CN116149132A - Embossing method - Google Patents

Abstract

The invention discloses an imprinting method, which comprises the following steps: providing a fluid expansion device, a flexible membrane and a substrate; arranging the soft film and the substrate oppositely; inflating the fluid expansion device, wherein the fluid expansion device presses the soft film so as to enable the soft film to move towards the substrate and be attached to the substrate; continuously inflating the fluid expansion device to enable the fluid expansion device to uniformly cover one side of the soft film far away from the substrate; maintaining the pressure of the fluid expansion device; releasing the gas in the fluid expansion device and separating the flexible membrane from the substrate. The soft film can be uniformly stressed in the imprinting process, and the imprinting work is completed by keeping the pressure in the inflation pressure device inconvenient. As the soft film is continuously subjected to uniform pressure, the reduction degree of the micro-nano structure after imprinting can be greatly improved, the yield and the imprinting precision are improved, and the finer micro-nano structure can be imprinted.

Description

Embossing method

Technical Field

The invention relates to the technical field of nanoimprinting, in particular to an imprinting method.

Background

In the development of semiconductor technology, the feature size of devices is smaller and smaller, and the photolithography process is becoming more complex, which also results in the increasing cost of the next generation photolithography technology. The reduction in exposure wavelength is required to reduce the feature size. Whereas nanoimprint techniques are not limited by the shortest exposure wavelength, but only by the precision of the template. Compared with the traditional photoetching technology, the nano-imprinting technology can prepare patterns with ultrahigh precision in a large scale under the condition of adopting lower cost, has good uniformity and repeatability, and can be compatible with the traditional photoetching technology to a great extent. Besides the very wide application prospect in the integrated circuit field, the nano-imprinting can be used for preparing the sub-wavelength grating with the period smaller than the optical wavelength in the optical field.

However, in the nanoimprint method in the prior art, a roller is generally used to assist in nanoimprint, the micro-nano structure on the template is imprinted on the soft film through the roller, and then solidification is performed after imprinting is completed, so that deviation occurs between the micro-nano structure and the template. Meanwhile, particularly when aiming at, for example, a tilted grating or a symmetrical structure, the nanoimprint method in the prior art may deteriorate the symmetry of the product, resulting in a decrease in the precision of the product.

Disclosure of Invention

The invention aims to provide a novel technical scheme of an imprinting method.

The embodiment of the application provides an imprinting method, which comprises the following steps:

providing a fluid expansion device, a flexible membrane and a substrate;

arranging the soft film and the substrate oppositely;

inflating the fluid expansion device, wherein the fluid expansion device presses the soft film so as to enable the soft film to move towards the substrate and be attached to the substrate;

continuously inflating the fluid expansion device to enable the fluid expansion device to uniformly cover one side of the soft film far away from the substrate;

maintaining the pressure of the fluid expansion device;

releasing the gas in the fluid expansion device and separating the flexible membrane from the substrate.

Optionally, a first micro-nano structure is disposed on a side of the flexible film facing the substrate, a first imprinting material layer is disposed on a side of the substrate facing the flexible film, and the fluid expansion device is inflated, so that the first micro-nano structure is imprinted on the first imprinting material layer.

Optionally, the flexible film is provided with the adhesive linkage towards one side of the base plate, the base plate is provided with the second micro-nano structure towards one side of the flexible film, the second imprinting material layer will the cladding of second micro-nano structure, to aerify the fluid expansion device, so that the second micro-nano structure imprints on the second imprinting material layer, when will the flexible film is to keeping away from with the direction of base plate is raised, the second imprinting material layer passes through the adhesive linkage with the flexible film is fixed, and along with the rising of flexible film, the second imprinting material layer with the base plate separation.

Optionally, the direction of the soft film is irradiated by a curing lamp in the process of maintaining the pressure of the fluid expansion device.

Optionally, the substrate is placed on a carrier plate, and the carrier plate is provided with a plurality of air pumping holes, and the positions of the substrate are fixed through the air pumping holes.

Optionally, in the imprinting process, the heating wire in the carrier disc is in a starting state.

Optionally, a plurality of height-adjustable film-separating columns are arranged on the periphery of the substrate, and the film-separating columns are lifted to enable the height of the soft film to be lifted and enable the soft film to be separated from the substrate.

Alternatively, the dwell time is 15s-25s.

Optionally, after the soft film is contacted with the substrate, the inflation amount in the fluid expansion device is continuously increased to enable the fluid expansion device to be deformed on one side of the soft film until the fluid expansion device covers the soft film.

Optionally, a third micro-nano structure is arranged on the soft film, a fourth micro-nano structure is arranged on the substrate, a third imprinting material layer is arranged on one side, facing the soft film, of the substrate, and the fluid expansion device is inflated, so that the third micro-nano structure is imprinted on the third imprinting material layer.

The inventor of the present invention found that in the prior art, when imprinting is performed on, for example, an oblique grating or a symmetrical structure, the imprinting is performed by the roller, and the stress of the flexible film is not uniform enough due to the special pressure application direction of the roller, and the direction is single, so that the pattern on the final product is partially missing or not clear enough, and defective products are generated. However, there is no imprinting method in the prior art, which can improve the definition of the pattern after the imprinting process. The technical task to be achieved or the technical problem to be solved by the present invention is therefore a new technical solution, which has never been conceived or not yet been contemplated by the person skilled in the art.

