-based porous diffusion layer in a PEM electrolytic cell; the invention also provides a PEM electrolyser comprising a porous diffusion layer made according to the above method.
As can be seen from the above examples, the present invention utilizes ultrafast laser pulse deposition technique to prepare a porous thin film layer composed of titanium nanoparticles on a titanium-based PTL, and the thin film layer has a stable nanostructure after sintering at high temperature, so that the PTL surface exhibits superhydrophilic characteristics, thereby improving the bubble removal capability of PEM electrolyzed water, and reducing mass transfer loss under the working condition of high current density.
According to the method for preparing the super-hydrophilic surface on the titanium-based PTL by using the ultra-fast laser pulse deposition, the super-hydrophilic surface comprises the inner wall of the PTL, so that the bubble removal capacity of the electrolytic cell under the working condition of high current density is further improved, the transmission of water in a porous layer is prevented from being blocked by bubbles, the performance of the electrolytic cell is further improved, and a solid engineering foundation can be laid for the cost reduction of the PEM electrolytic cell.
The details not described in detail in this specification belong to the prior art known to those skilled in the art, all standard parts used by the standard parts can be purchased from the market, the special-shaped parts can be customized according to the description of the specification and the drawings, the specific connection modes of all parts adopt conventional means such as mature bolts, rivets and welding in the prior art, the machinery, the parts and the equipment adopt conventional models in the prior art, and the circuit connection adopts conventional connection modes in the prior art, which are not described in detail.
The present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit and principles of the invention are intended to be equivalent substitutes and are included in the scope of the invention.
Claims (10)
1. A method for preparing a porous diffusion layer of a PEM electrolyzer based on a pulsed laser deposition technique, characterized in that it comprises the following steps:
1) Firstly, placing a titanium-based PTL in a vacuum cavity (1), and arranging a titanium target (6) below the titanium-based PTL to reduce the air pressure of the vacuum cavity (1) to 10 -3 –10 -5 Filling argon after Pa;
2) Then, a picosecond laser (7) is used for emitting a pulse laser beam (8) with a pulse width of 8-100ps, the diameter of a light spot before focusing of the pulse laser beam (8) is 3-6mm, the beam is focused to a diameter of 50-400 mu m through a field lens system, and then a scanning path of a focusing light spot on a titanium target (6) is controlled through a galvanometer system to bombard the titanium target, so that the titanium target is gasified/plasma-diffused;
3) The gasified titanium metal particles collide with argon gas to reduce speed in the diffusion process, and the titanium-based PTL at the top of the cavity is solidified and grown into a porous film layer composed of hundred-nanometer-level titanium metal particles.
2. The method of claim 1, further comprising the step of high temperature sintering: sintering the titanium-based PTL porous film layer after laser deposition for 2-4 hours in a vacuum environment at 900-1100 ℃ so as to improve the stability of the nano structure on the surface of the porous film layer.
3. The method of claim 1, wherein: the average output power of the pulse laser beam (8) is 100W-200W, the pulse frequency is 300kHz-1000kHz, the target base distance is 25mm-50mm, and the deposition time is 5-10 minutes.
4. The method of claim 1, wherein: the pressure of the argon gas of the deposition inert gas is 10 Pa to 30Pa.
5. The method of claim 1, wherein: the porous film layer consists of nano particles with the particle size of 10-30 nanometers, the nano structure scale is 10-300nm, and the thickness of the porous film layer is less than 1 micrometer.
6. The method of claim 1, wherein: in the step 1), the air pressure of the vacuum cavity (1) is reduced to 10 -3 And filling argon after Pa.
7. The method of claim 1, wherein: in the step 2), a picosecond laser (7) is used for emitting a pulse laser beam (8) with a pulse width of 10ps, the diameter of a light spot before focusing of the pulse laser beam (8) is 3mm, the light beam is focused to a diameter of 100 mu m through a field lens system, and then the scanning path of a focused light spot on a titanium target (6) is controlled through a galvanometer system.
8. A titanium-based porous diffusion layer, characterized in that: the titanium-based porous diffusion layer made according to the method of any one of claims 1 to 7.
9. Use of a titanium-based porous diffusion layer according to claim 8 in a PEM electrolyser.
10. A PEM electrolyzer characterized in that: the PEM electrolyser comprising a porous diffusion layer made according to the method of any one of claims 1 to 7.
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