CN116590683B - Optical film, preparation method thereof and optical film element - Google Patents
Optical film, preparation method thereof and optical film element Download PDFInfo
- Publication number
- CN116590683B CN116590683B CN202310499280.4A CN202310499280A CN116590683B CN 116590683 B CN116590683 B CN 116590683B CN 202310499280 A CN202310499280 A CN 202310499280A CN 116590683 B CN116590683 B CN 116590683B
- Authority
- CN
- China
- Prior art keywords
- layer
- film
- film layer
- virtual
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000012788 optical film Substances 0.000 title claims abstract description 73
- 238000002360 preparation method Methods 0.000 title abstract description 27
- 239000010408 film Substances 0.000 claims abstract description 127
- 239000010409 thin film Substances 0.000 claims abstract description 76
- 230000003287 optical effect Effects 0.000 claims abstract description 61
- 238000007747 plating Methods 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000005516 engineering process Methods 0.000 claims abstract description 10
- 230000005540 biological transmission Effects 0.000 claims description 69
- 238000002834 transmittance Methods 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 27
- 238000000576 coating method Methods 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 18
- 230000028161 membrane depolarization Effects 0.000 claims description 14
- 230000002999 depolarising effect Effects 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000007738 vacuum evaporation Methods 0.000 claims description 5
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- 230000008859 change Effects 0.000 abstract description 8
- 239000000463 material Substances 0.000 description 11
- 238000004088 simulation Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000001808 coupling effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/20—Design optimisation, verification or simulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Theoretical Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
Abstract
The invention provides an optical film, a preparation method thereof and an optical film element, relates to the technical field of optics, and aims to solve the problem that a coated product does not meet index requirements due to the change of a machine table coefficient, so that the performance and quality of the coated product are improved. The preparation method comprises the following steps: determining the actual design thickness of each film layer; determining the plating thickness of each film layer; forming an optical film on the substrate according to the plating thickness of each film layer; determining the actual design thickness of each film layer includes: determining the initial design thickness of each thin film layer; determining the virtual plating thickness of each film layer; forming a virtual optical film on a virtual substrate through a software simulation technology to obtain a virtual optical film element; performing virtual optical characteristic test on the virtual optical thin film element; judging whether the virtual optical characteristic curve meets the design requirement; if not, the initial design thickness of at least one thin film layer is adjusted.
Description
Technical Field
The invention relates to the technical field of optics, in particular to an optical film, a preparation method thereof and an optical film element.
Background
In the optical coating industry, the adopted film system design mode is as follows: firstly, designing by film system design software; and inputting information such as the design thickness of each film layer into a machine, and preparing the film by the film plating equipment according to plating parameters of the machine. In order to ensure that the coating film meets the index requirement, the coating film thickness of the machine table=design thickness is equal to the machine table coefficient; the machine coefficient is also called as a Tooling value, and after the Tooling value is determined, the Tooling value is affected by various process parameters, for example: plating temperature, ion source power or electron gun power and the like, and the technological parameters have coupling effect, so that the actual needed Tooling value in plating can be changed, and the formed film plating product can not meet the index requirement.
Disclosure of Invention
The invention provides an optical film, a preparation method thereof and an optical film element, and aims to solve the problem that a coated product does not meet the index requirement due to the change of a machine table coefficient, thereby improving the performance and quality of the coated product.
The invention provides a preparation method of an optical film, wherein the optical film comprises at least one film layer, and the preparation method comprises the following steps:
determining the actual design thickness of each thin film layer;
determining the plating thickness of each film layer, wherein the plating thickness of the film layer is the product of the actual design thickness of the film layer and the machine table coefficient corresponding to the film layer;
forming the optical film on the substrate according to the plating thickness of each film layer to obtain an optical film element;
wherein said determining the actual design thickness of each of said film layers comprises:
determining an initial design thickness of each of the thin film layers;
determining the virtual plating thickness of each film layer, wherein the virtual plating thickness of the film layer is the product of the initial design thickness of the film layer and the machine table coefficient corresponding to the film layer;
forming a virtual optical film on a virtual substrate through a software simulation technology to obtain a virtual optical film element;
performing virtual optical characteristic test on the virtual optical thin film element to obtain a virtual optical characteristic curve;
judging whether the virtual optical characteristic curve meets the design requirement or not;
if not, adjusting the initial design thickness of at least one thin film layer until the virtual optical characteristic curve of the virtual optical thin film element meets the design requirement, wherein the film thickness of each thin film layer corresponding to the design requirement is the actual design thickness of each thin film layer;
if so, determining the initial design thickness of each thin film layer as the actual design thickness of each thin film layer.