According to the imprinting method, the mode of applying pressure to the soft film is changed, so that the soft film can be uniformly stressed in the imprinting process, and the imprinting work is completed by keeping the pressure in the inflation pressure device inconvenient. As the soft film is continuously subjected to uniform pressure, the reduction degree of the micro-nano structure after imprinting can be greatly improved, the yield and the imprinting precision are improved, and the finer micro-nano structure can be imprinted.

Other features of the present invention and its advantages will become apparent from the following detailed description of exemplary embodiments of the invention, which proceeds with reference to the accompanying drawings.

Drawings

The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description, serve to explain the principles of the invention.

FIG. 1 is one of schematic structural views of an imprint apparatus in an embodiment of the present application;

FIG. 2 is a second schematic diagram of an embodiment of an embossing apparatus;

FIG. 3 is a top view of an embossing apparatus in an embodiment of the present application;

FIG. 4 is a schematic structural view of a flexible film carrier according to an embodiment of the present disclosure;

fig. 5 is a schematic structural diagram of a separation column in the first posture in the embodiment of the present application;

fig. 6 is a schematic structural diagram of the separation column in the second posture in the embodiment of the present application;

FIG. 7 is a schematic view of a structure of a carrier tray according to an embodiment of the present application;

fig. 8 to 14 are schematic views of an imprinting flow in the first embodiment;

fig. 15 to 21 are schematic diagrams of an imprint process in the second embodiment.

Reference numerals

1. A base; 2. a carrier plate; 21. an air suction hole; 3. a substrate; 4. separating a membrane column; 41. a bottom post; 42. a positioning pin; 43. a deformation mechanism; 44. a telescoping mechanism; 5. a soft film carrying device; 51. a soft film; 52. a frame; 53. a positioning ring; 54. an elastic member; 6. a fluid expansion device; 7. imprinting a material layer; 8. a curing light; 9. and an adhesive layer.

Detailed Description

Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that: the relative arrangement of the components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless it is specifically stated otherwise.

The following description of at least one exemplary embodiment is merely exemplary in nature and is in no way intended to limit the invention, its application, or uses.

Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but are intended to be part of the specification where appropriate.

In all examples shown and discussed herein, any specific values should be construed as merely illustrative, and not a limitation. Thus, other examples of exemplary embodiments may have different values.

It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further discussion thereof is necessary in subsequent figures.

Before describing the imprinting method in the embodiment of the present application in detail, the imprinting apparatus in the embodiment of the present application is described in detail, where:

as shown in fig. 1 to 7, an imprint apparatus includes:

the base 1, the base 1 is provided with a carrying disc 2, the carrying disc 2 is configured to carry a substrate 3, and a plurality of lifting or lowering separation columns 4 are symmetrically arranged on the base 1 and around the carrying disc 2; the base 1 is used for bearing other structures such as a carrier disc 2, a release column 4 and the like. The height of the soft film 51 can be adjusted by the film separation column 4, so that the imprinting is facilitated, and meanwhile, after the imprinting is finished, the soft film 51 and the substrate 3 can be separated by the film separation column 4. The carrier disc 2 may be used to carry a substrate 3, the side of the substrate 3 remote from the carrier disc being coated with a layer 7 of imprinting material. The substrate 3 is typically made of silicon, gallium arsenide, or the like, and has a certain hardness.

The soft film bearing device 5, the soft film 51 is configured to fix the soft film 51, and the side edges of the soft film bearing device 5 are respectively connected to the plurality of film separation columns 4; the soft film bearing device 5 is used for fixing the soft film 51, and the soft film bearing device 5 is connected to the film separating column 4, and the soft film 51 is arranged above the carrying disc 2 through the soft film bearing device 5.

The fluid expansion device 6 is positioned above the carrier plate 2, when no fluid is introduced into the fluid expansion device 6, the inflatable collision device is in a contracted state, and after the fluid is introduced into the fluid expansion device 6, the fluid expansion device 6 is in an expanded state and presses the soft film 51 towards the substrate 3; the fluid expansion means 6 may be configured like a balloon, and by inflating the fluid expansion means 6, the volume of the fluid expansion means 6 is increased so as to be in contact with the flexible membrane 51, and the flexible membrane 51 is pressed toward the carrier disc 2. Wherein, the micro-nano structure is arranged on the soft film 51, the soft film 51 is contacted with the imprinting material layer 7 on the substrate 3 through the fluid expansion device 6, and the fluid expansion device 6 is continuously inflated, so that the soft film 51 is completely attached to the substrate 3, and the micro-nano structure on the soft film 51 can be imprinted on the imprinting material layer 7 through continuously applying pressure to the soft film 51. Meanwhile, the fluid that can be introduced into the fluid expansion device 6 is not limited to a gas, but may be a liquid or a mixture of a gas and a liquid, and the fluid that can uniformly deform the fluid expansion device 6 is not particularly limited herein.

When the fluid expansion device 6 is inflated to make the flexible film 51 closely adhere to the imprinting material layer 7 of the substrate 3, the inflation amount in the fluid expansion device 6 is controlled, so that the volume of the fluid expansion device 6 can be kept unchanged, the pressure applied to the flexible film 51 is not changed correspondingly, the pressure maintaining effect is achieved, the imprinting work can be completed by the flexible film 51 under the most suitable pressure, and the excessive deformation of the imprinting material layer 7 caused by the overlarge pressure is avoided, and defective products are generated. Meanwhile, the micro-nano structure on the soft film 51 can be more clearly stamped on the stamping material layer 7 in the pressure maintaining process, so that the finished product effect is improved.

Specifically, after the fluid expansion device 6 presses the flexible film 51 against the imprinting material layer 7, the position of the flexible film 51 cannot be moved. The inflation of the fluid expansion means 6 is continued, and at this time, the shape of the fluid expansion means 6 is further changed, and the contact area between the fluid expansion means 6 and the flexible membrane 51 is gradually increased. By controlling the intake air amount of the fluid expansion device 6 until the fluid expansion device 6 completely covers the flexible membrane 51, the fluid expansion device 6 is kept at the same time in volume and pressure, so that the flexible membrane 51 can be uniformly stressed. At this time, the soft film 51 is uniformly stressed everywhere, so that the problem of bubble removal in the imprinting process is better solved, and meanwhile, the micro-nano structure is better reduced, so that the micro-nano structure on the substrate 3 is more accurate, and the yield is improved.

And a curing lamp 8, wherein the curing lamp 8 is arranged on the periphery side of the fluid expansion device 6, and the curing lamp 8 irradiates towards the direction of the carrier plate 2. In the pressure maintaining process, the curing lamp 8 is started, so that the stamping efficiency can be greatly improved, and the production rate of manufacturers can be improved. Meanwhile, the imprinting material layer 7 is rapidly solidified, so that the micro-nano structure can be imprinted on the imprinting material layer 7 as soon as possible, and the accuracy of the imprinting process is further enhanced.

By erecting a frame on the base 1, the curing light 8 and the fluid expansion device 6 are both arranged above the carrier plate 2 by the frame.

The product imprinted by the imprinting method has a clearer micro-nano structure, and the yield can be improved. If the aspect ratio of the micro-nano structure is high, the fluid expansion device 6 can better exhaust the gas in the micro-nano structure, so that the reduction degree is improved. Meanwhile, if the micro-nano structure on the flexible film 51 is obliquely arranged in multiple directions, the micro-nano structure is similar to the structure of an oblique grating and the like, or is axisymmetric, rotationally symmetric and the like, the patterns on the flexible film 51 cannot be clearly stamped on the substrate 3 due to unidirectional rolling of the rollers in the technical scheme in the prior art, so that the use of a finished product is affected. However, the fluid expansion device 6 in the embodiment of the present application can apply a uniform pressure to the surface of the flexible film 51, and meanwhile, the micro-nano structure on the flexible film 51 can be clearly and completely imprinted on the substrate 3 through the pressure maintaining function of the fluid expansion device 6.

Meanwhile, as shown in fig. 8 to 21, when imprinting is performed on a structure such as an inclined grating, since a plurality of groups of obliquely arranged gaps are formed on the inclined grating, bubbles are generated in the gaps during imprinting, but in the imprinting method in the prior art, bubbles in the gaps cannot be completely discharged, so that the imprinting effect is deteriorated, the finished product cannot reach the required precision, defective products are generated, the yield is reduced, and the cost is increased. In contrast, the imprinting apparatus according to the embodiment of the present invention can achieve the effect of uniformly applying pressure from the center to the periphery by the fluid expansion means 6. Regardless of the structure of the inclined grating, the imprinting equipment in the embodiment of the application can discharge bubbles, so that the yield is greatly improved. Meanwhile, after the fluid is introduced into the fluid expansion device 6, the central area firstly contacts the soft film 51, the soft film 51 is pressed onto the substrate 3, meanwhile, the fluid is continuously filled into the fluid expansion device 6, the contact area between the fluid expansion device 6 and the soft film 51 is gradually increased, and the fluid expansion device uniformly spreads from the central area of the soft film to the periphery, so that the imprinting from the center to the edge is realized. Aiming at a specific pattern, the air bubbles can be effectively discharged, and meanwhile, the pattern can be uniformly stressed, so that the integrity of imprinting is improved.

Optionally, the flexible film carrying device 5 includes a frame 52 and positioning rings 53, where the positioning rings 53 are disposed on the outer peripheral side of the frame 52, and the positioning rings 53 are respectively in one-to-one correspondence with different positions of the separation film columns 4, and the flexible film 51 is disposed in the frame 52. The frame 52 is used for carrying the flexible film 51, and the plurality of positioning rings 53 can be respectively sleeved on different film separating columns 4, and after the film separating columns 4 are lifted, the position of the flexible film carrying device 5 can be driven to be lifted, so that the flexible film 51 is separated from the substrate 3.