According to the preparation method of the optical film provided by the invention, the optical film comprises a depolarization light-splitting film; the virtual optical film comprises a virtual depolarization beam splitting film; the virtual optical thin film element comprises a virtual depolarization beam splitter prism;
the virtual optical characteristic curve comprises an S light transmission curve and a P light transmission curve;
the determining whether the virtual optical characteristic curve meets the design requirement includes:
and judging whether the absolute value of the difference value of the transmittance of the P light transmission curve and the S light transmission curve in a preset wave band belongs to a preset interval or not.
According to the method for preparing an optical film provided by the invention, if not, the initial design thickness of at least one film layer is adjusted until the virtual optical characteristic curve of the virtual optical film element meets the design requirement, which comprises the following steps:
and if the absolute value of the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve in the preset wave band does not belong to the preset interval, adjusting the initial design thickness of at least one thin film layer until the absolute value of the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve in the preset wave band is in the preset interval.
According to the method for preparing an optical film provided by the invention, if yes, determining the initial design thickness of each film layer as the actual design thickness of each film layer comprises the following steps:
and if the absolute value of the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve in the preset wave band belongs to a preset interval, determining the initial design thickness of each thin film layer as the actual design thickness of each thin film layer.
According to the preparation method of the optical film provided by the invention, the preset interval comprises an interval [0%,15% ], and the preset wave band comprises wave bands [630nm, 630nm ].
According to the preparation method of the optical film, the depolarization light-splitting film comprises a plurality of light-splitting film layers which are arranged in a laminated mode, wherein each light-splitting film layer comprises a first sub-layer and a second sub-layer which are alternately arranged in a laminated mode, and the refractive index of the first sub-layer is larger than that of the second sub-layer;
the machine coefficients corresponding to the first sub-layer are different from the machine coefficients corresponding to the second sub-layer.
According to the preparation method of the optical film provided by the invention, the first sub-layer comprises Ti 3 O 5 A layer, the second sub-layer comprising SiO 2 A layer;
the machine table coefficient corresponding to the first sub-layer is smaller than the machine table coefficient corresponding to the second sub-layer.
According to the preparation method of the optical film provided by the invention, the optical film is formed on a substrate according to the plating thickness of each film layer, so as to obtain an optical film element, and the preparation method comprises the following steps:
and forming the optical film on the surface to be coated of the substrate by adopting a vacuum evaporation coating process according to the coating thickness of each film layer so as to obtain an optical film element.
The invention also provides an optical film which is formed by the preparation method of any one of the optical films.
The invention also provides an optical film element comprising the optical film.
The invention provides an optical film, a preparation method thereof and an optical film element, wherein the optical film comprises at least one film layer, and the preparation method comprises the following steps: determining the actual design thickness of each thin film layer; determining the plating thickness of each film layer, wherein the plating thickness of the film layer is the product of the actual design thickness of the film layer and the machine table coefficient corresponding to the film layer; forming the optical film on the substrate according to the plating thickness of each film layer to obtain an optical film element; wherein said determining the actual design thickness of each of said film layers comprises: determining an initial design thickness of each of the thin film layers; determining the virtual plating thickness of each film layer, wherein the virtual plating thickness of the film layer is the product of the initial design thickness of the film layer and the machine table coefficient corresponding to the film layer; forming a virtual optical film on a virtual substrate through a software simulation technology to obtain a virtual optical film element; performing virtual optical characteristic test on the virtual optical thin film element to obtain a virtual optical characteristic curve; judging whether the virtual optical characteristic curve meets the design requirement or not; if not, adjusting the initial design thickness of at least one thin film layer until the virtual optical characteristic curve of the virtual optical thin film element meets the design requirement, wherein the film thickness of each thin film layer corresponding to the design requirement is the actual design thickness of each thin film layer; if so, determining the initial design thickness of each thin film layer as the actual design thickness of each thin film layer.
In the preparation method provided by the embodiment of the invention, the influence caused by the change of the machine coefficients is transferred to the initial design thickness of each film layer, and whether the initial design thickness is compensated and adjusted is selected through simulation, so that the actual design thickness of each film layer is ensured to meet the design requirement, the problem that the coated product does not meet the index requirement due to the change of the machine coefficients is avoided, and the performance and quality of the coated product are greatly improved. In addition, compared with the related technology for adjusting the machine table coefficient, the preparation method provided by the embodiment of the invention does not need to adjust the machine table coefficient, and meanwhile, does not need to finish the actual plating process for multiple times, thereby greatly reducing the preparation cost and time.
Drawings
In order to more clearly illustrate the invention or the technical solutions of the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the invention, and other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic flow chart of a method for producing an optical film according to the present invention;
FIG. 2 is a second flow chart of the method for producing an optical film according to the present invention;
FIG. 3 is a schematic view of an optical film element according to the present invention;
FIG. 4 is a graph of the theoretical design of a depolarizing beam splitter prism provided by the present invention;
FIG. 5 is a graph of transmission curves for various thin film layers provided by the present invention using initial design thickness for simulation design;
FIG. 6 is a graph of transmission curves obtained by performing a simulation design after initial design thickness adjustment of each thin film layer provided by the present invention;
FIG. 7 is a graph showing transmission curves obtained after coating a film by using the initial design thickness of each thin film layer as the actual design thickness of each thin film layer;
FIG. 8 is a second transmission graph obtained by simulation after initial design thickness adjustment of each thin film layer is provided;
FIG. 9 is a graph showing the transmission curve obtained after coating with the adjusted initial design thickness as the actual design thickness provided by the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the embodiments of the present invention, the words "first," "second," and the like are used to distinguish between the same item or similar items that have substantially the same function and function, and are merely used to clearly describe the technical solutions of the embodiments of the present invention, and are not to be construed as indicating or implying relative importance or implying that the number of technical features indicated is indicated.
In the embodiments of the present invention, "multi-layer" means two or more layers, and "at least one layer" means one layer or more, and "plurality" means two or more, unless specifically defined otherwise.
In the embodiments of the present invention, the azimuth or positional relationship indicated by the terms "upper", "lower", etc. are based on the azimuth or positional relationship shown in the drawings, and are merely for convenience of description and simplification of description, and are not indicative or implying that the apparatus or element referred to must have a specific azimuth, be constructed and operated in a specific azimuth, and thus should not be construed as limiting the present invention.
The optical film system design is to plate a plurality of layers of films on the surface of an optical element to achieve certain optical characteristics, wherein the refractive index, thickness and the like of the films are designed as the film system design.
In the related art, in order to meet design indexes, after plating is completed, optical characteristic detection is performed on a plated product, and the actual curve condition is observed, so that the machine coefficient is adjusted; and then plating again until the detected optical characteristic curve meets the design index requirement. The method can meet the design index requirement only by adjusting the machine coefficients for multiple times and completing plating for multiple times, and has long time consumption and high cost.
Based on the foregoing, an embodiment of the present invention provides a method for preparing an optical film, where the optical film includes at least one film layer, and referring to fig. 1, the method includes:
s01, determining the actual design thickness of each film layer.
The material of each thin film layer is not limited, and can be determined according to practical requirements.
S02, determining the plating thickness of each film layer, wherein the plating thickness of the film layer is the product of the actual design thickness of the film layer and the machine table coefficient corresponding to the film layer.
The corresponding machine coefficients of the film layers of different materials are different. The plating thickness of the film layer is stored in the machine by means of manual introduction or automatic introduction, etc., of course, other plating parameters, such as: the material of each film layer (i.e., the type of the film material) or the number of film layers (i.e., the number of film layers) is also required to be introduced into the machine.
S03, forming an optical film on the substrate according to the plating thickness of each film layer to obtain the optical film element.
The plating apparatus performs plating according to plating parameters of the machine, and the method of forming the optical thin film is not limited herein. For example, the film may be prepared by physical vapor deposition (Physical Vapor Deposition, PVD) film plating technology, which refers to technology that a material source (solid or liquid) is gasified into gaseous atoms or molecules or is partially ionized into ions by a physical method under vacuum condition, and a film with special functions is deposited on the surface of a substrate through a low-pressure gas (or plasma) process. Physical vapor deposition coating techniques are mainly divided into three categories: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. The optical film may be formed in step S03 by vacuum evaporation coating, but other coating techniques may be used, and the method is not limited thereto.
The types of the optical films are not limited, and examples thereof include optical films such as a polarizing beam splitter film and a depolarizing beam splitter film.
Referring to fig. 2, wherein, S01, determining the actual design thickness of each thin film layer includes:
and S011, determining the initial design thickness of each film layer.
The determination method is not limited herein, and the initial design thickness of each thin film layer may be determined by the film system design software according to the design index.
S012, determining the virtual plating thickness of each film layer, wherein the virtual plating thickness of the film layer is the product of the initial design thickness of the film layer and the machine table coefficient corresponding to the film layer.
The machine coefficients used in step S012 for calculating the virtual plating thickness are the same as the machine coefficients used in step S02 for calculating the plating thickness of the same thin film layer.
S013, forming a virtual optical film on the virtual substrate through a software simulation technology to obtain a virtual optical film element.
The specific simulation software used is not limited herein, and exemplary film system design software such as TFC, macleod, or OptiLayer may be used. The virtual optical film formed in step S013 is identical in number of layers, material, type, and the like to the optical film formed in step S03. The virtual optical thin film element obtained by step S013 is the same as the type and structure of the optical thin film element obtained by step S03.