Optionally, the release film column 4 comprises a bottom column 41, a positioning pin 42 and a deformation mechanism 43, the bottom column 41 is arranged on the base 1, one end of the positioning pin 42 is connected with the bottom column 41, the other end of the positioning pin 42 is connected with the deformation mechanism 43, and the deformation mechanism 43 comprises a first posture and a second posture; if the volume of the product imprinted by the imprinting equipment is unchanged, the bottom column 41 can be fixedly arranged on the base 1, and the space between the several separation columns 4 is unchanged; if the stamping device needs different stamped products and the sizes of the different products are different, that is, the size of the substrate 3 and the size of the flexible film 51 are different, the bottom post 41 can be slidably arranged on the base 1, so that the size of the space between the several separation film posts 4 can be conveniently adjusted when different products are manufactured. The diameter of the positioning pin 42 is smaller than the inner diameter of the positioning ring 53, the positioning ring 53 passes through the deformation mechanism 43 and is sleeved on the positioning pin 42, and after the positioning rings 53 are sleeved on the corresponding film separation columns 4 one by one, the frame 52 can be stretched out by adjusting the positions of the film separation columns 4, so that the flatness of the soft film 51 is further ensured.

When the deformation mechanism 43 is in the first posture, the diameter of the deformation mechanism 43 is smaller than the inner diameter of the positioning ring 53, and the positioning ring 53 can pass through the deformation mechanism 43 and is sleeved on the positioning pin 42; the first posture of the deformation mechanism 43 is in a contracted state, and the diameter of the deformation mechanism 43 in the contracted state is smaller than the inner diameter of the positioning ring 53, so that the positioning ring 53 can conveniently pass through.

When the deforming mechanism 43 is in the second posture, the diameter of the deforming mechanism 43 is larger than the outer diameter of the positioning ring 53, and the deforming mechanism 43 is configured to limit the positioning ring 53. The first posture of the deformation mechanism 43 is in an unfolding state, the diameter of the deformation mechanism 43 in the unfolding state is larger than the outer diameter of the positioning ring 53, the positioning ring 53 is prevented from falling off from the film separation column 4, deviation occurs in the imprinting process, and the micro-nano structure on the soft film 51 cannot be completely imprinted on the substrate 3.

Optionally, a telescopic mechanism 44 is disposed in the bottom post 41, one end of the positioning pin 42 away from the deformation mechanism 43 is connected with the telescopic mechanism 44, and when the deformation mechanism 43 is in the second posture, the deformation mechanism 43 and the telescopic mechanism 44 cooperate to limit the positioning ring 53. The telescopic mechanism 44 is used for supporting the positioning ring 53 towards one end of the deformation mechanism 43, when the telescopic mechanism 44 stretches, the telescopic mechanism 44 pushes the positioning ring 53 to move towards a direction away from the base 1, and the position of the soft film 51 is lifted, so that the soft film 51 is separated from the substrate 3. When the substrates 3 having different thicknesses are embossed, if the thickness of the substrate 3 is too large in order to control the distance between the flexible film 51 and the substrate 3, the flexible film 51 is easily stuck to the substrate 3 without being embossed in the process of mounting the flexible film 51, and the flexible film 51 is easily broken. Therefore, in order to maintain the flatness of the flexible film 51 before embossing, if the thickness of the substrate 3 is too large, the telescopic mechanism 44 can be started to raise the height of the release film column 4, accordingly, when the positioning ring 53 is sleeved on the positioning pin 42, the height of the telescopic mechanism 44 supporting the positioning ring 53 is raised correspondingly because of the raised height of the telescopic mechanism 44, so that the height of the flexible film 51 is raised, and the situation that the flexible film 51 is damaged when the flexible film 51 is not embossed is avoided to be directly contacted with the substrate 3.

Optionally, the frame 52 is a rectangular frame 52, two opposite side walls of the frame 52 are respectively provided with a first sliding rail and a second sliding rail, a first sliding rail and a second sliding rail are arranged between the first sliding rail and the second sliding rail in parallel, two inner walls of the frame 52, where the first sliding rail and the second sliding rail are not arranged, are respectively provided with a plurality of elastic pieces 54, the first sliding rail and the second sliding rail are connected to the frame 52 through the elastic pieces 54, and the flexible film 51 is fixed on the first sliding rail and the second sliding rail. By changing the distance between the first sliding rod and the second sliding rod, the area for accommodating the soft film 51 can be changed, and the elastic piece 54, the first sliding rod and the second sliding rod are matched, so that after the soft film 51 is installed, the soft film 51 is in an unfolding state, and the phenomenon that folds on the soft film 51 affect the impression effect is avoided. Meanwhile, in the embossing process, after the fluid expansion device 6 presses the flexible film 51, the flexible film 51 applies a tensile force to the first slide bar in the direction of the second slide bar, and applies a tensile force to the second slide bar in the direction of the first slide bar. At this time, the elastic member 54 provided on the first slide bar applies a pulling force to the first slide bar in a direction away from the second slide bar, and the elastic member 54 provided on the second slide bar applies a pulling force to the second slide bar in a direction away from the first slide bar. The deformation process of the soft film 51 is prolonged through the elastic piece 54, and in the process of extruding the soft film 51 by the fluid expansion device 6, the soft film 51 can be kept flat, so that the integrity of the micro-nano structure on the soft film 51 is further ensured, and the reduction degree of the pattern on the substrate 3 after the imprinting is finished is improved.