And S014, performing virtual optical characteristic test on the virtual optical thin film element to obtain a virtual optical characteristic curve.
The virtual optical characteristic curve may include an S-light reflection curve, a P-light reflection curve, an S-light transmission curve, or a P-light transmission curve, and the like, and the specific needs are selected according to design. For example, if the virtual optical film is a virtual depolarizing spectroscopic film, the virtual optical characteristics may include an S light transmission curve and a P light transmission curve.
S015, judging whether the virtual optical characteristic curve meets the design requirement.
The specific judgment method is not limited, and needs to be determined according to actual design requirements.
If not, executing S016, and adjusting the initial design thickness of at least one thin film layer until the virtual optical characteristic curve of the virtual optical thin film element meets the design requirement, wherein the film thickness of each thin film layer corresponding to the design requirement is the actual design thickness of each thin film layer.
The specific adjustment method is not limited herein, and the thickness of each thin film layer may be reduced or increased layer by layer according to the virtual optical characteristic curve, for example.
If yes, executing S017, and determining the initial design thickness of each film layer as the actual design thickness of each film layer.
In the preparation method provided by the embodiment of the invention, the influence caused by the change of the machine coefficients is transferred to the initial design thickness of each film layer, and whether the initial design thickness is compensated and adjusted is selected through simulation, so that the actual design thickness of each film layer is ensured to meet the design requirement, the problem that the coated product does not meet the index requirement due to the change of the machine coefficients is avoided, and the performance and quality of the coated product are greatly improved. In addition, compared with the related technology for adjusting the machine table coefficient, the preparation method provided by the embodiment of the invention does not need to adjust the machine table coefficient, and meanwhile, does not need to finish the actual plating process for multiple times, thereby greatly reducing the preparation cost and time.
In one or more embodiments, the optical film includes a depolarizing spectroscopic film; the virtual optical film comprises a virtual depolarization beam-splitting film; the virtual optical thin film element comprises a virtual depolarizing beam splitter prism; the virtual optical characteristic curves include an S-light transmission curve and a P-light transmission curve.
S015, judging whether the virtual optical characteristic curve meets the design requirement comprises:
s015', judging whether the absolute value of the difference value of the transmittance in the preset wave band of the P light transmission curve and the S light transmission curve belongs to a preset interval.
Referring to fig. 3, the depolarization beam splitter prism may be formed by gluing a pair of high-precision right-angle prisms 1, and simultaneously plating a depolarization beam splitter film 2 on the inclined surface of one of the prisms to realize that S light and P light are split according to a certain reflectance and transmittance in a specified wavelength range; meanwhile, the S polarization state and the P polarization state are ensured to have no change after passing through the prism.
The meaning of S light and P light is described below.
S-light, also called transverse wave, refers to polarized light with the direction of vibration perpendicular to the direction of propagation of the light. In one plane, the vibration direction of the S light is along the direction vertical to the incident surface, and the vibration direction is unchanged after reflection. P light, also called longitudinal wave, refers to polarized light having the same direction of vibration as the direction of propagation of the light. In one plane, the vibration direction of the P light is parallel to the incident surface, and the P light changes after reflection.
The S light transmission curve is a graph of the relation between the S light wavelength and the transmittance, and the P light transmission curve is a graph of the relation between the P light wavelength and the transmittance. The theoretical design curve of the depolarization beam splitter prism can be shown in fig. 4, and the transmission curves of the S light and the P light are basically coincident within a preset wave band, for example, the wave band [622nm,655nm ] shown in fig. 4, and the transmittance is about 50%. However, in actual production, it is difficult to achieve a theoretical design curve due to the influence of various factors. Referring to fig. 5, each thin film layer is subjected to simulation design by adopting an initial design thickness, so as to obtain the variation trend and the shape of the transmission curves of the S light and the P light after each layer of plating, and as can be seen from fig. 5, the transmission curves of the S light and the P light after each layer of thin film plating can be correspondingly changed, wherein the shape variation of the transmission curves of the P light is not greatly different, and the shape variation of the transmission curves of the S light is greatly different. According to the above preparation method, after the initial design thickness of each thin film layer is adjusted, the transmission curves of the S light and the P light shown in fig. 6 are obtained, and referring to fig. 6, the transmission curves of the S light and the P light are relatively close in the wavelength band [622nm,655nm ], and the absolute value of the difference between the two transmission values in the interval belongs to a preset interval, for example, the interval [0%,15% ], and the transmission curves are considered to meet the design requirement. In fig. 6, the transmittance of S light is larger than that of P light in a wavelength band [622nm,655nm ], and the difference between the transmittance of P light transmission curve and that of S light transmission curve in the wavelength band is smaller than 0, and the absolute value thereof belongs to the interval [0%,15% ]. Of course, the transmittance of S light may be smaller than the transmittance of P light within a predetermined wavelength band depending on the material or refractive index of the thin film, etc., and is not limited herein. In fig. 4 to 6, the ordinate represents the transmittance T, the abscissa represents the wavelength λ, and the unit is nm.
The absolute value of the difference between the transmittance in the predetermined wavelength band of the P light transmission curve and the transmittance of the S light transmission curve may be 0%, 3%, 5%, 8%, 10%, 12%, 13%, 14%, or the like, and the closer the value to 0, the closer to the ideal design curve, the better the plating effect.
The preset interval can be selected according to the material and layer number of the film, the process condition and the design requirement, and is not limited herein. The preset section may be a section of [0%,15% ], but may be a section of [0%,13% ], a section of [0%,10% ] or a section of [0%,8% ], for example.
The difference in transmittance in the predetermined wavelength band between the P-ray transmission curve and the S-ray transmission curve may be a positive value or a negative value, and is not limited thereto.
In order to simplify the judgment conditions and facilitate implementation, optionally, if not, executing S016 to adjust the initial design thickness of at least one thin film layer until the virtual optical characteristic curve of the virtual optical thin film element meets the design requirement, including:
if the absolute value of the difference between the transmittance of the preset wave band is not in the preset interval, executing S016', and adjusting the initial design thickness of at least one thin film layer until the absolute value of the difference between the transmittance of the preset wave band is in the preset interval.
For example, if the P light transmission curve and the S light transmission curve have the absolute value of the difference in transmittance in the wavelength band [630nm, 630nm ] not belonging to the interval [0%,15% ], S016' is performed to adjust the initial design thickness of at least one thin film layer until the P light transmission curve and the S light transmission curve have the absolute value of the difference in transmittance in the wavelength band [630nm, 630nm ] within the interval [0%,15% ].
In order to simplify the judgment conditions and facilitate implementation, optionally, if yes, executing S017 to determine the initial design thickness of each thin film layer as the actual design thickness of each thin film layer includes:
if the absolute value of the difference between the transmittance of the preset wave band belongs to the preset interval, executing S017', and determining the initial design thickness of each thin film layer as the actual design thickness of each thin film layer.
For example, if the P light transmission curve and the S light transmission curve have the absolute value of the difference in transmittance in the wavelength band [630nm, 630nm ] belonging to the interval [0%,15% ], S017' is performed to determine the initial design thickness of each thin film layer as the actual design thickness of each thin film layer.
Optionally, the preset interval includes interval [0%,15% ], and the preset wave band includes wave band [630nm, 630nm ], so as to form a depolarization light splitting film capable of realizing S light and P light splitting in the wave band [630nm, 630nm ] and having no change in polarization state.
In order to obtain better optical characteristics, optionally, the depolarizing light splitting film comprises a plurality of light splitting film layers which are arranged in a laminated way, wherein the light splitting film layers comprise first sub-layers and second sub-layers which are alternately arranged in a laminated way, and the refractive index of the first sub-layer is larger than that of the second sub-layer; the machine coefficients corresponding to the first sub-layer are different from the machine coefficients corresponding to the second sub-layer.
The machine coefficients can be selected according to the materials of the film layers, the materials are different, and the corresponding machine coefficients are different. Specific materials of the first sub-layer and the second sub-layer are not limited.
For ease of implementation, the first sub-layer may optionally comprise Ti 3 O 5 A layer, a second sub-layer comprising SiO 2 A layer; the machine table coefficient corresponding to the first sub-layer is smaller than the machine table coefficient corresponding to the second sub-layer.
For example, the machine coefficients corresponding to the first sub-layer may be 1.29039, and the machine coefficients corresponding to the second sub-layer may be 1.38183. Of course, other machine coefficients are also possible, and the present invention is not limited thereto.
In one or more embodiments, to obtain better coating quality, S03, forming an optical film on a substrate according to a coating thickness of each film layer, includes:
s03', forming an optical film on the surface to be coated of the substrate by adopting a vacuum evaporation coating process according to the coating thickness of each film layer.
For example, a thin film plating can be performed using a Laibao ARES1110 vacuum plating apparatus under conditions of a vacuum of 2.5E-3PA, a temperature of 200 ℃, an evaporation rate of 0.3nm/s, a main ion source working gas of argon, an ion beam voltage of 800V, an ion beam current of 300mA, and an oxygen flow of 20 sccm.