Alternatively, each of the separation columns 4 may be raised individually, or at least two separation columns 4 may be raised simultaneously. When the soft film 51 and the substrate 3 are separated, the height of a single film separating column 4 can be controlled according to different requirements of different products, parts of the soft film 51 are separated from the substrate 3, and then the film separating columns 4 at different positions are lifted, so that the soft film 51 at the corresponding positions is separated from the substrate 3, and finally, all the film separating columns 4 are controlled to be lifted, so that the soft film 51 is thoroughly separated from the substrate 3. Meanwhile, according to the comprehensive factors such as the embossing time and the like of the soft films 51 with different thicknesses and different materials, a plurality of the separation columns 4 can be selected to be lifted simultaneously, or all the separation columns 4 can be lifted simultaneously, so that a person skilled in the art can make different selections according to different application scenes, and the details are not repeated here.

Optionally, a plurality of circles of pumping holes 21 with different diameters are uniformly arranged on the carrier plate 2, and the pumping holes 21 are used for fixing the substrate 3. The vacuumizing effect between the substrate 3 and the carrying disc 2 is achieved through the vacuumizing hole 21, so that the substrate 3 can be stably arranged on the carrying disc 2 in the imprinting process, the position change of the substrate 3 in the imprinting process is avoided, the pattern is damaged, and unusable inferior products are generated.

Optionally, the height of the carrier plate 2 is adjustable, and a heating wire is provided in the carrier plate 2. If the thickness of the substrate 3 is sufficiently thin, even if the distance from the film post 4 is lowered to the lowest position, a large gap is still provided between the flexible film 51 and the substrate 3, and at this time, by raising the height of the carrier tray 2, the gap between the substrate 3 and the flexible film 51 is reduced until the desired gap is reached. The gap between the substrate 3 and the soft film 51 is prevented from being too large, so that the soft film 51 is prevented from being damaged in the imprinting process. The heating wire is started in the imprinting process, so that the imprinting material layer 7 is heated, the temperature of the imprinting material layer 7 reaches the temperature most suitable for imprinting, and meanwhile, the imprinting efficiency is improved by matching the fluid expansion device 6 and the curing lamp 8.

Optionally, at least one third sliding rail is arranged on the base 1, and the release film column 4 is arranged on the third sliding rail. The separation column 4 is arranged on the third sliding rail, so that the position of the separation column 4 can be adjusted. According to different demands, the base 1 can be provided with third sliding rails corresponding to the positions of the film separating columns 4, the third sliding rails are obliquely arranged and face the center of the base 1, the film separating columns 4 are controlled to slide on the third sliding rails, the positions of the film separating columns 4 are adjusted, the space between the film separating columns 4 is adjusted, the space is increased, and the soft film 51 and the substrate 3 with larger area can be accommodated. Meanwhile, according to different shapes of different products, the plurality of third sliding rails can correspondingly adjust the setting direction, for example, only the width between the film separation columns 4 in the horizontal direction can be adjusted, or only the distance between the film separation columns 4 in the vertical direction can be adjusted.

Optionally, a rack is erected on the base 1, the fluid expansion device 6 is arranged on the rack, the curing lamp 8 and the visual identification device are further erected on the rack, the curing lamp 8 and the visual identification device are arranged on the periphery side of the fluid expansion device 6, the illumination direction of the curing lamp 8 faces the carrying disc 2, and the identification direction of the visual identification device faces the carrying disc 2. The UV lamp is usually selected according to the curing lamp 8, but the curing lamp 8 can be adjusted accordingly according to the change of the imprinting material layer 7. The visual recognition device can accurately recognize the positional relationship between the flexible film 51 and the substrate 3, and is convenient for the operator to adjust.

Describing in detail an imprinting method provided in an embodiment of the present application, the imprinting method in the implementation of the present application includes:

providing a fluid expansion device 6, a flexible membrane 51 and a substrate 3;

disposing the flexible film 51 and the substrate 3 to face each other;

inflating the fluid expansion device 6, wherein the fluid expansion device 6 presses the soft film 51 so that the soft film 51 moves towards the substrate 3 and is attached to the substrate 3;

continuing to inflate the fluid expansion means 6 so that the fluid expansion means 6 uniformly covers the side of the flexible membrane 51 remote from the substrate 3; when the flexible film 51 contacts the substrate 3, the contact area between the fluid expansion device 6 and the flexible film 51 is gradually increased until the fluid expansion device 6 completely covers the flexible film 51, and the inflation amount is maintained.

Maintaining the pressure of the fluid expansion device 6; the volume of the fluid expansion means 6 is kept unchanged, and the entire flexible film 51 is subjected to uniform pressure in the direction toward the substrate 3. In the transfer process, if the micro-nano structure is obliquely or symmetrically arranged, the soft film 51 is uniformly stressed, so that the micro-nano structure can be better stamped on the designated structure.