Hereinafter, a depolarization light splitting film for preparing a depolarization light splitting prism will be specifically described. The depolarization beam splitting film comprises a plurality of beam splitting film layers which are arranged in a laminated way, wherein the beam splitting film layers comprise Ti which are alternately arranged in a laminated way 3 O 5 Layer and SiO 2 A layer.
The design targets are as follows: the incidence angle is 45+/-2 deg, the spectral ratio R is 50 percent of T=50% +/-3 percent of 50 percent, the preset interval comprises interval [0 percent ] and 15 percent ], and the preset wave band comprises wave bands [630nm and 630nm ].
Coating according to the actual design thickness of each film layer, wherein the initial design of each film layerThe thickness is the actual design thickness of each film layer, ti 3 O 5 The machine table coefficient corresponding to the layer is 1.29039, siO 2 The machine coefficient corresponding to the layer is 1.38183. The resulting depolarized spectroscopic film was subjected to an optical property test to obtain S-light and P-light transmission curves as shown in FIG. 7, and as shown in FIG. 7, using wavelength 633nm as an example, it was found that the transmittance of the P-light transmission curve at 633.04nm was 47.837%, the transmittance of the S-light transmission curve at 633.04nm was 23.424%, the difference between the transmittance of the P-light transmission curve and the transmittance of the S-light transmission curve at 633.04nm was 24.413%, the absolute value thereof was 24.413%, and the transmittance was not within the interval [0%,15 ]]And is considered to be not in accordance with the target requirements.
By adopting the preparation method provided by the embodiment, the initial design thickness of each film layer is adjusted by adopting a software simulation technology, ti 3 O 5 The machine table coefficient corresponding to the layer is 1.29039, siO 2 The machine table coefficient corresponding to the layer is 1.38183, the virtual optical characteristic curve obtained after software simulation coating is shown in figure 8, and the virtual optical characteristic curve can be obtained from figure 8, wherein the transmittance of the P light transmission curve at 633.06nm is 49.304%, the transmittance of the S light transmission curve at 633.06nm is 35.573%, the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve at 633.06nm is 13.731%, and the virtual optical characteristic curve belongs to the interval [0%,15 ]]And is considered to meet the target requirements.
Adopting the adjusted initial design thickness as the actual design thickness to prepare the film, wherein Ti 3 O 5 The machine table coefficient corresponding to the layer is 1.29039, siO 2 As shown in FIG. 9, the optical characteristic curve obtained after the actual plating of the layer was found to be 1.38183, the transmittance of the P light transmission curve at 633.05nm was 51.554%, the transmittance of the S light transmission curve at 633.05nm was 38.925%, the difference between the transmittance of the P light transmission curve and the transmittance of the S light transmission curve at 633.05nm was 12.629%, the absolute value was 12.629%, and the values were the intervals [0%,15 ]]And is considered to meet the target requirements. In fig. 7 to 9, the ordinate represents the transmittance T, the abscissa represents the wavelength λ, and the unit is nm.
The embodiment of the invention provides an optical film, which is formed by adopting the preparation method of the optical film.
The kind of the optical film is not limited, and the optical film may include an optical film such as a polarizing beam splitter film or a depolarizing beam splitter film, for example. The optical film formed by the preparation method has the characteristics of low cost and good optical performance.
Embodiments of the present invention provide an optical film element including the above optical film.
The kind of the optical thin film element is not limited, and the optical thin film element may include an optical thin film element such as a polarization beam splitter prism or a depolarization beam splitter prism, for example. The optical film element has the characteristics of low cost and good optical performance.
Reference herein to "one embodiment," "an embodiment," or "one or more embodiments" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the invention. Furthermore, it is noted that the word examples "in one embodiment" herein do not necessarily all refer to the same embodiment.
In the description provided herein, numerous specific details are set forth. However, it is understood that embodiments of the invention may be practiced without these specific details. In some instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and are not limiting; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. A method of producing an optical film, the optical film comprising at least one film layer, the method comprising:
determining the actual design thickness of each thin film layer;
determining the plating thickness of each film layer, wherein the plating thickness of the film layer is the product of the actual design thickness of the film layer and the machine table coefficient corresponding to the film layer;
forming the optical film on the substrate according to the plating thickness of each film layer to obtain an optical film element;
wherein said determining the actual design thickness of each of said film layers comprises:
determining an initial design thickness of each of the thin film layers;
determining the virtual plating thickness of each film layer, wherein the virtual plating thickness of the film layer is the product of the initial design thickness of the film layer and the machine table coefficient corresponding to the film layer;
forming a virtual optical film on a virtual substrate through a software simulation technology to obtain a virtual optical film element;
performing virtual optical characteristic test on the virtual optical thin film element to obtain a virtual optical characteristic curve;
judging whether the virtual optical characteristic curve meets the design requirement or not;
if not, adjusting the initial design thickness of at least one thin film layer until the virtual optical characteristic curve of the virtual optical thin film element meets the design requirement, wherein the film thickness of each thin film layer corresponding to the design requirement is the actual design thickness of each thin film layer;
if yes, determining the initial design thickness of each thin film layer as the actual design thickness of each thin film layer;
the virtual optical characteristic curve comprises an S light transmission curve and a P light transmission curve;
the determining whether the virtual optical characteristic curve meets the design requirement includes:
and judging whether the absolute value of the difference value of the transmittance of the P light transmission curve and the S light transmission curve in a preset wave band belongs to a preset interval or not.