Releasing the gas in the fluid expansion means 6 and separating the flexible membrane 51 from the substrate 3. After the imprinting is completed, the flexible film 51 and the substrate 3 are separated, and single imprinting is completed.

By using the imprinting method in the embodiment, the imprinting effect can be obviously improved, and the imprinting function can be completely and clearly realized aiming at the inclined grating or the symmetrically arranged micro-nano structure, so that the yield and the precision of the product are improved.

Alternatively, the direction of the flexible film 51 is irradiated by the curing lamp 8 during the pressure maintaining of the fluid expansion device 6. When the fluid expansion device 6 is used for maintaining pressure, the soft film 51 and the substrate 3 can be kept in a closely connected relation for a period of time, and meanwhile, the pressure of the fluid expansion device 6 to the soft film 51 is relatively uniform, so that the fluid expansion device can be transferred more completely and clearly when aiming at an inclined grating or a symmetrical micro-nano structure. By using the curing lamp 8 to irradiate in the pressure maintaining process, the curing effect is improved, and the definition and the integrity of the imprinting are further improved.

Optionally, the substrate 3 is placed on the carrier plate 2, and the carrier plate 2 has a plurality of air pumping holes 21, and the positions of the substrate 3 are fixed through the air pumping holes 21. When the air suction holes 21 on the carrier plate 2 are used for sucking air, a vacuum structure can be formed between the substrate 3 and the carrier plate 2, the position of the substrate 3 is fixed, and the phenomenon that defective products are generated due to the fact that the position of the substrate 3 is deviated in the imprinting process is avoided.

Optionally, during the imprinting process, the heating wire in the carrier disc 2 is in a start state. By starting the heating wire, the carrier plate 2 releases enough heat to heat the imprinting material, so that the imprinting temperature is reached, the imprinting efficiency is improved, and the definition of the finished pattern is improved.

Optionally, a plurality of height-adjustable release columns 4 are disposed on the peripheral side of the substrate 3, and the release columns 4 are lifted to raise the height of the flexible film 51 and separate the flexible film 51 from the substrate 3. The film separating column 4 is used for lifting the position of the soft film bearing device 5, so as to drive the soft film 51 to move in a direction away from the substrate 3, and further realize the effect of separating the soft film 51 from the substrate 3.

Alternatively, the dwell time is 15s-25s. According to the depth-to-width ratio of the micro-nano structure and different imprinting materials, the pressure maintaining time is adjusted so that the imprinted product can clearly show the pattern.

Optionally, after the flexible film 51 contacts with the substrate 3, the inflation amount in the fluid expansion device 6 is continuously increased to deform the fluid expansion device 6 attached to one side of the flexible film 51 until the fluid expansion device 6 covers the flexible film 51. After the fluid expansion device 6 expands and deforms, the soft film 51 is pushed to be in contact with the substrate 3, at this time, the fluid expansion device 6 does not cover the soft film 51 completely, so that the fluid expansion device 6 needs to be inflated continuously to enable the fluid expansion device 6 to deform continuously, and then the fluid expansion device 6 covers the soft film 51 completely, at this time, the soft film 51 is subjected to extrusion force in the direction towards the substrate 3, and the extrusion force is uniformly covered on the soft film 51, so that even if the micro-nano structure is complex, the embossing molding can be completed clearly.

The following are examples of specific methods for several different imprint situations using the above-described imprint apparatus and imprint method, and practical applications are not limited to these methods, and those skilled in the art will be able to suitably modify the above-described imprint method according to practical needs.

Example 1

As shown in fig. 8 to 14, the imprinting method in this embodiment, in particular, refers to a case where the micro-nano structure to be imprinted is disposed on the flexible film 51 on a side facing the substrate 3, and the imprinting material is disposed on the substrate 3, and the micro-nano structure on the flexible film 51 needs to be imprinted on the substrate 3.

Optionally, a first micro-nano structure is disposed on a side of the flexible film 51 facing the substrate 3, a first imprinting material layer is disposed on a side of the substrate 3 facing the flexible film 51, and the fluid expansion device 6 is inflated to imprint the first micro-nano structure on the first imprinting material layer. In this embodiment, the first imprinting material layer forms a pattern opposite to the first micro-nano structure, and the substrate 3 is removed, so that the effect of imprinting the first micro-nano structure onto the substrate 3 is achieved. The flexible film 51 in the present embodiment corresponds to a template, the substrate 3 corresponds to a product, and repeated imprinting can be achieved by continuously replacing the substrate 3.

Specifically, a substrate 3 with a first imprinting material layer on one side is placed on a carrier plate 2, and an air suction hole 21 of the carrier plate 2 is started to fix the position of the substrate 3;

the two ends of the soft film 51 are respectively fixed on a first slide bar and a second slide bar, a positioning ring 53 is sleeved on the release film column 4, and the deformation mechanism 43 is started, wherein the positioning ring 53 is limited on the positioning pin 42;

starting the fluid expansion device 6 until the fluid expansion device 6 is completely covered on the soft film 51, at the moment, the soft film 51 is tightly connected with the substrate 3, the pressure in the fluid expansion device 6 is kept constant, and meanwhile, the curing lamp 8 and the heating wire are started for 15-25 s;

and controlling the lifting of the film separating column 4 to drive the soft film bearing device 5 to lift so as to separate the soft film 51 from the substrate 3, wherein the first micro-nano structure on the soft film 51 is stamped on the substrate 3, and the substrate 3 is taken down.

Wherein fig. 8 is a preparation work before imprinting;

in fig. 9, the positions of the flexible film carrier device 5 and the fluid expansion device 6 are adjusted so that the fluid expansion device 6 is in contact with the flexible film 51, and at the same time, the first micro-nano structure on the flexible film 51 is in contact with the first imprinting material layer;

in fig. 10, the fluid is introduced into the fluid expansion device 6 to gradually increase the volume of the fluid expansion device 6, the flexible film 51 is pressed toward the substrate 3, and the first micro-nano structure is inserted into the first imprint material layer;

in fig. 11, the fluid expansion device 6 has been expanded to an optimal volume, and the flexible membrane 51 can be uniformly stressed to reach an optimal imprinting pressure, so that the air pressure in the fluid expansion device 6 is kept unchanged, and the pressure maintaining is started;

in fig. 12, the first imprint material layer is exposed to light in order to start the curing lamp 8;

in fig. 13, the position of the soft film carrying device 5 is gradually raised by the film releasing column 4 in the film releasing operation after the exposure is completed;

in fig. 14, the first micro-nano structure has been imprinted on the first imprinting material layer, so as to complete the imprinting operation.

Example two

As shown in fig. 15 to 21, the imprint method in the present embodiment differs from the first embodiment in that: the micro-nano structure to be imprinted is disposed on the substrate 3 on the side facing the flexible film 51, and the imprinting material is disposed on the substrate 3, so that the micro-nano structure on the substrate 3 is required to be imprinted on the flexible film 51.

Optionally, the side of the flexible film 51 facing the substrate 3 is provided with an adhesive layer 9, the side of the substrate 3 facing the flexible film 51 is provided with a second micro-nano structure, the second micro-nano structure is covered by a second imprinting material layer, the fluid expansion device 6 is inflated, so that the second micro-nano structure is imprinted on the second imprinting material layer, and when the flexible film 51 is lifted away from the substrate 3, the second imprinting material layer is fixed with the flexible film 51 through the adhesive layer 9 and is separated from the substrate 3 along with the lifting of the flexible film 51. The adhesive layer 9 is used to connect the second imprinting material layer to the flexible film 51 in order to avoid that the second imprinting material layer remains connected to the substrate 3 after imprinting is completed, while a release coating may be applied between the substrate 3 and the second imprinting material layer. The second imprinting material layer forms a pattern opposite to the second micro-nano structure, and the substrate 3 is removed, so that the effect of imprinting the second micro-nano structure onto the flexible film 51 is achieved. The substrate 3 in this embodiment corresponds to a template, the flexible film 51 corresponds to a product, and repeated imprinting can be achieved by continuously replacing the flexible film 51.

Specifically, a substrate 3 with a first imprinting material layer on one side is placed on a carrier plate 2, and an air suction hole 21 of the carrier plate 2 is started to fix the position of the substrate 3;

the two ends of the soft film 51 are respectively fixed on a first slide bar and a second slide bar, at the moment, the bonding layer 9 faces the direction of the substrate 3, the positioning ring 53 is sleeved on the release film column 4, and the deformation mechanism 43 is started, wherein the positioning ring 53 is limited on the positioning pin 42;

starting the fluid expansion device 6 until the fluid expansion device 6 is completely covered on the soft film 51, at the moment, the soft film 51 is tightly connected with the substrate 3, the pressure in the fluid expansion device 6 is kept constant, and meanwhile, the curing lamp 8 and the heating wire are started for 15-25 s;

and controlling the lifting of the film separating column 4 to drive the soft film bearing device 5 to lift so as to separate the soft film 51 from the substrate 3, and at the moment, the bonding layer 9 bonds and fixes the second imprinting material layer on the soft film 51, the second micro-nano structure on the substrate 3 is imprinted on the soft film 51, and the soft film 51 is taken down from the soft film bearing device 5.

Wherein fig. 15 is a preparation work before imprinting;

in fig. 16, the positions of the flexible film carrier device 5 and the fluid expansion device 6 are adjusted so that the fluid expansion device 6 is in contact with the flexible film 51, and at the same time, the second imprinting material layer on the substrate 3 is in contact with the adhesive layer 9;

in fig. 17, the fluid is introduced into the fluid expansion device 6, the volume of the fluid expansion device 6 is gradually increased, the flexible film 51 is pressed toward the substrate 3, and the connection strength between the adhesive layer 9 and the second imprinting material layer is gradually increased;

in fig. 18, the fluid expansion device 6 has been expanded to an optimal volume, and the flexible membrane 51 can be uniformly stressed to reach an optimal imprinting pressure, so that the air pressure in the fluid expansion device 6 is kept unchanged, and the pressure maintaining is started;

in fig. 19, the second imprint material layer is exposed to light in order to start the curing lamp 8;

in fig. 20, the position of the soft film carrying device 5 is gradually raised by the film releasing column 4 for the film releasing operation after the exposure is completed;

in fig. 21, the second micro-nano structure on the substrate 3 is already stamped on the second stamping material layer, and the second stamping material layer and the soft film 51 are fixedly connected through the adhesive layer 9, so that stamping work is completed.

Example III

Optionally, a third micro-nano structure is disposed on the soft film 51, a fourth micro-nano structure is disposed on the first side of the substrate 3, the first side of the substrate 3 faces towards the direction away from the soft film 51, and the second side of the substrate 3 faces towards one side of the soft film 51. A third imprinting material layer is provided on the second side, and the fluid expansion device 6 is inflated to imprint the third micro-nano structure on the third imprinting material layer, and finally, the first side of the substrate 3 is provided with a fourth micro-nano structure, and the second side of the substrate 3 is provided with a pattern imprinted by the third micro-nano structure. The third micro-nano structure can be manufactured by using the method in the second embodiment, and the fourth micro-nano structure can be manufactured by using the method in the first embodiment.

For example, the pattern on the first side of the flexible film 51 is a cross structure, the pattern on the first side of the substrate 3 is four rectangular squares arranged in a square shape, gaps are formed between the four rectangular squares, and the second side of the substrate 3 is smooth and flat without any pattern. The first side surface of the substrate 3 is arranged opposite to the soft film 51, the substrate 3 is placed on the carrying disc 2, the soft film 51 is fixed on the soft film carrying device 5, meanwhile, the visual recognition device is started for auxiliary calibration, and the position of the carrying disc 2 and the soft film 51 is adjusted, so that the cross-shaped structure on the soft film 51 can be correspondingly stamped on the position opposite to the gaps among the four rectangular small squares on the second side surface of the substrate 3. Finally, the substrate 3 presents a pattern with four rectangular dice arranged in a square on a first side, and a cross-shaped pattern is imprinted on a second side of the substrate 3, wherein the cross-shaped pattern corresponds to the gap positions between the four rectangular dice. Thereby realizing the double-sided imprinting of the substrate 3, and simultaneously, greatly improving the imprinting precision through the auxiliary calibration of the visual recognition device.

The above three embodiments are only specific applications of the embossing method in the embodiments of the present application, and the present application is not limited to the usage methods of the above three embodiments, and those skilled in the art can perform corresponding adjustment according to actual product requirements.

While certain specific embodiments of the invention have been described in detail by way of example, it will be appreciated by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the invention. It will be appreciated by those skilled in the art that modifications may be made to the above embodiments without departing from the scope and spirit of the invention. The scope of the invention is defined by the appended claims.

Claims (10)

1. An embossing method, comprising:

providing a fluid expansion device, a flexible membrane and a substrate;

arranging the soft film and the substrate oppositely;

inflating the fluid expansion device, wherein the fluid expansion device presses the soft film so as to enable the soft film to move towards the substrate and be attached to the substrate;

continuously inflating the fluid expansion device to enable the fluid expansion device to uniformly cover one side of the soft film far away from the substrate;

maintaining the pressure of the fluid expansion device;

releasing the gas in the fluid expansion device and separating the flexible membrane from the substrate.

2. The imprinting method according to claim 1, wherein a first micro-nano structure is provided on a side of the flexible film facing the substrate, a first imprinting material layer is provided on the substrate facing the flexible film, and the fluid expansion means is inflated to imprint the first micro-nano structure on the first imprinting material layer.

3. The imprinting method according to claim 1, wherein an adhesive layer is provided on a side of the flexible film facing the substrate, a second micro-nano structure is provided on a side of the substrate facing the flexible film, the second micro-nano structure is covered by a second imprinting material layer, the fluid expansion device is inflated to imprint the second micro-nano structure on the second imprinting material layer, and when the flexible film is lifted away from the substrate, the second imprinting material layer is fixed to the flexible film through the adhesive layer and is separated from the substrate along with the lifting of the flexible film.

4. A method of embossing as claimed in any one of claims 1 to 3, wherein the direction of the flexible film is illuminated by a curing light during the pressure maintaining of the fluid expansion means.

5. A stamping method as claimed in any one of claims 1 to 3, wherein the substrate is placed on a carrier plate, the carrier plate having a plurality of pumping holes therein through which the position of the substrate is fixed.

6. The imprinting method according to claim 5, wherein the heating wire in the carrier disc is in an activated state during imprinting.

7. The imprinting method according to claim 1, wherein a plurality of height-adjustable release columns are provided on a peripheral side of the substrate, and the release columns are lifted to raise the height of the flexible film and separate the flexible film from the substrate.

8. The embossing method as set forth in claim 1, wherein the dwell time is 15s-25s.

9. The imprinting method according to claim 1, wherein after the flexible film is contacted with the substrate, the inflation amount in the fluid expansion device is continuously increased to deform the fluid expansion device against one side of the flexible film until the fluid expansion device covers the flexible film.

10. The imprinting method according to claim 1, wherein a third micro-nano structure is provided on the flexible film, a fourth micro-nano structure is provided on the substrate, a third imprinting material layer is provided on a side of the substrate facing the flexible film, and the fluid expansion device is inflated to imprint the third micro-nano structure on the third imprinting material layer.

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