2. The method of manufacturing according to claim 1, wherein the optical film comprises a depolarizing spectroscopic film; the virtual optical film comprises a virtual depolarization beam splitting film; the virtual optical film element includes a virtual depolarizing beam splitter prism.
3. The method of claim 2, wherein if not, adjusting the initial design thickness of at least one of the film layers until the virtual optical characteristic of the virtual optical film element meets design requirements comprises:
and if the absolute value of the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve in the preset wave band does not belong to the preset interval, adjusting the initial design thickness of at least one thin film layer until the absolute value of the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve in the preset wave band is in the preset interval.
4. The method of claim 2, wherein determining the initial design thickness of each of the thin film layers as the actual design thickness of each of the thin film layers if so comprises:
and if the absolute value of the difference value of the transmittance of the P light transmission curve and the transmittance of the S light transmission curve in the preset wave band belongs to a preset interval, determining the initial design thickness of each thin film layer as the actual design thickness of each thin film layer.
5. The method of claim 2, wherein the predetermined interval includes an interval [0%,15% ], and the predetermined wavelength band includes a wavelength band [630nm, 630nm ].
6. The method of claim 2, wherein the depolarizing dichroic film comprises a plurality of dichroic film layers disposed in a stack, the dichroic film layers comprising a first sub-layer and a second sub-layer disposed in an alternating stack, wherein the first sub-layer has a refractive index greater than the refractive index of the second sub-layer;
the machine coefficients corresponding to the first sub-layer are different from the machine coefficients corresponding to the second sub-layer.
7. The method of claim 6, wherein the first sub-layer comprises Ti 3 O 5 A layer, the second sub-layer comprising SiO 2 A layer;
the machine table coefficient corresponding to the first sub-layer is smaller than the machine table coefficient corresponding to the second sub-layer.
8. The method of manufacturing according to claim 1, wherein said forming the optical film on the substrate according to the plating thickness of each of the film layers to obtain the optical film element comprises:
and forming the optical film on the surface to be coated of the substrate by adopting a vacuum evaporation coating process according to the coating thickness of each film layer so as to obtain an optical film element.
9. An optical film formed by the method of producing an optical film according to any one of claims 1 to 8.
10. An optical film element comprising the optical film of claim 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310499280.4A CN116590683B (en) | 2023-05-05 | 2023-05-05 | Optical film, preparation method thereof and optical film element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310499280.4A CN116590683B (en) | 2023-05-05 | 2023-05-05 | Optical film, preparation method thereof and optical film element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116590683A CN116590683A (en) | 2023-08-15 |
| CN116590683B true CN116590683B (en) | 2023-12-26 |
Family
ID=87589136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310499280.4A Active CN116590683B (en) | 2023-05-05 | 2023-05-05 | Optical film, preparation method thereof and optical film element |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116590683B (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0882517A (en) * | 1994-09-12 | 1996-03-26 | Ulvac Japan Ltd | Film thickness monitoring control method |
| JP2002053957A (en) * | 2000-08-04 | 2002-02-19 | Canon Inc | Method and apparatus for film deposition |
| CN101464536A (en) * | 2008-12-30 | 2009-06-24 | 中国科学院上海光学精密机械研究所 | Production method for 0 degree incidence polarizing film |
| CN102191475A (en) * | 2011-04-15 | 2011-09-21 | 中国科学院上海光学精密机械研究所 | Film thickness monitoring method capable of increasing spectral characteristics of film |
| WO2015004755A1 (en) * | 2013-07-10 | 2015-01-15 | 株式会社シンクロン | Optical film thickness measurement device, thin film forming device, and method for measuring film thickness |
| CN105088172A (en) * | 2015-09-21 | 2015-11-25 | 京东方科技集团股份有限公司 | Film thickness control system and method |
| CN107893216A (en) * | 2017-09-30 | 2018-04-10 | 同济大学 | A kind of method corrected quartzy monitoring method and prepare broadband anti-reflection film deposition errors |
| CN110687681A (en) * | 2019-09-10 | 2020-01-14 | 华中科技大学 | Optical film system optimization design method and product |
| CN113403601A (en) * | 2021-06-21 | 2021-09-17 | 中国科学院光电技术研究所 | Optical control device and method for coating thickness |
| CN113774353A (en) * | 2021-09-15 | 2021-12-10 | 佛山市博顿光电科技有限公司 | Technological parameter optimization method and device in film coating process and film coating real-time monitoring system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3189359A1 (en) * | 2015-09-03 | 2017-07-12 | 3M Innovative Properties Company | Optical system |
-
2023
- 2023-05-05 CN CN202310499280.4A patent/CN116590683B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0882517A (en) * | 1994-09-12 | 1996-03-26 | Ulvac Japan Ltd | Film thickness monitoring control method |
| JP2002053957A (en) * | 2000-08-04 | 2002-02-19 | Canon Inc | Method and apparatus for film deposition |
| CN101464536A (en) * | 2008-12-30 | 2009-06-24 | 中国科学院上海光学精密机械研究所 | Production method for 0 degree incidence polarizing film |
| CN102191475A (en) * | 2011-04-15 | 2011-09-21 | 中国科学院上海光学精密机械研究所 | Film thickness monitoring method capable of increasing spectral characteristics of film |
| WO2015004755A1 (en) * | 2013-07-10 | 2015-01-15 | 株式会社シンクロン | Optical film thickness measurement device, thin film forming device, and method for measuring film thickness |
| CN105088172A (en) * | 2015-09-21 | 2015-11-25 | 京东方科技集团股份有限公司 | Film thickness control system and method |
| CN107893216A (en) * | 2017-09-30 | 2018-04-10 | 同济大学 | A kind of method corrected quartzy monitoring method and prepare broadband anti-reflection film deposition errors |
| CN110687681A (en) * | 2019-09-10 | 2020-01-14 | 华中科技大学 | Optical film system optimization design method and product |
| CN113403601A (en) * | 2021-06-21 | 2021-09-17 | 中国科学院光电技术研究所 | Optical control device and method for coating thickness |
| CN113774353A (en) * | 2021-09-15 | 2021-12-10 | 佛山市博顿光电科技有限公司 | Technological parameter optimization method and device in film coating process and film coating real-time monitoring system |
Non-Patent Citations (1)
| Title |
|---|
| 晶振膜厚监控技术中Tooling Factor的精确标定;张立超;;光机电信息;第27卷(第11期);56-60 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116590683A (en) | 2023-08-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2020015103A1 (en) | 3d identification filter | |
| CN108265269B (en) | Coating method for improving environmental stability of multilayer laser film element | |
| CN110133783B (en) | Manufacturing method of infrared narrow-band filter | |
| CN111235527B (en) | Method for manufacturing optical thin film, film system structure, film coating method and laser reflector | |
| CN1687807A (en) | ZnS infrared window transparent increasing protective film and its preparing method | |
| US9964670B2 (en) | Inorganic optical element having a birefringent film with a columnar structure and a protective film formed thereon and method for manufacturing same | |
| CN112063974A (en) | Dichroic mirror based on sandwich-like structure interface and composite material and preparation method thereof | |
| CN110058343B (en) | Preparation method of short wave pass filter film based on multi-angle spectral measurement | |
| CN116590683B (en) | Optical film, preparation method thereof and optical film element | |
| JP4804830B2 (en) | Multilayer film forming method and film forming apparatus | |
| CN111638572B (en) | 3D structured light 940nm narrow-band filter and preparation method thereof | |
| CN111286700B (en) | Surface shape compensation method of optical coating element based on mixture single-layer film | |
| CN104849861A (en) | Method for preparing high-performance optical thin film | |
| Jakobs et al. | Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering | |
| US20180024276A1 (en) | Optical elements with stress-balancing coatings | |
| Hodgkinson et al. | Vacuum deposited biaxial thin films with all principal axes inclined to the substrate | |
| CN113703078A (en) | Broadband antireflection film for visible light region and preparation method thereof | |
| CN107561614B (en) | Large-aperture uniform optical filter and preparation method thereof | |
| JPH0790583A (en) | Thin film forming method | |
| Ma et al. | Non-polarizing broadband dichroic mirror | |
| CN116497310B (en) | Optical film element and preparation method thereof | |
| CN111378934B (en) | Coating method for improving spectrum and stress aging stability of electron beam evaporation film element | |
| CN114114703A (en) | All-dielectric depolarization beam splitter prism suitable for wide-angle incidence and preparation method thereof | |
| Marszałek et al. | The GdF3/MgF2 bilayer as an antireflective narrow-band ultraviolet filter | |
| Glocker et al. | System for Sputtering Uniform Optical Coatings on Flat and Curved Surfaces Without Masks |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |